JP2005532595A5 - - Google Patents
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- Publication number
- JP2005532595A5 JP2005532595A5 JP2004520441A JP2004520441A JP2005532595A5 JP 2005532595 A5 JP2005532595 A5 JP 2005532595A5 JP 2004520441 A JP2004520441 A JP 2004520441A JP 2004520441 A JP2004520441 A JP 2004520441A JP 2005532595 A5 JP2005532595 A5 JP 2005532595A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- dry film
- film resist
- weight
- composition layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 238000000034 method Methods 0.000 claims 7
- 239000000203 mixture Substances 0.000 claims 5
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 239000011342 resin composition Substances 0.000 claims 4
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims 3
- 229910052736 halogen Inorganic materials 0.000 claims 3
- 150000002367 halogens Chemical class 0.000 claims 3
- 238000010030 laminating Methods 0.000 claims 3
- -1 or C 1 -C 6 alkyl Chemical group 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 2
- UMAFXEHJBLLIRG-UHFFFAOYSA-N 4-[(9-butylcarbazol-3-yl)-[4-(n-methylanilino)phenyl]methyl]-n-methyl-n-phenylaniline Chemical compound C=1C=C2N(CCCC)C3=CC=CC=C3C2=CC=1C(C=1C=CC(=CC=1)N(C)C=1C=CC=CC=1)C(C=C1)=CC=C1N(C)C1=CC=CC=C1 UMAFXEHJBLLIRG-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000005228 aryl sulfonate group Chemical group 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 238000003475 lamination Methods 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 230000001681 protective effect Effects 0.000 claims 2
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910018286 SbF 6 Inorganic materials 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 150000008052 alkyl sulfonates Chemical class 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 239000012955 diaryliodonium Substances 0.000 claims 1
- 125000005520 diaryliodonium group Chemical group 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000008240 homogeneous mixture Substances 0.000 claims 1
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 230000000269 nucleophilic effect Effects 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 238000004806 packaging method and process Methods 0.000 claims 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 claims 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 1
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02405581 | 2002-07-10 | ||
| PCT/EP2003/006954 WO2004008251A1 (en) | 2002-07-10 | 2003-07-01 | Heat stable photocurable resin composition for dry film resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005532595A JP2005532595A (ja) | 2005-10-27 |
| JP2005532595A5 true JP2005532595A5 (https=) | 2006-08-17 |
Family
ID=30011298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004520441A Pending JP2005532595A (ja) | 2002-07-10 | 2003-07-01 | ドライフィルムレジストのための熱安定性光硬化性樹脂組成物 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US7198884B2 (https=) |
| EP (1) | EP1520209A1 (https=) |
| JP (1) | JP2005532595A (https=) |
| KR (1) | KR20050025324A (https=) |
| CN (1) | CN1666149A (https=) |
| AU (1) | AU2003250865A1 (https=) |
| BR (1) | BR0312652A (https=) |
| CA (1) | CA2491678A1 (https=) |
| MX (1) | MXPA05000439A (https=) |
| TW (1) | TWI279645B (https=) |
| WO (1) | WO2004008251A1 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060144270A1 (en) * | 2005-01-04 | 2006-07-06 | Prakash Seth | Photothermally sensitive compositions and system for CTP imaging processes |
| US8796583B2 (en) * | 2004-09-17 | 2014-08-05 | Eastman Kodak Company | Method of forming a structured surface using ablatable radiation sensitive material |
| JP4761923B2 (ja) * | 2005-10-20 | 2011-08-31 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び積層体 |
| JP4668111B2 (ja) * | 2005-12-26 | 2011-04-13 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版 |
| US7772355B2 (en) * | 2008-01-28 | 2010-08-10 | The United States Of America As Represented By The Secretary Of The Navy | Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds |
| US20090191491A1 (en) * | 2008-01-28 | 2009-07-30 | John Ganjei | Method of Creating an Image in a Photoresist Laminate |
| KR100913058B1 (ko) * | 2008-08-25 | 2009-08-20 | 금호석유화학 주식회사 | 포지티브형 감광성 수지 조성물, 패턴 형성 방법 및 반도체소자 |
| KR101811116B1 (ko) * | 2013-05-09 | 2017-12-20 | 캐논 가부시끼가이샤 | 화합물, 광경화성 조성물, 및 광경화성 조성물을 사용하여 패턴 형상을 갖는 막, 광학 부품, 회로 기판, 전자 부품을 제조하는 방법, 및 경화물 |
| US9085692B1 (en) | 2014-02-25 | 2015-07-21 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Synthesis of oligomeric divinyldialkylsilane containing compositions |
| WO2017057584A1 (ja) * | 2015-09-30 | 2017-04-06 | 富士フイルム株式会社 | 静電容量型入力装置の電極保護膜用の組成物、静電容量型入力装置の電極保護膜、転写フィルム、積層体、静電容量型入力装置および画像表示装置。 |
| US9944816B2 (en) * | 2016-06-02 | 2018-04-17 | Ppg Coatings Europe B.V. | Crosslinkable binders for solvent based intumescent coatings |
| CN108255014B (zh) * | 2017-12-11 | 2019-07-02 | 珠海市能动科技光学产业有限公司 | 一种含有改性聚氨酯和光固化单体的干膜光阻剂 |
| CN112099312A (zh) * | 2020-10-19 | 2020-12-18 | 河源诚展科技有限公司 | 一种光致抗蚀干膜及其制备方法 |
| KR102646265B1 (ko) * | 2021-01-13 | 2024-03-08 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 레지스터 패턴, 회로기판, 및 디스플레이 장치 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| LU76074A1 (https=) * | 1976-10-26 | 1978-05-16 | ||
| JPS6057340A (ja) * | 1983-09-08 | 1985-04-03 | Fuji Photo Film Co Ltd | 焼出し性組成物 |
| DE3447357A1 (de) * | 1984-12-24 | 1986-07-03 | Basf Ag, 6700 Ludwigshafen | Trockenfilmresist und verfahren zur herstellung von resistmustern |
-
2003
- 2003-07-01 JP JP2004520441A patent/JP2005532595A/ja active Pending
- 2003-07-01 CA CA002491678A patent/CA2491678A1/en not_active Abandoned
- 2003-07-01 MX MXPA05000439A patent/MXPA05000439A/es active IP Right Grant
- 2003-07-01 CN CN038160617A patent/CN1666149A/zh active Pending
- 2003-07-01 US US10/520,701 patent/US7198884B2/en not_active Expired - Fee Related
- 2003-07-01 WO PCT/EP2003/006954 patent/WO2004008251A1/en not_active Ceased
- 2003-07-01 KR KR1020057000324A patent/KR20050025324A/ko not_active Ceased
- 2003-07-01 BR BR0312652-8A patent/BR0312652A/pt not_active Application Discontinuation
- 2003-07-01 AU AU2003250865A patent/AU2003250865A1/en not_active Abandoned
- 2003-07-01 EP EP03763670A patent/EP1520209A1/en not_active Withdrawn
- 2003-07-09 TW TW092118721A patent/TWI279645B/zh not_active IP Right Cessation
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