JP5870040B2 - 高純度の金属酸化物粒子及びそれにより製造される材料の製造方法 - Google Patents
高純度の金属酸化物粒子及びそれにより製造される材料の製造方法 Download PDFInfo
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- JP5870040B2 JP5870040B2 JP2012552097A JP2012552097A JP5870040B2 JP 5870040 B2 JP5870040 B2 JP 5870040B2 JP 2012552097 A JP2012552097 A JP 2012552097A JP 2012552097 A JP2012552097 A JP 2012552097A JP 5870040 B2 JP5870040 B2 JP 5870040B2
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- metal
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- 239000002245 particle Substances 0.000 title claims description 160
- 229910044991 metal oxide Inorganic materials 0.000 title claims description 51
- 150000004706 metal oxides Chemical class 0.000 title claims description 50
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000000463 material Substances 0.000 title description 15
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- 238000000034 method Methods 0.000 claims description 99
- 229910052751 metal Inorganic materials 0.000 claims description 58
- 239000002184 metal Substances 0.000 claims description 58
- 239000003054 catalyst Substances 0.000 claims description 57
- 239000000203 mixture Substances 0.000 claims description 51
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- 239000000377 silicon dioxide Substances 0.000 claims description 34
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- 239000003623 enhancer Substances 0.000 claims description 24
- 230000015572 biosynthetic process Effects 0.000 claims description 21
- 238000009826 distribution Methods 0.000 claims description 18
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- 150000003138 primary alcohols Chemical class 0.000 claims description 11
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- 238000003786 synthesis reaction Methods 0.000 description 5
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- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
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- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- NKCVNYJQLIWBHK-UHFFFAOYSA-N carbonodiperoxoic acid Chemical compound OOC(=O)OO NKCVNYJQLIWBHK-UHFFFAOYSA-N 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 1
- 239000004914 cyclooctane Substances 0.000 description 1
- FHADSMKORVFYOS-UHFFFAOYSA-N cyclooctanol Chemical compound OC1CCCCCCC1 FHADSMKORVFYOS-UHFFFAOYSA-N 0.000 description 1
- XCIXKGXIYUWCLL-UHFFFAOYSA-N cyclopentanol Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical class CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910021518 metal oxyhydroxide Inorganic materials 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- VMESOKCXSYNAKD-UHFFFAOYSA-N n,n-dimethylhydroxylamine Chemical class CN(C)O VMESOKCXSYNAKD-UHFFFAOYSA-N 0.000 description 1
- MSXIOWULDXZJLX-UHFFFAOYSA-N n,n-dimethylpyrimidin-4-amine Chemical class CN(C)C1=CC=NC=N1 MSXIOWULDXZJLX-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 1
- 229940031826 phenolate Drugs 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000000244 polyoxyethylene sorbitan monooleate Substances 0.000 description 1
- 235000010482 polyoxyethylene sorbitan monooleate Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000053 polysorbate 80 Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- OGHBATFHNDZKSO-UHFFFAOYSA-N propan-2-olate Chemical compound CC(C)[O-] OGHBATFHNDZKSO-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000001577 simple distillation Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/36—Methods for preparing oxides or hydroxides in general by precipitation reactions in aqueous solutions
- C01B13/363—Mixtures of oxides or hydroxides by precipitation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/02—Particle morphology depicted by an image obtained by optical microscopy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12181—Composite powder [e.g., coated, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Description
この出願は、本明細書において参照によりその全体において組み込まれる、2010年2月8日付で出願された、米国実用特許出願番号第12/701,862号、発明の名称「高純度の金属酸化物粒子及びそれにより製造される材料の製造方法」からの利益を主張する。
開示される技術は、金属酸化物の粒子を製造する方法、及びそれから製造される材料を生産する方法に関し、合成溶融シリカ(fused synthetic silica)材料のための合成シリカ粒子の合成における具体的な利用可能性を見出す。
以下は、粒子反応器の生産が以下の通り形成されたことを例証する。即ち、350.7グラムの高純度水を、5.25グラムの電子級(electronic grade)の1500MWポリエチレングリコールに添加した。これに、39.4グラムのブタノールを添加して乳濁液の外観(presence)を示す粒子反応器を形成する。この混合物を還流下で52℃に保持した。
以下の実施例は、例えば、光触媒や、極端紫外線露光、宇宙衛星、勾配屈折率(grated refractive index)用の超低膨張ガラス等の光学応用、ならびに工作機械の対比標準試験片(reference blocks)にも有用であろう、ケイ酸チタンの合成を例証する。粒子反応器は以下の通り形成された。即ち、577.45グラムの高純度水を、5.625グラムの電子級の1500MWポリエチレングリコールに添加する。これに、42.1875グラムのブタノールを添加して乳濁液の外観を示す粒子反応器を形成する。この混合物を還流下で52℃に保持した。
以下の実施例は、化粧料分野における応用やフラットパネルスクリーンの散光器として有用であろう、比較的狭い粒子サイズ分布を有するメチル化シリカの合成を例証する。
Claims (37)
- 粒子の製造方法であって、
水、金属源、第1触媒、第1界面活性剤及び第1アルコールの混合物を含む第1相を形成すること、
水、第2アルコール及び第2界面活性剤を含む第2相に前記第1相を添加してブレンドを形成すること、
前記ブレンドを計量された、1〜10炭素原子の第1級アルコール及び1〜10炭素原子の第2級アルコールから選択された相エンハンサーで処理すること、ならびに
前記ブレンドを第2触媒と反応させて粒子を形成すること
を含む前記製造方法。 - 前記金属を含有する粒子におけるカチオン性不純物の全量が100ppb未満である、請求項1に記載される方法。
- 前記金属を含有する粒子におけるカチオン性不純物が10ppb未満である、請求項2に記載される方法。
- 前記金属源が、金属アルコキシド、加水分解性有機金属化合物、オキソ金属オリゴマー、又はこれらの2以上の混合物を含む、請求項1に記載される方法。
- 前記金属源が、金属アルコキシドを含み、且つ第1相における金属アルコキシド源に対する水のモル比が約0.5〜約4.0である、請求項4に記載される方法。
- 前記金属源がシリカ源を含む、請求項1に記載される方法。
- 前記シリカ源が、アルコキシシランに由来するシロキサンオリゴマーを含み、且つアルコキシシランに由来するシロキサンオリゴマーに対する水のモル比がシロキサンヘプタマー、環状シロキサン、又はこれらの混合物の少なくとも1種を提供する、請求項6に記載される方法。
- 前記シリカ源が、テトラメチルオルトシリケート、及びテトラエチルオルトシリケート若しくはテトラアルキルオルトシリケート、ビニルオルトシリケート、アリールオルトシリケート、又はこれらの2以上の組合わせの少なくとも1種を含む、請求項6に記載される方法。
- 前記第1及び/又は第2アルコールが1〜10炭素原子の構造を有する直鎖状アルコールを含む、請求項1に記載される方法。
- 前記第1界面活性剤が非極性化合物及び極性の化合物を含む補助界面活性剤系である、請求項1に記載される方法。
- 前記極性の化合物が第3級アルコールである、請求項10に記載される方法。
- 前記第2界面活性剤が非イオン界面活性剤を含む、請求項1に記載される方法。
- 前記非イオン界面活性剤がポリエトキシレート、ポリプロポキシレート、フェノラート、分子量400〜100,000を有するポリオール、又はこれらの2以上の組み合わせから選択される、請求項12に記載される方法。
- 前記金属アルコキシド源が、断熱温度上昇が約10℃〜約100℃の範囲内であるように添加される、請求項4に記載される方法。
- 前記第2相に第1相を添加する速度が、約30分〜約150分の範囲に相当する、請求項1に記載される方法。
- 前記第1相の形成が、水、第1界面活性剤及び第1アルコールを含む混合物に金属源を添加することを含む、請求項1に記載される方法。
- 前記第1相に金属源を添加する速度が、約20〜約120分の範囲である、請求項16に記載される方法。
- 前記第1相の形成が、水、第1触媒及び第1アルコールの混合物に前記金属源を添加すること、ならびに前記金属源の添加の後に第1界面活性剤を添加することを含む、請求項1に記載される方法。
- 前記相エンハンサーが、第1級アルコール、アルコールのアルキル誘導体、及び第2級アルコールから選択された少なくとも1種である、極性のアルコールを含む、請求項1に記載される方法。
- 前記第2触媒とブレンドを反応させる前の前記ブレンドのpHが約3.5以下であり、前記反応工程の間の前記混合物のpHが約6以下である、請求項1に記載される方法。
- 一次粒子が、約5ミクロン〜約1000ミクロンのサイズまで凝集する、請求項20に記載される方法。
- 前記金属酸化物粒子が、約0.5ミクロン〜約100ミクロンの一次粒子サイズを有する、請求項1に記載される方法。
- 少なくとも80%の金属酸化物粒子が約70〜約350ミクロンのサイズを有する、請求項22に記載される方法。
- 前記第1触媒が酸触媒又は塩基触媒を含む、請求項1に記載される方法。
- 前記第1触媒が、水酸化アンモニウム、水酸化第4級アンモニウム、ヒドロキシルアミン、ヒドロキシルアミンの誘導体、アミノピリジン、又はこれらの2以上の組み合わせから選択される塩基触媒を含む、請求項24に記載される方法。
- 前記塩基触媒が約0.01重量%〜約10重量%の濃度を有する、請求項24に記載される方法。
- 前記金属酸化物粒子が、水の量が約50重量%〜約99重量%の水性溶媒中に形成される、請求項1に記載される方法。
- 前記ブレンドが、毎秒約0.2〜約0.8フィートの翼端速度の任意の撹拌翼について、粒子懸濁及び狭い粒子分布を促進する条件下で混合される、請求項1に記載される方法。
- 高純度の合成シリカを製造するための方法であって:
水、アルコキシシラン、第1触媒、第1界面活性剤、及び第1アルコールの混合物を含む第1相を形成すること、
前記第1相を、水、第2アルコール、及び第2界面活性剤を含む第2相に添加してブレンドを形成すること、
前記ブレンドを計量された、1〜10炭素原子の第1級アルコール及び1〜10炭素原子の第2級アルコールから選択された相エンハンサーで処理すること、
前記ブレンドを第2触媒で処理してシリカ粒子を形成すること、ならびに
前記シリカ粒子を熱処理して合成溶融シリカを形成すること
を含む前記製造方法。 - 前記相エンハンサーが極性のアルコールを含む、請求項29に記載される方法。
- 前記第2触媒でブレンドを処理する前の混合物のpHが約3.5以下であり、該処理工程の間の該混合物のpHが約6以下である、請求項29に記載される方法。
- 前記第1界面活性剤が非極性化合物及び極性の化合物を含む補助界面活性剤系である、請求項29に記載される方法。
- 前記第2界面活性剤が非イオン界面活性剤である、請求項29に記載される方法。
- 前記非イオン界面活性剤が、ポリエトキシレート、ポリプロポキシレート、フェノラート、もしくは分子量約400〜約100,000を有するポリオール、又はこれらの2以上の組み合わせから選択される、請求項32に記載される方法。
- 前記第1相の温度が約30°〜約80℃である、請求項29に記載される方法。
- 前記第2相の温度が約30℃〜約100℃である、請求項29に記載される方法。
- 前記ブレンドが、毎秒約0.2〜約0.8フィートの翼端速度の任意の撹拌翼について、粒子懸濁及び狭い粒子分布を促進する条件下で混合される、請求項29に記載される方法。
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PCT/US2011/023695 WO2011097444A1 (en) | 2010-02-08 | 2011-02-04 | Method for making high purity metal oxide particles and materials made therof |
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- 2011-02-04 WO PCT/US2011/023695 patent/WO2011097444A1/en active Application Filing
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US8568898B2 (en) | 2013-10-29 |
EP2534103B1 (en) | 2019-04-17 |
US20110195011A1 (en) | 2011-08-11 |
US20120208024A1 (en) | 2012-08-16 |
CN102781839A (zh) | 2012-11-14 |
CN102781839B (zh) | 2015-08-19 |
US8197782B2 (en) | 2012-06-12 |
EP2534103A1 (en) | 2012-12-19 |
WO2011097444A1 (en) | 2011-08-11 |
JP2013518801A (ja) | 2013-05-23 |
BR112012019897A2 (pt) | 2016-05-03 |
EP2534103A4 (en) | 2014-03-19 |
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