|
EP1139138A4
(en)
|
1999-09-29 |
2006-03-08 |
Nikon Corp |
PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
|
|
WO2001023933A1
(en)
|
1999-09-29 |
2001-04-05 |
Nikon Corporation |
Projection optical system
|
|
US7301605B2
(en)
|
2000-03-03 |
2007-11-27 |
Nikon Corporation |
Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
|
|
TW497013B
(en)
*
|
2000-09-07 |
2002-08-01 |
Asm Lithography Bv |
Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method
|
|
JP2002287023A
(ja)
|
2001-03-27 |
2002-10-03 |
Nikon Corp |
投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
|
|
EP1571695A4
(en)
|
2002-12-10 |
2008-10-15 |
Nikon Corp |
EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE SAME
|
|
TW200421444A
(en)
|
2002-12-10 |
2004-10-16 |
Nippon Kogaku Kk |
Optical device and projecting exposure apparatus using such optical device
|
|
KR101381538B1
(ko)
|
2003-02-26 |
2014-04-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
JP4353179B2
(ja)
|
2003-03-25 |
2009-10-28 |
株式会社ニコン |
露光装置、露光方法、及びデバイス製造方法
|
|
EP3226073A3
(en)
|
2003-04-09 |
2017-10-11 |
Nikon Corporation |
Exposure method and apparatus, and method for fabricating device
|
|
KR101745223B1
(ko)
|
2003-04-10 |
2017-06-08 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
|
|
EP2667253B1
(en)
|
2003-04-10 |
2015-06-10 |
Nikon Corporation |
Environmental system including vacuum scavenge for an immersion lithography apparatus
|
|
SG189557A1
(en)
|
2003-04-11 |
2013-05-31 |
Nikon Corp |
Cleanup method for optics in immersion lithography
|
|
SG10201603067VA
(en)
|
2003-04-11 |
2016-05-30 |
Nikon Corp |
Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
|
|
KR101516141B1
(ko)
|
2003-05-06 |
2015-05-04 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
|
US7348575B2
(en)
|
2003-05-06 |
2008-03-25 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
|
|
TW201515064A
(zh)
|
2003-05-23 |
2015-04-16 |
尼康股份有限公司 |
曝光方法及曝光裝置以及元件製造方法
|
|
TWI503865B
(zh)
|
2003-05-23 |
2015-10-11 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
|
KR20150036794A
(ko)
|
2003-05-28 |
2015-04-07 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치, 및 디바이스 제조 방법
|
|
TW200511388A
(en)
|
2003-06-13 |
2005-03-16 |
Nikon Corp |
Exposure method, substrate stage, exposure apparatus and method for manufacturing device
|
|
TWI433212B
(zh)
|
2003-06-19 |
2014-04-01 |
尼康股份有限公司 |
An exposure apparatus, an exposure method, and an element manufacturing method
|
|
JP4835155B2
(ja)
|
2003-07-09 |
2011-12-14 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
EP1646075B1
(en)
|
2003-07-09 |
2011-06-15 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
EP1503244A1
(en)
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method
|
|
KR101641011B1
(ko)
|
2003-07-28 |
2016-07-19 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
|
|
KR101288632B1
(ko)
|
2003-08-21 |
2013-07-22 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
KR101094114B1
(ko)
|
2003-08-26 |
2011-12-15 |
가부시키가이샤 니콘 |
광학소자 및 노광장치
|
|
US6954256B2
(en)
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
|
EP2804048A1
(en)
|
2003-08-29 |
2014-11-19 |
Nikon Corporation |
Exposure apparatus and device fabricating method
|
|
TWI475596B
(zh)
|
2003-08-29 |
2015-03-01 |
尼康股份有限公司 |
A liquid recovery device, an exposure device, an exposure method, and an element manufacturing method
|
|
JP3870182B2
(ja)
|
2003-09-09 |
2007-01-17 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
US8208198B2
(en)
|
2004-01-14 |
2012-06-26 |
Carl Zeiss Smt Gmbh |
Catadioptric projection objective
|
|
JP4438747B2
(ja)
|
2003-09-26 |
2010-03-24 |
株式会社ニコン |
投影露光装置及び投影露光装置の洗浄方法、メンテナンス方法並びにデバイスの製造方法
|
|
EP2320273B1
(en)
|
2003-09-29 |
2015-01-21 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing a device
|
|
WO2005031824A1
(ja)
|
2003-09-29 |
2005-04-07 |
Nikon Corporation |
投影露光装置、投影露光方法およびデバイス製造方法
|
|
TW201738932A
(zh)
|
2003-10-09 |
2017-11-01 |
Nippon Kogaku Kk |
曝光裝置及曝光方法、元件製造方法
|
|
ATE490548T1
(de)
|
2003-10-22 |
2010-12-15 |
Nikon Corp |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur bauelementeherstellung
|
|
TWI511179B
(zh)
|
2003-10-28 |
2015-12-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造方法
|
|
EP1679738A4
(en)
|
2003-10-28 |
2008-08-06 |
Nikon Corp |
EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
|
|
EP3064998B1
(en)
|
2003-10-31 |
2018-03-14 |
Nikon Corporation |
Immersion exposure apparatus and method
|
|
TWI512335B
(zh)
|
2003-11-20 |
2015-12-11 |
尼康股份有限公司 |
光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
|
|
WO2005055296A1
(ja)
|
2003-12-03 |
2005-06-16 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法、並びに光学部品
|
|
US7466489B2
(en)
|
2003-12-15 |
2008-12-16 |
Susanne Beder |
Projection objective having a high aperture and a planar end surface
|
|
KR101119813B1
(ko)
|
2003-12-15 |
2012-03-06 |
가부시키가이샤 니콘 |
스테이지 장치, 노광 장치, 및 노광 방법
|
|
US7460206B2
(en)
|
2003-12-19 |
2008-12-02 |
Carl Zeiss Smt Ag |
Projection objective for immersion lithography
|
|
KR101324810B1
(ko)
|
2004-01-05 |
2013-11-01 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US7463422B2
(en)
|
2004-01-14 |
2008-12-09 |
Carl Zeiss Smt Ag |
Projection exposure apparatus
|
|
CN102207608B
(zh)
|
2004-01-14 |
2013-01-02 |
卡尔蔡司Smt有限责任公司 |
反射折射投影物镜
|
|
US20080151364A1
(en)
|
2004-01-14 |
2008-06-26 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
|
|
US20070164234A1
(en)
|
2004-01-15 |
2007-07-19 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
WO2005071491A2
(en)
|
2004-01-20 |
2005-08-04 |
Carl Zeiss Smt Ag |
Exposure apparatus and measuring device for a projection lens
|
|
JP4319189B2
(ja)
|
2004-01-26 |
2009-08-26 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
TWI395068B
(zh)
|
2004-01-27 |
2013-05-01 |
尼康股份有限公司 |
光學系統、曝光裝置以及曝光方法
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
US7990516B2
(en)
|
2004-02-03 |
2011-08-02 |
Nikon Corporation |
Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
|
|
KR101309428B1
(ko)
|
2004-02-04 |
2013-09-23 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
TWI511182B
(zh)
|
2004-02-06 |
2015-12-01 |
尼康股份有限公司 |
光學照明裝置、曝光裝置、曝光方法以及元件製造方法
|
|
WO2005076323A1
(ja)
|
2004-02-10 |
2005-08-18 |
Nikon Corporation |
露光装置及びデバイス製造方法、メンテナンス方法及び露光方法
|
|
WO2005081292A1
(ja)
|
2004-02-20 |
2005-09-01 |
Nikon Corporation |
露光装置、供給方法及び回収方法、露光方法、ならびにデバイス製造方法
|
|
DE102004013886A1
(de)
|
2004-03-16 |
2005-10-06 |
Carl Zeiss Smt Ag |
Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
|
|
TWI402893B
(zh)
|
2004-03-25 |
2013-07-21 |
尼康股份有限公司 |
曝光方法
|
|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
KR101162938B1
(ko)
|
2004-04-19 |
2012-07-05 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
KR20170028451A
(ko)
|
2004-05-17 |
2017-03-13 |
칼 짜이스 에스엠티 게엠베하 |
중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
|
|
US7486381B2
(en)
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
CN101833247B
(zh)
|
2004-06-04 |
2013-11-06 |
卡尔蔡司Smt有限责任公司 |
微光刻投影曝光系统的投影物镜的光学测量的测量系统
|
|
US8705008B2
(en)
|
2004-06-09 |
2014-04-22 |
Nikon Corporation |
Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
|
|
KR101433496B1
(ko)
|
2004-06-09 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US8373843B2
(en)
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
KR20180072867A
(ko)
|
2004-06-10 |
2018-06-29 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US8717533B2
(en)
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US8508713B2
(en)
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
KR101639928B1
(ko)
|
2004-06-10 |
2016-07-14 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 및 디바이스 제조 방법
|
|
WO2005124833A1
(ja)
|
2004-06-21 |
2005-12-29 |
Nikon Corporation |
露光装置及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
|
|
US8698998B2
(en)
|
2004-06-21 |
2014-04-15 |
Nikon Corporation |
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
|
|
JP5119666B2
(ja)
|
2004-06-21 |
2013-01-16 |
株式会社ニコン |
露光装置、液体除去方法、及びデバイス製造方法
|
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR101433491B1
(ko)
|
2004-07-12 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7914972B2
(en)
|
2004-07-21 |
2011-03-29 |
Nikon Corporation |
Exposure method and device manufacturing method
|
|
EP3267257B1
(en)
|
2004-08-03 |
2019-02-13 |
Nikon Corporation |
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|
|
ATE535015T1
(de)
|
2004-09-01 |
2011-12-15 |
Nikon Corp |
Substrathalter, bühnenvorrichtung und belichtungsvorrichtung
|
|
EP1801630A4
(en)
|
2004-09-13 |
2009-12-16 |
Nikon Corp |
OPTICAL PROJECTION SYSTEM, METHOD FOR MANUFACTURING OPTICAL SYSTEM FOR PROJECTION EXPOSURE SYSTEM, AND EXPOSURE METHOD
|
|
KR101285963B1
(ko)
|
2004-09-17 |
2013-07-12 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
SG188899A1
(en)
|
2004-09-17 |
2013-04-30 |
Nikon Corp |
Substrate holding device, exposure apparatus, and device manufacturing method
|
|
EP1806828A4
(en)
|
2004-10-01 |
2016-11-09 |
Nikon Corp |
LINEAR MOTOR, STAGE EQUIPMENT AND EXPOSURE DEVICE
|
|
EP3306647A1
(en)
|
2004-10-15 |
2018-04-11 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
JP4665712B2
(ja)
|
2004-10-26 |
2011-04-06 |
株式会社ニコン |
基板処理方法、露光装置及びデバイス製造方法
|
|
KR101318037B1
(ko)
|
2004-11-01 |
2013-10-14 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
WO2006051909A1
(ja)
|
2004-11-11 |
2006-05-18 |
Nikon Corporation |
露光方法、デバイス製造方法、及び基板
|
|
JP4905135B2
(ja)
|
2004-12-01 |
2012-03-28 |
株式会社ニコン |
ステージ装置及び露光装置
|
|
JP4784513B2
(ja)
|
2004-12-06 |
2011-10-05 |
株式会社ニコン |
メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
|
|
JP4752473B2
(ja)
|
2004-12-09 |
2011-08-17 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
|
EP3285282A1
(en)
|
2004-12-15 |
2018-02-21 |
Nikon Corporation |
Exposure apparatus and device fabricating method
|
|
US7450217B2
(en)
|
2005-01-12 |
2008-11-11 |
Asml Netherlands B.V. |
Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
|
KR20180125636A
(ko)
|
2005-01-31 |
2018-11-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
TWI424260B
(zh)
|
2005-03-18 |
2014-01-21 |
尼康股份有限公司 |
A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
|
|
JP4946109B2
(ja)
|
2005-03-18 |
2012-06-06 |
株式会社ニコン |
露光方法、露光装置、及びデバイス製造方法
|
|
CN100459039C
(zh)
|
2005-03-25 |
2009-02-04 |
尼康股份有限公司 |
照射形状的测量方法、掩模
|
|
JP4605219B2
(ja)
|
2005-03-30 |
2011-01-05 |
株式会社ニコン |
露光条件の決定方法、露光方法及び露光装置、並びにデバイス製造方法
|
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
|
US8089608B2
(en)
|
2005-04-18 |
2012-01-03 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
|
WO2006118258A1
(ja)
|
2005-04-28 |
2006-11-09 |
Nikon Corporation |
露光方法及び露光装置、並びにデバイス製造方法
|
|
KR101762083B1
(ko)
|
2005-05-12 |
2017-07-26 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
|
JP4596191B2
(ja)
|
2005-05-24 |
2010-12-08 |
株式会社ニコン |
露光方法及び露光装置、並びにデバイス製造方法
|
|
EP1895571A4
(en)
|
2005-06-21 |
2011-04-27 |
Nikon Corp |
EXPOSURE DEVICE, EXPOSURE METHOD, MAINTENANCE METHOD AND COMPONENT MANUFACTURING METHOD
|
|
US7924416B2
(en)
|
2005-06-22 |
2011-04-12 |
Nikon Corporation |
Measurement apparatus, exposure apparatus, and device manufacturing method
|
|
US8693006B2
(en)
|
2005-06-28 |
2014-04-08 |
Nikon Corporation |
Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
|
|
JP5194792B2
(ja)
|
2005-06-30 |
2013-05-08 |
株式会社ニコン |
露光装置及び方法、露光装置のメンテナンス方法、並びにデバイス製造方法
|
|
EP1909310A4
(en)
|
2005-07-11 |
2010-10-06 |
Nikon Corp |
EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
|
|
JP5040653B2
(ja)
|
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|
|
US8111374B2
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|
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|
|
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(ko)
|
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|
|
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(ko)
|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
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(ja)
|
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|
|
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(en)
|
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|
|
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(zh)
|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
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(en)
|
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|
|
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(en)
|
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2012-02-28 |
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|
|
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(ja)
|
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|
|
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(ko)
|
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|
|
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|
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|
|
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(ko)
|
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|
|
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(ko)
|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
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(ko)
|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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(zh)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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(ja)
|
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|
|
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|
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|
|
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(ko)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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(de)
|
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|
|
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(zh)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
US7592760B2
(en)
*
|
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|
|
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|
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|
|
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|
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|
|
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(en)
|
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|
|
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|
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|
|
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|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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(en)
|
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|
|
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|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
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|
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|
|
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(en)
|
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|
|
US20090153824A1
(en)
*
|
2007-12-17 |
2009-06-18 |
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|
|
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(en)
|
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|
|
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(en)
|
2008-09-10 |
2010-03-15 |
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|
|
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(en)
|
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2013-02-26 |
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|
|
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(en)
|
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2016-04-12 |
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|
|
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(ja)
*
|
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2013-03-21 |
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|
|
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(ja)
*
|
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|
|
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|
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|
|
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(ja)
*
|
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|
|
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(ja)
*
|
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