GB856621A - Improvements in or relating to polarising microscopes - Google Patents

Improvements in or relating to polarising microscopes

Info

Publication number
GB856621A
GB856621A GB2261156A GB2261156A GB856621A GB 856621 A GB856621 A GB 856621A GB 2261156 A GB2261156 A GB 2261156A GB 2261156 A GB2261156 A GB 2261156A GB 856621 A GB856621 A GB 856621A
Authority
GB
United Kingdom
Prior art keywords
polarization
corrector
plane
parallel
wave plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2261156A
Inventor
Andrew Fielding Huxley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Research Development Corp UK
Original Assignee
National Research Development Corp UK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Research Development Corp UK filed Critical National Research Development Corp UK
Priority to GB2261156A priority Critical patent/GB856621A/en
Publication of GB856621A publication Critical patent/GB856621A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications

Abstract

856,621. Polarizing microscope. NATIONAL RESEARCH DEVELOPMENT CORPORATION. Oct. 17, 1957 [July 20, 1956], No. 22611/56. Class 97(1) A polarizing microscope includes between a polarizer and rotatable analyser a corrector comprising one or more optical elements producing barrel distortion of the state of polarization of the beam passing through the microscope substantially to balance the pincushion distortion of such state caused by the other optical elements so that parallel plane polarized light reaches the analyser in the absence of a specimen to be observed. A beam of light 1 passes through a diaphragm 11 and thence through a polarizer 2 with a state of polarization indicated by 8 (i.e. plane polarized) to the corrector which includes a slab of birefringent uniaxial material mounted with its optic axis parallel to the axis of the optical system and producing a state of polarization as shown at 13; the corrector further comprises a quarter wave plate 14 which modifies the polarization pattern to that shown at 15 which is barrel distortion sufficient to nullify the pincushion distortion produced by the microscope lens system so that - for a certain axial position of the rotatable analyser 7 - complete extinction is obtained throughout the wavefront. In a second embodiment, the corrector consists of a single half wave plate of biaxial birefringent material with the refractive index parallel to the optical axis of the optical system differing considerably from those on the plane normal to this which are of approximately equal magnitude. Fig. 4 shows a further form of corrector consisting of a plate of optically active material of non uniform thickness - the surfaces being such as to distort the polarization in the required barrel manner. The upper face 20 is convexcylindrical and the lower face 21 of concavecylindrical form - the radii of the two cylinders being equal and their axes at right angles and disposed at 45 degrees to the plane of polarization of the light issuing from the polarizor indicated by the line 22. A further form of corrector comprises a piece of uniaxial birefringent material of the shape shown on Fig. 4, with optic axis perpendicular to the microscope axis and at 45 degrees to the plane of polarization of the rays issuing from the polarizor, in conjunction with which is a plane parallel plate of uniaxial birefringent material together with a quarter wave plate. For use with a strongly converging or diverging incident beam, the corrector may consist only of a half wave plate of uniaxial birefringent material with the slow direction either parallel or perpendicular to the plane of polarization of the incident ray. Also in the case of a strongly converging or diverging beam, the corrector may comprise one or more lenses together with a half wave plate with either its slow or fast direct parallel to the plane polarization.
GB2261156A 1956-07-20 1956-07-20 Improvements in or relating to polarising microscopes Expired GB856621A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2261156A GB856621A (en) 1956-07-20 1956-07-20 Improvements in or relating to polarising microscopes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2261156A GB856621A (en) 1956-07-20 1956-07-20 Improvements in or relating to polarising microscopes

Publications (1)

Publication Number Publication Date
GB856621A true GB856621A (en) 1960-12-21

Family

ID=10182244

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2261156A Expired GB856621A (en) 1956-07-20 1956-07-20 Improvements in or relating to polarising microscopes

Country Status (1)

Country Link
GB (1) GB856621A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005069081A2 (en) * 2004-01-16 2005-07-28 Carl Zeiss Smt Ag Polarization-modulating optical element
WO2005116772A1 (en) * 2004-05-25 2005-12-08 Carl Zeiss Smt Ag Apparatus for providing a pattern of polarization
EP1720047A1 (en) * 2004-02-06 2006-11-08 Nikon Corporation Polarization conversion element, lighting optical device, exposure system, and exposure method
US8259393B2 (en) 2004-01-16 2012-09-04 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8339578B2 (en) 2004-01-27 2012-12-25 Nikon Corporation Optical system, exposure system, and exposure method
US8482717B2 (en) 2004-01-16 2013-07-09 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction

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* Cited by examiner, † Cited by third party
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US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9146474B2 (en) 2003-04-09 2015-09-29 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
US9164393B2 (en) 2003-04-09 2015-10-20 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9423697B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9244359B2 (en) 2003-10-28 2016-01-26 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9146476B2 (en) 2003-10-28 2015-09-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140992B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US8279524B2 (en) 2004-01-16 2012-10-02 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US9316772B2 (en) 2004-01-16 2016-04-19 Carl Zeiss Smt Gmbh Producing polarization-modulating optical element for microlithography system
US8320043B2 (en) 2004-01-16 2012-11-27 Carl Zeiss Smt Gmbh Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
CN101799637B (en) * 2004-01-16 2012-07-04 卡尔蔡司Smt有限责任公司 Lighting optical device, microlithography projection system and device manufacturing method
CN101726863B (en) * 2004-01-16 2012-08-29 卡尔蔡司Smt有限责任公司 Polarization-modulating optical element
KR101230757B1 (en) * 2004-01-16 2013-02-06 칼 짜이스 에스엠티 게엠베하 Polarization-modulating optical element
KR101233879B1 (en) * 2004-01-16 2013-02-15 칼 짜이스 에스엠티 게엠베하 Polarization-modulating optical element
WO2005069081A3 (en) * 2004-01-16 2005-11-10 Zeiss Carl Smt Ag Polarization-modulating optical element
CN101793993B (en) * 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 Optical elements, optical arrangement and system
US8259393B2 (en) 2004-01-16 2012-09-04 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8482717B2 (en) 2004-01-16 2013-07-09 Carl Zeiss Smt Gmbh Polarization-modulating optical element
CN1910522B (en) * 2004-01-16 2010-05-26 卡尔蔡司Smt股份公司 Polarization-modulating optical element
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
JP2015180936A (en) * 2004-01-16 2015-10-15 カール・ツァイス・エスエムティー・ゲーエムベーハー Polarization modulating optical element
KR101295439B1 (en) * 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 Polarization-modulating optical element
KR101295438B1 (en) * 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 Polarization-modulating optical element
JP2011175271A (en) * 2004-01-16 2011-09-08 Carl Zeiss Smt Gmbh Polarization-modulating optical element
JP2011175272A (en) * 2004-01-16 2011-09-08 Carl Zeiss Smt Gmbh Polarization-modulating optical element
WO2005069081A2 (en) * 2004-01-16 2005-07-28 Carl Zeiss Smt Ag Polarization-modulating optical element
US8711479B2 (en) 2004-01-16 2014-04-29 Carl Zeiss Smt Gmbh Illumination apparatus for microlithography projection system including polarization-modulating optical element
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
CN101799587B (en) * 2004-01-16 2012-05-30 卡尔蔡司Smt有限责任公司 Optical system, projection system and manufacturing method of micro-structure semiconductor component
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8289623B2 (en) 2004-01-16 2012-10-16 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8436983B2 (en) 2004-01-27 2013-05-07 Nikon Corporation Optical system, exposure system, and exposure method
US8351021B2 (en) 2004-01-27 2013-01-08 Nikon Corporation Optical system, exposure system, and exposure method
US8339578B2 (en) 2004-01-27 2012-12-25 Nikon Corporation Optical system, exposure system, and exposure method
US9140990B2 (en) 2004-02-06 2015-09-22 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9423694B2 (en) 2004-02-06 2016-08-23 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
KR101323492B1 (en) * 2004-02-06 2013-10-31 가부시키가이샤 니콘 Lighting optical device, exposure system and exposure method, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
EP2618188A1 (en) * 2004-02-06 2013-07-24 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
TWI494972B (en) * 2004-02-06 2015-08-01 尼康股份有限公司 Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
EP1720047A4 (en) * 2004-02-06 2010-11-03 Nikon Corp Polarization conversion element, lighting optical device, exposure system, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429848B2 (en) 2004-02-06 2016-08-30 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
EP2615480A1 (en) * 2004-02-06 2013-07-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
EP2615479A1 (en) * 2004-02-06 2013-07-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
KR101244282B1 (en) * 2004-02-06 2013-03-18 가부시키가이샤 니콘 Lighting optical device, exposure system, exposure method and manufacturing method of device
EP1720047A1 (en) * 2004-02-06 2006-11-08 Nikon Corporation Polarization conversion element, lighting optical device, exposure system, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US7916391B2 (en) 2004-05-25 2011-03-29 Carl Zeiss Smt Gmbh Apparatus for providing a pattern of polarization
WO2005116772A1 (en) * 2004-05-25 2005-12-08 Carl Zeiss Smt Ag Apparatus for providing a pattern of polarization
US7697117B2 (en) 2004-05-25 2010-04-13 Asml Holding N.V. Providing a pattern of polarization

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