JP2003204001A5 - - Google Patents

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Publication number
JP2003204001A5
JP2003204001A5 JP2002027436A JP2002027436A JP2003204001A5 JP 2003204001 A5 JP2003204001 A5 JP 2003204001A5 JP 2002027436 A JP2002027436 A JP 2002027436A JP 2002027436 A JP2002027436 A JP 2002027436A JP 2003204001 A5 JP2003204001 A5 JP 2003204001A5
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JP
Japan
Prior art keywords
memory cell
bit line
memory cells
memory
bit lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002027436A
Other languages
English (en)
Japanese (ja)
Other versions
JP4004809B2 (ja
JP2003204001A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002027436A priority Critical patent/JP4004809B2/ja
Priority claimed from JP2002027436A external-priority patent/JP4004809B2/ja
Priority to KR10-2002-0065131A priority patent/KR100525137B1/ko
Priority to US10/278,854 priority patent/US6806525B2/en
Publication of JP2003204001A publication Critical patent/JP2003204001A/ja
Publication of JP2003204001A5 publication Critical patent/JP2003204001A5/ja
Priority to US10/928,193 priority patent/US6927998B2/en
Application granted granted Critical
Publication of JP4004809B2 publication Critical patent/JP4004809B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002027436A 2001-10-24 2002-02-04 半導体装置及びその動作方法 Expired - Fee Related JP4004809B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002027436A JP4004809B2 (ja) 2001-10-24 2002-02-04 半導体装置及びその動作方法
KR10-2002-0065131A KR100525137B1 (ko) 2001-10-24 2002-10-24 반도체 장치 및 그 동작 방법
US10/278,854 US6806525B2 (en) 2001-10-24 2002-10-24 Semiconductor device and operation method thereof
US10/928,193 US6927998B2 (en) 2001-10-24 2004-08-30 Nonvolatile semiconductor memory device capable of reducing threshold voltage variations of memory cells due to capacitance coupling

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001326900 2001-10-24
JP2001-326900 2001-10-24
JP2002027436A JP4004809B2 (ja) 2001-10-24 2002-02-04 半導体装置及びその動作方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007121113A Division JP2007257829A (ja) 2001-10-24 2007-05-01 半導体装置及びその動作方法

Publications (3)

Publication Number Publication Date
JP2003204001A JP2003204001A (ja) 2003-07-18
JP2003204001A5 true JP2003204001A5 (enExample) 2004-07-29
JP4004809B2 JP4004809B2 (ja) 2007-11-07

Family

ID=26624079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002027436A Expired - Fee Related JP4004809B2 (ja) 2001-10-24 2002-02-04 半導体装置及びその動作方法

Country Status (3)

Country Link
US (2) US6806525B2 (enExample)
JP (1) JP4004809B2 (enExample)
KR (1) KR100525137B1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7339822B2 (en) * 2002-12-06 2008-03-04 Sandisk Corporation Current-limited latch
KR100582335B1 (ko) * 2003-12-05 2006-05-22 에스티마이크로일렉트로닉스 엔.브이. 낸드 플래시 소자의 제조 방법
US7187059B2 (en) * 2004-06-24 2007-03-06 International Business Machines Corporation Compressive SiGe <110> growth and structure of MOSFET devices
KR100729351B1 (ko) * 2004-12-31 2007-06-15 삼성전자주식회사 낸드 플래시 메모리 장치 및 그것의 프로그램 방법
JP4580787B2 (ja) 2005-03-16 2010-11-17 株式会社東芝 半導体記憶装置およびその形成方法
US8314024B2 (en) * 2008-12-19 2012-11-20 Unity Semiconductor Corporation Device fabrication
US7751242B2 (en) * 2005-08-30 2010-07-06 Micron Technology, Inc. NAND memory device and programming methods
JP4992722B2 (ja) * 2005-12-14 2012-08-08 富士通セミコンダクター株式会社 半導体装置の製造方法
KR100666223B1 (ko) * 2006-02-22 2007-01-09 삼성전자주식회사 메모리셀 사이의 커플링 노이즈를 저감시키는 3-레벨불휘발성 반도체 메모리 장치 및 이에 대한 구동방법
US7638878B2 (en) 2006-04-13 2009-12-29 Micron Technology, Inc. Devices and systems including the bit lines and bit line contacts
JP2008047219A (ja) * 2006-08-16 2008-02-28 Toshiba Corp Ｎａｎｄ型フラッシュメモリ
JP5072301B2 (ja) * 2006-09-25 2012-11-14 株式会社東芝 半導体集積回路装置及びその動作方法
US8287685B2 (en) * 2006-12-06 2012-10-16 Dow Corning Corporation Airbag and process for its assembly
US7515452B1 (en) * 2007-01-03 2009-04-07 Xilinx, Inc. Interleaved memory cell with single-event-upset tolerance
US7638822B1 (en) 2007-01-03 2009-12-29 Xilinx, Inc. Memory cell with single-event-upset tolerance
US7688612B2 (en) * 2007-04-13 2010-03-30 Aplus Flash Technology, Inc. Bit line structure for a multilevel, dual-sided nonvolatile memory cell array
JP4703669B2 (ja) * 2008-02-18 2011-06-15 株式会社東芝 半導体記憶装置及びその製造方法
JP2011523911A (ja) * 2008-05-22 2011-08-25 ダウ・コーニング・コーポレイション 縫製されていない継ぎ目を製造するための方法及び組成物
JP4770930B2 (ja) * 2009-01-21 2011-09-14 ソニー株式会社 クロスポイント型半導体メモリ装置及びその製造方法
JP2011181131A (ja) 2010-02-26 2011-09-15 Toshiba Corp 半導体記憶装置
JP2012204537A (ja) * 2011-03-24 2012-10-22 Toshiba Corp 半導体記憶装置およびその製造方法
KR102291518B1 (ko) 2015-03-20 2021-08-20 삼성전자주식회사 불휘발성 메모리 장치 및 불휘발성 메모리 장치를 포함하는 스토리지 장치
US11020140B2 (en) 2015-06-17 2021-06-01 Cilag Gmbh International Ultrasonic surgical blade for use with ultrasonic surgical instruments

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3210355B2 (ja) 1991-03-04 2001-09-17 株式会社東芝 不揮発性半導体記憶装置
JPH06215564A (ja) * 1993-01-13 1994-08-05 Nec Corp 半導体記憶装置
JP3789173B2 (ja) * 1996-07-22 2006-06-21 Ｎｅｃエレクトロニクス株式会社 半導体記憶装置及び半導体記憶装置のアクセス方法
KR100261221B1 (ko) * 1997-12-31 2000-07-01 윤종용 단일 트랜지스터 셀 및 이를 제조하는 방법 및 이 소자로 구성된 메모리 회로와 이를 구동하는 방법
JP3629144B2 (ja) * 1998-06-01 2005-03-16 株式会社東芝 不揮発性半導体記憶装置
JP3178427B2 (ja) * 1998-08-18 2001-06-18 日本電気株式会社 半導体記憶装置
JP3540640B2 (ja) * 1998-12-22 2004-07-07 株式会社東芝 不揮発性半導体記憶装置
US6188608B1 (en) * 1999-04-23 2001-02-13 Matsushita Electric Industrial Co., Ltd. Nonvolatile semiconductor memory device
JP3470083B2 (ja) * 1999-05-12 2003-11-25 松下電器産業株式会社 不揮発性半導体記憶装置
DE60129786T2 (de) * 2001-01-15 2008-04-30 Stmicroelectronics S.R.L., Agrate Brianza Verfahren und Schaltung zum dynamischen Auslesen einer Speicherzelle, insbesondere einer nichtflüchtigen Multibitspeicherzelle
DE60218812D1 (de) * 2001-12-28 2007-04-26 St Microelectronics Srl Verfahren zur Regulierung der Sourcespannung während der Programmierung einer nichtflüchtigen Speicherzelle und dementsprechende Programmierungsschaltung
US6839284B1 (en) * 2003-06-17 2005-01-04 Powerchip Semiconductor Corp. Method of programming and erasing a non-volatile semiconductor memory

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