KR101199076B1 - 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 - Google Patents

강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 Download PDF

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Publication number
KR101199076B1
KR101199076B1 KR1020077000237A KR20077000237A KR101199076B1 KR 101199076 B1 KR101199076 B1 KR 101199076B1 KR 1020077000237 A KR1020077000237 A KR 1020077000237A KR 20077000237 A KR20077000237 A KR 20077000237A KR 101199076 B1 KR101199076 B1 KR 101199076B1
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South Korea
Prior art keywords
delete delete
reflectance
layer system
interference layer
projection objective
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Expired - Fee Related
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KR1020077000237A
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English (en)
Korean (ko)
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KR20070041497A (ko
Inventor
파트리크 샤이블레
알렉산드라 파찌디스
라이너 가라이스
미카엘 토트쩨크
하이코 펠트만
파울 그로이프너
한스-위르겐 로스탈스키
볼프강 징거
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20070041497A publication Critical patent/KR20070041497A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/02—Telephoto objectives, i.e. systems of the type + - in which the distance from the front vertex to the image plane is less than the equivalent focal length
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G03B27/545—Lamp housings; Illuminating means for enlargers
    • G03B27/547—Lamp housings; Illuminating means for enlargers colour mixing heads
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G03B27/725—Optical projection devices wherein the contrast is controlled electrically (e.g. cathode ray tube masking)
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020077000237A 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 Expired - Fee Related KR101199076B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US57680804P 2004-06-04 2004-06-04
US60/576,808 2004-06-04
US63325804P 2004-12-03 2004-12-03
US60/633,258 2004-12-03
PCT/EP2005/005979 WO2005119369A1 (en) 2004-06-04 2005-06-03 Projection system with compensation of intensity variatons and compensation element therefor

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020117023187A Division KR101248328B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소

Publications (2)

Publication Number Publication Date
KR20070041497A KR20070041497A (ko) 2007-04-18
KR101199076B1 true KR101199076B1 (ko) 2012-11-07

Family

ID=34969021

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020117023187A Expired - Fee Related KR101248328B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
KR1020077000237A Expired - Fee Related KR101199076B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020117023187A Expired - Fee Related KR101248328B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소

Country Status (5)

Country Link
US (1) US8605257B2 (enExample)
EP (1) EP1759248A1 (enExample)
JP (2) JP4913041B2 (enExample)
KR (2) KR101248328B1 (enExample)
WO (1) WO2005119369A1 (enExample)

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JP2012028803A (ja) 2012-02-09
EP1759248A1 (en) 2007-03-07
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