KR100905686B1 - 프린트 배선판 - Google Patents
프린트 배선판 Download PDFInfo
- Publication number
- KR100905686B1 KR100905686B1 KR1020077025324A KR20077025324A KR100905686B1 KR 100905686 B1 KR100905686 B1 KR 100905686B1 KR 1020077025324 A KR1020077025324 A KR 1020077025324A KR 20077025324 A KR20077025324 A KR 20077025324A KR 100905686 B1 KR100905686 B1 KR 100905686B1
- Authority
- KR
- South Korea
- Prior art keywords
- solder
- wiring board
- resist layer
- printed wiring
- micrometers
- Prior art date
Links
- 229910000679 solder Inorganic materials 0.000 claims abstract description 412
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
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- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
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- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3478—Applying solder preforms; Transferring prefabricated solder patterns
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
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- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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Abstract
Description
Claims (11)
- 도체 회로와 층간 수지 절연층이 상호 적층되어 이루어짐과 함께, 상이한 층에 위치하는 도체 회로들이 비아홀을 개재하여 전기적으로 접속되어 이루어지는 빌드업 배선층을 갖고, 최외층의 층간 수지 절연막과 최외층의 도체 회로 상에는 솔더 레지스트층이 형성되고, 그 솔더 레지스트층에 형성한 개구부로부터 노출되는 상기 도체 회로의 일부를, 전자 부품을 실장하기 위한 도체 패드로서 형성하고, 그 도체 패드 상에 땜납 범프를 형성하여 이루어지는 프린트 배선판에 있어서,상기 도체 패드는 0㎛ 초과 200㎛ 이하의 피치로 배치됨과 함께,상기 땜납 범프는, 상기 솔더 레지스트층에 형성된 개구부 내에 땜납볼을 탑재함으로써 형성되고,상기 땜납 범프의 솔더 레지스트층 표면에서부터의 높이 (H) 와 상기 개구부의 개구 직경 (D) 의 비 (H/D) 가 0.55 ∼ 1.0 인 것을 특징으로 하는 프린트 배선판.
- 도체 회로와 층간 수지 절연층이 상호 적층되어 이루어짐과 함께, 상이한 층에 위치하는 도체 회로들이 비아홀을 개재하여 전기적으로 접속되어 이루어지는 빌드업 배선층을 갖고, 최외층의 층간 수지 절연막과 최외층의 도체 회로 상에는 솔더 레지스트층이 형성되고, 그 솔더 레지스트층에 형성한 개구부로부터 노출되는 상기 도체 회로의 일부를, 전자 부품을 실장하기 위한 도체 패드로서 형성하고, 그 도체 패드 상에 땜납 범프를 형성하여, 그 땜납 범프를 사이에 두고 실장된 전자 부품과 솔더 레지스트층 사이를 언더필에 의해서 수지 봉지하여 이루어지는 프린트 배선판에 있어서,상기 도체 패드는 0㎛ 초과 200㎛ 이하의 피치로 배치됨과 함께,상기 땜납 범프는, 상기 솔더 레지스트층에 형성된 개구부 내에 땜납볼을 탑재함으로써 형성되고,상기 땜납 범프의 솔더 레지스트층 표면에서부터의 높이 (H) 와 상기 개구부의 개구 직경 (D) 의 비 (H/D) 가 0.55 ∼ 1.0 인 것을 특징으로 하는 프린트 배선판.
- 제 1 항 또는 제 2 항에 있어서,상기 솔더 레지스트층의 표면은, 적어도 전자 부품 실장 영역에 있어서 평탄화 처리가 실시되어 이루어지는 것을 특징으로 하는 프린트 배선판.
- 제 3 항에 있어서,상기 솔더 레지스트층의 평탄화된 표면은, 추가로 조화 (粗化) 처리가 실시되어 이루어지는 것을 특징으로 하는 프린트 배선판.
- 제 3 항에 있어서,상기 솔더 레지스트층의 평탄화된 표면은, 그 최대 표면 거칠기가 0.8 ∼ 3.0㎛ 인 것을 특징으로 하는 프린트 배선판.
- 제 5 항에 있어서,상기 솔더 레지스트층의 조화 (粗化) 된 표면은, 그 표면 거칠기가 상기 평탄화된 표면의 최대 표면 거칠기보다 작고, 또한 산술 평균 거칠기 (Ra) 로 0.2 ∼ 0.5㎛ 인 것을 특징으로 하는 프린트 배선판.
- 제 1 항 또는 제 2 항에 있어서,상기 도체 패드는, 최외층에 위치하는 층간 수지 절연층에 형성한 개구 내에 도금 도체를 충전하여 이루어지는 필드 비아의 형태로 형성되고, 상기 층간 수지 절연층 표면에서 노출되는 필드 비아 표면의 요철량은, 층간 수지 절연층 상에 형성되는 도체 회로의 두께에 대하여 -5㎛ ∼ +5㎛ 인 것을 특징으로 하는 프린트 배선판.
- 제 1 항 또는 제 2 항에 있어서,상기 도체 패드는, 0㎛ 초과 150㎛ 이하의 피치로 배치되는 것을 특징으로 하는 프린트 배선판.
- 도체 회로와 층간 수지 절연층이 상호 적층되어 이루어짐과 함께, 상이한 층에 위치하는 도체 회로들이 비아홀을 개재하여 전기적으로 접속되어 이루어지는 빌드업 배선층을 갖고, 최외층의 층간 수지 절연막과 최외층의 도체 회로 상에는 솔더 레지스트층이 형성되고, 그 솔더 레지스트층에 형성한 개구부로부터 노출되는 상기 도체 회로의 일부를, 전자 부품을 실장하기 위한 도체 패드로서 형성하고, 그 도체 패드 상에 땜납 범프를 형성하여 이루어지는 프린트 배선판을 제조하는 방법에 있어서,상기 도체 패드는 0㎛ 초과 200㎛ 이하의 피치로 배치하는 공정과,상기 솔더 레지스트층에 형성한 개구부를 개재하여 상기 도체 패드 상에 땜납볼을 탑재하는 공정과,상기 땜납볼의 솔더 레지스트층 표면으로부터의 높이 (H) 와 상기 개구부의 개구 직경 (D) 과의 비 (H/D) 가 0.55 ∼ 1.0 이도록, 상기 땜납 범프를 형성하는 공정을 포함하고 있는 프린트 배선판의 제조 방법.
- 제 9 항에 있어서,상기 도체 패드는, 0㎛ 초과 150㎛ 이하의 피치로 배치하는 것을 특징으로 하는 프린트 배선판의 제조 방법.
- 제 9 항 또는 제 10 항에 있어서,상기 땜납볼을 탑재하는 공정과,볼 정렬용 마스크의 상방에, 그 볼 정렬용 마스크에 대향하는 개구를 구비하는 통부재를 위치시키고, 그 통부재에서 공기를 흡입함으로써 통부재 바로 아래의 볼 정렬용 마스크 상에 땜납볼을 집합시키는 공정과,상기 통부재를 수평 방향으로 이동시킴으로써, 상기 볼 정렬용 마스크의 개구를 개재하여 상기 도체 패드 상에 땜납볼을 낙하시키는 공정을 포함하는 것을 특징으로 하는 프린트 배선판의 제조 방법.
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CN101826496B (zh) * | 2005-05-23 | 2015-03-18 | 揖斐电株式会社 | 印刷线路板及其制造方法 |
CN101171894B (zh) * | 2005-06-30 | 2010-05-19 | 揖斐电株式会社 | 印刷线路板 |
WO2007004658A1 (ja) | 2005-06-30 | 2007-01-11 | Ibiden Co., Ltd. | プリント配線板 |
EP1978556A1 (en) * | 2006-01-27 | 2008-10-08 | Ibiden Co., Ltd. | Printed-circuit board, and method for manufacturing the same |
TW200746964A (en) * | 2006-01-27 | 2007-12-16 | Ibiden Co Ltd | Method of manufacturing printed wiring board |
US7969005B2 (en) * | 2007-04-27 | 2011-06-28 | Sanyo Electric Co., Ltd. | Packaging board, rewiring, roughened conductor for semiconductor module of a portable device, and manufacturing method therefor |
JP5101169B2 (ja) * | 2007-05-30 | 2012-12-19 | 新光電気工業株式会社 | 配線基板とその製造方法 |
US7982137B2 (en) * | 2007-06-27 | 2011-07-19 | Hamilton Sundstrand Corporation | Circuit board with an attached die and intermediate interposer |
TWI463582B (zh) * | 2007-09-25 | 2014-12-01 | Ngk Spark Plug Co | 具有焊接凸塊之配線基板的製造方法 |
US9941245B2 (en) * | 2007-09-25 | 2018-04-10 | Intel Corporation | Integrated circuit packages including high density bump-less build up layers and a lesser density core or coreless substrate |
KR101551898B1 (ko) * | 2007-10-05 | 2015-09-09 | 신꼬오덴기 고교 가부시키가이샤 | 배선 기판, 반도체 장치 및 이들의 제조 방법 |
KR100965341B1 (ko) * | 2007-12-20 | 2010-06-22 | 삼성전기주식회사 | 인쇄회로기판의 제조방법 |
KR100992181B1 (ko) | 2007-12-26 | 2010-11-04 | 삼성전기주식회사 | 패키지용 기판 및 그 제조방법 |
US7759137B2 (en) * | 2008-03-25 | 2010-07-20 | Stats Chippac, Ltd. | Flip chip interconnection structure with bump on partial pad and method thereof |
US9345148B2 (en) | 2008-03-25 | 2016-05-17 | Stats Chippac, Ltd. | Semiconductor device and method of forming flipchip interconnection structure with bump on partial pad |
TWI363585B (en) * | 2008-04-02 | 2012-05-01 | Advanced Semiconductor Eng | Method for manufacturing a substrate having embedded component therein |
EP2157841A4 (en) | 2008-05-30 | 2011-11-02 | Ibiden Co Ltd | MOUNTING DEVICE FOR A SOLDERING BALL |
US8471154B1 (en) * | 2009-08-06 | 2013-06-25 | Amkor Technology, Inc. | Stackable variable height via package and method |
US20110195223A1 (en) * | 2010-02-11 | 2011-08-11 | Qualcomm Incorporated | Asymmetric Front/Back Solder Mask |
JP5290215B2 (ja) * | 2010-02-15 | 2013-09-18 | ルネサスエレクトロニクス株式会社 | 半導体装置、半導体パッケージ、インタポーザ、及びインタポーザの製造方法 |
JP5623308B2 (ja) * | 2010-02-26 | 2014-11-12 | 日本特殊陶業株式会社 | 多層配線基板及びその製造方法 |
US20120160542A1 (en) * | 2010-12-22 | 2012-06-28 | Oluwafemi Olufemi B | Crosstalk reduction on microstrip routing |
JP2012169591A (ja) | 2011-01-24 | 2012-09-06 | Ngk Spark Plug Co Ltd | 多層配線基板 |
US8643154B2 (en) | 2011-01-31 | 2014-02-04 | Ibiden Co., Ltd. | Semiconductor mounting device having multiple substrates connected via bumps |
US8692129B2 (en) * | 2011-03-31 | 2014-04-08 | Ibiden Co., Ltd. | Package-substrate-mounting printed wiring board and method for manufacturing the same |
KR101936451B1 (ko) * | 2011-05-09 | 2019-01-08 | 엔테그리스, 아이엔씨. | 미세다공성 막 층들 및 나노섬유 층을 포함하는 다공성 복합막 |
US8653658B2 (en) | 2011-11-30 | 2014-02-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Planarized bumps for underfill control |
CN102543930A (zh) * | 2012-02-03 | 2012-07-04 | 昆山美微电子科技有限公司 | 电铸晶圆凸块 |
JP5502139B2 (ja) * | 2012-05-16 | 2014-05-28 | 日本特殊陶業株式会社 | 配線基板 |
US8970035B2 (en) | 2012-08-31 | 2015-03-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump structures for semiconductor package |
US9673131B2 (en) | 2013-04-09 | 2017-06-06 | Intel Corporation | Integrated circuit package assemblies including a glass solder mask layer |
KR101734425B1 (ko) * | 2013-09-24 | 2017-05-11 | 주식회사 엘지화학 | 드라이 필름 솔더 레지스트의 제조 방법과, 이에 사용되는 필름 적층체 |
JP6320066B2 (ja) * | 2014-02-13 | 2018-05-09 | イビデン株式会社 | ボール搭載用マスクおよびボール搭載装置 |
JP2016012002A (ja) * | 2014-06-27 | 2016-01-21 | 日立化成株式会社 | 感光性樹脂組成物の硬化物、それに用いる感光性樹脂組成物及び半導体装置搭載用基板の製造方法、半導体装置の製造方法 |
JP5882510B2 (ja) * | 2014-06-30 | 2016-03-09 | 太陽インキ製造株式会社 | 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法 |
JP6329027B2 (ja) * | 2014-08-04 | 2018-05-23 | ミネベアミツミ株式会社 | フレキシブルプリント基板 |
CN104185360B (zh) * | 2014-08-18 | 2017-05-24 | 深圳市华星光电技术有限公司 | 一种印刷电路板及其设计方法 |
JP2016076533A (ja) * | 2014-10-03 | 2016-05-12 | イビデン株式会社 | バンプ付きプリント配線板およびその製造方法 |
JP6230520B2 (ja) * | 2014-10-29 | 2017-11-15 | キヤノン株式会社 | プリント回路板及び電子機器 |
US10269758B2 (en) * | 2015-12-24 | 2019-04-23 | Intel Corporation | Systems and processes for measuring thickness values of semiconductor substrates |
JP6175205B1 (ja) * | 2017-02-01 | 2017-08-02 | 太陽インキ製造株式会社 | 感光性フィルム、感光性フィルム積層体およびそれらを用いて形成された硬化物 |
JP6949550B2 (ja) | 2017-05-17 | 2021-10-13 | 日本発條株式会社 | ディスク装置用サスペンションの配線部材 |
JP6199524B1 (ja) * | 2017-07-03 | 2017-09-20 | 太陽インキ製造株式会社 | 感光性フィルム、感光性フィルム積層体およびそれらを用いて形成された硬化物 |
JP6199525B1 (ja) * | 2017-07-03 | 2017-09-20 | 太陽インキ製造株式会社 | 感光性フィルム、感光性フィルム積層体およびそれらを用いて形成された硬化物 |
JP2019140174A (ja) * | 2018-02-07 | 2019-08-22 | イビデン株式会社 | プリント配線板およびプリント配線板の製造方法 |
CN109688720B (zh) * | 2018-12-30 | 2020-09-01 | 北京康普锡威科技有限公司 | 预制焊料的pcb板的制备方法及pcb板 |
CN116801482B (zh) * | 2022-03-18 | 2024-05-10 | 华为技术有限公司 | 电路板组件及其加工方法、电子设备 |
CN114585175B (zh) * | 2022-04-29 | 2022-07-15 | 广东科翔电子科技股份有限公司 | 一种Mini-LED焊盘加高方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004207370A (ja) * | 2002-12-24 | 2004-07-22 | Cmk Corp | プリント配線板の製造方法 |
JP2004319676A (ja) * | 2003-04-15 | 2004-11-11 | Harima Chem Inc | はんだ析出方法およびはんだバンプ形成方法 |
Family Cites Families (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0245357B2 (ja) | 1982-06-25 | 1990-10-09 | Hitachi Ltd | Kibannosetsuzokukozo |
US5118027A (en) * | 1991-04-24 | 1992-06-02 | International Business Machines Corporation | Method of aligning and mounting solder balls to a substrate |
JPH05121411A (ja) | 1991-10-25 | 1993-05-18 | Rohm Co Ltd | 電子部品における接続用バンプの形成方法 |
US5329423A (en) | 1993-04-13 | 1994-07-12 | Scholz Kenneth D | Compressive bump-and-socket interconnection scheme for integrated circuits |
JPH1140908A (ja) | 1997-07-22 | 1999-02-12 | Ibiden Co Ltd | プリント配線板 |
JPH1174403A (ja) * | 1997-08-28 | 1999-03-16 | Mitsubishi Electric Corp | 半導体装置 |
US6046910A (en) * | 1998-03-18 | 2000-04-04 | Motorola, Inc. | Microelectronic assembly having slidable contacts and method for manufacturing the assembly |
JP2000022039A (ja) * | 1998-07-06 | 2000-01-21 | Shinko Electric Ind Co Ltd | 半導体装置及びその製造方法 |
WO2000010369A1 (fr) * | 1998-08-10 | 2000-02-24 | Fujitsu Limited | Realisation de bossages de soudure, methode de montage d'un dispositif electronique et structure de montage pour ce dispositif |
JP3213292B2 (ja) * | 1999-07-12 | 2001-10-02 | ソニーケミカル株式会社 | 多層基板、及びモジュール |
TW434856B (en) * | 2000-05-15 | 2001-05-16 | Siliconware Precision Industries Co Ltd | Manufacturing method for high coplanarity solder ball array of ball grid array integrated circuit package |
CN1196392C (zh) * | 2000-07-31 | 2005-04-06 | 日本特殊陶业株式会社 | 布线基板及其制造方法 |
US6563210B2 (en) * | 2000-12-19 | 2003-05-13 | Intel Corporation | Parallel plane substrate |
TWI293315B (en) * | 2000-12-26 | 2008-02-11 | Ngk Spark Plug Co | Wiring substrate |
JP5004378B2 (ja) * | 2001-01-10 | 2012-08-22 | イビデン株式会社 | 多層プリント配線板 |
JP4587571B2 (ja) | 2001-01-12 | 2010-11-24 | イビデン株式会社 | 多層プリント配線板の製造方法 |
JP2002290030A (ja) * | 2001-03-23 | 2002-10-04 | Ngk Spark Plug Co Ltd | 配線基板 |
JP3595283B2 (ja) * | 2001-06-27 | 2004-12-02 | 日本特殊陶業株式会社 | 配線基板及びその製造方法 |
DE10138042A1 (de) | 2001-08-08 | 2002-11-21 | Infineon Technologies Ag | Elektronisches Bauteil und Verfahren zu seiner Herstellung |
JP3910387B2 (ja) * | 2001-08-24 | 2007-04-25 | 新光電気工業株式会社 | 半導体パッケージ及びその製造方法並びに半導体装置 |
US6753480B2 (en) * | 2001-10-12 | 2004-06-22 | Ultratera Corporation | Printed circuit board having permanent solder mask |
TW557521B (en) * | 2002-01-16 | 2003-10-11 | Via Tech Inc | Integrated circuit package and its manufacturing process |
JP2003218272A (ja) * | 2002-01-25 | 2003-07-31 | Sony Corp | 高周波モジュール及びその製造方法 |
JP3819806B2 (ja) * | 2002-05-17 | 2006-09-13 | 富士通株式会社 | バンプ電極付き電子部品およびその製造方法 |
JP4209178B2 (ja) * | 2002-11-26 | 2009-01-14 | 新光電気工業株式会社 | 電子部品実装構造及びその製造方法 |
JP2004179578A (ja) * | 2002-11-29 | 2004-06-24 | Ngk Spark Plug Co Ltd | 配線基板及びその製造方法 |
JP4006699B2 (ja) * | 2003-04-22 | 2007-11-14 | 日立金属株式会社 | 微小ボール搭載用マスクおよび微小ボールの搭載方法 |
WO2004103039A1 (ja) * | 2003-05-19 | 2004-11-25 | Dai Nippon Printing Co., Ltd. | 両面配線基板および両面配線基板の製造方法並びに多層配線基板 |
KR100520961B1 (ko) * | 2003-05-30 | 2005-10-17 | 엘지전자 주식회사 | 인쇄회로기판의 제조방법 |
TWI222687B (en) * | 2003-08-14 | 2004-10-21 | Advanced Semiconductor Eng | Semiconductor chip with bumps and method for manufacturing the same |
TWI335195B (en) * | 2003-12-16 | 2010-12-21 | Ngk Spark Plug Co | Multilayer wiring board |
JP4860113B2 (ja) * | 2003-12-26 | 2012-01-25 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の製造方法 |
JP4387231B2 (ja) * | 2004-03-31 | 2009-12-16 | 新光電気工業株式会社 | キャパシタ実装配線基板及びその製造方法 |
TWI240389B (en) | 2004-05-06 | 2005-09-21 | Advanced Semiconductor Eng | High-density layout substrate for flip-chip package |
CN100367491C (zh) * | 2004-05-28 | 2008-02-06 | 日本特殊陶业株式会社 | 中间基板 |
US7626829B2 (en) * | 2004-10-27 | 2009-12-01 | Ibiden Co., Ltd. | Multilayer printed wiring board and manufacturing method of the multilayer printed wiring board |
JP2006216713A (ja) * | 2005-02-02 | 2006-08-17 | Ibiden Co Ltd | 多層プリント配線板 |
TWI414218B (zh) * | 2005-02-09 | 2013-11-01 | Ngk Spark Plug Co | 配線基板及配線基板內建用之電容器 |
US7183652B2 (en) * | 2005-04-27 | 2007-02-27 | Infineon Technologies Ag | Electronic component and electronic configuration |
CN101826496B (zh) | 2005-05-23 | 2015-03-18 | 揖斐电株式会社 | 印刷线路板及其制造方法 |
CN101171894B (zh) * | 2005-06-30 | 2010-05-19 | 揖斐电株式会社 | 印刷线路板 |
WO2007004658A1 (ja) | 2005-06-30 | 2007-01-11 | Ibiden Co., Ltd. | プリント配線板 |
JP4838068B2 (ja) * | 2005-09-01 | 2011-12-14 | 日本特殊陶業株式会社 | 配線基板 |
CN101283631B (zh) * | 2005-12-20 | 2010-06-09 | 揖斐电株式会社 | 印刷线路板的制造方法 |
-
2006
- 2006-06-28 CN CN2006800148623A patent/CN101171894B/zh active Active
- 2006-06-28 CN CN201010138568A patent/CN101868120A/zh active Pending
- 2006-06-28 JP JP2007524083A patent/JP5021472B2/ja active Active
- 2006-06-28 WO PCT/JP2006/313342 patent/WO2007004657A1/ja active Application Filing
- 2006-06-28 EP EP06780769A patent/EP1887845A4/en not_active Withdrawn
- 2006-06-29 US US11/476,557 patent/US7714233B2/en active Active
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-
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- 2010-02-26 US US12/713,274 patent/US8003897B2/en active Active
- 2010-11-23 US US12/952,537 patent/US8832935B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004207370A (ja) * | 2002-12-24 | 2004-07-22 | Cmk Corp | プリント配線板の製造方法 |
JP2004319676A (ja) * | 2003-04-15 | 2004-11-11 | Harima Chem Inc | はんだ析出方法およびはんだバンプ形成方法 |
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CN101868120A (zh) | 2010-10-20 |
US20100155129A1 (en) | 2010-06-24 |
WO2007004657A1 (ja) | 2007-01-11 |
CN101171894A (zh) | 2008-04-30 |
EP1887845A1 (en) | 2008-02-13 |
KR20070116966A (ko) | 2007-12-11 |
TW200738090A (en) | 2007-10-01 |
US20110061232A1 (en) | 2011-03-17 |
US20070096327A1 (en) | 2007-05-03 |
US8003897B2 (en) | 2011-08-23 |
JPWO2007004657A1 (ja) | 2009-01-29 |
JP5021472B2 (ja) | 2012-09-05 |
TWI309543B (ko) | 2009-05-01 |
EP1887845A4 (en) | 2010-08-11 |
CN101171894B (zh) | 2010-05-19 |
US7714233B2 (en) | 2010-05-11 |
US8832935B2 (en) | 2014-09-16 |
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