WO1999023693A1
(en)
*
|
1997-10-30 |
1999-05-14 |
Sumitomo Electric Industries, Ltd. |
GaN SINGLE CRYSTALLINE SUBSTRATE AND METHOD OF PRODUCING THE SAME
|
US20110163323A1
(en)
*
|
1997-10-30 |
2011-07-07 |
Sumitomo Electric Industires, Ltd. |
GaN SINGLE CRYSTAL SUBSTRATE AND METHOD OF MAKING THE SAME
|
CN1174359C
(zh)
*
|
1999-03-04 |
2004-11-03 |
三星电子株式会社 |
反射型液晶显示器及其制造方法
|
JP3550070B2
(ja)
*
|
1999-03-23 |
2004-08-04 |
三菱電線工業株式会社 |
GaN系化合物半導体結晶、その成長方法及び半導体基材
|
JP3702700B2
(ja)
*
|
1999-03-31 |
2005-10-05 |
豊田合成株式会社 |
Iii族窒化物系化合物半導体素子及びその製造方法
|
JP3555500B2
(ja)
*
|
1999-05-21 |
2004-08-18 |
豊田合成株式会社 |
Iii族窒化物半導体及びその製造方法
|
JP2001168028A
(ja)
*
|
1999-12-03 |
2001-06-22 |
Sony Corp |
窒化物系iii−v族化合物の結晶製造方法、窒化物系iii−v族化合物結晶基板、窒化物系iii−v族化合物結晶膜およびデバイスの製造方法
|
US6566231B2
(en)
*
|
2000-02-24 |
2003-05-20 |
Matsushita Electric Industrial Co., Ltd. |
Method of manufacturing high performance semiconductor device with reduced lattice defects in the active region
|
JP2003526203A
(ja)
*
|
2000-03-02 |
2003-09-02 |
アイクストロン、アーゲー |
III族−N、(III−V)族−Nおよび金属−窒素の所定成分による層構造をSi基板上に作成する方法および装置
|
US6627974B2
(en)
|
2000-06-19 |
2003-09-30 |
Nichia Corporation |
Nitride semiconductor substrate and method for manufacturing the same, and nitride semiconductor device using nitride semiconductor substrate
|
US6841808B2
(en)
*
|
2000-06-23 |
2005-01-11 |
Toyoda Gosei Co., Ltd. |
Group III nitride compound semiconductor device and method for producing the same
|
JP2002222771A
(ja)
*
|
2000-11-21 |
2002-08-09 |
Ngk Insulators Ltd |
Iii族窒化物膜の製造方法、iii族窒化物膜の製造用下地膜、及びその下地膜の製造方法
|
US6864158B2
(en)
*
|
2001-01-29 |
2005-03-08 |
Matsushita Electric Industrial Co., Ltd. |
Method of manufacturing nitride semiconductor substrate
|
JP3679720B2
(ja)
*
|
2001-02-27 |
2005-08-03 |
三洋電機株式会社 |
窒化物系半導体素子および窒化物系半導体の形成方法
|
JP3690340B2
(ja)
|
2001-03-06 |
2005-08-31 |
ソニー株式会社 |
半導体発光素子及びその製造方法
|
US6562701B2
(en)
*
|
2001-03-23 |
2003-05-13 |
Matsushita Electric Industrial Co., Ltd. |
Method of manufacturing nitride semiconductor substrate
|
JP4055503B2
(ja)
*
|
2001-07-24 |
2008-03-05 |
日亜化学工業株式会社 |
半導体発光素子
|
JP2003077847A
(ja)
*
|
2001-09-06 |
2003-03-14 |
Sumitomo Chem Co Ltd |
3−5族化合物半導体の製造方法
|
US6967359B2
(en)
*
|
2001-09-13 |
2005-11-22 |
Japan Science And Technology Agency |
Nitride semiconductor substrate production method thereof and semiconductor optical device using the same
|
TWI285918B
(en)
|
2002-01-11 |
2007-08-21 |
Sumitomo Chemical Co |
Method of producing 3-5 group compound semiconductor and semiconductor element
|
US6890785B2
(en)
*
|
2002-02-27 |
2005-05-10 |
Sony Corporation |
Nitride semiconductor, semiconductor device, and manufacturing methods for the same
|
JP3997827B2
(ja)
*
|
2002-04-30 |
2007-10-24 |
住友電気工業株式会社 |
窒化ガリウム成長用基板及び窒化ガリウム成長用基板の製造方法並びに窒化ガリウム基板の製造方法
|
US6998305B2
(en)
|
2003-01-24 |
2006-02-14 |
Asm America, Inc. |
Enhanced selectivity for epitaxial deposition
|
KR100504180B1
(ko)
*
|
2003-01-29 |
2005-07-28 |
엘지전자 주식회사 |
질화물 화합물 반도체의 결정성장 방법
|
JP3966207B2
(ja)
*
|
2003-03-28 |
2007-08-29 |
豊田合成株式会社 |
半導体結晶の製造方法及び半導体発光素子
|
JP3821232B2
(ja)
*
|
2003-04-15 |
2006-09-13 |
日立電線株式会社 |
エピタキシャル成長用多孔質基板およびその製造方法ならびにiii族窒化物半導体基板の製造方法
|
JP4757634B2
(ja)
*
|
2003-04-28 |
2011-08-24 |
パナソニック株式会社 |
半導体発光素子およびその製造方法
|
EP1667241B1
(en)
*
|
2003-08-19 |
2016-12-07 |
Nichia Corporation |
Semiconductor light emitting diode and method of manufacturing the same
|
JP4380294B2
(ja)
*
|
2003-10-29 |
2009-12-09 |
日立電線株式会社 |
Iii−v族窒化物系半導体基板
|
JP2005136200A
(ja)
*
|
2003-10-30 |
2005-05-26 |
Univ Nagoya |
窒化物半導体結晶層の作製方法、窒化物半導体結晶層、及び窒化物半導体結晶層作製用の基材
|
US20050110040A1
(en)
*
|
2003-11-26 |
2005-05-26 |
Hui Peng |
Texture for localizing and minimizing effects of lattice constants mismatch
|
US7276423B2
(en)
*
|
2003-12-05 |
2007-10-02 |
International Rectifier Corporation |
III-nitride device and method with variable epitaxial growth direction
|
KR100568300B1
(ko)
*
|
2004-03-31 |
2006-04-05 |
삼성전기주식회사 |
질화물 반도체 발광소자 및 그 제조방법
|
JP4661088B2
(ja)
*
|
2004-06-01 |
2011-03-30 |
住友化学株式会社 |
pn接合を有する化合物半導体基板の製造方法
|
JP3833674B2
(ja)
*
|
2004-06-08 |
2006-10-18 |
松下電器産業株式会社 |
窒化物半導体レーザ素子
|
JP5015417B2
(ja)
*
|
2004-06-09 |
2012-08-29 |
住友電気工業株式会社 |
GaN結晶の製造方法
|
JP4140606B2
(ja)
*
|
2005-01-11 |
2008-08-27 |
ソニー株式会社 |
GaN系半導体発光素子の製造方法
|
WO2006125040A2
(en)
*
|
2005-05-17 |
2006-11-23 |
Amberwave Systems Corporation |
Lattice-mismatched semiconductor structures with reduced dislocation defect densities related methods for device fabrication
|
US9153645B2
(en)
|
2005-05-17 |
2015-10-06 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
|
US20070267722A1
(en)
*
|
2006-05-17 |
2007-11-22 |
Amberwave Systems Corporation |
Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
|
US8324660B2
(en)
|
2005-05-17 |
2012-12-04 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
|
KR101329388B1
(ko)
*
|
2005-07-26 |
2013-11-14 |
앰버웨이브 시스템즈 코포레이션 |
다른 액티브 영역 물질의 집적회로 집적을 위한 솔루션
|
JP4656410B2
(ja)
*
|
2005-09-05 |
2011-03-23 |
住友電気工業株式会社 |
窒化物半導体デバイスの製造方法
|
US7638842B2
(en)
*
|
2005-09-07 |
2009-12-29 |
Amberwave Systems Corporation |
Lattice-mismatched semiconductor structures on insulators
|
US20070054467A1
(en)
*
|
2005-09-07 |
2007-03-08 |
Amberwave Systems Corporation |
Methods for integrating lattice-mismatched semiconductor structure on insulators
|
JP4462249B2
(ja)
|
2005-09-22 |
2010-05-12 |
ソニー株式会社 |
発光ダイオードの製造方法、集積型発光ダイオードの製造方法および窒化物系iii−v族化合物半導体の成長方法
|
TW200735418A
(en)
|
2005-11-22 |
2007-09-16 |
Rohm Co Ltd |
Nitride semiconductor device
|
JP4631681B2
(ja)
*
|
2005-12-05 |
2011-02-16 |
日立電線株式会社 |
窒化物系半導体基板及び半導体装置
|
TWI519686B
(zh)
*
|
2005-12-15 |
2016-02-01 |
聖戈班晶體探測器公司 |
低差排密度氮化鎵(GaN)之生長方法
|
US8013320B2
(en)
*
|
2006-03-03 |
2011-09-06 |
Panasonic Corporation |
Nitride semiconductor device and method for fabricating the same
|
GB2436398B
(en)
*
|
2006-03-23 |
2011-08-24 |
Univ Bath |
Growth method using nanostructure compliant layers and HVPE for producing high quality compound semiconductor materials
|
WO2007112066A2
(en)
*
|
2006-03-24 |
2007-10-04 |
Amberwave Systems Corporation |
Lattice-mismatched semiconductor structures and related methods for device fabrication
|
US8278176B2
(en)
|
2006-06-07 |
2012-10-02 |
Asm America, Inc. |
Selective epitaxial formation of semiconductor films
|
WO2008030574A1
(en)
|
2006-09-07 |
2008-03-13 |
Amberwave Systems Corporation |
Defect reduction using aspect ratio trapping
|
WO2008036256A1
(en)
*
|
2006-09-18 |
2008-03-27 |
Amberwave Systems Corporation |
Aspect ratio trapping for mixed signal applications
|
US7799592B2
(en)
*
|
2006-09-27 |
2010-09-21 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Tri-gate field-effect transistors formed by aspect ratio trapping
|
US7875958B2
(en)
|
2006-09-27 |
2011-01-25 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Quantum tunneling devices and circuits with lattice-mismatched semiconductor structures
|
US20080187018A1
(en)
|
2006-10-19 |
2008-08-07 |
Amberwave Systems Corporation |
Distributed feedback lasers formed via aspect ratio trapping
|
US9064706B2
(en)
|
2006-11-17 |
2015-06-23 |
Sumitomo Electric Industries, Ltd. |
Composite of III-nitride crystal on laterally stacked substrates
|
JP5332168B2
(ja)
*
|
2006-11-17 |
2013-11-06 |
住友電気工業株式会社 |
Iii族窒化物結晶の製造方法
|
US20080132081A1
(en)
*
|
2006-12-04 |
2008-06-05 |
Shaheen Mohamad A |
Thin III-V semiconductor films with high electron mobility
|
GB0701069D0
(en)
*
|
2007-01-19 |
2007-02-28 |
Univ Bath |
Nanostructure template and production of semiconductors using the template
|
EP2126963A4
(en)
*
|
2007-03-16 |
2011-03-16 |
Sebastian Lourdudoss |
SEMICONDUCTOR HETEROSTRUCTURES AND MANUFACTURE THEREOF
|
US8237151B2
(en)
|
2009-01-09 |
2012-08-07 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Diode-based devices and methods for making the same
|
WO2008124154A2
(en)
|
2007-04-09 |
2008-10-16 |
Amberwave Systems Corporation |
Photovoltaics on silicon
|
US7825328B2
(en)
|
2007-04-09 |
2010-11-02 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Nitride-based multi-junction solar cell modules and methods for making the same
|
US8304805B2
(en)
|
2009-01-09 |
2012-11-06 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Semiconductor diodes fabricated by aspect ratio trapping with coalesced films
|
US8329541B2
(en)
*
|
2007-06-15 |
2012-12-11 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
InP-based transistor fabrication
|
KR101093588B1
(ko)
|
2007-09-07 |
2011-12-15 |
타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 |
멀티-정션 솔라 셀
|
US7759199B2
(en)
*
|
2007-09-19 |
2010-07-20 |
Asm America, Inc. |
Stressor for engineered strain on channel
|
US8652947B2
(en)
*
|
2007-09-26 |
2014-02-18 |
Wang Nang Wang |
Non-polar III-V nitride semiconductor and growth method
|
US7790566B2
(en)
*
|
2008-03-19 |
2010-09-07 |
International Business Machines Corporation |
Semiconductor surface treatment for epitaxial growth
|
US8183667B2
(en)
|
2008-06-03 |
2012-05-22 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Epitaxial growth of crystalline material
|
US8274097B2
(en)
|
2008-07-01 |
2012-09-25 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Reduction of edge effects from aspect ratio trapping
|
US8981427B2
(en)
|
2008-07-15 |
2015-03-17 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Polishing of small composite semiconductor materials
|
CN102160145B
(zh)
|
2008-09-19 |
2013-08-21 |
台湾积体电路制造股份有限公司 |
通过外延层过成长的元件形成
|
US20100072515A1
(en)
*
|
2008-09-19 |
2010-03-25 |
Amberwave Systems Corporation |
Fabrication and structures of crystalline material
|
US8253211B2
(en)
|
2008-09-24 |
2012-08-28 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Semiconductor sensor structures with reduced dislocation defect densities
|
JP5705207B2
(ja)
*
|
2009-04-02 |
2015-04-22 |
台湾積體電路製造股▲ふん▼有限公司Taiwan Semiconductor Manufacturing Company,Ltd. |
結晶物質の非極性面から形成される装置とその製作方法
|
US8507304B2
(en)
|
2009-07-17 |
2013-08-13 |
Applied Materials, Inc. |
Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)
|
US20110027973A1
(en)
*
|
2009-07-31 |
2011-02-03 |
Applied Materials, Inc. |
Method of forming led structures
|
US8148241B2
(en)
*
|
2009-07-31 |
2012-04-03 |
Applied Materials, Inc. |
Indium surfactant assisted HVPE of high quality gallium nitride and gallium nitride alloy films
|
US8436362B2
(en)
|
2009-08-24 |
2013-05-07 |
Micron Technology, Inc. |
Solid state lighting devices with selected thermal expansion and/or surface characteristics, and associated methods
|
SG169921A1
(en)
*
|
2009-09-18 |
2011-04-29 |
Taiwan Semiconductor Mfg |
Improved fabrication and structures of crystalline material
|
DE102009047881B4
(de)
|
2009-09-30 |
2022-03-03 |
OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung |
Verfahren zur Herstellung einer epitaktisch hergestellten Schichtstruktur
|
US9601328B2
(en)
*
|
2009-10-08 |
2017-03-21 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Growing a III-V layer on silicon using aligned nano-scale patterns
|
US8367528B2
(en)
*
|
2009-11-17 |
2013-02-05 |
Asm America, Inc. |
Cyclical epitaxial deposition and etch
|
US8203153B2
(en)
*
|
2010-01-15 |
2012-06-19 |
Koninklijke Philips Electronics N.V. |
III-V light emitting device including a light extracting structure
|
JP2012033708A
(ja)
*
|
2010-07-30 |
2012-02-16 |
Sumitomo Electric Ind Ltd |
半導体装置の製造方法
|
JP5696543B2
(ja)
|
2011-03-17 |
2015-04-08 |
セイコーエプソン株式会社 |
半導体基板の製造方法
|
US8809170B2
(en)
|
2011-05-19 |
2014-08-19 |
Asm America Inc. |
High throughput cyclical epitaxial deposition and etch process
|
US9142400B1
(en)
|
2012-07-17 |
2015-09-22 |
Stc.Unm |
Method of making a heteroepitaxial layer on a seed area
|
JP2014056879A
(ja)
|
2012-09-11 |
2014-03-27 |
Rohm Co Ltd |
半導体発光素子
|
JP5296255B1
(ja)
*
|
2012-11-21 |
2013-09-25 |
株式会社東芝 |
窒化物半導体素子、窒化物半導体ウェーハ及び窒化物半導体層の形成方法
|
US20140158976A1
(en)
*
|
2012-12-06 |
2014-06-12 |
Sansaptak DASGUPTA |
Iii-n semiconductor-on-silicon structures and techniques
|
US9574135B2
(en)
*
|
2013-08-22 |
2017-02-21 |
Nanoco Technologies Ltd. |
Gas phase enhancement of emission color quality in solid state LEDs
|
JP6573154B2
(ja)
|
2014-06-05 |
2019-09-11 |
パナソニックIpマネジメント株式会社 |
窒化物半導体構造、窒化物半導体構造を備えた電子デバイス、窒化物半導体構造を備えた発光デバイス、および窒化物半導体構造を製造する方法
|
JP2016062956A
(ja)
|
2014-09-16 |
2016-04-25 |
アイシン精機株式会社 |
基板及びその製造方法、半導体素子及びその製造方法、並びにレーザ加工装置
|
DE102014116999A1
(de)
*
|
2014-11-20 |
2016-05-25 |
Osram Opto Semiconductors Gmbh |
Verfahren zur Herstellung eines optoelektronischen Halbleiterchips und optoelektronischer Halbleiterchip
|
KR102523231B1
(ko)
|
2015-02-23 |
2023-04-18 |
미쯔비시 케미컬 주식회사 |
C 면 GaN 기판
|
WO2016136547A1
(ja)
|
2015-02-23 |
2016-09-01 |
三菱化学株式会社 |
C面GaN基板
|
US9779935B1
(en)
*
|
2016-04-05 |
2017-10-03 |
Infineon Technologies Austria Ag |
Semiconductor substrate with stress relief regions
|
US10734255B2
(en)
*
|
2016-05-25 |
2020-08-04 |
Tokyo Electron Limited |
Substrate cleaning method, substrate cleaning system and memory medium
|
CN111312800B
(zh)
|
2018-12-12 |
2023-03-28 |
联华电子股份有限公司 |
具有外延层的半导体结构及其制作方法
|