KR101295438B1 - 편광변조 광학소자 - Google Patents

편광변조 광학소자 Download PDF

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Publication number
KR101295438B1
KR101295438B1 KR1020117024708A KR20117024708A KR101295438B1 KR 101295438 B1 KR101295438 B1 KR 101295438B1 KR 1020117024708 A KR1020117024708 A KR 1020117024708A KR 20117024708 A KR20117024708 A KR 20117024708A KR 101295438 B1 KR101295438 B1 KR 101295438B1
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KR
South Korea
Prior art keywords
polarization
optical element
optical
axis
thickness profile
Prior art date
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Expired - Fee Related
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KR1020117024708A
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English (en)
Korean (ko)
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KR20110122880A (ko
Inventor
다미안 피올카
마르쿠스 데구엔테
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20110122880A publication Critical patent/KR20110122880A/ko
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Publication of KR101295438B1 publication Critical patent/KR101295438B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0147—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on thermo-optic effects

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Polarising Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020117024708A 2004-01-16 2005-01-14 편광변조 광학소자 Expired - Fee Related KR101295438B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US53732704P 2004-01-16 2004-01-16
US60/537,327 2004-01-16
PCT/EP2005/000320 WO2005069081A2 (en) 2004-01-16 2005-01-14 Polarization-modulating optical element

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020067010502A Division KR101165862B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020127001214A Division KR101295439B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자

Publications (2)

Publication Number Publication Date
KR20110122880A KR20110122880A (ko) 2011-11-11
KR101295438B1 true KR101295438B1 (ko) 2013-08-09

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Family Applications (7)

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KR1020117024708A Expired - Fee Related KR101295438B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020117024707A Expired - Fee Related KR101099847B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020117024706A Expired - Fee Related KR101099913B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020117024702A Expired - Fee Related KR101230757B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020127001214A Expired - Fee Related KR101295439B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020127016368A Expired - Fee Related KR101233879B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020067010502A Expired - Fee Related KR101165862B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자

Family Applications After (6)

Application Number Title Priority Date Filing Date
KR1020117024707A Expired - Fee Related KR101099847B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020117024706A Expired - Fee Related KR101099913B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020117024702A Expired - Fee Related KR101230757B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020127001214A Expired - Fee Related KR101295439B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020127016368A Expired - Fee Related KR101233879B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자
KR1020067010502A Expired - Fee Related KR101165862B1 (ko) 2004-01-16 2005-01-14 편광변조 광학소자

Country Status (7)

Country Link
US (6) US8279524B2 (https=)
EP (1) EP1716457B9 (https=)
JP (8) JP4958562B2 (https=)
KR (7) KR101295438B1 (https=)
CN (5) CN101793993B (https=)
AT (1) ATE539383T1 (https=)
WO (1) WO2005069081A2 (https=)

Families Citing this family (187)

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