JPWO2021187481A5 - - Google Patents

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Publication number
JPWO2021187481A5
JPWO2021187481A5 JP2022508378A JP2022508378A JPWO2021187481A5 JP WO2021187481 A5 JPWO2021187481 A5 JP WO2021187481A5 JP 2022508378 A JP2022508378 A JP 2022508378A JP 2022508378 A JP2022508378 A JP 2022508378A JP WO2021187481 A5 JPWO2021187481 A5 JP WO2021187481A5
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JP
Japan
Prior art keywords
group
composition
insulating film
forming
film according
Prior art date
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JP2022508378A
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English (en)
Japanese (ja)
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JP7444239B2 (ja
JPWO2021187481A1 (https=
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Priority claimed from PCT/JP2021/010607 external-priority patent/WO2021187481A1/ja
Publication of JPWO2021187481A1 publication Critical patent/JPWO2021187481A1/ja
Publication of JPWO2021187481A5 publication Critical patent/JPWO2021187481A5/ja
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Publication of JP7444239B2 publication Critical patent/JP7444239B2/ja
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JP2022508378A 2020-03-18 2021-03-16 感光性絶縁膜形成組成物 Active JP7444239B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020047394 2020-03-18
JP2020047394 2020-03-18
PCT/JP2021/010607 WO2021187481A1 (ja) 2020-03-18 2021-03-16 感光性絶縁膜形成組成物

Publications (3)

Publication Number Publication Date
JPWO2021187481A1 JPWO2021187481A1 (https=) 2021-09-23
JPWO2021187481A5 true JPWO2021187481A5 (https=) 2022-11-14
JP7444239B2 JP7444239B2 (ja) 2024-03-06

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JP2022508378A Active JP7444239B2 (ja) 2020-03-18 2021-03-16 感光性絶縁膜形成組成物

Country Status (5)

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JP (1) JP7444239B2 (https=)
KR (1) KR102696847B1 (https=)
CN (1) CN115298616B (https=)
TW (1) TWI858239B (https=)
WO (1) WO2021187481A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022210096A1 (ja) * 2021-04-02 2022-10-06 Jsr株式会社 絶縁膜形成用感放射線性組成物、パターンを有する樹脂膜および半導体回路基板
JP2024160416A (ja) * 2021-09-21 2024-11-14 日産化学株式会社 非感光性絶縁膜形成組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2110262A1 (de) * 1971-03-04 1972-09-14 Basf Ag Verfahren zur Herstellung von Copolymerisatlösungen und dispersionen
JP6476558B2 (ja) * 2014-03-07 2019-03-06 Dic株式会社 酸基含有(メタ)アクリレート樹脂、酸基含有(メタ)アクリレート樹脂の製造方法、硬化性樹脂材料、その硬化物、及びレジスト材料
JP6566023B2 (ja) * 2015-03-11 2019-08-28 Jsr株式会社 重合体、樹脂組成物及び樹脂成形体
CN105061754A (zh) * 2015-09-06 2015-11-18 吉林大学 一种聚芳醚类聚合物及其制备方法
WO2017183461A1 (ja) * 2016-04-20 2017-10-26 Jsr株式会社 重合体、組成物、成形体、硬化物及び積層体
JP6919290B2 (ja) * 2016-04-27 2021-08-18 Jsr株式会社 組成物、硬化物及び積層体
WO2019044874A1 (ja) * 2017-09-01 2019-03-07 日産化学株式会社 感光性樹脂組成物
JP7115165B2 (ja) * 2017-09-15 2022-08-09 Jsr株式会社 高周波回路用積層体及びフレキシブルプリント基板
JP7294341B2 (ja) * 2018-07-25 2023-06-20 Jsr株式会社 感光性樹脂組成物、パターンを有する樹脂膜の製造方法、パターンを有する樹脂膜、および半導体回路基板
JP7702778B2 (ja) * 2020-04-27 2025-07-04 味の素株式会社 樹脂組成物
WO2022210096A1 (ja) * 2021-04-02 2022-10-06 Jsr株式会社 絶縁膜形成用感放射線性組成物、パターンを有する樹脂膜および半導体回路基板

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