JP2023126803A5 - - Google Patents
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- Publication number
- JP2023126803A5 JP2023126803A5 JP2023099736A JP2023099736A JP2023126803A5 JP 2023126803 A5 JP2023126803 A5 JP 2023126803A5 JP 2023099736 A JP2023099736 A JP 2023099736A JP 2023099736 A JP2023099736 A JP 2023099736A JP 2023126803 A5 JP2023126803 A5 JP 2023126803A5
- Authority
- JP
- Japan
- Prior art keywords
- underlayer film
- resist underlayer
- resist
- group
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 11
- 125000004432 carbon atom Chemical group C* 0.000 claims 6
- 229920000642 polymer Polymers 0.000 claims 6
- 239000004065 semiconductor Substances 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- 125000001931 aliphatic group Chemical group 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 239000000178 monomer Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004414 alkyl thio group Chemical group 0.000 claims 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 150000001721 carbon Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000005842 heteroatom Chemical group 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019088345 | 2019-05-08 | ||
| JP2019088345 | 2019-05-08 | ||
| JP2021518387A JP7306451B2 (ja) | 2019-05-08 | 2020-05-01 | 脂環式化合物末端の重合体を含むレジスト下層膜形成組成物 |
| PCT/JP2020/018436 WO2020226141A1 (ja) | 2019-05-08 | 2020-05-01 | 脂環式化合物末端の重合体を含むレジスト下層膜形成組成物 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021518387A Division JP7306451B2 (ja) | 2019-05-08 | 2020-05-01 | 脂環式化合物末端の重合体を含むレジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023126803A JP2023126803A (ja) | 2023-09-12 |
| JP2023126803A5 true JP2023126803A5 (https=) | 2023-11-30 |
| JP7622779B2 JP7622779B2 (ja) | 2025-01-28 |
Family
ID=73050771
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021518387A Active JP7306451B2 (ja) | 2019-05-08 | 2020-05-01 | 脂環式化合物末端の重合体を含むレジスト下層膜形成組成物 |
| JP2023099736A Active JP7622779B2 (ja) | 2019-05-08 | 2023-06-19 | 脂環式化合物末端の重合体を含むレジスト下層膜形成組成物 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021518387A Active JP7306451B2 (ja) | 2019-05-08 | 2020-05-01 | 脂環式化合物末端の重合体を含むレジスト下層膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12510823B2 (https=) |
| JP (2) | JP7306451B2 (https=) |
| KR (1) | KR102796661B1 (https=) |
| CN (1) | CN113795532B (https=) |
| TW (2) | TWI844674B (https=) |
| WO (1) | WO2020226141A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7268684B2 (ja) * | 2018-10-05 | 2023-05-08 | 日産化学株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| KR102777091B1 (ko) * | 2021-01-27 | 2025-03-07 | 닛산 가가쿠 가부시키가이샤 | 다중결합을 갖는 막형성 조성물 |
| WO2022244682A1 (ja) * | 2021-05-19 | 2022-11-24 | Jsr株式会社 | 半導体基板の製造方法及びレジスト下層膜形成用組成物 |
| CN120584325A (zh) | 2023-02-09 | 2025-09-02 | 日产化学株式会社 | 抗蚀剂下层膜形成用组合物 |
| WO2025197551A1 (ja) * | 2024-03-18 | 2025-09-25 | Jsr株式会社 | 半導体基板の製造方法、レジスト下層膜形成用組成物及び窒素含有化合物の製造方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4317870B2 (ja) * | 2003-03-11 | 2009-08-19 | フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド | 新規な感光性樹脂組成物 |
| JP4105036B2 (ja) | 2003-05-28 | 2008-06-18 | 信越化学工業株式会社 | レジスト下層膜材料ならびにパターン形成方法 |
| JP5337983B2 (ja) * | 2007-09-19 | 2013-11-06 | 日産化学工業株式会社 | 多環式脂肪族環を有するポリマーを含むリソグラフィー用レジスト下層膜形成組成物 |
| WO2009104685A1 (ja) * | 2008-02-21 | 2009-08-27 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| US8822138B2 (en) * | 2009-08-19 | 2014-09-02 | Nissan Chemical Industries, Ltd. | Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring |
| US8507192B2 (en) | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
| WO2013141015A1 (ja) | 2012-03-23 | 2013-09-26 | 日産化学工業株式会社 | Ｅｕｖリソグラフィー用レジスト下層膜形成組成物 |
| KR101866209B1 (ko) * | 2012-05-07 | 2018-06-11 | 닛산 가가쿠 고교 가부시키 가이샤 | 레지스트 하층막 형성조성물 |
| KR101489922B1 (ko) | 2012-06-15 | 2015-02-06 | 주식회사 성원정보기술 | 자동차부품용 고무제품을 위한 약품 배합 평량 측정 자동화 장치 |
| CN107108549A (zh) * | 2014-12-25 | 2017-08-29 | 三菱瓦斯化学株式会社 | 化合物、树脂、光刻用基底膜形成材料、光刻用基底膜、图案形成方法和纯化方法 |
| JP6413888B2 (ja) * | 2015-03-30 | 2018-10-31 | Jsr株式会社 | パターン形成用組成物、パターン形成方法及びブロック共重合体 |
| JP7020912B2 (ja) * | 2015-08-31 | 2022-02-16 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びその製造方法、並びにレジストパターン形成方法 |
| JP6497535B2 (ja) * | 2015-11-17 | 2019-04-10 | 日産化学株式会社 | レジスト下層膜形成組成物用添加剤及び該添加剤を含むレジスト下層膜形成組成物 |
| JP6699168B2 (ja) * | 2015-12-25 | 2020-05-27 | 日産化学株式会社 | レジスト下層膜形成用組成物及びレジストパターンの形成方法 |
| JP6853716B2 (ja) * | 2017-03-31 | 2021-03-31 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
-
2020
- 2020-05-01 KR KR1020217032612A patent/KR102796661B1/ko active Active
- 2020-05-01 US US17/605,044 patent/US12510823B2/en active Active
- 2020-05-01 CN CN202080033637.4A patent/CN113795532B/zh active Active
- 2020-05-01 WO PCT/JP2020/018436 patent/WO2020226141A1/ja not_active Ceased
- 2020-05-01 JP JP2021518387A patent/JP7306451B2/ja active Active
- 2020-05-06 TW TW109114985A patent/TWI844674B/zh active
- 2020-05-06 TW TW113117292A patent/TWI876990B/zh active
-
2023
- 2023-06-19 JP JP2023099736A patent/JP7622779B2/ja active Active
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