JP4753170B2 - 半導体装置及びその製造方法 - Google Patents

半導体装置及びその製造方法 Download PDF

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Publication number
JP4753170B2
JP4753170B2 JP2004062323A JP2004062323A JP4753170B2 JP 4753170 B2 JP4753170 B2 JP 4753170B2 JP 2004062323 A JP2004062323 A JP 2004062323A JP 2004062323 A JP2004062323 A JP 2004062323A JP 4753170 B2 JP4753170 B2 JP 4753170B2
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JP
Japan
Prior art keywords
semiconductor device
dicing
semiconductor
alignment mark
manufacturing
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Expired - Fee Related
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JP2004062323A
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English (en)
Japanese (ja)
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JP2005252078A5 (https=
JP2005252078A (ja
Inventor
崇 野間
嘉則 関
元明 和久井
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Sanyo Electric Co Ltd
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Sanyo Electric Co Ltd
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Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2004062323A priority Critical patent/JP4753170B2/ja
Priority to TW094104769A priority patent/TWI288956B/zh
Priority to US11/069,061 priority patent/US7456083B2/en
Priority to KR1020050018007A priority patent/KR100682003B1/ko
Priority to CNB2005100530225A priority patent/CN100446187C/zh
Priority to SG200501359A priority patent/SG114787A1/en
Priority to EP05004918A priority patent/EP1575086A3/en
Publication of JP2005252078A publication Critical patent/JP2005252078A/ja
Publication of JP2005252078A5 publication Critical patent/JP2005252078A5/ja
Application granted granted Critical
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M3/00Medical syringes, e.g. enemata; Irrigators
    • A61M3/02Enemata; Irrigators
    • A61M3/0233Enemata; Irrigators characterised by liquid supply means, e.g. from pressurised reservoirs
    • A61M3/0254Enemata; Irrigators characterised by liquid supply means, e.g. from pressurised reservoirs the liquid being pumped
    • A61M3/0262Enemata; Irrigators characterised by liquid supply means, e.g. from pressurised reservoirs the liquid being pumped manually, e.g. by squeezing a bulb
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00Cutting or separating of wafers, substrates or parts of devices
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M3/00Medical syringes, e.g. enemata; Irrigators
    • A61M3/02Enemata; Irrigators
    • A61M3/0233Enemata; Irrigators characterised by liquid supply means, e.g. from pressurised reservoirs
    • A61M3/025Enemata; Irrigators characterised by liquid supply means, e.g. from pressurised reservoirs supplied directly from the pressurised water source, e.g. with medicament supply
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M3/00Medical syringes, e.g. enemata; Irrigators
    • A61M3/02Enemata; Irrigators
    • A61M3/0279Cannula; Nozzles; Tips; their connection means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00Marks applied to devices, e.g. for alignment or identification
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/0198Manufacture or treatment batch processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/01Manufacture or treatment
    • H10W74/014Manufacture or treatment using batch processing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/129Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed forming a chip-scale package [CSP]
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M2205/00General characteristics of the apparatus
    • A61M2205/07General characteristics of the apparatus having air pumping means
    • A61M2205/071General characteristics of the apparatus having air pumping means hand operated
    • A61M2205/075Bulb type
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M2205/00General characteristics of the apparatus
    • A61M2205/33Controlling, regulating or measuring
    • A61M2205/3331Pressure; Flow
    • A61M2205/3334Measuring or controlling the flow rate
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M2210/00Anatomical parts of the body
    • A61M2210/10Trunk
    • A61M2210/1042Alimentary tract
    • A61M2210/1064Large intestine
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M2210/00Anatomical parts of the body
    • A61M2210/14Female reproductive, genital organs
    • A61M2210/1475Vagina
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00Marks applied to devices, e.g. for alignment or identification
    • H10W46/501Marks applied to devices, e.g. for alignment or identification for use before dicing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00Marks applied to devices, e.g. for alignment or identification
    • H10W46/601Marks applied to devices, e.g. for alignment or identification for use after dicing
    • H10W46/603Formed on wafers or substrates before dicing and remaining on chips after dicing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241Dispositions, e.g. layouts
    • H10W72/244Dispositions, e.g. layouts relative to underlying supporting features, e.g. bond pads, RDLs or vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/922Bond pads being integral with underlying chip-level interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9415Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu

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  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Anesthesiology (AREA)
  • Biomedical Technology (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Hematology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Dicing (AREA)
JP2004062323A 2004-03-05 2004-03-05 半導体装置及びその製造方法 Expired - Fee Related JP4753170B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004062323A JP4753170B2 (ja) 2004-03-05 2004-03-05 半導体装置及びその製造方法
TW094104769A TWI288956B (en) 2004-03-05 2005-02-18 Semiconductor device and manufacturing method thereof
US11/069,061 US7456083B2 (en) 2004-03-05 2005-03-02 Semiconductor device and manufacturing method of the same
CNB2005100530225A CN100446187C (zh) 2004-03-05 2005-03-04 半导体装置及其制造方法
KR1020050018007A KR100682003B1 (ko) 2004-03-05 2005-03-04 반도체 장치 및 그 제조 방법
SG200501359A SG114787A1 (en) 2004-03-05 2005-03-05 Semiconductor device and manufacturing method of the same
EP05004918A EP1575086A3 (en) 2004-03-05 2005-03-07 Semiconductor device and manufacturing method of the same, including a dicing step

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004062323A JP4753170B2 (ja) 2004-03-05 2004-03-05 半導体装置及びその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010127140A Division JP2010199625A (ja) 2010-06-02 2010-06-02 半導体装置及びその製造方法

Publications (3)

Publication Number Publication Date
JP2005252078A JP2005252078A (ja) 2005-09-15
JP2005252078A5 JP2005252078A5 (https=) 2007-04-19
JP4753170B2 true JP4753170B2 (ja) 2011-08-24

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JP2004062323A Expired - Fee Related JP4753170B2 (ja) 2004-03-05 2004-03-05 半導体装置及びその製造方法

Country Status (7)

Country Link
US (1) US7456083B2 (https=)
EP (1) EP1575086A3 (https=)
JP (1) JP4753170B2 (https=)
KR (1) KR100682003B1 (https=)
CN (1) CN100446187C (https=)
SG (1) SG114787A1 (https=)
TW (1) TWI288956B (https=)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI232560B (en) * 2002-04-23 2005-05-11 Sanyo Electric Co Semiconductor device and its manufacture
TWI229435B (en) * 2002-06-18 2005-03-11 Sanyo Electric Co Manufacture of semiconductor device
TWI227550B (en) * 2002-10-30 2005-02-01 Sanyo Electric Co Semiconductor device manufacturing method
JP4401181B2 (ja) * 2003-08-06 2010-01-20 三洋電機株式会社 半導体装置及びその製造方法
JP3962713B2 (ja) * 2003-09-30 2007-08-22 キヤノン株式会社 アライメントマークの形成方法、およびデバイスが構成される基板
JP4322181B2 (ja) * 2004-07-29 2009-08-26 三洋電機株式会社 半導体装置の製造方法
US20060258051A1 (en) * 2005-05-10 2006-11-16 Texas Instruments Incorporated Method and system for solder die attach
KR100652435B1 (ko) * 2005-10-07 2006-12-01 삼성전자주식회사 첫 번째 다이의 위치를 구분할 수 있는 표시수단을구비하는 웨이퍼 및 웨이퍼의 다이 부착 방법
US8153464B2 (en) * 2005-10-18 2012-04-10 International Rectifier Corporation Wafer singulation process
TWI324800B (en) * 2005-12-28 2010-05-11 Sanyo Electric Co Method for manufacturing semiconductor device
TW200737506A (en) * 2006-03-07 2007-10-01 Sanyo Electric Co Semiconductor device and manufacturing method of the same
JP2007329153A (ja) * 2006-06-06 2007-12-20 Fujitsu Ltd デバイスの製造方法、ダイシング方法、およびダイシング装置
CN100524719C (zh) * 2006-08-03 2009-08-05 南茂科技股份有限公司 阵列封装基板及封装体阵列的切割方式的判断方法
TWI367557B (en) 2006-08-11 2012-07-01 Sanyo Electric Co Semiconductor device and manufaturing method thereof
JP5076407B2 (ja) * 2006-09-05 2012-11-21 ミツミ電機株式会社 半導体装置及びその製造方法
KR100784388B1 (ko) * 2006-11-14 2007-12-11 삼성전자주식회사 반도체 패키지 및 제조방법
JP5010247B2 (ja) 2006-11-20 2012-08-29 オンセミコンダクター・トレーディング・リミテッド 半導体装置及びその製造方法
US7569409B2 (en) * 2007-01-04 2009-08-04 Visera Technologies Company Limited Isolation structures for CMOS image sensor chip scale packages
US7679167B2 (en) * 2007-01-08 2010-03-16 Visera Technologies Company, Limited Electronic assembly for image sensor device and fabrication method thereof
JP2008294405A (ja) * 2007-04-25 2008-12-04 Sanyo Electric Co Ltd 半導体装置及びその製造方法
JP2008288285A (ja) * 2007-05-15 2008-11-27 Sharp Corp 積層基板の切断方法、半導体装置の製造方法、半導体装置、発光装置及びバックライト装置
DE102007030284B4 (de) * 2007-06-29 2009-12-31 Schott Ag Verfahren zum Verpacken von Halbleiter-Bauelementen und verfahrensgemäß hergestelltes Zwischenprodukt
US8338267B2 (en) * 2007-07-11 2012-12-25 Sematech, Inc. Systems and methods for vertically integrating semiconductor devices
CN101689542A (zh) 2007-07-12 2010-03-31 Nxp股份有限公司 晶片上的集成电路和分离晶片上的集成电路的方法
TWI375321B (en) * 2007-08-24 2012-10-21 Xintec Inc Electronic device wafer level scale packages and fabrication methods thereof
CN101950729B (zh) * 2007-09-05 2012-09-26 精材科技股份有限公司 电子元件的晶圆级封装及其制造方法
JP2010103300A (ja) * 2008-10-23 2010-05-06 Sanyo Electric Co Ltd 半導体装置及びその製造方法
US8289388B2 (en) * 2009-05-14 2012-10-16 Asm Assembly Automation Ltd Alignment method for singulation system
CN102800656B (zh) * 2011-05-20 2015-11-25 精材科技股份有限公司 晶片封装体、晶片封装体的形成方法以及封装晶圆
DE102011112659B4 (de) * 2011-09-06 2022-01-27 Vishay Semiconductor Gmbh Oberflächenmontierbares elektronisches Bauelement
JP6096442B2 (ja) * 2012-09-10 2017-03-15 ラピスセミコンダクタ株式会社 半導体装置および半導体装置の製造方法
JP6193665B2 (ja) * 2013-07-26 2017-09-06 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
JP6257291B2 (ja) * 2013-12-04 2018-01-10 株式会社ディスコ パッケージ基板の加工方法
CN104977745B (zh) * 2015-06-24 2018-05-25 武汉华星光电技术有限公司 液晶显示面板用基板及液晶显示面板切割方法
JP2017053999A (ja) * 2015-09-09 2017-03-16 株式会社東芝 半導体装置および検査パターン配置方法
JP6607639B2 (ja) * 2015-12-24 2019-11-20 株式会社ディスコ ウェーハの加工方法
US10163954B2 (en) * 2016-04-11 2018-12-25 Omnivision Technologies, Inc. Trenched device wafer, stepped-sidewall device die, and associated method
JP2019054172A (ja) * 2017-09-15 2019-04-04 東芝メモリ株式会社 半導体装置
JP7075652B2 (ja) * 2017-12-28 2022-05-26 三星ダイヤモンド工業株式会社 スクライブ装置およびスクライブ方法
DE102019204457B4 (de) 2019-03-29 2024-01-25 Disco Corporation Substratbearbeitungsverfahren
CN110549351B (zh) * 2019-09-19 2020-10-30 中国科学院合肥物质科学研究院 一种物料氧化层打磨机器人控制系统及其控制方法
CN111128966A (zh) * 2019-12-25 2020-05-08 华天科技(昆山)电子有限公司 对位结构及封装切割方法
CN117672886A (zh) * 2022-08-25 2024-03-08 群创光电股份有限公司 电子装置的制造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6030314A (ja) * 1983-07-08 1985-02-15 富士通株式会社 ダイシング装置
JPH04177715A (ja) * 1990-11-10 1992-06-24 Fujitsu Ltd 半導体装置
JP2666761B2 (ja) 1995-03-28 1997-10-22 日本電気株式会社 半導体ウェハ
US5777392A (en) * 1995-03-28 1998-07-07 Nec Corporation Semiconductor device having improved alignment marks
KR970008386A (ko) * 1995-07-07 1997-02-24 하라 세이지 기판의 할단(割斷)방법 및 그 할단장치
IL123207A0 (en) * 1998-02-06 1998-09-24 Shellcase Ltd Integrated circuit device
US6271102B1 (en) * 1998-02-27 2001-08-07 International Business Machines Corporation Method and system for dicing wafers, and semiconductor structures incorporating the products thereof
JP3065309B1 (ja) * 1999-03-11 2000-07-17 沖電気工業株式会社 半導体装置の製造方法
WO2001009927A1 (en) * 1999-07-28 2001-02-08 Infineon Technologies North America Corp. Semiconductor structures and manufacturing methods
US6309943B1 (en) * 2000-04-25 2001-10-30 Amkor Technology, Inc. Precision marking and singulation method
US6579738B2 (en) * 2000-12-15 2003-06-17 Micron Technology, Inc. Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials
US6869861B1 (en) * 2001-03-08 2005-03-22 Amkor Technology, Inc. Back-side wafer singulation method
JP3603828B2 (ja) * 2001-05-28 2004-12-22 富士ゼロックス株式会社 インクジェット式記録ヘッド及びその製造方法並びにインクジェット式記録装置
JP3872319B2 (ja) * 2001-08-21 2007-01-24 沖電気工業株式会社 半導体装置及びその製造方法
JP2003100666A (ja) * 2001-09-26 2003-04-04 Toshiba Corp 半導体装置の製造方法
JP2004006820A (ja) * 2002-04-23 2004-01-08 Sanyo Electric Co Ltd 半導体装置及びその製造方法
JP3877700B2 (ja) * 2002-04-23 2007-02-07 三洋電機株式会社 半導体装置及びその製造方法
JP2003347476A (ja) * 2002-05-22 2003-12-05 Sanyo Electric Co Ltd 半導体集積装置及びその製造方法
CN2552163Y (zh) * 2002-05-23 2003-05-21 立卫科技股份有限公司 封装切单的辨识点电镀线的结构
JP3796202B2 (ja) * 2002-07-05 2006-07-12 三洋電機株式会社 半導体集積装置の製造方法

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KR20060043788A (ko) 2006-05-15
EP1575086A3 (en) 2006-06-14
US7456083B2 (en) 2008-11-25
KR100682003B1 (ko) 2007-02-15
JP2005252078A (ja) 2005-09-15
CN100446187C (zh) 2008-12-24
EP1575086A2 (en) 2005-09-14
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