JP6793103B2 - ひずみゲージ - Google Patents

ひずみゲージ Download PDF

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Publication number
JP6793103B2
JP6793103B2 JP2017191820A JP2017191820A JP6793103B2 JP 6793103 B2 JP6793103 B2 JP 6793103B2 JP 2017191820 A JP2017191820 A JP 2017191820A JP 2017191820 A JP2017191820 A JP 2017191820A JP 6793103 B2 JP6793103 B2 JP 6793103B2
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JP
Japan
Prior art keywords
resistor
functional layer
strain gauge
base material
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017191820A
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English (en)
Japanese (ja)
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JP2019066311A (ja
JP2019066311A5 (enExample
Inventor
寿昭 浅川
寿昭 浅川
祐汰 相澤
祐汰 相澤
慎也 戸田
慎也 戸田
真太郎 ▲高▼田
真太郎 ▲高▼田
真一 丹羽
真一 丹羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MinebeaMitsumi Inc
Original Assignee
MinebeaMitsumi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2017191820A priority Critical patent/JP6793103B2/ja
Application filed by MinebeaMitsumi Inc filed Critical MinebeaMitsumi Inc
Priority to US16/650,560 priority patent/US11542590B2/en
Priority to CN202310346190.1A priority patent/CN116608762B/zh
Priority to PCT/JP2018/035706 priority patent/WO2019065740A1/ja
Priority to CN201880076750.3A priority patent/CN111417829B/zh
Priority to EP23187300.1A priority patent/EP4269936B1/en
Priority to EP18862478.7A priority patent/EP3690387B1/en
Publication of JP2019066311A publication Critical patent/JP2019066311A/ja
Publication of JP2019066311A5 publication Critical patent/JP2019066311A5/ja
Application granted granted Critical
Publication of JP6793103B2 publication Critical patent/JP6793103B2/ja
Priority to US17/929,830 priority patent/US11702730B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
    • G01B7/18—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in resistance
    • G01B7/20—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in resistance formed by printed-circuit technique
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0063—Reactive sputtering characterised by means for introducing or removing gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2268—Arrangements for correcting or for compensating unwanted effects
    • G01L1/2281—Arrangements for correcting or for compensating unwanted effects for temperature variations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
JP2017191820A 2017-09-29 2017-09-29 ひずみゲージ Active JP6793103B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2017191820A JP6793103B2 (ja) 2017-09-29 2017-09-29 ひずみゲージ
CN202310346190.1A CN116608762B (zh) 2017-09-29 2018-09-26 应变片
PCT/JP2018/035706 WO2019065740A1 (ja) 2017-09-29 2018-09-26 ひずみゲージ
CN201880076750.3A CN111417829B (zh) 2017-09-29 2018-09-26 应变片
US16/650,560 US11542590B2 (en) 2017-09-29 2018-09-26 Strain gauge
EP23187300.1A EP4269936B1 (en) 2017-09-29 2018-09-26 Strain gauge
EP18862478.7A EP3690387B1 (en) 2017-09-29 2018-09-26 Strain gauge
US17/929,830 US11702730B2 (en) 2017-09-29 2022-09-06 Strain gauge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017191820A JP6793103B2 (ja) 2017-09-29 2017-09-29 ひずみゲージ

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020098850A Division JP2020129013A (ja) 2020-06-05 2020-06-05 ひずみゲージ

Publications (3)

Publication Number Publication Date
JP2019066311A JP2019066311A (ja) 2019-04-25
JP2019066311A5 JP2019066311A5 (enExample) 2020-03-26
JP6793103B2 true JP6793103B2 (ja) 2020-12-02

Family

ID=65901960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017191820A Active JP6793103B2 (ja) 2017-09-29 2017-09-29 ひずみゲージ

Country Status (5)

Country Link
US (2) US11542590B2 (enExample)
EP (2) EP3690387B1 (enExample)
JP (1) JP6793103B2 (enExample)
CN (2) CN116608762B (enExample)
WO (1) WO2019065740A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240003762A1 (en) * 2020-10-30 2024-01-04 Nitto Denko Corporation Strain sensor, functional film, and method for manufacturing same

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7201542B2 (ja) * 2019-06-21 2023-01-10 ミネベアミツミ株式会社 転がり軸受、回転装置、軸受監視装置、軸受監視方法
JP7390139B2 (ja) 2019-09-05 2023-12-01 ミネベアミツミ株式会社 センサモジュール、ひずみ検出装置
JP7426794B2 (ja) * 2019-10-01 2024-02-02 ミネベアミツミ株式会社 センサモジュール
JP2021110703A (ja) * 2020-01-15 2021-08-02 ミネベアミツミ株式会社 ひずみゲージ
JP7406517B2 (ja) * 2020-03-24 2023-12-27 ミネベアミツミ株式会社 ひずみゲージ
JP7659380B2 (ja) * 2020-10-30 2025-04-09 日東電工株式会社 積層フィルムおよび歪みセンサの製造方法
JP7638081B2 (ja) * 2020-10-30 2025-03-03 日東電工株式会社 積層フィルムおよび歪みセンサ
JP7736429B2 (ja) * 2020-10-30 2025-09-09 日東電工株式会社 積層フィルム、第２積層フィルムの製造方法およびひずみセンサの製造方法
JP2022106507A (ja) * 2021-01-07 2022-07-20 ミネベアミツミ株式会社 ひずみゲージ
JP7189240B2 (ja) * 2021-01-18 2022-12-13 ミネベアミツミ株式会社 ひずみゲージ
JP2023021714A (ja) * 2021-08-02 2023-02-14 ミネベアミツミ株式会社 脈波測定装置
JP2023021715A (ja) * 2021-08-02 2023-02-14 ミネベアミツミ株式会社 脈波測定装置
DE102021209525A1 (de) 2021-08-31 2023-03-02 CEROBEAR GmbH Wälzlager und Verfahren zur Überwachung eines Wälzlagers

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