BR112012019897A2 - "método para produção de partículas de óxido de metal de alta pureza e materiais feitos das mesmas" - Google Patents

"método para produção de partículas de óxido de metal de alta pureza e materiais feitos das mesmas"

Info

Publication number
BR112012019897A2
BR112012019897A2 BR112012019897A BR112012019897A BR112012019897A2 BR 112012019897 A2 BR112012019897 A2 BR 112012019897A2 BR 112012019897 A BR112012019897 A BR 112012019897A BR 112012019897 A BR112012019897 A BR 112012019897A BR 112012019897 A2 BR112012019897 A2 BR 112012019897A2
Authority
BR
Brazil
Prior art keywords
metal oxide
oxide particles
production
high purity
materials made
Prior art date
Application number
BR112012019897A
Other languages
English (en)
Inventor
Antonio L Devera
Original Assignee
Momentive Performance Mat Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Momentive Performance Mat Inc filed Critical Momentive Performance Mat Inc
Publication of BR112012019897A2 publication Critical patent/BR112012019897A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/36—Methods for preparing oxides or hydroxides in general by precipitation reactions in aqueous solutions
    • C01B13/363—Mixtures of oxides or hydroxides by precipitation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/02—Particle morphology depicted by an image obtained by optical microscopy
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12181—Composite powder [e.g., coated, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)

Abstract

patente de invenção: "método para produção de partículas de óxido de metal de alta pureza e materiais feitos das mesmas". a presente invenção refere-se a um método de produção de óxido de metal e partículas de óxido de metal misturadas. o método inclui tratamento de uma mistura formada de uma fonte de metal, tal como alcóxido de metal, um tensoativo e um primeiro álcool em um meio aquoso em um rendimento de óxido de metal muito alto. a mistura é reagida usando um catalisador para formar partículas de óxido de metal tendo um tamanho de partículas desejado na referida mistura. o método é particularmente adequado para formação de partículas de sílica. as partículas de óxido de metal podem, então, ser termicamente tratadas para formar óxidos de metal fundidos sintéticos tais como, por exemplo, sílica fundida sintética.
BR112012019897A 2010-02-08 2011-02-04 "método para produção de partículas de óxido de metal de alta pureza e materiais feitos das mesmas" BR112012019897A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/701,862 US8197782B2 (en) 2010-02-08 2010-02-08 Method for making high purity metal oxide particles and materials made thereof
PCT/US2011/023695 WO2011097444A1 (en) 2010-02-08 2011-02-04 Method for making high purity metal oxide particles and materials made therof

Publications (1)

Publication Number Publication Date
BR112012019897A2 true BR112012019897A2 (pt) 2016-05-03

Family

ID=44353888

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112012019897A BR112012019897A2 (pt) 2010-02-08 2011-02-04 "método para produção de partículas de óxido de metal de alta pureza e materiais feitos das mesmas"

Country Status (6)

Country Link
US (2) US8197782B2 (pt)
EP (1) EP2534103B1 (pt)
JP (1) JP5870040B2 (pt)
CN (1) CN102781839B (pt)
BR (1) BR112012019897A2 (pt)
WO (1) WO2011097444A1 (pt)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6401612B2 (ja) * 2011-07-29 2018-10-10 モーメンティブ・パフォーマンス・マテリアルズ・インク 高純度金属酸化物粒子の製造方法およびそのために製造される材料
KR20140094621A (ko) * 2011-11-23 2014-07-30 모멘티브 퍼포먼스 머티리얼즈 인크. 관능화된 금속-함유 입자 및 그 제조방법
CA2885263C (en) 2012-09-17 2021-11-16 W. R. Grace & Co.-Conn. Chromatography media and devices
RU2545288C1 (ru) * 2013-08-27 2015-03-27 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП "ГНИИХТЭОС") Способ получения нано,- микроструктурированных гибридных золей
US9825205B2 (en) * 2014-01-17 2017-11-21 Pacific Light Technologies Corp. Quantum dot (QD) polymer composites for on-chip light emitting diode (LED) applications
CN107847907A (zh) 2014-05-02 2018-03-27 格雷斯公司 官能化载体材料以及制备和使用官能化载体材料的方法
PL3302784T3 (pl) 2015-06-05 2022-01-17 W.R. Grace & Co.-Conn. Adsorbentowe środki klarujące do bioprzetwarzania oraz sposoby ich wytwarzania i stosowania
US10428241B2 (en) 2017-10-05 2019-10-01 Fujifilm Electronic Materials U.S.A., Inc. Polishing compositions containing charged abrasive
CN108946828B (zh) * 2018-08-16 2020-08-11 济南大学 一种NiO/In2O3多级结构的合成方法及其产品
JP7084847B2 (ja) * 2018-11-02 2022-06-15 株式会社トクヤマ シリカ－チタニア複合酸化物粒子
CN112939043A (zh) * 2021-03-19 2021-06-11 山东大学 一种相转变温度降低的α-氧化铝的制备方法及其应用
WO2023106194A1 (ja) * 2021-12-06 2023-06-15 三井金属鉱業株式会社 複合金属酸化合物分酸液、複合金属酸化合物粉末、複合金属酸化合物膜、及びそれらの製造方法
CN115433419B (zh) * 2022-09-30 2023-12-15 浙江华正新材料股份有限公司 树脂胶液、半固化片、电路基板以及印制电路板

Family Cites Families (103)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5858292B2 (ja) * 1980-01-21 1983-12-24 株式会社日立製作所 シリカガラスの製造方法
US4767433A (en) * 1986-05-22 1988-08-30 Asahi Glass Company Ltd. Spherical silica glass powder particles and process for their production
US4727173A (en) 1987-03-31 1988-02-23 Union Carbide Corporation Process for producing trialkoxysilanes from the reaction of silicon metal and alcohol
US5256386A (en) * 1987-06-29 1993-10-26 Eka Nobel Ab Method for preparation of silica particles
GB8715679D0 (en) * 1987-07-03 1987-08-12 Shaw R D Ethyl silicate bonding
US4943542A (en) * 1987-10-31 1990-07-24 Hitachi Chemical Company, Ltd. Process for producing silica glass
EP0328715B1 (en) * 1988-02-19 1992-08-05 Tohru Yamamoto A catalyst for sol-gel method using metal alkoxide and sol-gel method using the same
US4943425A (en) * 1988-04-01 1990-07-24 Gte Laboratories Incorporated Method of making high purity dense silica of large particle size
US4940571A (en) * 1988-04-01 1990-07-10 Gte Laboratories Incorporated Method of making large particle size, high purity dense silica
US5030433A (en) * 1988-07-18 1991-07-09 International Minerals & Chemical Corp. Process for producing pure and dense amorphous synthetic silica particles
US5017354A (en) * 1988-09-02 1991-05-21 Akzo America Inc. Process for production of high purity silica gel
US4979973A (en) * 1988-09-13 1990-12-25 Shin-Etsu Chemical Co., Ltd. Preparation of fused silica glass by hydrolysis of methyl silicate
JPH02172830A (ja) * 1988-12-26 1990-07-04 Hoya Corp ガラスの製造方法
US5328645A (en) * 1989-01-04 1994-07-12 Ppg Industries, Inc. Gel promoters for silica sols
US5637507A (en) * 1989-01-05 1997-06-10 The United States Of America As Represented By The United States Department Of Energy Tetraethyl orthosilicate-based glass composition and method
JPH02196015A (ja) * 1989-01-25 1990-08-02 Chisso Corp シリカの製造方法
US5207814A (en) * 1989-02-10 1993-05-04 Enichem S.P.A. Process for preparing monoliths of aerogels of metal oxides
DE69008892T2 (de) * 1989-02-20 1994-09-29 Nitto Chemical Industry Co Ltd Verfahren zur Herstellung von Kieselsäure mit einem niedrigen Silanolgehalt.
JPH02293333A (ja) * 1989-04-28 1990-12-04 Hoya Corp ガラスの製造方法
JPH02307830A (ja) * 1989-05-18 1990-12-21 Chisso Corp 石英ガラス粉末の製造方法
JPH0393638A (ja) * 1989-09-04 1991-04-18 Shin Etsu Chem Co Ltd 合成石英ガラス粉の製造方法
US4983369A (en) * 1989-11-22 1991-01-08 Allied-Signal Inc. Process for forming highly uniform silica spheres
US5063179A (en) * 1990-03-02 1991-11-05 Cabot Corporation Process for making non-porous micron-sized high purity silica
US4999446A (en) 1990-06-21 1991-03-12 Union Carbide Chemicals And Plastics Company Inc. Trimethoxysilane preparation via the methanol-silicon reaction with recycle
DE69109026T2 (de) * 1990-09-07 1995-12-07 Mitsubishi Chem Corp Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand.
EP0486004B1 (en) * 1990-11-16 1996-09-11 Mitsubishi Chemical Corporation Method for producing a high-purity silica glass powder
US5186745A (en) * 1991-02-04 1993-02-16 Motorola, Inc. Teos based spin-on-glass and processes for making and using the same
US5084590A (en) 1991-06-24 1992-01-28 Union Carbide Chemicals & Plastics Technology Corporation Trimethoxysilane preparation via the methanol-silicon reaction using a continuous process and multiple reactors
US5312613A (en) * 1991-07-09 1994-05-17 Akzo N.V. Process for producing ceramic precursor powders without gel formation
IT1251939B (it) * 1991-10-17 1995-05-27 Donegani Guido Ist Procedimento per la preparazione di materiali a base di ossidi inorganici con granulometria monodispersa e materiali cosi ottenuti.
CA2135875A1 (en) * 1992-05-20 1993-11-25 Kenneth G. Sharp Process for making inorganic gels
US5372796A (en) * 1993-04-13 1994-12-13 Southwest Research Institute Metal oxide-polymer composites
JPH072513A (ja) * 1993-06-15 1995-01-06 Kimmon Mfg Co Ltd 合成石英ガラス粉の製造方法
US5480582A (en) * 1993-06-30 1996-01-02 Pope; Edward J. A. Process for synthesizing amorphous silica microspheres with fluorescence behavior
US5376449A (en) * 1993-07-09 1994-12-27 Martin Marietta Energy Systems, Inc. Silica powders for powder evacuated thermal insulating panel and method
US5425930A (en) * 1993-09-17 1995-06-20 Alliedsignal Inc. Process for forming large silica spheres by low temperature nucleation
IT1266660B1 (it) * 1993-11-04 1997-01-09 Eniricerche Spa Procedimento per la preparazione di xerogels di silice porosi in forma sferica
CA2179645C (en) * 1993-12-21 2004-05-18 Seiichiro Tanaka Ultrafine reactive silica particles, suspension containing the same, and hard coating composition
US6591634B1 (en) * 1994-02-25 2003-07-15 Toshinori Morizane Method for production of metal oxide glass film at a low temperature
FR2721615A1 (fr) * 1994-06-24 1995-12-29 Rhone Poulenc Chimie Procédé de préparation de particules d'oxyde métallique organophiles.
JP2580537B2 (ja) * 1994-06-27 1997-02-12 工業技術院長 シリカ球状粒子からなる三次元網状構造体
JPH0826742A (ja) * 1994-07-11 1996-01-30 Mitsubishi Chem Corp 合成石英ガラス粉
WO1996004210A1 (fr) * 1994-08-04 1996-02-15 Hitachi Chemical Company, Ltd. Procede de production de verre de silice
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
WO1996020128A1 (fr) * 1994-12-26 1996-07-04 Mitsubishi Chemical Corporation Procede de production de poudre de quartz synthetique
US6296826B1 (en) * 1994-12-30 2001-10-02 Shin-Etsu Quartz Products Co., Ltd. Method for the preparation of vitrified silica particles
US6071838A (en) * 1995-01-12 2000-06-06 Mitsubishi Chemical Corporation Silica gel, synthetic quartz glass powder, quartz glass shaped product molding, and processes for producing these
EP0823403B1 (en) 1995-04-28 2003-07-16 Mitsubishi Chemical Corporation Processes for producing synthetic quartz powder and producing shaped quartz glass
EP0831060B1 (en) * 1995-05-26 2003-12-03 Mitsubishi Chemical Corporation Synthetic quartz glass powder, quartz glass moldings, high purity tetraalkoxysilane, and production methods thereof
DE19520448C2 (de) * 1995-06-03 1997-09-04 Schott Glaswerke Verfahren zur Herstellung von feinteiligen Multikomponenten-Glaspulvern zur Verwendung als Glasfluß für die Erzeugung von Schichten und Dekoren auf Glas, Glaskeramik oder Keramik
US6130152A (en) * 1995-11-16 2000-10-10 Texas Instruments Incorporated Aerogel thin film formation from multi-solvent systems
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US6645908B1 (en) * 1996-09-30 2003-11-11 Ut-Battelle, Llc Sol-gel derived sorbents
KR100364309B1 (ko) * 1996-11-20 2003-01-24 미쓰비시 가가꾸 가부시키가이샤 실리카겔,합성석영유리분말및석영유리의성형품
EP1626108A1 (en) * 1996-12-17 2006-02-15 Tosoh Corporation Low hydrogen overvoltage cathode and process for production thereof
US5902893A (en) 1997-05-20 1999-05-11 Air Products And Chemicals, Inc. Purification of organosilanes of group 13 (IIIA) and 15 (VA) impurities
DE19729505A1 (de) * 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat
JPH11127423A (ja) * 1997-10-20 1999-05-11 Toshiba Corp 映像信号処理装置
JP2000012314A (ja) * 1998-06-25 2000-01-14 Tosoh Corp 大孔径の磁性シリカ粒子及びその製造方法
TW421670B (en) * 1999-04-02 2001-02-11 Ind Tech Res Inst Fast-cured sol materials
JP2001064009A (ja) * 1999-08-26 2001-03-13 Kansai Research Institute 無機質ミクロ構造体およびその製造方法
KR100329123B1 (ko) * 1999-08-28 2002-03-21 윤덕용 웨이퍼 폴리싱용 실리카 슬러리의 제조 방법
EP1088789A3 (en) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Porous silica granule, its method of production and its use in a method for producing quartz glass
US6360564B1 (en) * 2000-01-20 2002-03-26 Corning Incorporated Sol-gel method of preparing powder for use in forming glass
US6826927B2 (en) * 2000-06-28 2004-12-07 Mitsubishi Materials Quartz Corporation Synthetic quartz powder, its production process, and synthetic quartz crucible
US6838068B2 (en) * 2000-06-30 2005-01-04 Mitsubishi Chemical Corporation Silica gel
WO2003008332A1 (fr) * 2001-07-19 2003-01-30 Mitsubishi Chemical Corporation Poudre de quartz de grande purete, procede de fabrication et article obtenu a partir de cette poudre
CN1166448C (zh) * 2001-07-27 2004-09-15 鞍山钢铁学院 液相纳米粉体及纳米粒子聚集结构材料的制备方法
CN1227157C (zh) * 2001-09-25 2005-11-16 三菱化学株式会社 硅石
US20030069347A1 (en) * 2001-09-28 2003-04-10 Hideki Oishi Calcined silica particle and manufacturing method of same
TWI247795B (en) * 2001-11-15 2006-01-21 Catalysts & Chem Ind Co Silica particles for polishing and a polishing agent
JP4117641B2 (ja) * 2001-11-26 2008-07-16 ジャパンスーパークォーツ株式会社 合成石英粉の処理方法およびその石英ガラス製品
EP1314695B1 (en) * 2001-11-27 2007-08-22 Mitsubishi Chemical Corporation Silica and method for producing the same
US7323508B2 (en) * 2001-11-28 2008-01-29 Akzo Nobel N.V. Neutral carbonated alkaline earth metal carboxylates
JP2003165952A (ja) * 2001-11-29 2003-06-10 Asahi Kasei Corp 絶縁薄膜製造用の塗布組成物
US20040056376A1 (en) * 2002-09-23 2004-03-25 The Regents Of The University Of California Method for preparing precursors for producing monolithic metal oxide aerogels
US20040091411A1 (en) * 2002-11-08 2004-05-13 Bijan Modrek-Najafabadi High surface area, high porosity silica packing with narrow particle and pore diameter distribution and methods of making same
WO2004074180A1 (ja) * 2003-02-18 2004-09-02 Tytemn Corporation 耐アルカリ性繭型コロイダルシリカ粒子及びその製造方法
JP2004269287A (ja) * 2003-03-06 2004-09-30 Shinetsu Quartz Prod Co Ltd 光学用合成石英ガラス部材及びその製造方法
ITNO20030005A1 (it) * 2003-03-21 2004-09-22 Novara Technology Srl VETRI DI SiO2 AD ALTA OMOGENEITA'.
KR100529059B1 (ko) * 2003-06-11 2005-11-16 재단법인 포항산업과학연구원 다공질 실리카 구의 제조방법
US7232556B2 (en) * 2003-09-26 2007-06-19 Nanoproducts Corporation Titanium comprising nanoparticles and related nanotechnology
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
EP1721662A4 (en) * 2004-02-05 2012-11-07 Taiyo Kagaku Kk INITIATING ADSORPTION AGENT CONTAINING POROUS SILICA
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
DE102004011110A1 (de) * 2004-03-08 2005-09-22 Merck Patent Gmbh Verfahren zur Herstellung monodisperser SiO2-Partikel
TW200604097A (en) * 2004-07-26 2006-02-01 Fuso Chemical Co Ltd Silica sol and manufacturing method therefor
US20060099130A1 (en) * 2004-11-08 2006-05-11 Rolando Roque-Malherbe Silica mesoporous materials
US7452518B2 (en) * 2004-12-28 2008-11-18 Momentive Performance Materials Inc. Process for treating synthetic silica powder and synthetic silica powder treated thereof
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
US7589039B2 (en) * 2004-12-29 2009-09-15 Corning Incorporated Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
JP4643314B2 (ja) * 2005-03-10 2011-03-02 独立行政法人科学技術振興機構 規則的に配列したナノ粒子状シリカ、及びその製造方法
US7731110B2 (en) * 2005-06-29 2010-06-08 J.M. Huber Corporation Method for making precipitated silica compositions and products thereof
US20100003182A1 (en) * 2006-06-02 2010-01-07 Lorenzo Costa Pellitized silica
JP5270344B2 (ja) 2006-07-31 2013-08-21 扶桑化学工業株式会社 シリカゾルおよびその製造方法
US20080070146A1 (en) * 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
JP5155185B2 (ja) 2006-12-12 2013-02-27 扶桑化学工業株式会社 コロイダルシリカの製造方法
US20080206562A1 (en) 2007-01-12 2008-08-28 The Regents Of The University Of California Methods of generating supported nanocatalysts and compositions thereof
CN100586851C (zh) * 2007-01-15 2010-02-03 苏州纳迪微电子有限公司 金属杂质含量小于1ppm的耐碱性超高纯硅溶胶的制备方法
WO2008111636A1 (ja) * 2007-03-13 2008-09-18 Mitsubishi Chemical Corporation シリカ多孔質体、光学用途積層体及び組成物、並びに、シリカ多孔質体の製造方法
US20100272996A1 (en) * 2007-07-13 2010-10-28 Justin Holmes method for synthesising microparticles
US20100003204A1 (en) * 2008-07-02 2010-01-07 Energy Materials Corporation Nanoparticle hybrid sunscreens
KR101183831B1 (ko) * 2009-05-25 2012-09-18 (주)석경에이티 단분산의 복합 실리카 미세입자의 제조방법

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US8568898B2 (en) 2013-10-29
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