JP2023027033A5 - - Google Patents
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- Publication number
- JP2023027033A5 JP2023027033A5 JP2022162821A JP2022162821A JP2023027033A5 JP 2023027033 A5 JP2023027033 A5 JP 2023027033A5 JP 2022162821 A JP2022162821 A JP 2022162821A JP 2022162821 A JP2022162821 A JP 2022162821A JP 2023027033 A5 JP2023027033 A5 JP 2023027033A5
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- composition
- trimethylsilyl
- aprotic solvent
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims description 62
- 238000004381 surface treatment Methods 0.000 claims description 31
- 239000000010 aprotic solvent Substances 0.000 claims description 18
- -1 siloxanes Chemical class 0.000 claims description 17
- 239000012756 surface treatment agent Substances 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 12
- 150000002596 lactones Chemical class 0.000 claims description 11
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 10
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 10
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical group O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 6
- JOOMLFKONHCLCJ-UHFFFAOYSA-N N-(trimethylsilyl)diethylamine Chemical compound CCN(CC)[Si](C)(C)C JOOMLFKONHCLCJ-UHFFFAOYSA-N 0.000 claims description 6
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 5
- 235000013877 carbamide Nutrition 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 5
- 150000002576 ketones Chemical class 0.000 claims description 5
- 150000003951 lactams Chemical class 0.000 claims description 5
- 150000003672 ureas Chemical class 0.000 claims description 5
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical group CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims description 4
- JYOQNYLFMVKQHO-UHFFFAOYSA-N 1,1-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)N(C(N)=O)[Si](C)(C)C JYOQNYLFMVKQHO-UHFFFAOYSA-N 0.000 claims description 3
- KRUQDZRWZXUUAD-UHFFFAOYSA-N bis(trimethylsilyl) sulfate Chemical compound C[Si](C)(C)OS(=O)(=O)O[Si](C)(C)C KRUQDZRWZXUUAD-UHFFFAOYSA-N 0.000 claims description 3
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 claims description 3
- KAHVZNKZQFSBFW-UHFFFAOYSA-N n-methyl-n-trimethylsilylmethanamine Chemical group CN(C)[Si](C)(C)C KAHVZNKZQFSBFW-UHFFFAOYSA-N 0.000 claims description 3
- VMZOBROUFBEGAR-UHFFFAOYSA-N tris(trimethylsilyl) phosphite Chemical compound C[Si](C)(C)OP(O[Si](C)(C)C)O[Si](C)(C)C VMZOBROUFBEGAR-UHFFFAOYSA-N 0.000 claims description 3
- CVNCFZIIZGNVFD-UHFFFAOYSA-N n,n-bis(trimethylsilyl)prop-2-en-1-amine Chemical compound C[Si](C)(C)N([Si](C)(C)C)CC=C CVNCFZIIZGNVFD-UHFFFAOYSA-N 0.000 claims description 2
- FBADCSUQBLLAHW-UHFFFAOYSA-N 4-trimethylsilyloxypent-3-en-2-one Chemical compound CC(=O)C=C(C)O[Si](C)(C)C FBADCSUQBLLAHW-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- 239000002335 surface treatment layer Substances 0.000 description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- ZSMNRKGGHXLZEC-UHFFFAOYSA-N n,n-bis(trimethylsilyl)methanamine Chemical compound C[Si](C)(C)N(C)[Si](C)(C)C ZSMNRKGGHXLZEC-UHFFFAOYSA-N 0.000 description 4
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 4
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- FBADCSUQBLLAHW-SOFGYWHQSA-N (e)-4-trimethylsilyloxypent-3-en-2-one Chemical compound CC(=O)\C=C(/C)O[Si](C)(C)C FBADCSUQBLLAHW-SOFGYWHQSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- HIMXYMYMHUAZLW-UHFFFAOYSA-N [[[dimethyl(phenyl)silyl]amino]-dimethylsilyl]benzene Chemical compound C=1C=CC=CC=1[Si](C)(C)N[Si](C)(C)C1=CC=CC=C1 HIMXYMYMHUAZLW-UHFFFAOYSA-N 0.000 description 2
- YFONAHAKNVIHPT-UHFFFAOYSA-N [methyl-[[methyl(diphenyl)silyl]amino]-phenylsilyl]benzene Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C)N[Si](C)(C=1C=CC=CC=1)C1=CC=CC=C1 YFONAHAKNVIHPT-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 239000006184 cosolvent Substances 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- CWXWPIUMYLZIME-UHFFFAOYSA-N n-[dimethyl(2-phenylethyl)silyl]-n-methylmethanamine Chemical compound CN(C)[Si](C)(C)CCC1=CC=CC=C1 CWXWPIUMYLZIME-UHFFFAOYSA-N 0.000 description 2
- QULMGWCCKILBTO-UHFFFAOYSA-N n-[dimethylamino(dimethyl)silyl]-n-methylmethanamine Chemical group CN(C)[Si](C)(C)N(C)C QULMGWCCKILBTO-UHFFFAOYSA-N 0.000 description 2
- 239000012487 rinsing solution Substances 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024092571A JP2024103792A (ja) | 2017-03-24 | 2024-06-06 | 表面処理方法およびそのための組成物 |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762476182P | 2017-03-24 | 2017-03-24 | |
| US62/476,182 | 2017-03-24 | ||
| US201862617688P | 2018-01-16 | 2018-01-16 | |
| US62/617,688 | 2018-01-16 | ||
| PCT/US2018/023697 WO2018175682A1 (en) | 2017-03-24 | 2018-03-22 | Surface treatment methods and compositions therefor |
| JP2019552589A JP7452782B2 (ja) | 2017-03-24 | 2018-03-22 | 表面処理方法およびそのための組成物 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019552589A Division JP7452782B2 (ja) | 2017-03-24 | 2018-03-22 | 表面処理方法およびそのための組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024092571A Division JP2024103792A (ja) | 2017-03-24 | 2024-06-06 | 表面処理方法およびそのための組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023027033A JP2023027033A (ja) | 2023-03-01 |
| JP2023027033A5 true JP2023027033A5 (https=) | 2023-12-18 |
| JP7502388B2 JP7502388B2 (ja) | 2024-06-18 |
Family
ID=63581154
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019552589A Active JP7452782B2 (ja) | 2017-03-24 | 2018-03-22 | 表面処理方法およびそのための組成物 |
| JP2022162821A Active JP7502388B2 (ja) | 2017-03-24 | 2022-10-07 | 表面処理方法およびそのための組成物 |
| JP2024092571A Pending JP2024103792A (ja) | 2017-03-24 | 2024-06-06 | 表面処理方法およびそのための組成物 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019552589A Active JP7452782B2 (ja) | 2017-03-24 | 2018-03-22 | 表面処理方法およびそのための組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024092571A Pending JP2024103792A (ja) | 2017-03-24 | 2024-06-06 | 表面処理方法およびそのための組成物 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10593538B2 (https=) |
| EP (1) | EP3602606B1 (https=) |
| JP (3) | JP7452782B2 (https=) |
| KR (1) | KR102519448B1 (https=) |
| CN (2) | CN110462525B (https=) |
| IL (1) | IL269490B (https=) |
| SG (1) | SG11201908617QA (https=) |
| TW (1) | TWI835725B (https=) |
| WO (1) | WO2018175682A1 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10941301B2 (en) * | 2017-12-28 | 2021-03-09 | Tokyo Ohka Kogyo Co., Ltd. | Surface treatment method, surface treatment agent, and method for forming film region-selectively on substrate |
| EP3735325A4 (en) | 2018-01-05 | 2021-03-03 | FUJIFILM Electronic Materials U.S.A, Inc. | SURFACE TREATMENT COMPOSITIONS AND PROCEDURES |
| KR102084164B1 (ko) * | 2018-03-06 | 2020-05-27 | 에스케이씨 주식회사 | 반도체 공정용 조성물 및 반도체 공정 |
| SG11202009171XA (en) * | 2018-04-05 | 2020-10-29 | Central Glass Co Ltd | Surface treatment method of wafer and composition used for said method |
| US20200035494A1 (en) * | 2018-07-30 | 2020-01-30 | Fujifilm Electronic Materials U.S.A., Inc. | Surface Treatment Compositions and Methods |
| CN113169060B (zh) * | 2018-11-22 | 2025-04-01 | 中央硝子株式会社 | 倒角部处理剂组合物和晶圆的制造方法 |
| KR20220050922A (ko) * | 2019-08-21 | 2022-04-25 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | 표면 처리 조성물 및 방법 |
| JP7574798B2 (ja) * | 2019-08-27 | 2024-10-29 | 株式会社レゾナック | 組成物、及び接着性ポリマーの洗浄方法 |
| JP7446097B2 (ja) * | 2019-12-06 | 2024-03-08 | 東京応化工業株式会社 | 表面処理剤及び表面処理方法 |
| CN115668459B (zh) * | 2020-05-21 | 2025-12-16 | 中央硝子株式会社 | 半导体基板的表面处理方法及表面处理剂组合物 |
| KR20230015959A (ko) * | 2020-05-21 | 2023-01-31 | 샌트랄 글래스 컴퍼니 리미티드 | 반도체 기판의 표면 처리 방법, 및 표면처리제 조성물 |
| JP7701868B2 (ja) * | 2021-12-13 | 2025-07-02 | 東京応化工業株式会社 | 基板表面処理方法、基板表面の領域選択的製膜方法、及び表面処理剤 |
| US20230317464A1 (en) * | 2022-03-31 | 2023-10-05 | Fujifilm Electronic Materials U.S.A., Inc. | Surface Treatment Compositions and Methods |
| US20240101929A1 (en) * | 2022-09-14 | 2024-03-28 | Fujifilm Electronic Materials U.S.A., Inc. | Surface Treatment Compositions and Methods |
| WO2024248021A1 (ja) * | 2023-05-31 | 2024-12-05 | セントラル硝子株式会社 | 膜形成用組成物、基板の製造方法、および膜形成用組成物の製造方法 |
| US20250157825A1 (en) * | 2023-11-13 | 2025-05-15 | Fujifilm Electronic Materials U.S.A., Inc. | Etching methods |
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| JP2017516310A (ja) | 2014-05-12 | 2017-06-15 | 東京エレクトロン株式会社 | フレキシブルなナノ構造の乾燥を改善するための方法及びシステム |
| JP6564312B2 (ja) | 2015-03-31 | 2019-08-21 | 東京応化工業株式会社 | 表面処理方法及び表面処理液 |
| US9703202B2 (en) * | 2015-03-31 | 2017-07-11 | Tokyo Ohka Kogyo Co., Ltd. | Surface treatment process and surface treatment liquid |
| US9976037B2 (en) * | 2015-04-01 | 2018-05-22 | Versum Materials Us, Llc | Composition for treating surface of substrate, method and device |
| JP6592303B2 (ja) * | 2015-08-14 | 2019-10-16 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板洗浄方法および基板洗浄装置 |
| JP6681796B2 (ja) | 2016-06-21 | 2020-04-15 | 東京応化工業株式会社 | シリル化剤溶液、表面処理方法、及び半導体デバイスの製造方法 |
| JP6310583B2 (ja) * | 2017-02-10 | 2018-04-11 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理方法および基板処理装置 |
| CN108250916A (zh) * | 2017-12-29 | 2018-07-06 | 安徽鑫发铝业有限公司 | 一种汽车用铝型材表面处理工艺 |
| EP3735325A4 (en) | 2018-01-05 | 2021-03-03 | FUJIFILM Electronic Materials U.S.A, Inc. | SURFACE TREATMENT COMPOSITIONS AND PROCEDURES |
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2018
- 2018-03-22 KR KR1020197030566A patent/KR102519448B1/ko active Active
- 2018-03-22 WO PCT/US2018/023697 patent/WO2018175682A1/en not_active Ceased
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- 2018-03-22 EP EP18772478.6A patent/EP3602606B1/en active Active
- 2018-03-22 US US15/928,152 patent/US10593538B2/en active Active
- 2018-03-22 CN CN201880019856.XA patent/CN110462525B/zh active Active
- 2018-03-22 CN CN202410395705.1A patent/CN118344845A/zh active Pending
- 2018-03-22 JP JP2019552589A patent/JP7452782B2/ja active Active
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