GB856621A - Improvements in or relating to polarising microscopes - Google Patents
Improvements in or relating to polarising microscopesInfo
- Publication number
- GB856621A GB856621A GB2261156A GB2261156A GB856621A GB 856621 A GB856621 A GB 856621A GB 2261156 A GB2261156 A GB 2261156A GB 2261156 A GB2261156 A GB 2261156A GB 856621 A GB856621 A GB 856621A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polarization
- corrector
- plane
- parallel
- wave plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000010287 polarization Effects 0.000 abstract 9
- 239000000463 material Substances 0.000 abstract 5
- 230000003287 optical effect Effects 0.000 abstract 5
- 241000226585 Antennaria plantaginifolia Species 0.000 abstract 2
- 239000011149 active material Substances 0.000 abstract 1
- 230000008033 biological extinction Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Abstract
856,621. Polarizing microscope. NATIONAL RESEARCH DEVELOPMENT CORPORATION. Oct. 17, 1957 [July 20, 1956], No. 22611/56. Class 97(1) A polarizing microscope includes between a polarizer and rotatable analyser a corrector comprising one or more optical elements producing barrel distortion of the state of polarization of the beam passing through the microscope substantially to balance the pincushion distortion of such state caused by the other optical elements so that parallel plane polarized light reaches the analyser in the absence of a specimen to be observed. A beam of light 1 passes through a diaphragm 11 and thence through a polarizer 2 with a state of polarization indicated by 8 (i.e. plane polarized) to the corrector which includes a slab of birefringent uniaxial material mounted with its optic axis parallel to the axis of the optical system and producing a state of polarization as shown at 13; the corrector further comprises a quarter wave plate 14 which modifies the polarization pattern to that shown at 15 which is barrel distortion sufficient to nullify the pincushion distortion produced by the microscope lens system so that - for a certain axial position of the rotatable analyser 7 - complete extinction is obtained throughout the wavefront. In a second embodiment, the corrector consists of a single half wave plate of biaxial birefringent material with the refractive index parallel to the optical axis of the optical system differing considerably from those on the plane normal to this which are of approximately equal magnitude. Fig. 4 shows a further form of corrector consisting of a plate of optically active material of non uniform thickness - the surfaces being such as to distort the polarization in the required barrel manner. The upper face 20 is convexcylindrical and the lower face 21 of concavecylindrical form - the radii of the two cylinders being equal and their axes at right angles and disposed at 45 degrees to the plane of polarization of the light issuing from the polarizor indicated by the line 22. A further form of corrector comprises a piece of uniaxial birefringent material of the shape shown on Fig. 4, with optic axis perpendicular to the microscope axis and at 45 degrees to the plane of polarization of the rays issuing from the polarizor, in conjunction with which is a plane parallel plate of uniaxial birefringent material together with a quarter wave plate. For use with a strongly converging or diverging incident beam, the corrector may consist only of a half wave plate of uniaxial birefringent material with the slow direction either parallel or perpendicular to the plane of polarization of the incident ray. Also in the case of a strongly converging or diverging beam, the corrector may comprise one or more lenses together with a half wave plate with either its slow or fast direct parallel to the plane polarization.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2261156A GB856621A (en) | 1956-07-20 | 1956-07-20 | Improvements in or relating to polarising microscopes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2261156A GB856621A (en) | 1956-07-20 | 1956-07-20 | Improvements in or relating to polarising microscopes |
Publications (1)
Publication Number | Publication Date |
---|---|
GB856621A true GB856621A (en) | 1960-12-21 |
Family
ID=10182244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2261156A Expired GB856621A (en) | 1956-07-20 | 1956-07-20 | Improvements in or relating to polarising microscopes |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB856621A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005069081A3 (en) * | 2004-01-16 | 2005-11-10 | Zeiss Carl Smt Ag | Polarization-modulating optical element |
WO2005116772A1 (en) * | 2004-05-25 | 2005-12-08 | Carl Zeiss Smt Ag | Apparatus for providing a pattern of polarization |
EP1720047A4 (en) * | 2004-02-06 | 2010-11-03 | Nikon Corp | Polarization conversion element, lighting optical device, exposure system, and exposure method |
US8259393B2 (en) | 2004-01-16 | 2012-09-04 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
US8339578B2 (en) | 2004-01-27 | 2012-12-25 | Nikon Corporation | Optical system, exposure system, and exposure method |
US8482717B2 (en) | 2004-01-16 | 2013-07-09 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
US8675177B2 (en) | 2003-04-09 | 2014-03-18 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas |
US9140992B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9164209B2 (en) | 2003-11-20 | 2015-10-20 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction |
-
1956
- 1956-07-20 GB GB2261156A patent/GB856621A/en not_active Expired
Cited By (58)
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US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
US9146474B2 (en) | 2003-04-09 | 2015-09-29 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas |
US9885959B2 (en) | 2003-04-09 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator |
US9164393B2 (en) | 2003-04-09 | 2015-10-20 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas |
US8675177B2 (en) | 2003-04-09 | 2014-03-18 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas |
US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9760014B2 (en) | 2003-10-28 | 2017-09-12 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9423697B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9244359B2 (en) | 2003-10-28 | 2016-01-26 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9146476B2 (en) | 2003-10-28 | 2015-09-29 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9140993B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9140992B2 (en) | 2003-10-28 | 2015-09-22 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
US9164209B2 (en) | 2003-11-20 | 2015-10-20 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction |
US10281632B2 (en) | 2003-11-20 | 2019-05-07 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction |
US8289623B2 (en) | 2004-01-16 | 2012-10-16 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
JP2011175271A (en) * | 2004-01-16 | 2011-09-08 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
CN1910522B (en) * | 2004-01-16 | 2010-05-26 | 卡尔蔡司Smt股份公司 | Polarization-modulating optical element |
KR101230757B1 (en) * | 2004-01-16 | 2013-02-06 | 칼 짜이스 에스엠티 게엠베하 | Polarization-modulating optical element |
KR101233879B1 (en) * | 2004-01-16 | 2013-02-15 | 칼 짜이스 에스엠티 게엠베하 | Polarization-modulating optical element |
US9581911B2 (en) | 2004-01-16 | 2017-02-28 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
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JP2011175272A (en) * | 2004-01-16 | 2011-09-08 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
US8482717B2 (en) | 2004-01-16 | 2013-07-09 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
US9316772B2 (en) | 2004-01-16 | 2016-04-19 | Carl Zeiss Smt Gmbh | Producing polarization-modulating optical element for microlithography system |
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KR101295439B1 (en) * | 2004-01-16 | 2013-08-09 | 칼 짜이스 에스엠티 게엠베하 | Polarization-modulating optical element |
KR101295438B1 (en) * | 2004-01-16 | 2013-08-09 | 칼 짜이스 에스엠티 게엠베하 | Polarization-modulating optical element |
CN101726863B (en) * | 2004-01-16 | 2012-08-29 | 卡尔蔡司Smt有限责任公司 | Polarization-modulating optical element |
JP2015180936A (en) * | 2004-01-16 | 2015-10-15 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Polarization modulating optical element |
US8320043B2 (en) | 2004-01-16 | 2012-11-27 | Carl Zeiss Smt Gmbh | Illumination apparatus for microlithographyprojection system including polarization-modulating optical element |
US8711479B2 (en) | 2004-01-16 | 2014-04-29 | Carl Zeiss Smt Gmbh | Illumination apparatus for microlithography projection system including polarization-modulating optical element |
US8861084B2 (en) | 2004-01-16 | 2014-10-14 | Carl Zeiss Smt Ag | Polarization-modulating optical element |
US8259393B2 (en) | 2004-01-16 | 2012-09-04 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
WO2005069081A3 (en) * | 2004-01-16 | 2005-11-10 | Zeiss Carl Smt Ag | Polarization-modulating optical element |
US8279524B2 (en) | 2004-01-16 | 2012-10-02 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
US8270077B2 (en) | 2004-01-16 | 2012-09-18 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
US8436983B2 (en) | 2004-01-27 | 2013-05-07 | Nikon Corporation | Optical system, exposure system, and exposure method |
US8351021B2 (en) | 2004-01-27 | 2013-01-08 | Nikon Corporation | Optical system, exposure system, and exposure method |
US8339578B2 (en) | 2004-01-27 | 2012-12-25 | Nikon Corporation | Optical system, exposure system, and exposure method |
US9429848B2 (en) | 2004-02-06 | 2016-08-30 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10007194B2 (en) | 2004-02-06 | 2018-06-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
EP2615479A1 (en) * | 2004-02-06 | 2013-07-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
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US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
KR101323492B1 (en) * | 2004-02-06 | 2013-10-31 | 가부시키가이샤 니콘 | Lighting optical device, exposure system and exposure method, and device manufacturing method |
US9423694B2 (en) | 2004-02-06 | 2016-08-23 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US9140990B2 (en) | 2004-02-06 | 2015-09-22 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
KR101244282B1 (en) * | 2004-02-06 | 2013-03-18 | 가부시키가이샤 니콘 | Lighting optical device, exposure system, exposure method and manufacturing method of device |
US10241417B2 (en) | 2004-02-06 | 2019-03-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
EP1720047A4 (en) * | 2004-02-06 | 2010-11-03 | Nikon Corp | Polarization conversion element, lighting optical device, exposure system, and exposure method |
TWI494972B (en) * | 2004-02-06 | 2015-08-01 | 尼康股份有限公司 | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
US10234770B2 (en) | 2004-02-06 | 2019-03-19 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
EP2618188A1 (en) * | 2004-02-06 | 2013-07-24 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US7697117B2 (en) | 2004-05-25 | 2010-04-13 | Asml Holding N.V. | Providing a pattern of polarization |
US7916391B2 (en) | 2004-05-25 | 2011-03-29 | Carl Zeiss Smt Gmbh | Apparatus for providing a pattern of polarization |
WO2005116772A1 (en) * | 2004-05-25 | 2005-12-08 | Carl Zeiss Smt Ag | Apparatus for providing a pattern of polarization |
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