JP2016136622A - 記憶装置および電子機器 - Google Patents
記憶装置および電子機器 Download PDFInfo
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- JP2016136622A JP2016136622A JP2016004890A JP2016004890A JP2016136622A JP 2016136622 A JP2016136622 A JP 2016136622A JP 2016004890 A JP2016004890 A JP 2016004890A JP 2016004890 A JP2016004890 A JP 2016004890A JP 2016136622 A JP2016136622 A JP 2016136622A
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- transistor
- layer
- oxide semiconductor
- semiconductor layer
- film
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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Abstract
【解決手段】第1の層と、第2の層とのそれぞれが互いに重なる領域を有し、第1の層は、酸化物半導体を活性層とする第1のトランジスタを有し、第2の層は、酸化物半導体を活性層とする第2のトランジスタおよび第3のトランジスタを有し、第1の層に形成されるトランジスタのオフ電流は、第2の層に形成されるトランジスタよりも小さく、第2の層に形成されるトランジスタの電界効果移動度は、第1の層に形成されるトランジスタよりも大きい構成とする。
【選択図】図1
Description
本実施の形態では、本発明の一態様である記憶装置について、図面を参照して説明する。
本実施の形態では、本発明の一態様に用いることのできる酸化物半導体を有するトランジスタについて図面を用いて説明する。なお、本実施の形態における図面では、明瞭化のために一部の要素を拡大、縮小、または省略して図示している。
本実施の形態では、実施の形態2に示したトランジスタの構成要素について詳細を説明する。
以下では、本発明の一態様に用いることのできる酸化物半導体膜の構造について説明する。
本実施の形態では、先の実施の形態で説明した記憶装置を含むCPUについて説明する。
本発明の一態様に係る半導体装置は、表示機器、パーソナルコンピュータ、記録媒体を備えた画像再生装置(代表的にはDVD:Digital Versatile Disc等の記録媒体を再生し、その画像を表示しうるディスプレイを有する装置)に用いることができる。その他に、本発明の一態様に係る半導体装置を用いることができる電子機器として、携帯電話、携帯型を含むゲーム機、携帯データ端末、電子書籍端末、ビデオカメラ、デジタルスチルカメラ等のカメラ、ゴーグル型ディスプレイ(ヘッドマウントディスプレイ)、ナビゲーションシステム、音響再生装置(カーオーディオ、デジタルオーディオプレイヤー等)、複写機、ファクシミリ、プリンタ、プリンタ複合機、現金自動預け入れ払い機(ATM)、自動販売機などが挙げられる。これら電子機器の具体例を図19に示す。
41 絶縁層
44 絶縁層
51 トランジスタ
52 トランジスタ
53 トランジスタ
54 トランジスタ
55 トランジスタ
58 活性層
59 容量素子
71 配線
72 配線
73 配線
74 配線
75 配線
76 配線
80 絶縁層
81 導電体
93 回路
101 トランジスタ
102 トランジスタ
103 トランジスタ
104 トランジスタ
105 トランジスタ
106 トランジスタ
107 トランジスタ
108 トランジスタ
109 トランジスタ
110 トランジスタ
111 トランジスタ
112 トランジスタ
115 基板
120 絶縁層
130 酸化物半導体層
130a 酸化物半導体層
130b 酸化物半導体層
130c 酸化物半導体層
140 導電層
141 導電層
142 導電層
150 導電層
151 導電層
152 導電層
160 絶縁層
170 導電層
171 導電層
172 導電層
173 導電層
175 絶縁層
180 絶縁層
231 領域
232 領域
233 領域
331 領域
332 領域
333 領域
334 領域
335 領域
901 筐体
902 筐体
903 表示部
904 表示部
905 マイクロフォン
906 スピーカー
907 操作キー
908 スタイラス
911 筐体
912 筐体
913 表示部
914 操作キー
915 レンズ
916 接続部
921 筐体
922 表示部
923 キーボード
924 ポインティングデバイス
931 筐体
932 表示部
933 リストバンド
941 筐体
942 表示部
949 カメラ
951 車体
952 車輪
953 ダッシュボード
954 ライト
1189 ROMインターフェース
1190 基板
1191 ALU
1192 ALUコントローラ
1193 インストラクションデコーダ
1194 インタラプトコントローラ
1195 タイミングコントローラ
1196 レジスタ
1197 レジスタコントローラ
1198 バスインターフェース
1199 ROM
1200 記憶素子
1201 回路
1202 回路
1203 スイッチ
1204 スイッチ
1206 論理素子
1207 容量素子
1208 容量素子
1209 トランジスタ
1210 トランジスタ
1213 トランジスタ
1214 トランジスタ
1220 回路
2100 層
2200 層
2300 層
2400 層
Claims (13)
- 第1の層と、第2の層と、を有する記憶装置であって、
前記第1の層は、前記第2の層と重なるように設けられ、
前記第1の層は、酸化物半導体を活性層とする第1のトランジスタを有し、
前記第2の層は、酸化物半導体を活性層とする第2のトランジスタおよび第3のトランジスタを有し、
前記第1のトランジスタのソースまたはドレインの一方は、前記第2のトランジスタのゲートと電気的に接続され、
前記第2のトランジスタのソースまたはドレインの一方は、前記第3のトランジスタのソースまたはドレインの一方と電気的に接続され、
前記第1のトランジスタのオフ電流は、前記第2のトランジスタおよび前記第3のトランジスタよりも小さく、
前記第2のトランジスタおよび前記第3のトランジスタの電界効果移動度は、前記第1のトランジスタよりも大きいことを特徴とする記憶装置。 - 第1の層と、第2の層と、第3の層と、を有する記憶装置であって、
前記第1の層は、酸化物半導体を活性層とする第1のトランジスタを有し、
前記第2の層は、酸化物半導体を活性層とする第2のトランジスタおよび第3のトランジスタを有し、
前記第3の層は、シリコンを活性領域または活性層とする第4のトランジスタを有し、
前記第1のトランジスタのソースまたはドレインの一方は、前記第2のトランジスタのゲートと電気的に接続され、
前記第2のトランジスタのソースまたはドレインの一方は、前記第3のトランジスタのソースまたはドレインの一方と電気的に接続され、
前記第1のトランジスタのオフ電流は、前記第2のトランジスタおよび前記第3のトランジスタよりも小さく、
前記第2のトランジスタおよび前記第3のトランジスタの電界効果移動度は、前記第1のトランジスタよりも大きく、
前記第1のトランジスタ乃至前記第3のトランジスタは、第1の回路の構成要素であり、
前記第4のトランジスタは、第2の回路の構成要素であることを特徴とする記憶装置。 - 請求項1または2において、
前記第1のトランジスタが有する活性層は、前記第2のトランジスタおよび前記第3のトランジスタの活性層よりもバンドギャップが大きいことを特徴とする記憶装置。 - 請求項1乃至3にいずれか一項において、
前記第2のトランジスタおよび前記第3のトランジスタの活性層は、前記第1のトランジスタよりも膜厚が厚いことを特徴とする記憶装置。 - 請求項2乃至4のいずれか一項において、
前記第1の層、前記第2の層、前記第3の層は、
高さ方向に、前記第1の層、前記第2の層、前記第3の層の順で配置される構成、または、前記第2の層、前記第1の層、前記第3の層の順で配置される構成であることを特徴とする記憶装置。 - 第1の層と、第2の層と、第3の層と、を有する記憶装置であって、
前記第1の層は、酸化物半導体を活性層とする第1のトランジスタを有し、
前記第2の層は、酸化物半導体を活性層とする第2のトランジスタ、第3のトランジスタおよび第4のトランジスタを有し、
前記第3の層は、シリコンを活性領域または活性層とする第5のトランジスタを有し、
前記第1のトランジスタのソースまたはドレインの一方は、前記第2のトランジスタのゲートと電気的に接続され、
前記第2のトランジスタのソースまたはドレインの一方は、前記第3のトランジスタのソースまたはドレインの一方と電気的に接続され、
前記第1のトランジスタのオフ電流は、前記第2のトランジスタ乃至前記第4のトランジスタよりも小さく、
前記第2のトランジスタおよび前記第3のトランジスタの電界効果移動度は、前記第1のトランジスタよりも大きく、
前記第1のトランジスタ乃至前記第3のトランジスタは、第1の回路の構成要素であり、
前記第4のトランジスタおよび前記第5のトランジスタは、第2の回路の構成要素であることを特徴とする記憶装置。 - 請求項6において、
前記第1のトランジスタが有する活性層は、前記第2のトランジスタ、前記第3のトランジスタおよび前記第4のトランジスタの活性層よりもバンドギャップが大きいことを特徴とする記憶装置。 - 請求項6または7において、
前記第2のトランジスタ、前記第3のトランジスタおよび前記第4のトランジスタの活性層は、前記第1のトランジスタよりも膜厚が厚いことを特徴とする記憶装置。 - 請求項6乃至8のいずれか一項において、
前記第1の層、前記第2の層、前記第3の層は、
高さ方向に、前記第1の層、前記第2の層、前記第3の層の順で配置される構成、または、前記第2の層、前記第1の層、前記第3の層の順で配置される構成であることを特徴とする記憶装置。 - 請求項1乃至9のいずれか一項において、
前記第1の回路は、信号を保持する機能を有し、前記第2の回路は、前記第1の回路を駆動する機能を有することを特徴とする記憶装置。 - 請求項1乃至10のいずれか一項において、
前記第1のトランジスタのソースまたはドレインの一方は、容量素子の一方の電極と電気的に接続されていることを特徴とする記憶装置。 - 請求項1乃至11のいずれか一項において、
前記酸化物半導体は、InとZnと、M(MはAl、Ti、Ga、Sn、Y、Zr、La、Ce、NdまたはHf)と、を有することを特徴とする記憶装置。 - 請求項1乃至12のいずれか一項に記載の記憶装置と、
表示装置と、
を有することを特徴とする電子機器。
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