JP2006024939A5 - - Google Patents

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Publication number
JP2006024939A5
JP2006024939A5 JP2005197421A JP2005197421A JP2006024939A5 JP 2006024939 A5 JP2006024939 A5 JP 2006024939A5 JP 2005197421 A JP2005197421 A JP 2005197421A JP 2005197421 A JP2005197421 A JP 2005197421A JP 2006024939 A5 JP2006024939 A5 JP 2006024939A5
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Japan
Prior art keywords
substrate
residual liquid
projection
substrate table
detecting
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JP2005197421A
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Japanese (ja)
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JP2006024939A (ja
JP4342482B2 (ja
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Priority claimed from US10/885,489 external-priority patent/US7463330B2/en
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Publication of JP4342482B2 publication Critical patent/JP4342482B2/ja
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JP2005197421A 2004-07-07 2005-07-06 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP4342482B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/885,489 US7463330B2 (en) 2004-07-07 2004-07-07 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

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JP2009000117A Division JP4898848B2 (ja) 2004-07-07 2009-01-05 リソグラフィ装置およびデバイス製造方法

Publications (3)

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JP2006024939A JP2006024939A (ja) 2006-01-26
JP2006024939A5 true JP2006024939A5 (enExample) 2009-02-19
JP4342482B2 JP4342482B2 (ja) 2009-10-14

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JP2005197421A Expired - Fee Related JP4342482B2 (ja) 2004-07-07 2005-07-06 リソグラフィ装置およびデバイス製造方法
JP2009000117A Expired - Fee Related JP4898848B2 (ja) 2004-07-07 2009-01-05 リソグラフィ装置およびデバイス製造方法
JP2010088441A Expired - Lifetime JP4970566B2 (ja) 2004-07-07 2010-04-07 リソグラフィ投影装置およびデバイス製造方法

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JP2009000117A Expired - Fee Related JP4898848B2 (ja) 2004-07-07 2009-01-05 リソグラフィ装置およびデバイス製造方法
JP2010088441A Expired - Lifetime JP4970566B2 (ja) 2004-07-07 2010-04-07 リソグラフィ投影装置およびデバイス製造方法

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US (5) US7463330B2 (enExample)
JP (3) JP4342482B2 (enExample)

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