JP2018140935A - 中程度の付着力および残留強度を有する積層物品 - Google Patents
中程度の付着力および残留強度を有する積層物品 Download PDFInfo
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- JP2018140935A JP2018140935A JP2018084880A JP2018084880A JP2018140935A JP 2018140935 A JP2018140935 A JP 2018140935A JP 2018084880 A JP2018084880 A JP 2018084880A JP 2018084880 A JP2018084880 A JP 2018084880A JP 2018140935 A JP2018140935 A JP 2018140935A
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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Abstract
Description
図1を参照すると、物品100は、対向する主面122、124を有するガラス基板120(ここに記載したように、強化されていても強力であってもよい)、少なくとも1つの対向する主面(122または124)に配置された膜110および膜110とガラス基板120との間に配置された亀裂軽減層130を備えている。1つ以上の代わりの実施の形態において、亀裂軽減層130および膜110は、少なくとも1つの主面(122または124)上に配置されることに加え、またはその代わりに、ガラス基板の副面(minor surface)に配置されていてもよい。ここに用いたように、ガラス基板120は実質的に平らな板であってよいが、他の実施の形態は、湾曲したもしくは別なふうに形成または造形されたガラス基板を利用してもよい。ガラス基板120は、実質的に透き通り、透明であり、光を拡散しないことがある。このガラス基板は、約1.45から約1.55の範囲の屈折率を有することがある。1つ以上の実施の形態において、ガラス基板120は、ここにさらに詳しく記載するように、強化されていても、強力であると特徴付けられてもよい。ガラス基板120は、そのような強化前に、比較的無垢であり、傷を含まないことがある(例えば、表面傷の数が少ない、または平均表面傷サイズが約1マイクロメートル未満である)。強化されたまたは強力なガラス基板120が使用される場合、そのような基板は、そのような基板の1つ以上の対向する主面において、高い平均曲げ強度(強化されていないまたは強力ではないガラス基板と比べて)または高い表面破壊歪み(強化されていないまたは強力ではないガラス基板と比べて)を有すると特徴付けられるであろう。
物品100は、ガラス基板120の表面上、詳しくは亀裂軽減層130上に配置された膜110を備えている。膜110は、ガラス基板120の一方または両方の主面122、124上に配置されてもよい。1つ以上の実施の形態において、膜110は、一方または両方の主面122、124上に配置されることに加えて、またはその代わりに、ガラス基板120の1つ以上の副面(図示せず)上に配置されていてもよい。1つ以上の実施の形態において、膜110は、目に容易に見える巨視的引っ掻き傷または欠陥を含まない。膜110は、ガラス基板120と有効界面140を形成する。
(1)光学干渉効果を最小にするために、ガラス基板120、亀裂軽減層130および/または他の膜または層のいずれかの屈折率と同様の屈折率、
(2)反射防止干渉効果を達成するために調整された屈折率(実および/または虚成分)、および/または
(3)UVまたはIR遮断または反射を達成するため、または着色/色付け効果を達成するためなどの、波長選択的反射効果または波長選択的吸収効果を達成するために調整された屈折率(実および/または虚成分)、
のいずれかを有する材料を膜110に含むことが都合よいであろう。1つ以上の実施の形態において、膜110は、ガラス基板120の屈折率より高いおよび/または亀裂軽減層130の屈折率より高い屈折率を有することがある。1つ以上の実施の形態において、その膜は、約1.7から約2.2の範囲、または約1.4から約1.6の範囲、または約1.6から約1.9の範囲の屈折率を有することがある。
ここに記載されたように、亀裂軽減層は、有効界面140で中程度の付着エネルギーを提供する。亀裂軽減層130は、膜110またはガラス基板120の代わりに亀裂軽減層中への亀裂の逸れを促進する低靭性層を有効界面に形成することによって、中程度の付着エネルギーを提供する。亀裂軽減層130は、低靭性界面を形成することによって、中程度の付着エネルギーを提供することもある。その低靭性界面は、規定荷重の印加の際にガラス基板120または膜110からの亀裂軽減層130の剥離によって特徴付けられる。この剥離により、亀裂が第1の界面150または第2の界面160のいずれかに沿って逸れる。亀裂は、例えば、一方の界面から他方の界面に越えることもある経路にしたがって、第1と第2の界面150および160の組合せに沿って逸れることもある。
実施例1A〜1Eは、61モル%≦SiO2≦75モル%;7モル%≦Al2O3≦15モル%;0モル%≦B2O3≦12モル%;9モル%≦Na2O≦21モル%;0モル%≦K2O≦4モル%;0モル%≦MgO≦7モル%;0モル%≦CaO≦3モル%;および0モル%≦SnO2≦1モル%の組成を有するガラス基板を提供することによって形成した。それらのガラス基板の厚さは0.7mmであった。ガラス基板をイオン交換により強化して、約690MPaの表面圧縮応力(CS)および約24μmの圧縮層の深さ(DOL)を提供した。イオン交換プロセスは、約350℃から450℃の範囲の温度に加熱した溶融硝酸カリウム(KNO3)浴中にガラス基板を浸漬することによって行った。ガラス基板は、3〜8時間の期間に亘りその浴中に浸漬して、前記表面CSおよび前記圧縮DOLを達成した。イオン交換プロセスを完了した後、実施例1A〜1Eのガラス基板を、約50℃の温度を有する、Semiclean KGにより供給された、2%の濃度のKOH清浄液中で洗浄した。
実施例2A〜2Gは、0.7mm厚のイオン交換により強化したアルミノケイ酸塩ガラス基板を提供することによって作製した。このガラス基板は、61モル%≦SiO2≦75モル%;7モル%≦Al2O3≦15モル%;0モル%≦B2O3≦12モル%;9モル%≦Na2O≦21モル%;0モル%≦K2O≦4モル%;0モル%≦MgO≦7モル%;0モル%≦CaO≦3モル%;および0モル%≦SnO2≦1モル%の組成を含んだ。このガラス基板を、3〜8時間に亘り約350〜450℃の温度を有するKNO3溶融塩浴中でイオン交換した。このイオン交換ガラス基板は、約687MPaの表面圧縮応力および約24マイクロメートルのイオン交換層の深さを有した。次いで、ガラス基板を、40〜110kHzで超音波撹拌しながら、約50〜70℃の温度を有するKOH清浄液(1〜4%のSemiclean KG)中で洗浄し、同じ周波数範囲で超音波処理しながら、脱イオン水で濯ぎ、乾燥させた。
実施例3A〜3Bは、1.0mm厚のイオン交換により強化したアルミノケイ酸塩ガラス基板を提供することによって作製した。このガラス基板は、61モル%≦SiO2≦75モル%;7モル%≦Al2O3≦15モル%;0モル%≦B2O3≦12モル%;9モル%≦Na2O≦21モル%;0モル%≦K2O≦4モル%;0モル%≦MgO≦7モル%;0モル%≦CaO≦3モル%;および0モル%≦SnO2≦1モル%の組成を有した。このガラス基板を、3〜8時間に亘り約350〜450℃の温度を有するKNO3溶融塩浴中でイオン交換して、強化ガラス基板を提供した。この強化ガラス基板は、約885MPaの圧縮応力および約42マイクロメートルのイオン交換層の深さを有した。次いで、ガラス基板を、40〜110kHzで超音波撹拌しながら、約50〜70℃の温度を有するKOH清浄液(1〜4%のSemiclean KG)中で洗浄し、同じ周波数範囲で超音波処理しながら、脱イオン水で濯ぎ、乾燥させた。
11 貫通亀裂
12,110 膜
13 片側の逸れ
14 両側の逸れ
16 停止亀裂
18 キンク
100 物品
130 亀裂軽減層
140 有効界面
150 第1の界面
160 第2の界面
Claims (9)
- 積層物品において、
対向する主面を有し、第1の平均破壊歪みを有するガラス基板、
第1の主面上に配置されて、第1の界面を形成する亀裂軽減層であって、厚さが100nm以下であり、ポリマーを含む、亀裂軽減層、および
前記亀裂軽減層上に配置されて、第2の界面を形成する膜であって、前記第1の平均破壊歪みより小さい第2の平均破壊歪みを有する膜、
を備え、
前記第1の界面および前記第2の界面の少なくとも一方が、前記物品が、前記第1の平均破壊歪みと前記第2の平均破壊歪みとの間の歪みレベルで歪んだときに、前記亀裂軽減層の少なくとも一部分が、前記膜または前記ガラス基板から分離するような中程度の付着力を示す、積層物品。 - 前記亀裂軽減層の前記少なくとも一部分が、前記膜から始まる亀裂が該亀裂軽減層に橋渡ししたときに、該膜から、または前記ガラス基板から始まる亀裂が該亀裂軽減層に橋渡ししたときに、該ガラス基板から、分離する、請求項1記載の積層物品。
- 前記亀裂軽減層が、前記ガラス基板および前記膜の一方の破壊靭性の約50%以下である破壊靭性を有する、請求項1または2記載の積層物品。
- 前記ポリマーが、プラズマ重合フルオロポリマー、プラズマ重合炭化水素ポリマー、プラズマ重合シロキサンポリマーおよびプラズマ重合シランポリマーの1つ以上を含むものである、請求項1から3いずれか1項記載の積層物品。
- 前記亀裂軽減層が連続層または不連続層から構成される、請求項1から4いずれか1項記載の積層物品。
- 前記ガラス基板が、アルカリアルミノケイ酸塩ガラス、アルカリ含有ホウケイ酸ガラスおよびアルカリアルミノホウケイ酸塩ガラスの1つから構成され、約500MPa超の圧縮応力および約15μm超の圧縮層の深さを有する、請求項1から5いずれか1項記載の積層物品。
- 積層物品において、
対向する主面を有し、第1の平均破壊歪みを有するガラス基板、
第1の主面上に配置されて、第1の界面を形成する亀裂軽減層であって、厚さが100nm以下であり、ポリマーを含む、亀裂軽減層、および
前記亀裂軽減層上に配置されて、第2の界面を形成する膜であって、前記第1の平均破壊歪みより小さい第2の平均破壊歪みを有する膜、
を備え、
前記第1の界面と前記第2の界面の1つ以上で約4J/m2未満の有効付着エネルギーを示す、積層物品。 - 前記亀裂軽減層が、前記膜から始まる亀裂が該亀裂軽減層に橋渡ししたときに、該膜から、または前記ガラス基板から始まる亀裂が該亀裂軽減層に橋渡ししたときに、該ガラス基板から、少なくとも部分的に剥離する、請求項7記載の積層物品。
- 積層物品において、
対向する主面を有するガラス基板であって、第1の平均破壊歪みを有するガラス基板、
第1の主面上に配置された亀裂軽減層であって、厚さが100nm以下であり、ポリマーを含む、亀裂軽減層、および
前記亀裂軽減層上に配置された膜であって、前記第1の平均破壊歪みより小さい第2の平均破壊歪みを有する膜、
を備え、
前記亀裂軽減層により、前記膜および前記ガラス基板の一方から始まり、該亀裂軽減層に入る亀裂が、該亀裂軽減層内に留まる、積層物品。
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