JP2012518859A - マスタデバイスを含む積み重ね半導体デバイス - Google Patents

マスタデバイスを含む積み重ね半導体デバイス Download PDF

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JP2012518859A
JP2012518859A JP2011550388A JP2011550388A JP2012518859A JP 2012518859 A JP2012518859 A JP 2012518859A JP 2011550388 A JP2011550388 A JP 2011550388A JP 2011550388 A JP2011550388 A JP 2011550388A JP 2012518859 A JP2012518859 A JP 2012518859A
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chip
volatile memory
area
memory chip
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JP2012518859A5 (enExample
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ジン−キ・キム
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Mosaid Technologies Inc
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Conversant Intellectual Property Management Inc
Mosaid Technologies Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
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    • G11C5/06Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/06Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/063Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/30Power supply circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
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    • H01L2224/02Bonding areas; Manufacturing methods related thereto
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    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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    • H01L2225/04All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
JP2011550388A 2009-02-24 2010-02-12 マスタデバイスを含む積み重ね半導体デバイス Pending JP2012518859A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US15491009P 2009-02-24 2009-02-24
US61/154,910 2009-02-24
US12/429,310 2009-04-24
US12/429,310 US7894230B2 (en) 2009-02-24 2009-04-24 Stacked semiconductor devices including a master device
PCT/CA2010/000195 WO2010096901A1 (en) 2009-02-24 2010-02-12 Stacked semiconductor devices including a master device

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JP2013214655A Division JP2014057077A (ja) 2009-02-24 2013-10-15 マスタデバイスを含む積み重ね半導体デバイス

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JP2012518859A true JP2012518859A (ja) 2012-08-16
JP2012518859A5 JP2012518859A5 (enExample) 2013-03-14

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JP2011550388A Pending JP2012518859A (ja) 2009-02-24 2010-02-12 マスタデバイスを含む積み重ね半導体デバイス
JP2013214655A Pending JP2014057077A (ja) 2009-02-24 2013-10-15 マスタデバイスを含む積み重ね半導体デバイス

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US (4) US7894230B2 (enExample)
EP (1) EP2401745A1 (enExample)
JP (2) JP2012518859A (enExample)
KR (1) KR20110121671A (enExample)
CN (2) CN104332179A (enExample)
DE (1) DE112010000880T5 (enExample)
TW (1) TW201101464A (enExample)
WO (1) WO2010096901A1 (enExample)

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JP2014501016A (ja) * 2010-11-23 2014-01-16 モサイド・テクノロジーズ・インコーポレーテッド 集積回路デバイス内の内部電源を共有するための方法および装置
JP2016504701A (ja) * 2012-11-19 2016-02-12 シリコン ストーリッジ テクノロージー インコーポレイテッドSilicon Storage Technology, Inc. 三次元フラッシュメモリシステム
JP2016528719A (ja) * 2013-06-26 2016-09-15 インテル・コーポレーション マルチダイアセンブリにおける電力管理
JP2017502444A (ja) * 2013-12-02 2017-01-19 シリコン ストーリッジ テクノロージー インコーポレイテッドSilicon Storage Technology, Inc. 構成可能なピンを備える三次元フラッシュnorメモリシステム

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US7894230B2 (en) * 2009-02-24 2011-02-22 Mosaid Technologies Incorporated Stacked semiconductor devices including a master device
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JP2012146377A (ja) * 2011-01-14 2012-08-02 Elpida Memory Inc 半導体装置
JP5647026B2 (ja) * 2011-02-02 2014-12-24 ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. 半導体装置及びその製造方法
US9432298B1 (en) 2011-12-09 2016-08-30 P4tents1, LLC System, method, and computer program product for improving memory systems
KR20120122549A (ko) 2011-04-29 2012-11-07 에스케이하이닉스 주식회사 반도체 메모리 장치 및 그의 리페어 방법
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KR20140008766A (ko) * 2012-07-11 2014-01-22 에스케이하이닉스 주식회사 반도체메모리장치
US20150019802A1 (en) * 2013-07-11 2015-01-15 Qualcomm Incorporated Monolithic three dimensional (3d) random access memory (ram) array architecture with bitcell and logic partitioning
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