JP4995455B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4995455B2 JP4995455B2 JP2005345347A JP2005345347A JP4995455B2 JP 4995455 B2 JP4995455 B2 JP 4995455B2 JP 2005345347 A JP2005345347 A JP 2005345347A JP 2005345347 A JP2005345347 A JP 2005345347A JP 4995455 B2 JP4995455 B2 JP 4995455B2
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- 239000004065 semiconductor Substances 0.000 title claims description 338
- 239000010410 layer Substances 0.000 claims description 204
- 230000002093 peripheral effect Effects 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 34
- 239000011229 interlayer Substances 0.000 claims description 16
- 238000000605 extraction Methods 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 description 319
- 239000004020 conductor Substances 0.000 description 80
- 230000001681 protective effect Effects 0.000 description 31
- 238000010586 diagram Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 14
- 238000009792 diffusion process Methods 0.000 description 13
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 238000002955 isolation Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 239000012212 insulator Substances 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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Description
図1は、本発明の一実施の形態である半導体装置1の平面図(全体平面図)である。なお、図1は平面図であるが、図面を見易くするために、電源配線5、接地配線6、接地配線7および電源配線8にハッチングを付してある。
図11は、本実施の形態の半導体装置の要部平面図であり、上記実施の形態1の図4に対応するものである。上記実施の形態1の図4と同様に、図11では、半導体装置の周辺部近傍が示されており、入出力回路11、回路15、電源配線5、接地配線6、およびボンディングパッド4の平面レイアウトが示され、接地配線7および電源配線8などは図示を省略している。
図12および図13は、本実施の形態の半導体装置の要部平面図であり、上記実施の形態1の図2および図5にそれぞれ対応するものである。図12と図13は同じ領域が示されているが、上記実施の形態1の図2と同様に、図12では、半導体装置の周辺部近傍が示されており、入出力回路11aおよび回路15の平面レイアウトが示され、図13は、入出力回路11a、電源配線5、接地配線6、接地配線7、電源配線8、導体層51およびボンディングパッド4cの平面レイアウトが示されている。図14および図15は、本実施の形態の半導体装置の要部断面図であり、図12のE−E線の断面が図14にほぼ対応し、図12のF−F線の断面が図15にほぼ対応する。図16は、入出力回路11aを示す回路図(等価回路図)である。
図17〜図20は、本実施の形態の半導体装置の要部平面図である。図17〜図19は、上記実施の形態1の図2〜図4にそれぞれ対応するものである。図17〜図20は、同じ領域が示されているが、上記実施の形態1の図2と同様に、図17では、半導体装置の周辺部近傍が示されており、入出力回路11b,11cおよび回路15の平面レイアウトが示され、図18は、図17に電源配線5、接地配線6、接地配線7および電源配線8を加えた図に対応する。図19は、図17に電源配線5、接地配線6、導体層51およびボンディングパッド4を加えた図に対応し、図20は、図17に電源配線5、接地配線6および配線71,72を加えた図に対応する。図21および図22は、本実施の形態の半導体装置の要部断面図であり、図17のG−G線の断面が図21にほぼ対応し、図17のH−H線の断面が図22にほぼ対応する。図23は、入出力回路11bを示す回路図(等価回路図)であり、図24は、入出力回路11cを示す回路図(等価回路図)である。
2 主面
2a 端部
3 コア領域
4,4a,4b,4c,4d,4e ボンディングパッド
5 電源配線
6 接地配線
7 接地配線
8 電源配線
11,11a,11b,11c 入出力回路
21,21a,21b,21c nMISFET形成領域
22 抵抗素子形成領域
23,23a,23b,23c ダイオード素子形成領域
24 引き出し領域
25,25a,25b,25c ダイオード素子形成領域
26 抵抗素子形成領域
27 pMISFET形成領域
27a,27b,27c nMISFET形成領域
30 半導体基板
31 素子分離領域
32 p型ウエル
33 n型ウエル
34 ゲート電極
35,35d,35s n型半導体領域
36 ゲート電極
37,37d,37s p型半導体領域
38,39 抵抗素子
41 n型半導体領域
42 p型半導体領域
43 p型半導体領域
44 n型半導体領域
46 p型半導体領域
47 n型半導体領域
50 絶縁膜
51 導体層
52 開口部
53,53a,53b,53c 配線
61 ゲート電極
62,62a,62b n型半導体領域
63 n型半導体領域
64 p型半導体領域
65 p型半導体領域
66 n型半導体領域
71,72 配線
D1,D2,D3,D4,D5,D6,D7,D8 ダイオード素子
M1〜M7 配線
PG プラグ
Qn1,Qn3,Qn4,Qn5,Qn6,Qn7,Qn8 nチャネル型MISFET
Qp1 pチャネル型MISFET
R1,R2 抵抗素子
Claims (19)
- 半導体基板と、
前記半導体基板に形成され、且つ、第1領域と第2領域とを有する入出力回路部と、
前記半導体基板上に形成され、第1および第2電源配線と、前記第1および第2電源配線よりも下層に位置する第1配線とを有する多層配線構造と、
前記第1および第2電源配線よりも上層に位置し、且つ、前記入出力回路部と電気的に接続するボンディングパッドと、
を有する半導体装置であって、
前記第1領域は、前記第2領域よりも前記半導体装置の外周部に近い領域であり、
前記第1電源配線は、前記第1領域上を通過するように配置されており、
前記第2電源配線は、前記第2領域上を通過するように配置されており、
前記第1領域と第2領域の間には、引き出し領域が設けられており、
前記第1領域は前記ボンディングパッドへ信号を出力するための第1MISFET素子を含み、
前記第2領域は前記ボンディングパッドへ信号を出力するための第2MISFET素子を含み、
前記第1配線は、前記引き出し領域で、前記第1および第2電源配線よりも上層に引き出され、前記ボンディングパッドに電気的に接続しており、
前記ボンディングパッドは、前記第1電源配線上に位置しており、且つ、前記第2電源配線上には位置していないことを特徴とする半導体装置。 - 半導体基板と、
前記半導体基板に形成された入出力回路部と、
前記入出力回路部より上層に形成された第1配線と、
前記第1配線より上層に形成された第1電源配線、及び、前記第1電源配線とは異なる電位を供給するための第2電源配線と、
前記第1及び第2電源配線よりも上層に形成され、且つ、前記第1配線を介して前記入出力回路部と電気的に接続するボンディングパッドと、
前記ボンディングパッド上に形成された絶縁膜と、
前記ボンディングパッドの表面を露出するように前記絶縁膜に形成された開口部とを有する半導体装置であって、
前記入出力回路部は、第1領域、第2領域、及び、前記第1領域と前記第2領域との間に位置する引き出し領域を有し、
前記第1領域は前記ボンディングパッドへ信号を出力するための第1MISFET素子を含み、
前記第2領域は前記ボンディングパッドへ信号を出力するための第2MISFET素子を含み、
前記第1領域は前記第2領域よりも前記半導体装置の外周部に近い領域であり、
前記第1配線は前記引き出し領域上に位置しており、
前記第1電源配線は前記第1領域上に位置しており、
前記第2電源配線は前記第2領域上に位置しており、
前記ボンディングパッドは前記第1領域上に位置しており、
前記開口部は前記第1領域上に位置しており、且つ、前記第2領域上には位置していないことを特徴とする半導体装置。 - 請求項1または2記載の半導体装置において、
前記第1または第2電源配線のどちらか一方が、接地電位を供給するための配線であることを特徴とする半導体装置。 - 請求項1〜3のいずれか1項に記載の半導体装置において、
前記ボンディングパッドが信号の入力または出力用のボンディングパッドであることを特徴とする半導体装置。 - 請求項1〜4のいずれか1項に記載の半導体装置において、
前記第1領域は第1抵抗素子と第1ダイオード素子とを有し、前記第2領域は第2抵抗素子と第2ダイオード素子とを有することを特徴とする半導体装置。 - 請求項5記載の半導体装置において、
前記第1および第2電源配線は、前記半導体装置の外周部に沿って延在し、
前記第1MISFET素子を形成した領域、前記第1抵抗素子を形成した領域、前記第1ダイオード素子を形成した領域、前記引き出し領域、前記第2ダイオード素子を形成した領域、前記第2抵抗素子を形成した領域および前記第2MISFET素子を形成した領域は、前記第1および第2電源配線の延在方向と交差する方向に、順に配置されていることを特徴とする半導体装置。 - 請求項5または6記載の半導体装置において、
前記ボンディングパッドは、前記第1ダイオード素子を介して前記第1電源配線に接続され、前記第2ダイオード素子を介して前記第2電源配線に接続され、前記第1抵抗素子を介して前記第1MISFET素子のソースまたはドレインの一方に電気的に接続され、且つ、前記第2抵抗素子を介して前記第2MISFET素子のソースまたはドレインの一方に電気的に接続されており、
前記第1MISFET素子のソースまたはドレインの他方は、前記第1電源配線に接続され、
前記第2MISFET素子のソースまたはドレインの他方は、前記第2電源配線に接続され、
前記第1および第2MISFET素子のゲートは前記ボンディングパッドへ出力するための出力信号を内部回路から受けていることを特徴とする半導体装置。 - 請求項1〜4のいずれか1項に記載の半導体装置において、
前記入出力回路部は、第1抵抗素子、第2抵抗素子、第1ダイオード素子及び第2ダイオード素子を有することを特徴とする半導体装置。 - 請求項1〜8のいずれか1項に記載の半導体装置において、
前記第1配線は、前記入出力回路部上に形成された第1層間絶縁膜中に埋め込まれて形成されており、
前記第1電源配線、及び、前記第2電源配線は、前記第1配線、及び、前記第1層間絶縁膜上に形成された第2層間絶縁膜中に埋め込まれて形成されていることを特徴とする半導体装置。 - 請求項9に記載の半導体装置において、
前記第1配線、前記第1電源配線、及び、前記第2電源配線は、銅を主成分として形成されていることを特徴とする半導体装置。 - 半導体基板と、
前記半導体基板に形成された第1及び第2入出力回路部と、
前記第1及び第2入出力回路部より上層に形成された第1及び第2配線と、
前記第1及び第2配線より上層に形成された第1電源配線と、
前記第1及び第2配線より上層に形成され、且つ、前記第1電源配線とは異なる電位を供給するための第2電源配線と、
前記第1及び第2電源配線よりも上層に形成され、且つ、前記第1配線を介して前記第1入出力回路部と電気的に接続する第1ボンディングパッドと、
前記第1及び第2電源配線よりも上層に形成され、且つ、前記第2配線を介して前記第2入出力回路部と電気的に接続する第2ボンディングパッドと、
前記第1及び第2ボンディングパッド上に形成された絶縁膜と、
前記第1ボンディングパッドの表面を露出するように前記絶縁膜に形成された第1開口部と、
前記第2ボンディングパッドの表面を露出するように前記絶縁膜に形成された第2開口部とを有する半導体装置であって、
前記第1入出力回路部は、第1領域、第2領域、及び、前記第1領域と前記第2領域との間に位置する第1引き出し領域を有し、
前記第2入出力回路部は、第3領域、第4領域、及び、前記第3領域と前記第4領域との間に位置する第2引き出し領域を有し、
前記第1領域は前記第1ボンディングパッドへ信号を出力するための第1MISFET素子を含み、
前記第2領域は前記第1ボンディングパッドへ信号を出力するための第2MISFET素子を含み、
前記第1及び第3領域は、前記第2及び第4領域よりも前記半導体装置の外周部に近い領域であり、
前記第1配線は前記第1引き出し領域上に位置しており、
前記第2配線は前記第2引き出し領域上に位置しており、
前記第1及び第2電源配線は、前記半導体装置の外周部に沿った第1方向に延在しており、
前記第1電源配線は前記第1及び第3領域上に位置しており、
前記第2電源配線は前記第2及び第4領域上に位置しており、
前記第1ボンディングパッドは前記第1領域上に位置しており、
前記第2ボンディングパッドは前記第4領域上に位置しており、
前記第1開口部は前記第1領域上に位置しており、且つ、前記第2領域上には位置しておらず、
前記第2開口部は前記第4領域上に位置しており、且つ、前記第3領域上には位置していないことを特徴とする半導体装置。 - 請求項11に記載の半導体装置において、
前記第1または第2電源配線のどちらか一方は、接地電位を供給するための配線であることを特徴とする半導体装置。 - 請求項11または12記載の半導体装置において、
前記第1または第2ボンディングパッドのどちらか一方は、信号の入力または出力用のボンディングパッドであることを特徴とする半導体装置。 - 請求項11〜13のいずれか1項に記載の半導体装置において、
前記第1領域は第1抵抗素子と第1ダイオード素子とを有し、前記第2領域は第2抵抗素子と第2ダイオード素子とを有していることを特徴とする半導体装置。 - 請求項14記載の半導体装置において、
前記第1MISFET素子、前記第1抵抗素子、前記第1ダイオード素子、前記第1引き出し領域、前記第2ダイオード素子、前記第2抵抗素子および前記第2MISFET素子は、前記第1方向と交差する第2方向に沿って順に配置されていることを特徴とする半導体装置。 - 請求項14または15記載の半導体装置において、
前記第1ボンディングパッドは、前記第1ダイオード素子を介して前記第1電源配線に接続され、前記第2ダイオード素子を介して前記第2電源配線に接続され、前記第1抵抗素子を介して前記第1MISFET素子のソースまたはドレインの一方に電気的に接続され、且つ、前記第2抵抗素子を介して前記第2MISFET素子のソースまたはドレインの一方に電気的に接続されており、
前記第1MISFET素子のソースまたはドレインの他方は、前記第1電源配線に接続され、
前記第2MISFET素子のソースまたはドレインの他方は、前記第2電源配線に接続されていることを特徴とする半導体装置。 - 請求項11〜13のいずれか1項に記載の半導体装置において、
前記第2入出力回路部は、第1抵抗素子、第2抵抗素子、第1ダイオード素子及び第2ダイオード素子を有することを特徴とする半導体装置。 - 請求項11〜17のいずれか1項に記載の半導体装置において、
前記第1及び第2配線は、それぞれ、前記第1及び第2入出力回路部上に形成された第1層間絶縁膜中に埋め込まれて形成されており、
前記第1電源配線、及び、前記第2電源配線は、それぞれ、前記第1配線、前記第2配線、及び、前記第1層間絶縁膜上に形成された第2層間絶縁膜中に埋め込まれて形成されていることを特徴とする半導体装置。 - 請求項18に記載の半導体装置において、
前記第1配線、前記第2配線、前記第1電源配線、及び、前記第2電源配線は、銅を主成分として形成されていることを特徴とする半導体装置。
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US12/253,850 US7714357B2 (en) | 2005-11-30 | 2008-10-17 | Semiconductor device |
US12/727,811 US8552561B2 (en) | 2005-11-30 | 2010-03-19 | Semiconductor device with output circuit arrangement |
US14/011,704 US8946770B2 (en) | 2005-11-30 | 2013-08-27 | Semiconductor device with output circuit and pad |
US14/591,817 US9093283B2 (en) | 2005-11-30 | 2015-01-07 | Semiconductor devices with output circuit and pad |
US14/746,774 US9343460B2 (en) | 2005-11-30 | 2015-06-22 | Semiconductor device with output circuit and pad arrangements |
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US8552561B2 (en) | 2013-10-08 |
US20150108579A1 (en) | 2015-04-23 |
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US9515019B2 (en) | 2016-12-06 |
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US20150287724A1 (en) | 2015-10-08 |
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US20160233154A1 (en) | 2016-08-11 |
US9343460B2 (en) | 2016-05-17 |
US20100171177A1 (en) | 2010-07-08 |
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US20090050940A1 (en) | 2009-02-26 |
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CN1976032A (zh) | 2007-06-06 |
CN101685818A (zh) | 2010-03-31 |
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US7714357B2 (en) | 2010-05-11 |
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Free format text: JAPANESE INTERMEDIATE CODE: R350 |