JP3765896B2 - 光学的立体造形用光硬化性樹脂組成物 - Google Patents

光学的立体造形用光硬化性樹脂組成物 Download PDF

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Publication number
JP3765896B2
JP3765896B2 JP35289396A JP35289396A JP3765896B2 JP 3765896 B2 JP3765896 B2 JP 3765896B2 JP 35289396 A JP35289396 A JP 35289396A JP 35289396 A JP35289396 A JP 35289396A JP 3765896 B2 JP3765896 B2 JP 3765896B2
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Prior art keywords
group
compound
resin composition
acrylate
meth
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Expired - Lifetime
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JP35289396A
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English (en)
Japanese (ja)
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JPH10168165A5 (cg-RX-API-DMAC7.html
JPH10168165A (ja
Inventor
哲也 山村
毅 渡辺
章 竹内
孝志 宇加地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
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JSR Corp
Japan Fine Coatings Co Ltd
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26579727&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3765896(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority to JP35289396A priority Critical patent/JP3765896B2/ja
Application filed by JSR Corp, Japan Fine Coatings Co Ltd filed Critical JSR Corp
Priority to EP97203898A priority patent/EP0848294B1/en
Priority to DE69706816T priority patent/DE69706816T2/de
Priority to US08/989,407 priority patent/US5981616A/en
Publication of JPH10168165A publication Critical patent/JPH10168165A/ja
Priority to US09/394,031 priority patent/US6365644B1/en
Priority to US10/671,438 priority patent/USRE42593E1/en
Publication of JPH10168165A5 publication Critical patent/JPH10168165A5/ja
Publication of JP3765896B2 publication Critical patent/JP3765896B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP35289396A 1996-12-13 1996-12-13 光学的立体造形用光硬化性樹脂組成物 Expired - Lifetime JP3765896B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP35289396A JP3765896B2 (ja) 1996-12-13 1996-12-13 光学的立体造形用光硬化性樹脂組成物
EP97203898A EP0848294B1 (en) 1996-12-13 1997-12-12 Photo-curable resin composition used for photo-fabrication of three-dimensional objects
DE69706816T DE69706816T2 (de) 1996-12-13 1997-12-12 Photohärtbare Harzzusammensetzung zur Verwendung zum Photo-Herstellen dreidimensionaler Objekte
US08/989,407 US5981616A (en) 1996-12-13 1997-12-12 Photo-curable resin composition used for photo fabication of three-dimensional objects
US09/394,031 US6365644B1 (en) 1996-12-13 1999-09-13 Photo-curable resin composition used for photo-fabrication of three-dimensional object
US10/671,438 USRE42593E1 (en) 1996-12-13 2003-09-26 Photo-curable resin composition used for photo-fabrication of three-dimensional object

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35289396A JP3765896B2 (ja) 1996-12-13 1996-12-13 光学的立体造形用光硬化性樹脂組成物
US08/989,407 US5981616A (en) 1996-12-13 1997-12-12 Photo-curable resin composition used for photo fabication of three-dimensional objects

Publications (3)

Publication Number Publication Date
JPH10168165A JPH10168165A (ja) 1998-06-23
JPH10168165A5 JPH10168165A5 (cg-RX-API-DMAC7.html) 2004-11-04
JP3765896B2 true JP3765896B2 (ja) 2006-04-12

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Family Applications (1)

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JP35289396A Expired - Lifetime JP3765896B2 (ja) 1996-12-13 1996-12-13 光学的立体造形用光硬化性樹脂組成物

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Country Link
US (3) US5981616A (cg-RX-API-DMAC7.html)
EP (1) EP0848294B1 (cg-RX-API-DMAC7.html)
JP (1) JP3765896B2 (cg-RX-API-DMAC7.html)
DE (1) DE69706816T2 (cg-RX-API-DMAC7.html)

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