KR101118995B1 - 고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원 - Google Patents

고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원 Download PDF

Info

Publication number
KR101118995B1
KR101118995B1 KR1020067019050A KR20067019050A KR101118995B1 KR 101118995 B1 KR101118995 B1 KR 101118995B1 KR 1020067019050 A KR1020067019050 A KR 1020067019050A KR 20067019050 A KR20067019050 A KR 20067019050A KR 101118995 B1 KR101118995 B1 KR 101118995B1
Authority
KR
South Korea
Prior art keywords
delete delete
target
laser
droplet
euv light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067019050A
Other languages
English (en)
Korean (ko)
Other versions
KR20060125903A (ko
Inventor
로버트 피. 아킨스
리차드 엘. 샌드스트롬
윌리암 엔. 파르틀로
이고르 브이. 포멘코프
토마스 디. 스타이거
마틴 제이. 알고츠
노버트 알 보워링
로버트 엔. 자크스
프레데릭 에이. 팔렌샤트
송준
Original Assignee
사이머 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 사이머 인코포레이티드 filed Critical 사이머 인코포레이티드
Publication of KR20060125903A publication Critical patent/KR20060125903A/ko
Application granted granted Critical
Publication of KR101118995B1 publication Critical patent/KR101118995B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0084—Control of the laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067019050A 2004-03-17 2005-03-03 고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원 Expired - Fee Related KR101118995B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/803,526 2004-03-17
US10/803,526 US7087914B2 (en) 2004-03-17 2004-03-17 High repetition rate laser produced plasma EUV light source
PCT/US2005/007056 WO2005089130A2 (en) 2004-03-17 2005-03-03 A high repetition rate laser produced plasma euv light source

Publications (2)

Publication Number Publication Date
KR20060125903A KR20060125903A (ko) 2006-12-06
KR101118995B1 true KR101118995B1 (ko) 2012-03-12

Family

ID=34985273

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067019050A Expired - Fee Related KR101118995B1 (ko) 2004-03-17 2005-03-03 고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원

Country Status (6)

Country Link
US (4) US7087914B2 (enExample)
EP (1) EP1726028B1 (enExample)
JP (1) JP5139055B2 (enExample)
KR (1) KR101118995B1 (enExample)
TW (2) TWI276270B (enExample)
WO (1) WO2005089130A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150130440A (ko) * 2013-03-15 2015-11-23 에이에스엠엘 네델란즈 비.브이. 극자외 광원을 위한 빔 위치 제어

Families Citing this family (193)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
US7928416B2 (en) * 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7916388B2 (en) 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4574211B2 (ja) * 2004-04-19 2010-11-04 キヤノン株式会社 光源装置、当該光源装置を有する露光装置
US20060020634A1 (en) * 2004-07-20 2006-01-26 International Business Machines Corporation Method, system and program for recording changes made to a database
JP4578901B2 (ja) * 2004-09-09 2010-11-10 株式会社小松製作所 極端紫外光源装置
JP5100990B2 (ja) * 2004-10-07 2012-12-19 ギガフォトン株式会社 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置
JP2006128342A (ja) * 2004-10-28 2006-05-18 Canon Inc 露光装置、光源装置及びデバイス製造方法
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7329884B2 (en) * 2004-11-08 2008-02-12 Nikon Corporation Exposure apparatus and exposure method
US8093530B2 (en) * 2004-11-19 2012-01-10 Canon Kabushiki Kaisha Laser cutting apparatus and laser cutting method
WO2006064592A1 (ja) * 2004-12-17 2006-06-22 Osaka University 極端紫外光・x線源用ターゲット及びその製造方法
US7196343B2 (en) * 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
EP1837897A4 (en) * 2005-01-12 2008-04-16 Nikon Corp LASER PLASMA EUV LIGHT SOURCE, TARGET MEMBER, MANUFACTURING PROCESS FOR A TARGET MEMBER, TARGET PROCESSING METHOD AND EUV EXPOSURE SYSTEM
US7445319B2 (en) * 2005-02-22 2008-11-04 Synergy Innovations, Inc. System and method for creating liquid droplet impact forced collapse of laser nanoparticle nucleated cavities for controlled nuclear reactions
DE102005014433B3 (de) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7746913B2 (en) * 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7643529B2 (en) * 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
JP5156193B2 (ja) * 2006-02-01 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
US8513629B2 (en) 2011-05-13 2013-08-20 Cymer, Llc Droplet generator with actuator induced nozzle cleaning
US20070215575A1 (en) * 2006-03-15 2007-09-20 Bo Gu Method and system for high-speed, precise, laser-based modification of one or more electrical elements
JP4885587B2 (ja) * 2006-03-28 2012-02-29 株式会社小松製作所 ターゲット供給装置
JP4954584B2 (ja) * 2006-03-31 2012-06-20 株式会社小松製作所 極端紫外光源装置
WO2007121142A2 (en) * 2006-04-12 2007-10-25 The Regents Of The University Of California Improved light source employing laser-produced plasma
JP5156202B2 (ja) * 2006-07-10 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
JP5162113B2 (ja) * 2006-08-07 2013-03-13 ギガフォトン株式会社 極端紫外光源装置
KR101312625B1 (ko) * 2006-11-03 2013-10-01 삼성전자주식회사 동작 추적 장치 및 방법
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
JP5358060B2 (ja) * 2007-02-20 2013-12-04 ギガフォトン株式会社 極端紫外光源装置
JP4867712B2 (ja) * 2007-02-27 2012-02-01 株式会社ニコン 露光装置、デバイス製造方法、及び露光方法
US8198611B2 (en) * 2007-04-02 2012-06-12 Globalfoundries Inc. Laser beam formatting module and method for fabricating semiconductor dies using same
US7763871B2 (en) * 2008-04-02 2010-07-27 Asml Netherlands B.V. Radiation source
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7795816B2 (en) * 2007-10-08 2010-09-14 Applied Materials, Inc. High speed phase scrambling of a coherent beam using plasma
US20090095924A1 (en) * 2007-10-12 2009-04-16 International Business Machines Corporation Electrode design for euv discharge plasma source
NL1036768A1 (nl) * 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
WO2009140270A2 (en) * 2008-05-13 2009-11-19 The Regents Of The University Of California System and method for light source employing laser-produced plasma
JP5758569B2 (ja) * 2008-06-12 2015-08-05 ギガフォトン株式会社 スラブ型レーザ装置
JP5335298B2 (ja) * 2008-06-20 2013-11-06 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の生成方法
JP2010062141A (ja) * 2008-08-04 2010-03-18 Komatsu Ltd 極端紫外光源装置
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
NL1036803A (nl) 2008-09-09 2010-03-15 Asml Netherlands Bv Radiation system and lithographic apparatus.
JP5587578B2 (ja) 2008-09-26 2014-09-10 ギガフォトン株式会社 極端紫外光源装置およびパルスレーザ装置
JP5536401B2 (ja) * 2008-10-16 2014-07-02 ギガフォトン株式会社 レーザ装置および極端紫外光光源装置
JP2010123929A (ja) 2008-10-24 2010-06-03 Gigaphoton Inc 極端紫外光光源装置
US8436328B2 (en) * 2008-12-16 2013-05-07 Gigaphoton Inc. Extreme ultraviolet light source apparatus
EP2380411B1 (en) 2008-12-16 2015-04-15 Philips Deutschland GmbH Method and device for generating euv radiation or soft x-rays with enhanced efficiency
US8232537B2 (en) * 2008-12-18 2012-07-31 Asml Netherlands, B.V. Radiation source, lithographic apparatus and device manufacturing method
JP5322217B2 (ja) 2008-12-27 2013-10-23 ウシオ電機株式会社 光源装置
NL2003777A (en) * 2009-01-08 2010-07-13 Asml Netherlands Bv Laser device.
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8304752B2 (en) * 2009-04-10 2012-11-06 Cymer, Inc. EUV light producing system and method utilizing an alignment laser
JP5603135B2 (ja) * 2009-05-21 2014-10-08 ギガフォトン株式会社 チャンバ装置におけるターゲット軌道を計測及び制御する装置及び方法
JPWO2010137625A1 (ja) 2009-05-27 2012-11-15 ギガフォトン株式会社 ターゲット出力装置及び極端紫外光源装置
JP2011023712A (ja) 2009-06-19 2011-02-03 Gigaphoton Inc 極端紫外光源装置
NL2004837A (en) * 2009-07-09 2011-01-10 Asml Netherlands Bv Radiation system and lithographic apparatus.
WO2011013779A1 (ja) * 2009-07-29 2011-02-03 株式会社小松製作所 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
CN102484938B (zh) * 2009-09-01 2014-12-10 株式会社Ihi 等离子体光源
JP2011054376A (ja) * 2009-09-01 2011-03-17 Ihi Corp Ｌｐｐ方式のｅｕｖ光源とその発生方法
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
KR101790074B1 (ko) * 2010-02-09 2017-10-25 에이에스엠엘 네델란즈 비.브이. 방사선 소스, 리소그래피 장치 및 디바이스 제조 방법
JP2013519211A (ja) 2010-02-09 2013-05-23 エナジェティック・テクノロジー・インコーポレーテッド レーザー駆動の光源
US9265136B2 (en) 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9113540B2 (en) * 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP2013004258A (ja) * 2011-06-15 2013-01-07 Gigaphoton Inc 極端紫外光生成装置及び極端紫外光の生成方法
JP2011192965A (ja) 2010-02-22 2011-09-29 Komatsu Ltd チャンバ装置、および極端紫外光生成装置
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
JP5701618B2 (ja) * 2010-03-04 2015-04-15 ギガフォトン株式会社 極端紫外光生成装置
WO2011116898A1 (en) * 2010-03-25 2011-09-29 Eth Zurich Steering device for controlling the direction and/or velocity of droplets of a target material and extreme euv source with such a steering device
WO2011116897A1 (en) * 2010-03-25 2011-09-29 Eth Zurich A beam line for a source of extreme ultraviolet (euv) radiation
JP5765759B2 (ja) 2010-03-29 2015-08-19 ギガフォトン株式会社 極端紫外光生成装置および方法
US9072152B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a variation value formula for the intensity
US9072153B2 (en) * 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
US8263953B2 (en) 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
US9066412B2 (en) 2010-04-15 2015-06-23 Asml Netherlands B.V. Systems and methods for cooling an optic
US9110377B2 (en) * 2010-09-08 2015-08-18 Asml Netherlands B.V. Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
JP5802465B2 (ja) 2010-10-29 2015-10-28 ギガフォトン株式会社 ドロップレット生成及び検出装置、並びにドロップレット制御装置
US8810902B2 (en) 2010-12-29 2014-08-19 Asml Netherlands B.V. Multi-pass optical apparatus
WO2012103150A2 (en) * 2011-01-28 2012-08-02 Lawrence Livermore National Security, Llc Final beam transport system
US8399868B2 (en) * 2011-02-15 2013-03-19 Sematech Inc. Tools, methods and devices for mitigating extreme ultraviolet optics contamination
US8633459B2 (en) 2011-03-02 2014-01-21 Cymer, Llc Systems and methods for optics cleaning in an EUV light source
JP2012199512A (ja) * 2011-03-10 2012-10-18 Gigaphoton Inc 極端紫外光生成装置及び極端紫外光生成方法
US8604452B2 (en) 2011-03-17 2013-12-10 Cymer, Llc Drive laser delivery systems for EUV light source
US9516730B2 (en) 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
KR20130015144A (ko) * 2011-08-02 2013-02-13 삼성디스플레이 주식회사 증착원어셈블리, 유기층증착장치 및 이를 이용한 유기발광표시장치의 제조 방법
JP6047573B2 (ja) 2011-09-02 2016-12-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
US9335637B2 (en) 2011-09-08 2016-05-10 Kla-Tencor Corporation Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation
JP5881345B2 (ja) * 2011-09-13 2016-03-09 ギガフォトン株式会社 極端紫外光生成装置
JP6081711B2 (ja) * 2011-09-23 2017-02-15 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
JP6021454B2 (ja) * 2011-10-05 2016-11-09 ギガフォトン株式会社 極端紫外光生成装置および極端紫外光生成方法
US9500953B2 (en) 2011-12-06 2016-11-22 Asml Netherlands B.V. Radiation source
US9279445B2 (en) 2011-12-16 2016-03-08 Asml Netherlands B.V. Droplet generator steering system
US9671698B2 (en) * 2012-02-22 2017-06-06 Asml Netherlands B.V. Fuel stream generator, source collector apparatus and lithographic apparatus
US8598552B1 (en) * 2012-05-31 2013-12-03 Cymer, Inc. System and method to optimize extreme ultraviolet light generation
EP2870834B1 (en) * 2012-07-06 2017-02-01 ETH Zürich Method for controlling an interaction between droplet targets and a laser and apparatus for conducting said method
JP6087105B2 (ja) * 2012-10-23 2017-03-01 ギガフォトン株式会社 極端紫外光生成装置
JP5567640B2 (ja) * 2012-11-05 2014-08-06 ギガフォトン株式会社 極端紫外光源装置
WO2014120985A1 (en) * 2013-01-30 2014-08-07 Kla-Tencor Corporation Euv light source using cryogenic droplet targets in mask inspection
FR3002720B1 (fr) * 2013-02-27 2015-04-10 Ecole Polytech Dispositif de magnetisation de plasma laser par champ magnetique pulse
JP6168797B2 (ja) * 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
US9699876B2 (en) * 2013-03-14 2017-07-04 Asml Netherlands, B.V. Method of and apparatus for supply and recovery of target material
US9000405B2 (en) 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
US8872144B1 (en) * 2013-09-24 2014-10-28 Asml Netherlands B.V. System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
JP6241062B2 (ja) 2013-04-30 2017-12-06 ウシオ電機株式会社 極端紫外光光源装置
WO2014192872A1 (ja) 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
US9544984B2 (en) 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
GB2505315B (en) 2013-08-07 2014-08-06 Rofin Sinar Uk Ltd Optical amplifier arrangement
JP6220879B2 (ja) * 2013-08-27 2017-10-25 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光生成システム
JP6513025B2 (ja) 2013-09-17 2019-05-15 ギガフォトン株式会社 極端紫外光生成装置
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
US9497840B2 (en) * 2013-09-26 2016-11-15 Asml Netherlands B.V. System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
JP6646576B2 (ja) * 2013-11-15 2020-02-14 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
DE102013224583A1 (de) * 2013-11-29 2015-06-03 Carl Zeiss Smt Gmbh Messanordnung zur Verwendung bei der Trajektorienbestimmung fliegender Objekte
US9301382B2 (en) 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
JP6383736B2 (ja) * 2013-12-25 2018-08-29 ギガフォトン株式会社 極端紫外光生成装置
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9748086B2 (en) 2014-05-15 2017-08-29 Excelitas Technologies Corp. Laser driven sealed beam lamp
JP6252358B2 (ja) * 2014-05-27 2017-12-27 ウシオ電機株式会社 極端紫外光光源装置
US9544986B2 (en) 2014-06-27 2017-01-10 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9155178B1 (en) * 2014-06-27 2015-10-06 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9609731B2 (en) 2014-07-07 2017-03-28 Media Lario Srl Systems and methods for synchronous operation of debris-mitigation devices
US9301381B1 (en) 2014-09-12 2016-03-29 International Business Machines Corporation Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas
US9392679B2 (en) * 2014-12-05 2016-07-12 Globalfoundries Inc. Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer processing
CN104502624B (zh) * 2014-12-08 2017-11-21 天津大学 一种采用等离子体信号测定激光驱动飞片速度的装置
WO2016131583A1 (en) * 2015-02-19 2016-08-25 Asml Netherlands B.V. Radiation source
NL2016199A (en) * 2015-03-03 2016-09-30 Asml Netherlands Bv Radiation Sensor Apparatus.
NL2016358A (en) * 2015-03-18 2016-09-30 Asml Netherlands Bv A radiation system and method.
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US9538628B1 (en) * 2015-06-11 2017-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Method for EUV power improvement with fuel droplet trajectory stabilization
JP6676066B2 (ja) 2015-11-05 2020-04-08 ギガフォトン株式会社 極端紫外光生成装置
WO2017187571A1 (ja) * 2016-04-27 2017-11-02 ギガフォトン株式会社 極端紫外光センサユニット及び極端紫外光生成装置
US9941034B2 (en) 2016-05-10 2018-04-10 Honeywell Federal Manufacturing & Technologies, Llc Direct write dispensing apparatus and method
US9476841B1 (en) * 2016-06-14 2016-10-25 OOO “Isteq B.V.” High-brightness LPP EUV light source
US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
CN110462522B (zh) * 2017-03-20 2021-10-08 Asml荷兰有限公司 光刻系统、euv辐射源、光刻扫描设备和控制系统
CN107063403B (zh) * 2017-03-31 2021-01-15 上海大学 机械式水表计量精度自动检测装置及方法
US10524345B2 (en) * 2017-04-28 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Residual gain monitoring and reduction for EUV drive laser
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
CN118011728A (zh) 2017-10-19 2024-05-10 西默有限公司 在单次光刻曝光通过过程中形成多个空间图像
US11266002B2 (en) 2017-10-26 2022-03-01 Asml Netherlands B.V. System for monitoring a plasma
US10165664B1 (en) * 2017-11-21 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for decontaminating windows of an EUV source module
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
WO2019186754A1 (ja) 2018-03-28 2019-10-03 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
US10568195B2 (en) * 2018-05-30 2020-02-18 Kla-Tencor Corporation System and method for pumping laser sustained plasma with a frequency converted illumination source
US10976674B2 (en) 2018-08-17 2021-04-13 Taiwan Semiconductor Manufacturing Co., Ltd. Method for detecting EUV pellicle rupture
NL2025013A (en) * 2019-03-07 2020-09-11 Asml Netherlands Bv Laser system for source material conditioning in an euv light source
KR102681561B1 (ko) 2019-09-24 2024-07-03 삼성전자주식회사 극자외선 발생 장치
KR102120017B1 (ko) * 2019-10-10 2020-06-05 문상호 저주파 불면증 치료 장치
US20240039237A1 (en) * 2020-09-18 2024-02-01 Arizona Board Of Regents On Behalf Of The University Of Arizona Interleaved multi-pass optical amplifier
WO2022072088A1 (en) * 2020-09-29 2022-04-07 Cymer, Llc Electromagnetic shield for a sealing mechanism of a laser chamber
WO2022234669A1 (ja) * 2021-05-07 2022-11-10 スカパーＪｓａｔ株式会社 推力発生装置、宇宙機
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US20250185147A1 (en) * 2022-03-23 2025-06-05 Asml Netherlands B.V. EUV Light Source Target Metrology
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
CN115151013B (zh) * 2022-08-31 2022-11-25 兰州大学 一种中子俘获照射系统
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
WO2024166102A1 (en) * 2023-02-06 2024-08-15 Ramot At Tel-Aviv University Ltd. Laser based on a dielectric resonator with gas or plasma at population inversion

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001052653A (ja) * 1999-08-05 2001-02-23 Toshiba Corp 紫外線発生装置
KR20020033181A (ko) * 1999-09-20 2002-05-04 토마스 엘. 무어헤드 자외선 복사 발생 장치 및 방법
DE10154287A1 (de) * 2001-10-11 2003-05-15 Lite On Electronics Inc Verfahren zum Herstellen einer Weißlichtquelle
JP2003534631A (ja) * 2000-05-22 2003-11-18 プレックス・エルエルシー 中性ビームを制御することに基づく極紫外線源

Family Cites Families (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6383A (en) * 1849-04-24 Machine fob
US68012A (en) * 1867-08-20 James swan
US168049A (en) * 1875-09-21 Improvement in gas apparatus
US219056A (en) * 1879-08-26 Improvement in batteries
US55364A (en) * 1866-06-05 Improvement in braces for bits
US163313A (en) * 1875-05-18 Improvement in cigar-box trays
US100882A (en) * 1870-03-15 Improvement in combined carriage, cradle, swing, and baby-walker
US2759106A (en) 1951-05-25 1956-08-14 Wolter Hans Optical image-forming mirror system providing for grazing incidence of rays
US3279176A (en) 1959-07-31 1966-10-18 North American Aviation Inc Ion rocket engine
US3150483A (en) 1962-05-10 1964-09-29 Aerospace Corp Plasma generator and accelerator
US3232046A (en) 1962-06-06 1966-02-01 Aerospace Corp Plasma generator and propulsion exhaust system
US3746870A (en) 1970-12-21 1973-07-17 Gen Electric Coated light conduit
US3969628A (en) 1974-04-04 1976-07-13 The United States Of America As Represented By The Secretary Of The Army Intense, energetic electron beam assisted X-ray generator
US4042848A (en) 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
US3946332A (en) 1974-06-13 1976-03-23 Samis Michael A High power density continuous wave plasma glow jet laser system
US3961197A (en) 1974-08-21 1976-06-01 The United States Of America As Represented By The United States Energy Research And Development Administration X-ray generator
US3960473A (en) 1975-02-06 1976-06-01 The Glastic Corporation Die structure for forming a serrated rod
US4162160A (en) 1977-08-25 1979-07-24 Fansteel Inc. Electrical contact material and method for making the same
US4143275A (en) 1977-09-28 1979-03-06 Battelle Memorial Institute Applying radiation
US4203393A (en) 1979-01-04 1980-05-20 Ford Motor Company Plasma jet ignition engine and method
JPS5756668A (en) 1980-09-18 1982-04-05 Nissan Motor Co Ltd Plasma igniter
US4364342A (en) 1980-10-01 1982-12-21 Ford Motor Company Ignition system employing plasma spray
USRE34806E (en) 1980-11-25 1994-12-13 Celestech, Inc. Magnetoplasmadynamic processor, applications thereof and methods
US4538291A (en) 1981-11-09 1985-08-27 Kabushiki Kaisha Suwa Seikosha X-ray source
US4536884A (en) 1982-09-20 1985-08-20 Eaton Corporation Plasma pinch X-ray apparatus
US4633492A (en) 1982-09-20 1986-12-30 Eaton Corporation Plasma pinch X-ray method
US4618971A (en) 1982-09-20 1986-10-21 Eaton Corporation X-ray lithography system
US4504964A (en) 1982-09-20 1985-03-12 Eaton Corporation Laser beam plasma pinch X-ray system
US4507588A (en) 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
DE3332711A1 (de) 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
JPS60125673A (ja) * 1983-12-13 1985-07-04 Canon Inc 液体噴射記録装置
JPS60175351A (ja) 1984-02-14 1985-09-09 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置およびｘ線露光法
US4561406A (en) 1984-05-25 1985-12-31 Combustion Electromagnetics, Inc. Winged reentrant electromagnetic combustion chamber
US4837794A (en) 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US4626193A (en) 1985-08-02 1986-12-02 Itt Corporation Direct spark ignition system
US4774914A (en) 1985-09-24 1988-10-04 Combustion Electromagnetics, Inc. Electromagnetic ignition--an ignition system producing a large size and intense capacitive and inductive spark with an intense electromagnetic field feeding the spark
CA1239487A (en) 1985-10-03 1988-07-19 National Research Council Of Canada Multiple vacuum arc derived plasma pinch x-ray source
CA1239486A (en) 1985-10-03 1988-07-19 Rajendra P. Gupta Gas discharge derived annular plasma pinch x-ray source
US4928020A (en) 1988-04-05 1990-05-22 The United States Of America As Represented By The United States Department Of Energy Saturable inductor and transformer structures for magnetic pulse compression
DE3927089C1 (enExample) 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5102776A (en) 1989-11-09 1992-04-07 Cornell Research Foundation, Inc. Method and apparatus for microlithography using x-pinch x-ray source
US5027076A (en) 1990-01-29 1991-06-25 Ball Corporation Open cage density sensor
US5175755A (en) 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5126638A (en) 1991-05-13 1992-06-30 Maxwell Laboratories, Inc. Coaxial pseudospark discharge switch
US5142166A (en) 1991-10-16 1992-08-25 Science Research Laboratory, Inc. High voltage pulsed power source
JPH0816720B2 (ja) 1992-04-21 1996-02-21 日本航空電子工業株式会社 軟ｘ線多層膜反射鏡
US5317574A (en) * 1992-12-31 1994-05-31 Hui Wang Method and apparatus for generating x-ray and/or extreme ultraviolet laser
US5411224A (en) 1993-04-08 1995-05-02 Dearman; Raymond M. Guard for jet engine
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US5504795A (en) 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
DE69628514T2 (de) 1995-02-17 2004-04-29 Cymer, Inc., San Diego Leistungspulsgenerator mit energierückgewinnung
US5830336A (en) 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
US5963616A (en) 1997-03-11 1999-10-05 University Of Central Florida Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
JP3385898B2 (ja) 1997-03-24 2003-03-10 安藤電気株式会社 可変波長半導体レーザ光源
US5936988A (en) 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US5866871A (en) 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof
US6172324B1 (en) 1997-04-28 2001-01-09 Science Research Laboratory, Inc. Plasma focus radiation source
US6566668B2 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6586757B2 (en) 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6815700B2 (en) 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6744060B2 (en) 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
US6064072A (en) 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US5763930A (en) 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6452199B1 (en) 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
US6580517B2 (en) 2000-03-01 2003-06-17 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
JP2000091096A (ja) 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
US6285743B1 (en) 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
JP2000098098A (ja) * 1998-09-21 2000-04-07 Nikon Corp Ｘ線発生装置
US6031598A (en) 1998-09-25 2000-02-29 Euv Llc Extreme ultraviolet lithography machine
WO2000025322A1 (en) 1998-10-27 2000-05-04 Jmar Technology Co. Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation
JP2000188198A (ja) * 1998-12-21 2000-07-04 Agency Of Ind Science & Technol レ―ザ―プラズマｘ線源装置
US6333775B1 (en) * 1999-01-13 2001-12-25 Euv Llc Extreme-UV lithography vacuum chamber zone seal
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6549551B2 (en) 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6493323B1 (en) * 1999-05-14 2002-12-10 Lucent Technologies Inc. Asynchronous object oriented configuration control system for highly reliable distributed systems
JP4329177B2 (ja) * 1999-08-18 2009-09-09 株式会社ニコン Ｘ線発生装置及びこれを備えた投影露光装置及び露光方法
US6317448B1 (en) 1999-09-23 2001-11-13 Cymer, Inc. Bandwidth estimating technique for narrow band laser
US6377651B1 (en) 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
TWI246872B (en) 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
TW508980B (en) * 1999-12-23 2002-11-01 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6493423B1 (en) 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6195272B1 (en) 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
US6647086B2 (en) 2000-05-19 2003-11-11 Canon Kabushiki Kaisha X-ray exposure apparatus
US6904073B2 (en) 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002006096A (ja) 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
US6576912B2 (en) 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
US20020090054A1 (en) 2001-01-10 2002-07-11 Michael Sogard Apparatus and method for containing debris from laser plasma radiation sources
US7190707B2 (en) 2001-01-29 2007-03-13 Cymer, Inc. Gas discharge laser light source beam delivery unit
US6804327B2 (en) 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US6396900B1 (en) 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
DE10151080C1 (de) 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
JP4320999B2 (ja) * 2002-02-04 2009-08-26 株式会社ニコン Ｘ線発生装置及び露光装置
US7016388B2 (en) * 2002-05-07 2006-03-21 Cymer, Inc. Laser lithography light source with beam delivery
US6792076B2 (en) * 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators
DE10305701B4 (de) * 2003-02-07 2005-10-06 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung mit hohen Repetitionsraten
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
US7002443B2 (en) 2003-06-25 2006-02-21 Cymer, Inc. Method and apparatus for cooling magnetic circuit elements

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001052653A (ja) * 1999-08-05 2001-02-23 Toshiba Corp 紫外線発生装置
KR20020033181A (ko) * 1999-09-20 2002-05-04 토마스 엘. 무어헤드 자외선 복사 발생 장치 및 방법
JP2003534631A (ja) * 2000-05-22 2003-11-18 プレックス・エルエルシー 中性ビームを制御することに基づく極紫外線源
DE10154287A1 (de) * 2001-10-11 2003-05-15 Lite On Electronics Inc Verfahren zum Herstellen einer Weißlichtquelle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150130440A (ko) * 2013-03-15 2015-11-23 에이에스엠엘 네델란즈 비.브이. 극자외 광원을 위한 빔 위치 제어
KR102214861B1 (ko) * 2013-03-15 2021-02-10 에이에스엠엘 네델란즈 비.브이. 극자외 광원을 위한 빔 위치 제어

Also Published As

Publication number Publication date
US7525111B2 (en) 2009-04-28
US20070029511A1 (en) 2007-02-08
US7087914B2 (en) 2006-08-08
WO2005089130A2 (en) 2005-09-29
US7317196B2 (en) 2008-01-08
KR20060125903A (ko) 2006-12-06
EP1726028A2 (en) 2006-11-29
TW200534750A (en) 2005-10-16
US20050205811A1 (en) 2005-09-22
US7361918B2 (en) 2008-04-22
US20080197297A1 (en) 2008-08-21
WO2005089130A3 (en) 2006-02-09
EP1726028A4 (en) 2010-12-08
JP5139055B2 (ja) 2013-02-06
JP2007529869A (ja) 2007-10-25
TWI305477B (en) 2009-01-11
EP1726028B1 (en) 2014-05-21
US20050205810A1 (en) 2005-09-22
TWI276270B (en) 2007-03-11
TW200536217A (en) 2005-11-01

Similar Documents

Publication Publication Date Title
KR101118995B1 (ko) 고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원
KR102688301B1 (ko) 액적 스트림 내에서의 액적의 합체를 제어하는 장치 및 방법
EP2870834B1 (en) Method for controlling an interaction between droplet targets and a laser and apparatus for conducting said method
KR101710433B1 (ko) 액적 가속기를 포함하는 ｅｕｖ 방사선 소스 및 리소그래피 장치
KR101052062B1 (ko) 방사선 시스템 및 리소그래피 장치
US9986628B2 (en) Method and apparatus for generating radiation
US9541840B2 (en) Faceted EUV optical element
US12133319B2 (en) Apparatus and method for generating extreme ultraviolet radiation
KR20220022472A (ko) 레이저 집속 모듈
US7335900B2 (en) Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
US11166361B2 (en) Method and device for measuring contamination in EUV source
US11153959B2 (en) Apparatus and method for generating extreme ultraviolet radiation
KR102629725B1 (ko) 재료 경로 상에서 이동하는 재료를 포획하기 위한 리셉터클
US9648714B2 (en) Fuel system for lithographic apparatus, EUV source, lithographic apparatus and fuel filtering method
WO2025140811A1 (en) Extreme ultraviolet light generation sequence for an extreme ultraviolet light source
NL2012718A (en) Radiation systems and associated methods.

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

FPAY Annual fee payment
PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20160211

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20170203

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20180202

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20190212

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20250216

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

H13 Ip right lapsed

Free format text: ST27 STATUS EVENT CODE: N-4-6-H10-H13-OTH-PC1903 (AS PROVIDED BY THE NATIONAL OFFICE); TERMINATION CATEGORY : DEFAULT_OF_REGISTRATION_FEE

Effective date: 20250216

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20250216