JP2008032335A - ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法 - Google Patents

ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法 Download PDF

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Publication number
JP2008032335A
JP2008032335A JP2006207774A JP2006207774A JP2008032335A JP 2008032335 A JP2008032335 A JP 2008032335A JP 2006207774 A JP2006207774 A JP 2006207774A JP 2006207774 A JP2006207774 A JP 2006207774A JP 2008032335 A JP2008032335 A JP 2008032335A
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Japan
Prior art keywords
housing
pressure
chamber
clean
measuring means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006207774A
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English (en)
Japanese (ja)
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JP2008032335A5 (enExample
Inventor
Takahiro Jingu
孝広 神宮
Yusuke Miyazaki
祐輔 宮▲崎▼
Kazuhiro Zama
一浩 座間
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Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2006207774A priority Critical patent/JP2008032335A/ja
Priority to US11/882,063 priority patent/US7925390B2/en
Publication of JP2008032335A publication Critical patent/JP2008032335A/ja
Publication of JP2008032335A5 publication Critical patent/JP2008032335A5/ja
Priority to US13/040,350 priority patent/US20110153114A1/en
Pending legal-status Critical Current

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F11/00Control or safety arrangements
    • F24F11/30Control or safety arrangements for purposes related to the operation of the system, e.g. for safety or monitoring
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F11/00Control or safety arrangements
    • F24F11/70Control systems characterised by their outputs; Constructional details thereof
    • F24F11/72Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure
    • F24F11/74Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure for controlling air flow rate or air velocity
    • F24F11/77Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure for controlling air flow rate or air velocity by controlling the speed of ventilators
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F2110/00Control inputs relating to air properties
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F2110/00Control inputs relating to air properties
    • F24F2110/40Pressure, e.g. wind pressure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B30/00Energy efficient heating, ventilation or air conditioning [HVAC]
    • Y02B30/70Efficient control or regulation technologies, e.g. for control of refrigerant flow, motor or heating

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Ventilation (AREA)
JP2006207774A 2006-07-31 2006-07-31 ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法 Pending JP2008032335A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006207774A JP2008032335A (ja) 2006-07-31 2006-07-31 ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法
US11/882,063 US7925390B2 (en) 2006-07-31 2007-07-30 Mini environment apparatus, inspection apparatus, manufacturing apparatus and cleaning method of space
US13/040,350 US20110153114A1 (en) 2006-07-31 2011-03-04 Mini Environment Apparatus, Inspection Apparatus, Manufacturing Apparatus and Cleaning Method of Space

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006207774A JP2008032335A (ja) 2006-07-31 2006-07-31 ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012118914A Division JP5385425B2 (ja) 2012-05-24 2012-05-24 検査装置及びミニエンバイロメント構造

Publications (2)

Publication Number Publication Date
JP2008032335A true JP2008032335A (ja) 2008-02-14
JP2008032335A5 JP2008032335A5 (enExample) 2008-12-04

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JP2006207774A Pending JP2008032335A (ja) 2006-07-31 2006-07-31 ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法

Country Status (2)

Country Link
US (2) US7925390B2 (enExample)
JP (1) JP2008032335A (enExample)

Cited By (7)

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JP2010092950A (ja) * 2008-10-06 2010-04-22 Hitachi High-Technologies Corp 試料測定装置
JP2012149817A (ja) * 2011-01-19 2012-08-09 Nippon Spindle Mfg Co Ltd 温調装置
CN107101346A (zh) * 2017-06-19 2017-08-29 芜湖美智空调设备有限公司 室外风机控制方法、空调器以及计算机可读存储介质
JP2018011448A (ja) * 2016-07-14 2018-01-18 Ckd株式会社 アクチュエータ
JP2019134678A (ja) * 2019-04-24 2019-08-08 Ckd株式会社 アクチュエータ
JP2021158222A (ja) * 2020-03-27 2021-10-07 国立研究開発法人産業技術総合研究所 カプセル化クリーンルームシステム
WO2024142563A1 (ja) * 2022-12-27 2024-07-04 株式会社Sumco 半導体ウェーハの処理装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008032335A (ja) * 2006-07-31 2008-02-14 Hitachi High-Technologies Corp ミニエンバイロメント装置、検査装置、製造装置、及び空間の清浄化方法
JP5056143B2 (ja) * 2007-04-25 2012-10-24 ダイキン工業株式会社 ファン制御システム
JP2009002634A (ja) * 2007-06-25 2009-01-08 Unitec Inc ユニット型クリーンルーム
US8202145B2 (en) * 2009-03-20 2012-06-19 Maintainer Corporation Of Iowa Service truck body pressurized storage system
JP5085716B2 (ja) * 2010-11-02 2012-11-28 株式会社東芝 サーバ室管理用の空調システム、およびこれを利用したサーバ管理用システム、空調制御方法
US8834582B2 (en) * 2011-12-26 2014-09-16 Beijing Sevenstar Electronics Co., Ltd. Apparatus for manufacturing semiconductor wafer
CN103177985B (zh) * 2011-12-26 2016-08-03 北京七星华创电子股份有限公司 半导体晶圆制造装置
US10646734B2 (en) * 2014-05-05 2020-05-12 Wayne Fueling Systems Sweden Ab Purge and pressurization system with feedback control
CN105135603A (zh) * 2015-08-12 2015-12-09 武汉华星光电技术有限公司 腔室气流控制系统及方法
DE102018106751B4 (de) * 2017-07-31 2025-02-27 Taiwan Semiconductor Manufacturing Co. Ltd. Automatisiertes inspektionswerkzeug
KR102385366B1 (ko) 2017-09-20 2022-04-08 삼성전자주식회사 반도체 제조 설비의 제어 시스템 및 방법과, 이를 이용한 집적 회로의 제조 방법 및 프로세서의 제조 방법
CN109855205A (zh) * 2018-12-07 2019-06-07 青岛海尔空调器有限总公司 空调自清洁控制的方法、装置及计算机存储介质
CN114247225B (zh) * 2021-11-17 2023-05-16 江苏百维能源科技有限公司 一种电能计量器具柜
BE1031344B1 (nl) * 2023-02-15 2024-09-16 Abn Cleanroom Tech N V Inrichting en werkwijze voor het ventileren van een klimaatkamer

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JP2006125812A (ja) * 2004-09-29 2006-05-18 Matsushita Electric Ind Co Ltd クリーンルーム設備及びクリーンルームの室圧制御方法

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JP2010092950A (ja) * 2008-10-06 2010-04-22 Hitachi High-Technologies Corp 試料測定装置
JP2012149817A (ja) * 2011-01-19 2012-08-09 Nippon Spindle Mfg Co Ltd 温調装置
JP2018011448A (ja) * 2016-07-14 2018-01-18 Ckd株式会社 アクチュエータ
CN107101346A (zh) * 2017-06-19 2017-08-29 芜湖美智空调设备有限公司 室外风机控制方法、空调器以及计算机可读存储介质
JP2019134678A (ja) * 2019-04-24 2019-08-08 Ckd株式会社 アクチュエータ
JP2021158222A (ja) * 2020-03-27 2021-10-07 国立研究開発法人産業技術総合研究所 カプセル化クリーンルームシステム
JP7410565B2 (ja) 2020-03-27 2024-01-10 国立研究開発法人産業技術総合研究所 カプセル化クリーンルームシステム
WO2024142563A1 (ja) * 2022-12-27 2024-07-04 株式会社Sumco 半導体ウェーハの処理装置

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