JP4913041B2 - 強度変化の補償を伴う投影系及びそのための補償素子 - Google Patents

強度変化の補償を伴う投影系及びそのための補償素子 Download PDF

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Publication number
JP4913041B2
JP4913041B2 JP2007513861A JP2007513861A JP4913041B2 JP 4913041 B2 JP4913041 B2 JP 4913041B2 JP 2007513861 A JP2007513861 A JP 2007513861A JP 2007513861 A JP2007513861 A JP 2007513861A JP 4913041 B2 JP4913041 B2 JP 4913041B2
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Japan
Prior art keywords
exposure apparatus
projection
projection exposure
filter
layer
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Expired - Fee Related
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JP2007513861A
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English (en)
Japanese (ja)
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JP2008502127A (ja
JP2008502127A5 (enExample
Inventor
シャイブル パトリック
パツィディス アレクサンドラ
ガライス ライナー
トートツェック ミヒャエル
フェルドマン ハイコ
グロイプナー パウル
ロスタルスキー ハンス−ユーゲン
ズィンガー ヴォルフガング
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2008502127A publication Critical patent/JP2008502127A/ja
Publication of JP2008502127A5 publication Critical patent/JP2008502127A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/02—Telephoto objectives, i.e. systems of the type + - in which the distance from the front vertex to the image plane is less than the equivalent focal length
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G03B27/545—Lamp housings; Illuminating means for enlargers
    • G03B27/547—Lamp housings; Illuminating means for enlargers colour mixing heads
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G03B27/725—Optical projection devices wherein the contrast is controlled electrically (e.g. cathode ray tube masking)
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007513861A 2004-06-04 2005-06-03 強度変化の補償を伴う投影系及びそのための補償素子 Expired - Fee Related JP4913041B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US57680804P 2004-06-04 2004-06-04
US60/576,808 2004-06-04
US63325804P 2004-12-03 2004-12-03
US60/633,258 2004-12-03
PCT/EP2005/005979 WO2005119369A1 (en) 2004-06-04 2005-06-03 Projection system with compensation of intensity variatons and compensation element therefor

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011207458A Division JP5134716B2 (ja) 2004-06-04 2011-09-22 強度変化の補償を伴う投影系及びそのための補償素子

Publications (3)

Publication Number Publication Date
JP2008502127A JP2008502127A (ja) 2008-01-24
JP2008502127A5 JP2008502127A5 (enExample) 2008-07-03
JP4913041B2 true JP4913041B2 (ja) 2012-04-11

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ID=34969021

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007513861A Expired - Fee Related JP4913041B2 (ja) 2004-06-04 2005-06-03 強度変化の補償を伴う投影系及びそのための補償素子
JP2011207458A Expired - Fee Related JP5134716B2 (ja) 2004-06-04 2011-09-22 強度変化の補償を伴う投影系及びそのための補償素子

Family Applications After (1)

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JP2011207458A Expired - Fee Related JP5134716B2 (ja) 2004-06-04 2011-09-22 強度変化の補償を伴う投影系及びそのための補償素子

Country Status (5)

Country Link
US (1) US8605257B2 (enExample)
EP (1) EP1759248A1 (enExample)
JP (2) JP4913041B2 (enExample)
KR (2) KR101199076B1 (enExample)
WO (1) WO2005119369A1 (enExample)

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