KR101416112B1 - 재료를 서로 접착하는 방법 및 조성물 - Google Patents
재료를 서로 접착하는 방법 및 조성물 Download PDFInfo
- Publication number
- KR101416112B1 KR101416112B1 KR1020087003583A KR20087003583A KR101416112B1 KR 101416112 B1 KR101416112 B1 KR 101416112B1 KR 1020087003583 A KR1020087003583 A KR 1020087003583A KR 20087003583 A KR20087003583 A KR 20087003583A KR 101416112 B1 KR101416112 B1 KR 101416112B1
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- South Korea
- Prior art keywords
- composition
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B9/00—Making granules
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/06—Embossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L59/00—Compositions of polyacetals; Compositions of derivatives of polyacetals
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/015—Imprinting
- B81C2201/0153—Imprinting techniques not provided for in B81C2201/0152
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2451/00—Presence of graft polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Medicinal Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/187,407 US8557351B2 (en) | 2005-07-22 | 2005-07-22 | Method for adhering materials together |
| US11/187,406 | 2005-07-22 | ||
| US11/187,407 | 2005-07-22 | ||
| US11/187,406 US7759407B2 (en) | 2005-07-22 | 2005-07-22 | Composition for adhering materials together |
| PCT/US2006/021948 WO2007050133A2 (en) | 2005-07-22 | 2006-06-05 | Method and composition for adhering materials together |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20080038338A KR20080038338A (ko) | 2008-05-06 |
| KR101416112B1 true KR101416112B1 (ko) | 2014-07-08 |
Family
ID=37968270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087003583A Active KR101416112B1 (ko) | 2005-07-22 | 2006-06-05 | 재료를 서로 접착하는 방법 및 조성물 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8557351B2 (enExample) |
| EP (1) | EP1915888B1 (enExample) |
| JP (1) | JP5084728B2 (enExample) |
| KR (1) | KR101416112B1 (enExample) |
| SG (1) | SG163605A1 (enExample) |
| TW (1) | TWI329239B (enExample) |
| WO (1) | WO2007050133A2 (enExample) |
Families Citing this family (78)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7307118B2 (en) * | 2004-11-24 | 2007-12-11 | Molecular Imprints, Inc. | Composition to reduce adhesion between a conformable region and a mold |
| US20050160934A1 (en) * | 2004-01-23 | 2005-07-28 | Molecular Imprints, Inc. | Materials and methods for imprint lithography |
| US20060108710A1 (en) * | 2004-11-24 | 2006-05-25 | Molecular Imprints, Inc. | Method to reduce adhesion between a conformable region and a mold |
| US7939131B2 (en) * | 2004-08-16 | 2011-05-10 | Molecular Imprints, Inc. | Method to provide a layer with uniform etch characteristics |
| US20060062922A1 (en) * | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
| US7759407B2 (en) * | 2005-07-22 | 2010-07-20 | Molecular Imprints, Inc. | Composition for adhering materials together |
| US8808808B2 (en) * | 2005-07-22 | 2014-08-19 | Molecular Imprints, Inc. | Method for imprint lithography utilizing an adhesion primer layer |
| US8846195B2 (en) * | 2005-07-22 | 2014-09-30 | Canon Nanotechnologies, Inc. | Ultra-thin polymeric adhesion layer |
| US8142703B2 (en) * | 2005-10-05 | 2012-03-27 | Molecular Imprints, Inc. | Imprint lithography method |
| US20080110557A1 (en) * | 2006-11-15 | 2008-05-15 | Molecular Imprints, Inc. | Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces |
| GB0701909D0 (en) * | 2007-01-31 | 2007-03-14 | Imp Innovations Ltd | Deposition Of Organic Layers |
| GB2453766A (en) * | 2007-10-18 | 2009-04-22 | Novalia Ltd | Method of fabricating an electronic device |
| TWI495951B (zh) * | 2007-12-04 | 2015-08-11 | Molecular Imprints Inc | 超薄聚合性黏著層 |
| US9323143B2 (en) * | 2008-02-05 | 2016-04-26 | Canon Nanotechnologies, Inc. | Controlling template surface composition in nano-imprint lithography |
| JP2010080680A (ja) * | 2008-09-26 | 2010-04-08 | Bridgestone Corp | 凹凸パターンの形成方法及び凹凸パターンの製造装置 |
| US8361546B2 (en) * | 2008-10-30 | 2013-01-29 | Molecular Imprints, Inc. | Facilitating adhesion between substrate and patterned layer |
| US20100109195A1 (en) | 2008-11-05 | 2010-05-06 | Molecular Imprints, Inc. | Release agent partition control in imprint lithography |
| US8529778B2 (en) * | 2008-11-13 | 2013-09-10 | Molecular Imprints, Inc. | Large area patterning of nano-sized shapes |
| US20110165412A1 (en) * | 2009-11-24 | 2011-07-07 | Molecular Imprints, Inc. | Adhesion layers in nanoimprint lithograhy |
| WO2012033943A2 (en) * | 2010-09-08 | 2012-03-15 | Molecular Imprints, Inc. | Vapor delivery system for use in imprint lithography |
| JP5218521B2 (ja) | 2010-10-21 | 2013-06-26 | 大日本印刷株式会社 | インプリント方法とこれに用いる転写基材および密着剤 |
| JP5767615B2 (ja) | 2011-10-07 | 2015-08-19 | 富士フイルム株式会社 | インプリント用下層膜組成物およびこれを用いたパターン形成方法 |
| WO2013051735A1 (en) * | 2011-10-07 | 2013-04-11 | Fujifilm Corporation | Underlay film composition for imprints and method of forming pattern and pattern formation method using the same |
| DE102011086889A1 (de) * | 2011-11-22 | 2013-05-23 | Mtu Aero Engines Gmbh | Generatives Herstellen eines Bauteils |
| JP5899145B2 (ja) * | 2012-06-18 | 2016-04-06 | 富士フイルム株式会社 | インプリント用下層膜形成組成物およびパターン形成方法 |
| JP5827180B2 (ja) | 2012-06-18 | 2015-12-02 | 富士フイルム株式会社 | インプリント用硬化性組成物と基板の密着用組成物およびこれを用いた半導体デバイス |
| JP6029506B2 (ja) | 2013-03-26 | 2016-11-24 | 富士フイルム株式会社 | インプリント用下層膜形成組成物およびパターン形成方法 |
| JP6047049B2 (ja) * | 2013-03-27 | 2016-12-21 | 富士フイルム株式会社 | 組成物、硬化物、積層体、下層膜の製造方法、パターン形成方法、パターンおよび半導体レジストの製造方法 |
| TWI656162B (zh) | 2014-06-20 | 2019-04-11 | 日商富士軟片股份有限公司 | 下層膜形成用樹脂組成物、積層體、圖案形成方法及元件的製造方法 |
| TWI635365B (zh) | 2014-08-21 | 2018-09-11 | 日商富士軟片股份有限公司 | Sublayer film forming composition, laminate, pattern forming method, imprint forming kit, and device manufacturing method |
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| CN107075661B (zh) * | 2014-09-26 | 2020-03-17 | 韩国机械研究院 | 形成有多个纳米间隙的基底及其制备方法 |
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| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| KR102295988B1 (ko) | 2014-10-17 | 2021-09-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| US10488753B2 (en) | 2015-09-08 | 2019-11-26 | Canon Kabushiki Kaisha | Substrate pretreatment and etch uniformity in nanoimprint lithography |
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| KR102609439B1 (ko) | 2015-10-30 | 2023-12-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법 |
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| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
| EP4354488A4 (en) | 2021-06-09 | 2025-08-13 | Canon Kk | CURABLE COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD |
| JP2023090491A (ja) | 2021-12-17 | 2023-06-29 | キヤノン株式会社 | 膜形成方法、および物品の製造方法 |
| JP2023116190A (ja) | 2022-02-09 | 2023-08-22 | キヤノン株式会社 | 膜形成方法および物品製造方法 |
| JP2023125842A (ja) | 2022-02-28 | 2023-09-07 | キヤノン株式会社 | パターン形成方法、及び物品製造方法 |
| EP4538019A1 (en) | 2022-06-13 | 2025-04-16 | Canon Kabushiki Kaisha | Curable composition, method for forming inverted pattern, method for forming film, and method for producing article |
| US12325046B2 (en) * | 2022-06-28 | 2025-06-10 | Canon Kabushiki Kaisha | Superstrate including a body and layers and methods of forming and using the same |
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| EP1915888B1 (en) | 2018-12-19 |
| JP2009503139A (ja) | 2009-01-29 |
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| US20070017631A1 (en) | 2007-01-25 |
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| US8557351B2 (en) | 2013-10-15 |
| TWI329239B (en) | 2010-08-21 |
| JP5084728B2 (ja) | 2012-11-28 |
| SG163605A1 (en) | 2010-08-30 |
| TW200710566A (en) | 2007-03-16 |
| EP1915888A2 (en) | 2008-04-30 |
| EP1915888A4 (en) | 2013-05-22 |
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