JP2007525736A - インサイチュ式フロー検証及び較正システム及び方法 - Google Patents
インサイチュ式フロー検証及び較正システム及び方法 Download PDFInfo
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- 238000012795 verification Methods 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000011065 in-situ storage Methods 0.000 title claims abstract description 20
- 238000004891 communication Methods 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 2
- 230000006870 function Effects 0.000 abstract description 4
- 238000012546 transfer Methods 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 67
- 230000008859 change Effects 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 238000009530 blood pressure measurement Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000010200 validation analysis Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/17—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters using calibrated reservoirs
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/0092—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume for metering by volume
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/15—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
- Measuring Volume Flow (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (20)
- フロー制御装置のインサイチュ検証及び較正のためのシステムであって、
フロー検証装置と、
前記フロー制御装置を前記フロー検証装置に接続する第1のネットワーク物理層と、
前記フロー検証装置に接続された第2のネットワーク物理層と、
を備えており、前記フロー検証装置のコントローラは、前記第1のネットワーク物理層上の前記フロー制御装置を、前記第2のネットワーク物理層を通じて提供される単一のコマンドに基づいて検証し、必要であれば、較正するようにプログラムされていることを特徴とするシステム。 - 請求項1記載のシステムにおいて、前記第1のネットワーク物理層は、EtherNet/IPネットワーク物理層を含むことを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記第2のネットワーク物理層は、DeviceNetTMデバイスネット・ネットワーク物理層を含むことを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記フロー検証装置は上昇率フロー検証装置であることを特徴とするシステム。
- 請求項4記載のシステムにおいて、前記フロー検証装置はGBRORTMインサイチュ・フロー検証装置であることを特徴とするシステム。
- 請求項4記載のシステムにおいて、前記フロー検証装置はTru-FloTMインサイチュ・フロー検証装置であることを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記第1のネットワーク物理層に接続されたフロー制御装置を更に備えていることを特徴とするシステム。
- 請求項7記載のシステムにおいて、前記フロー制御装置は圧力非感知型の質量流量コントローラを備えていることを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記第1のネットワーク物理層に接続されたハブを更に備えていることを特徴とするシステム。
- 請求項9記載のシステムにおいて、前記ハブはBlueBoxTM通信マネジャを含むことを特徴とするシステム。
- フロー制御装置のインサイチュ検証及び較正のための方法であって、
フロー検証装置を第1のネットワーク物理層を介して前記フロー制御装置に接続するステップと、
第2のネットワーク物理層を前記フロー検証装置に接続するステップと、
前記フロー検証装置のコントローラを、前記第1のネットワーク物理層上の前記フロー制御装置を前記第2のネットワーク物理層を通じて提供される単一のコマンドに基づいて検証し、必要であれば、較正するようにプログラムするステップと、
を含むことを特徴とする方法。 - 請求項11記載の方法において、前記第1のネットワーク物理層は、EtherNet/IPネットワーク物理層を含むことを特徴とする方法。
- 請求項11記載の方法において、前記第2のネットワーク物理層は、DeviceNetTMネットワーク物理層を含むことを特徴とする方法。
- 請求項11記載の方法において、前記フロー検証装置は上昇率フロー検証装置であることを特徴とする方法。
- 請求項14記載の方法において、前記フロー検証装置はGBRORTMインサイチュ・フロー検証装置であることを特徴とする方法。
- 請求項14記載の方法において、前記フロー検証装置はTru-FloTMインサイチュ・フロー検証装置であることを特徴とする方法。
- 請求項11記載の方法において、前記フロー制御装置は圧力非感知型の質量流量コントローラを備えていることを特徴とする方法。
- 請求項11記載の方法において、ハブを前記第1のネットワーク物理層に接続するステップを更に含むことを特徴とする方法。
- 請求項18記載の方法において、前記ハブはBlueBoxTM通信マネジャを含むことを特徴とする方法。
- 請求項11記載の方法において、前記フロー検証装置は、気体マニフォルドを介して前記フロー制御装置と流体通信関係に配置されることを特徴とする方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US10/603,946 US6955072B2 (en) | 2003-06-25 | 2003-06-25 | System and method for in-situ flow verification and calibration |
PCT/US2004/016142 WO2005006390A2 (en) | 2003-06-25 | 2004-05-24 | System and method for in-situ flow verification and calibration |
Publications (2)
Publication Number | Publication Date |
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JP2007525736A true JP2007525736A (ja) | 2007-09-06 |
JP4537393B2 JP4537393B2 (ja) | 2010-09-01 |
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JP2006517136A Expired - Fee Related JP4537393B2 (ja) | 2003-06-25 | 2004-05-24 | インサイチュ式フロー検証及び較正システム及び方法 |
Country Status (7)
Country | Link |
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US (1) | US6955072B2 (ja) |
JP (1) | JP4537393B2 (ja) |
KR (1) | KR101076833B1 (ja) |
CN (1) | CN100394149C (ja) |
DE (1) | DE112004001142B4 (ja) |
GB (1) | GB2418260B (ja) |
WO (1) | WO2005006390A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012248193A (ja) * | 2011-05-26 | 2012-12-13 | Spts Technologies Ltd | マスフローコントローラーの監視 |
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- 2004-05-24 GB GB0526353A patent/GB2418260B/en not_active Expired - Fee Related
- 2004-05-24 DE DE112004001142.6T patent/DE112004001142B4/de not_active Expired - Fee Related
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JP2003501637A (ja) * | 1999-05-26 | 2003-01-14 | サイバー・インストゥルメンツ・テクノロジー・リミテッド・ライアビリティ・カンパニー | リアルタイムの流量測定と修正が可能な広範囲ガス流動システム |
JP2003504748A (ja) * | 1999-07-09 | 2003-02-04 | ミリポール・コーポレイシヨン | デジタル質量流量コントローラの動作のためのシステムおよび方法 |
JP2004510225A (ja) * | 2000-09-20 | 2004-04-02 | ファガシティ コーポレーション | 流体質量流量コントローラおよびその操作方法 |
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JP2012248193A (ja) * | 2011-05-26 | 2012-12-13 | Spts Technologies Ltd | マスフローコントローラーの監視 |
Also Published As
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WO2005006390A3 (en) | 2005-07-21 |
US20040261492A1 (en) | 2004-12-30 |
GB2418260A (en) | 2006-03-22 |
GB0526353D0 (en) | 2006-02-01 |
KR101076833B1 (ko) | 2011-10-25 |
US6955072B2 (en) | 2005-10-18 |
CN1829903A (zh) | 2006-09-06 |
GB2418260B (en) | 2006-12-13 |
WO2005006390A2 (en) | 2005-01-20 |
DE112004001142B4 (de) | 2018-04-12 |
JP4537393B2 (ja) | 2010-09-01 |
CN100394149C (zh) | 2008-06-11 |
KR20060026063A (ko) | 2006-03-22 |
DE112004001142T5 (de) | 2006-05-18 |
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