JP2006523015A5 - - Google Patents

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JP2006523015A5
JP2006523015A5 JP2006503556A JP2006503556A JP2006523015A5 JP 2006523015 A5 JP2006523015 A5 JP 2006523015A5 JP 2006503556 A JP2006503556 A JP 2006503556A JP 2006503556 A JP2006503556 A JP 2006503556A JP 2006523015 A5 JP2006523015 A5 JP 2006523015A5
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gas
ratio
substrate
chamber
hydrogen
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JP2006523015A (ja
JP4673290B2 (ja
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Priority claimed from PCT/US2004/004278 external-priority patent/WO2004074932A2/en
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JP2006503556A 2003-02-14 2004-02-12 水素含有ラジカルによる未変性酸化物の洗浄 Expired - Fee Related JP4673290B2 (ja)

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US44737203P 2003-02-14 2003-02-14
PCT/US2004/004278 WO2004074932A2 (en) 2003-02-14 2004-02-12 Method and apparatus for cleaning of native oxides with hydroge-containing radicals

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JP2010255015A Division JP5061231B2 (ja) 2003-02-14 2010-11-15 水素含有ラジカルによる未変性酸化物の洗浄

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JP2006523015A JP2006523015A (ja) 2006-10-05
JP2006523015A5 true JP2006523015A5 (enExample) 2010-03-04
JP4673290B2 JP4673290B2 (ja) 2011-04-20

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JP2006503556A Expired - Fee Related JP4673290B2 (ja) 2003-02-14 2004-02-12 水素含有ラジカルによる未変性酸化物の洗浄
JP2010255015A Expired - Fee Related JP5061231B2 (ja) 2003-02-14 2010-11-15 水素含有ラジカルによる未変性酸化物の洗浄
JP2012127100A Expired - Fee Related JP5542172B2 (ja) 2003-02-14 2012-06-04 水素含有ラジカルによる未変性酸化物の洗浄

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JP2010255015A Expired - Fee Related JP5061231B2 (ja) 2003-02-14 2010-11-15 水素含有ラジカルによる未変性酸化物の洗浄
JP2012127100A Expired - Fee Related JP5542172B2 (ja) 2003-02-14 2012-06-04 水素含有ラジカルによる未変性酸化物の洗浄

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US (1) US7604708B2 (enExample)
JP (3) JP4673290B2 (enExample)
KR (3) KR101352995B1 (enExample)
CN (2) CN101457338B (enExample)
WO (1) WO2004074932A2 (enExample)

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