KR101190454B1 - 레이저 가공 장치 - Google Patents
레이저 가공 장치 Download PDFInfo
- Publication number
- KR101190454B1 KR101190454B1 KR1020117019739A KR20117019739A KR101190454B1 KR 101190454 B1 KR101190454 B1 KR 101190454B1 KR 1020117019739 A KR1020117019739 A KR 1020117019739A KR 20117019739 A KR20117019739 A KR 20117019739A KR 101190454 B1 KR101190454 B1 KR 101190454B1
- Authority
- KR
- South Korea
- Prior art keywords
- region
- cutting
- processed
- laser light
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
- B28D1/221—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising by thermic methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/562—Protection against mechanical damage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Mining & Mineral Resources (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2004-231555 | 2004-08-06 | ||
| JP2004231555 | 2004-08-06 | ||
| PCT/JP2005/013746 WO2006013763A1 (ja) | 2004-08-06 | 2005-07-27 | レーザ加工方法及び半導体装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077004069A Division KR101109860B1 (ko) | 2004-08-06 | 2005-07-27 | 레이저 가공 방법, 가공 대상물 절단 방법 및 반도체 장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20110111505A KR20110111505A (ko) | 2011-10-11 |
| KR101190454B1 true KR101190454B1 (ko) | 2012-10-11 |
Family
ID=35787052
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077004069A Expired - Lifetime KR101109860B1 (ko) | 2004-08-06 | 2005-07-27 | 레이저 가공 방법, 가공 대상물 절단 방법 및 반도체 장치 |
| KR1020117019739A Expired - Lifetime KR101190454B1 (ko) | 2004-08-06 | 2005-07-27 | 레이저 가공 장치 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077004069A Expired - Lifetime KR101109860B1 (ko) | 2004-08-06 | 2005-07-27 | 레이저 가공 방법, 가공 대상물 절단 방법 및 반도체 장치 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US8604383B2 (enExample) |
| EP (2) | EP2230042B1 (enExample) |
| JP (2) | JP4200177B2 (enExample) |
| KR (2) | KR101109860B1 (enExample) |
| CN (2) | CN100548564C (enExample) |
| MY (2) | MY139839A (enExample) |
| TW (1) | TWI376282B (enExample) |
| WO (1) | WO2006013763A1 (enExample) |
Families Citing this family (91)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4659300B2 (ja) * | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
| WO2003076119A1 (fr) | 2002-03-12 | 2003-09-18 | Hamamatsu Photonics K.K. | Procede de decoupe d'objet traite |
| TWI326626B (en) * | 2002-03-12 | 2010-07-01 | Hamamatsu Photonics Kk | Laser processing method |
| DE60313900T2 (de) | 2002-03-12 | 2008-01-17 | Hamamatsu Photonics K.K., Hamamatsu | Methode zur Trennung von Substraten |
| TWI520269B (zh) | 2002-12-03 | 2016-02-01 | 濱松赫德尼古斯股份有限公司 | Cutting method of semiconductor substrate |
| FR2852250B1 (fr) * | 2003-03-11 | 2009-07-24 | Jean Luc Jouvin | Fourreau de protection pour canule, un ensemble d'injection comportant un tel fourreau et aiguille equipee d'un tel fourreau |
| EP1609559B1 (en) * | 2003-03-12 | 2007-08-08 | Hamamatsu Photonics K. K. | Laser beam machining method |
| KR101119387B1 (ko) * | 2003-07-18 | 2012-03-07 | 하마마츠 포토닉스 가부시키가이샤 | 절단방법 |
| JP4563097B2 (ja) | 2003-09-10 | 2010-10-13 | 浜松ホトニクス株式会社 | 半導体基板の切断方法 |
| JP4509578B2 (ja) | 2004-01-09 | 2010-07-21 | 浜松ホトニクス株式会社 | レーザ加工方法及びレーザ加工装置 |
| JP4598407B2 (ja) * | 2004-01-09 | 2010-12-15 | 浜松ホトニクス株式会社 | レーザ加工方法及びレーザ加工装置 |
| JP4601965B2 (ja) * | 2004-01-09 | 2010-12-22 | 浜松ホトニクス株式会社 | レーザ加工方法及びレーザ加工装置 |
| EP1742253B1 (en) | 2004-03-30 | 2012-05-09 | Hamamatsu Photonics K.K. | Laser processing method |
| KR101109860B1 (ko) | 2004-08-06 | 2012-02-21 | 하마마츠 포토닉스 가부시키가이샤 | 레이저 가공 방법, 가공 대상물 절단 방법 및 반도체 장치 |
| JP4198123B2 (ja) | 2005-03-22 | 2008-12-17 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| JP4762653B2 (ja) * | 2005-09-16 | 2011-08-31 | 浜松ホトニクス株式会社 | レーザ加工方法及びレーザ加工装置 |
| JP4907965B2 (ja) * | 2005-11-25 | 2012-04-04 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| JP4804911B2 (ja) * | 2005-12-22 | 2011-11-02 | 浜松ホトニクス株式会社 | レーザ加工装置 |
| JP4907984B2 (ja) * | 2005-12-27 | 2012-04-04 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップ |
| EP1875983B1 (en) | 2006-07-03 | 2013-09-11 | Hamamatsu Photonics K.K. | Laser processing method and chip |
| JP5183892B2 (ja) | 2006-07-03 | 2013-04-17 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| JP4954653B2 (ja) * | 2006-09-19 | 2012-06-20 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| CN101516566B (zh) * | 2006-09-19 | 2012-05-09 | 浜松光子学株式会社 | 激光加工方法和激光加工装置 |
| JP5101073B2 (ja) * | 2006-10-02 | 2012-12-19 | 浜松ホトニクス株式会社 | レーザ加工装置 |
| JP5132911B2 (ja) * | 2006-10-03 | 2013-01-30 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| JP4964554B2 (ja) * | 2006-10-03 | 2012-07-04 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| CN102357739B (zh) * | 2006-10-04 | 2014-09-10 | 浜松光子学株式会社 | 激光加工方法 |
| JP5336054B2 (ja) * | 2007-07-18 | 2013-11-06 | 浜松ホトニクス株式会社 | 加工情報供給装置を備える加工情報供給システム |
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| JP5056839B2 (ja) * | 2009-12-25 | 2012-10-24 | 三星ダイヤモンド工業株式会社 | 被加工物の加工方法および被加工物の分割方法 |
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| EP3913660B1 (en) | 2020-05-22 | 2024-06-19 | Nichia Corporation | Method of cutting semiconductor element and semiconductor element |
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- 2005-07-27 WO PCT/JP2005/013746 patent/WO2006013763A1/ja not_active Ceased
- 2005-07-27 EP EP05767042.4A patent/EP1775059B1/en not_active Expired - Lifetime
- 2005-07-27 CN CN2008101857806A patent/CN101434010B/zh not_active Expired - Lifetime
- 2005-08-04 TW TW094126479A patent/TWI376282B/zh not_active IP Right Cessation
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| JP2002192370A (ja) * | 2000-09-13 | 2002-07-10 | Hamamatsu Photonics Kk | レーザ加工方法 |
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| US20140015113A1 (en) | 2014-01-16 |
| KR101109860B1 (ko) | 2012-02-21 |
| JP4197693B2 (ja) | 2008-12-17 |
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| TW200613081A (en) | 2006-05-01 |
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| MY139839A (en) | 2009-10-30 |
| EP1775059A4 (en) | 2009-09-23 |
| CN1993201A (zh) | 2007-07-04 |
| EP1775059A1 (en) | 2007-04-18 |
| MY172847A (en) | 2019-12-12 |
| EP2230042B1 (en) | 2017-10-25 |
| JPWO2006013763A1 (ja) | 2008-05-01 |
| CN100548564C (zh) | 2009-10-14 |
| TWI376282B (en) | 2012-11-11 |
| EP2230042A3 (en) | 2014-08-13 |
| KR20070031467A (ko) | 2007-03-19 |
| CN101434010B (zh) | 2011-04-13 |
| CN101434010A (zh) | 2009-05-20 |
| WO2006013763A1 (ja) | 2006-02-09 |
| EP1775059B1 (en) | 2015-01-07 |
| JP2006068816A (ja) | 2006-03-16 |
| KR20110111505A (ko) | 2011-10-11 |
| JP4200177B2 (ja) | 2008-12-24 |
| US8604383B2 (en) | 2013-12-10 |
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