JPWO2022270230A5 - - Google Patents
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- Publication number
- JPWO2022270230A5 JPWO2022270230A5 JP2023529746A JP2023529746A JPWO2022270230A5 JP WO2022270230 A5 JPWO2022270230 A5 JP WO2022270230A5 JP 2023529746 A JP2023529746 A JP 2023529746A JP 2023529746 A JP2023529746 A JP 2023529746A JP WO2022270230 A5 JPWO2022270230 A5 JP WO2022270230A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- resin composition
- composition according
- sensitive resin
- actinic ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 claims 11
- 239000011342 resin composition Substances 0.000 claims 9
- 238000000034 method Methods 0.000 claims 6
- 150000001450 anions Chemical class 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- 229910052731 fluorine Inorganic materials 0.000 claims 3
- 125000001153 fluoro group Chemical group F* 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 125000004434 sulfur atom Chemical group 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021103377 | 2021-06-22 | ||
| PCT/JP2022/021808 WO2022270230A1 (ja) | 2021-06-22 | 2022-05-27 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022270230A1 JPWO2022270230A1 (https=) | 2022-12-29 |
| JPWO2022270230A5 true JPWO2022270230A5 (https=) | 2024-03-25 |
Family
ID=84543833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023529746A Pending JPWO2022270230A1 (https=) | 2021-06-22 | 2022-05-27 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240152049A1 (https=) |
| JP (1) | JPWO2022270230A1 (https=) |
| KR (1) | KR102885012B1 (https=) |
| TW (1) | TW202306938A (https=) |
| WO (1) | WO2022270230A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115997167B (zh) * | 2020-06-10 | 2025-07-04 | 富士胶片株式会社 | 感光化射线性或感放射线性树脂组合物、抗蚀剂膜 |
| JP2025066062A (ja) * | 2023-10-10 | 2025-04-22 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4695941B2 (ja) * | 2005-08-19 | 2011-06-08 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2011209660A (ja) * | 2010-03-30 | 2011-10-20 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜及びパターン形成方法 |
| KR102476090B1 (ko) * | 2018-02-28 | 2022-12-09 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 레지스트막, 패턴 형성 방법, 전자 디바이스의 제조 방법 |
| WO2019167570A1 (ja) * | 2018-03-01 | 2019-09-06 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
| KR20210074371A (ko) * | 2019-01-28 | 2021-06-21 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 레지스트막, 패턴 형성 방법, 전자 디바이스의 제조 방법 |
| JP2020183375A (ja) | 2019-04-26 | 2020-11-12 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| WO2020261753A1 (ja) * | 2019-06-28 | 2020-12-30 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、組成物収容体 |
-
2022
- 2022-05-27 WO PCT/JP2022/021808 patent/WO2022270230A1/ja not_active Ceased
- 2022-05-27 JP JP2023529746A patent/JPWO2022270230A1/ja active Pending
- 2022-05-27 KR KR1020237044108A patent/KR102885012B1/ko active Active
- 2022-06-06 TW TW111120817A patent/TW202306938A/zh unknown
-
2023
- 2023-12-21 US US18/392,802 patent/US20240152049A1/en active Pending
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