JP3739375B2 - 半導体装置及びその製造方法 - Google Patents
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Description
12:搭載基板
12a:搭載基板のチップ搭載面
14、141:半導体チップ
14a:半導体チップの第2の主表面の角部
14b:半導体チップの第1の主表面
14c:半導体チップの第2の主表面
18a:第1の溝(第1の目標線)
18b:第2の溝(第2の目標線)
20a:搭載基板のチップ搭載面の角部
21:電極パッド
22:パッシベーション膜
24:保護膜
25:半田ボール(外部端子)
26:第1の導電部
28:第2の導電部(ポスト部)
30:導電部
32:封止層
33:表面保護膜
34:配線層
40:ウェハ
45:開口部
50:積層体
100:第1の領域
200:第2の領域
181a:第1の溝の縁
181b:第2の溝の縁
Claims (17)
- チップ搭載面を有する搭載基板を準備する工程と、
互いに平行な複数の目標線を前記チップ搭載面に形成する工程と、
前記目標線間の間隔よりも短い辺を有し、電極パッドが形成された第1の主表面と該第1の主表面と対向する第2の主表面とを有する複数の半導体チップを準備する工程と、
前記チップ搭載面上の前記目標線間に、前記第2の主表面が対面するよう複数の前記半導体チップを前記チップ搭載面上に搭載する工程であって、隣り合う2本の目標線の一方の目標線に沿って互いに離間させて搭載する工程と、
前記チップ搭載面上に、複数の前記半導体チップを覆うように封止層を形成する工程と、
前記電極パッドと電気的に接続されるとともに、前記封止層の表面領域のうち前記半導体チップ上方に位置する第1の領域上から前記半導体チップ間に位置する第2の領域上にわたって延在する配線パターンを形成する工程と、
前記第2の領域上に位置する前記配線パターンの表面上に、外部端子を形成する工程と、
前記第2の領域において前記封止層及び前記搭載基板を切断する工程と
を含むことを特徴とする半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記半導体チップを前記チップ搭載面上に搭載する工程では、複数の前記半導体チップを、該半導体チップの辺を前記一方の目標線に合わせて搭載することを特徴とする半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記半導体チップを前記チップ搭載面上に搭載する工程では、複数の前記半導体チップを、該半導体チップの辺を前記一方の目標線から所定の距離だけ離して搭載することを特徴とする半導体装置の製造方法。 - 請求項1ないし3のいずれか一項に記載の半導体装置の製造方法において、
前記目標線は互いに平行な第1の目標線と、該第1の目標線に直角に交差する第2の目標線で構成され、
前記半導体チップを前記チップ搭載面上に搭載する工程における前記一方の目標線は、前記第1の目標線もしくは前記第2の目標線のいずれか一方であることを特徴する半導体装置の製造方法。 - 請求項4に記載の半導体装置の製造方法において、
前記半導体チップを前記チップ搭載面上に搭載する工程では、前記半導体チップの角部を、前記第1及び第2の目標線が交差することによって形成される前記チップ搭載面の角部に合わせて搭載することを特徴とする半導体装置の製造方法。 - 請求項4に記載の半導体装置の製造方法において、
前記半導体チップを前記チップ搭載面上に搭載する工程では、前記半導体チップを、前記第1及び第2の目標線それぞれに対して平行にずらして搭載することを特徴とする半導体装置の製造方法。 - 請求項1ないし6のいずれか一項に記載の半導体装置の製造方法において、
前記目標線は、前記チップ搭載面に形成された溝であることを特徴とする半導体装置の製造方法。 - 請求項1ないし6のいずれか一項に記載の半導体装置の製造方法において、
前記目標線は、前記チップ搭載面から突出した突出部であることを特徴とする半導体装置の製造方法。 - 電極パッドが形成された第1の主表面と、該第1の主表面と対向する第2の主表面とを有する半導体チップと、
前記第2の主表面の面積よりも広い面積を有するとともに前記第2の主表面と対面するチップ搭載面を有し、前記半導体チップを搭載する搭載基板と、
前記チップ搭載面上に、前記半導体チップを覆うように形成された封止層と、
前記電極パッドと電気的に接続されるとともに、前記封止層の表面領域のうち前記半導体チップの上方に位置する第1の領域上から該第1の領域を囲む第2の領域上にわたって延在する配線パターンと、
前記第2の領域上に位置する前記配線パターンの表面上に配置された外部端子と
を有し、
前記搭載基板のチップ搭載面には、前記搭載基板の対向する一対の側面間に延在する溝部が形成されており、該溝部には前記封止層が形成されていることを特徴とする半導体装置。 - 請求項9に記載の半導体装置において、
前記半導体チップは、前記溝部に沿って前記搭載基板上に搭載されていることを特徴とする半導体装置。 - 請求項9に記載の半導体装置において、
前記半導体チップは、前記溝部に合わせて前記搭載基板上に搭載されていることを特徴とする半導体装置。 - 請求項9に記載の半導体装置において、
前記半導体チップは、前記溝部から所定の距離離間して前記搭載基板上に搭載されていることを特徴とする半導体装置。 - 請求項9に記載の半導体装置において、
前記搭載基板及び前記封止層の側面は切断された切断面であることを特徴とする半導体装置。 - 請求項9ないし13のいずれか一項に記載の半導体装置において、
前記溝部は、前記搭載基板の対向する一対の側面間に延在する第1の溝部と、前記搭載基板の対向する他の一対の側面間に延在する第2の溝部で構成されていることを特徴とする半導体装置。 - 請求項14に記載の半導体装置において、
前記半導体チップの角部は、前記第1及び第2の溝部が交差することによって形成される前記チップ搭載面の角部に合わせて搭載されていることを特徴とする半導体装置。 - 請求項14に記載の半導体装置において、
前記半導体チップは、前記第1及び第2の溝部のそれぞれに対して平行にずらして搭載されていることを特徴とする半導体装置。 - 電極パッドが形成された第1の主表面と、該第1の主表面と対向する第2の主表面とを有する半導体チップと、
前記第2の主表面の面積よりも広い面積を有するとともに、前記第2の主表面と対面するチップ搭載面を有し、前記半導体チップを搭載する搭載基板と、
前記チップ搭載面上に、前記半導体チップを覆うように形成された封止層と、
前記電極パッドと電気的に接続されるとともに、前記封止層の表面領域のうち前記半導体チップの上方に位置する第1の領域上から該第1の領域を囲む第2の領域上にわたって延在する配線パターンと、
前記第2の領域上に位置する前記配線パターンの表面上に配置された外部端子と
を有し、
前記搭載基板のチップ搭載面には、前記搭載基板の対向する一対の側面間に延在する突出部が形成されており、該突出部は前記封止層で覆われていることを特徴とする半導体装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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JP2003399373A JP3739375B2 (ja) | 2003-11-28 | 2003-11-28 | 半導体装置及びその製造方法 |
US10/798,555 US7193301B2 (en) | 2003-11-28 | 2004-03-12 | Semiconductor device and manufacturing method thereof |
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Application Number | Priority Date | Filing Date | Title |
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JP2003399373A JP3739375B2 (ja) | 2003-11-28 | 2003-11-28 | 半導体装置及びその製造方法 |
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JP2005166692A JP2005166692A (ja) | 2005-06-23 |
JP3739375B2 true JP3739375B2 (ja) | 2006-01-25 |
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JP3721000B2 (ja) | 1999-02-24 | 2005-11-30 | ローム株式会社 | 半導体装置 |
JP3065309B1 (ja) | 1999-03-11 | 2000-07-17 | 沖電気工業株式会社 | 半導体装置の製造方法 |
US6548895B1 (en) * | 2001-02-21 | 2003-04-15 | Sandia Corporation | Packaging of electro-microfluidic devices |
JP3829736B2 (ja) | 2002-02-28 | 2006-10-04 | 凸版印刷株式会社 | チップサイズパッケージの製造方法 |
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JP2005166692A (ja) | 2005-06-23 |
US7193301B2 (en) | 2007-03-20 |
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