JP2005518088A5 - - Google Patents

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Publication number
JP2005518088A5
JP2005518088A5 JP2003532723A JP2003532723A JP2005518088A5 JP 2005518088 A5 JP2005518088 A5 JP 2005518088A5 JP 2003532723 A JP2003532723 A JP 2003532723A JP 2003532723 A JP2003532723 A JP 2003532723A JP 2005518088 A5 JP2005518088 A5 JP 2005518088A5
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Japan
Prior art keywords
tungsten
plasma
ignited
substrate
vapor deposition
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JP2003532723A
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Japanese (ja)
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JP2005518088A (ja
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Priority claimed from PCT/US2002/022585 external-priority patent/WO2003029515A2/en
Publication of JP2005518088A publication Critical patent/JP2005518088A/ja
Publication of JP2005518088A5 publication Critical patent/JP2005518088A5/ja
Pending legal-status Critical Current

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JP2003532723A 2001-07-16 2002-07-16 タングステン複合膜の形成 Pending JP2005518088A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US30602701P 2001-07-16 2001-07-16
PCT/US2002/022585 WO2003029515A2 (en) 2001-07-16 2002-07-16 Formation of composite tungsten films

Publications (2)

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JP2005518088A JP2005518088A (ja) 2005-06-16
JP2005518088A5 true JP2005518088A5 (enExample) 2006-01-05

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JP2003532723A Pending JP2005518088A (ja) 2001-07-16 2002-07-16 タングステン複合膜の形成

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US (3) US6939804B2 (enExample)
JP (1) JP2005518088A (enExample)
TW (1) TW581822B (enExample)
WO (1) WO2003029515A2 (enExample)

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