JP2003168736A5 - - Google Patents

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Publication number
JP2003168736A5
JP2003168736A5 JP2001366351A JP2001366351A JP2003168736A5 JP 2003168736 A5 JP2003168736 A5 JP 2003168736A5 JP 2001366351 A JP2001366351 A JP 2001366351A JP 2001366351 A JP2001366351 A JP 2001366351A JP 2003168736 A5 JP2003168736 A5 JP 2003168736A5
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JP
Japan
Prior art keywords
electrode layer
drain
power amplification
formation region
pad formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001366351A
Other languages
English (en)
Japanese (ja)
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JP2003168736A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001366351A priority Critical patent/JP2003168736A/ja
Priority claimed from JP2001366351A external-priority patent/JP2003168736A/ja
Priority to US10/291,834 priority patent/US6765268B2/en
Priority to CN02152669A priority patent/CN1421927A/zh
Publication of JP2003168736A publication Critical patent/JP2003168736A/ja
Priority to US10/870,921 priority patent/US6992528B2/en
Publication of JP2003168736A5 publication Critical patent/JP2003168736A5/ja
Priority to US11/280,464 priority patent/US7141876B2/en
Priority to US11/581,587 priority patent/US7439622B2/en
Priority to US12/203,851 priority patent/US8022537B2/en
Pending legal-status Critical Current

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JP2001366351A 2001-11-30 2001-11-30 半導体素子及び高周波電力増幅装置並びに無線通信機 Pending JP2003168736A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2001366351A JP2003168736A (ja) 2001-11-30 2001-11-30 半導体素子及び高周波電力増幅装置並びに無線通信機
US10/291,834 US6765268B2 (en) 2001-11-30 2002-11-12 Multiple transistors having a common gate pad between first group of drains and second group of drains
CN02152669A CN1421927A (zh) 2001-11-30 2002-11-29 半导体器件
US10/870,921 US6992528B2 (en) 2001-11-30 2004-06-21 Semiconductor device
US11/280,464 US7141876B2 (en) 2001-11-30 2005-11-17 Semiconductor device
US11/581,587 US7439622B2 (en) 2001-11-30 2006-10-17 Semiconductor device
US12/203,851 US8022537B2 (en) 2001-11-30 2008-09-03 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001366351A JP2003168736A (ja) 2001-11-30 2001-11-30 半導体素子及び高周波電力増幅装置並びに無線通信機

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005335152A Division JP2006094557A (ja) 2005-11-21 2005-11-21 半導体素子及び高周波電力増幅装置並びに無線通信機

Publications (2)

Publication Number Publication Date
JP2003168736A JP2003168736A (ja) 2003-06-13
JP2003168736A5 true JP2003168736A5 (enExample) 2005-09-15

Family

ID=19176263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001366351A Pending JP2003168736A (ja) 2001-11-30 2001-11-30 半導体素子及び高周波電力増幅装置並びに無線通信機

Country Status (3)

Country Link
US (5) US6765268B2 (enExample)
JP (1) JP2003168736A (enExample)
CN (1) CN1421927A (enExample)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6856006B2 (en) * 2002-03-28 2005-02-15 Siliconix Taiwan Ltd Encapsulation method and leadframe for leadless semiconductor packages
JP2003168736A (ja) * 2001-11-30 2003-06-13 Hitachi Ltd 半導体素子及び高周波電力増幅装置並びに無線通信機
US6825559B2 (en) 2003-01-02 2004-11-30 Cree, Inc. Group III nitride based flip-chip intergrated circuit and method for fabricating
JP2004260364A (ja) * 2003-02-25 2004-09-16 Renesas Technology Corp 半導体装置及び高出力電力増幅装置並びにパソコンカード
JP4146290B2 (ja) * 2003-06-06 2008-09-10 株式会社ルネサステクノロジ 半導体装置
TW200518345A (en) * 2003-08-08 2005-06-01 Renesas Tech Corp Semiconductor device
US7211840B2 (en) * 2003-10-31 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Transistor
US7166867B2 (en) 2003-12-05 2007-01-23 International Rectifier Corporation III-nitride device with improved layout geometry
US20050134410A1 (en) * 2003-12-18 2005-06-23 Intel Corporation Power addition apparatus, systems, and methods
JP3999759B2 (ja) * 2004-04-02 2007-10-31 富士通株式会社 基板及び電子機器
US7135748B2 (en) * 2004-10-26 2006-11-14 Power Integrations, Inc. Integrated circuit with multi-length output transistor segment
US7548111B2 (en) * 2005-01-19 2009-06-16 Micro Mobio Corporation Miniature dual band power amplifier with reserved pins
US7508261B2 (en) * 2005-01-19 2009-03-24 Micro-Mobio, Inc. Systems of miniaturized compatible radio frequency wireless devices
EP1900022B1 (en) * 2005-07-01 2015-10-07 Vishay-Siliconix Complete power management system implemented in a single surface mount package
US7385263B2 (en) * 2006-05-02 2008-06-10 Atmel Corporation Low resistance integrated MOS structure
US7834662B2 (en) 2006-12-13 2010-11-16 Apple Inc. Level shifter with embedded logic and low minimum voltage
US8111001B2 (en) 2007-07-17 2012-02-07 Cree, Inc. LED with integrated constant current driver
JP4655083B2 (ja) * 2007-11-16 2011-03-23 セイコーエプソン株式会社 微小電気機械装置
EP2269219B1 (en) * 2008-04-15 2012-01-25 Nxp B.V. High frequency field-effect transistor
JP5644042B2 (ja) * 2008-10-20 2014-12-24 株式会社村田製作所 半導体装置
GB2466313A (en) * 2008-12-22 2010-06-23 Cambridge Silicon Radio Ltd Radio Frequency CMOS Transistor
JP2010171114A (ja) * 2009-01-21 2010-08-05 Renesas Technology Corp 半導体装置
US8798564B2 (en) * 2009-03-17 2014-08-05 Provigent Ltd. Transmitter with replaceable power amplifier
US8139370B2 (en) * 2009-03-24 2012-03-20 Viasat, Inc. Electronic system having field effect transistors and interconnect bumps on a semiconductor substrate
US8102728B2 (en) 2009-04-07 2012-01-24 Apple Inc. Cache optimizations using multiple threshold voltage transistors
JP5397289B2 (ja) * 2010-03-29 2014-01-22 住友電気工業株式会社 電界効果トランジスタ
US8319256B2 (en) 2010-06-23 2012-11-27 Power Integrations, Inc. Layout design for a high power, GaN-based FET
TW201310585A (zh) * 2011-08-29 2013-03-01 富晶電子股份有限公司 封裝結構
KR101262643B1 (ko) * 2011-10-17 2013-05-08 숭실대학교산학협력단 멀티 트랜지스터
CN102867753B (zh) * 2012-09-07 2015-10-28 清华大学 基于倒置工艺的射频功率管及其形成方法
RU2504897C1 (ru) * 2012-10-04 2014-01-20 Открытое акционерное общество "Омский научно-исследовательский институт приборостроения" (ОАО "ОНИИП") Полосовой высокоизбирательный перестраиваемый lс-фильтр
US9078380B2 (en) * 2012-10-19 2015-07-07 Nvidia Corporation MOSFET stack package
US8947888B2 (en) * 2012-12-17 2015-02-03 Microsoft Corporation Substantially rigid interconnection structure for devices
DE102013202220A1 (de) * 2013-02-12 2014-08-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strahlungsquelle und Verfahren zu deren Betrieb
US9214423B2 (en) * 2013-03-15 2015-12-15 Semiconductor Components Industries, Llc Method of forming a HEMT semiconductor device and structure therefor
EP2869339B1 (en) * 2013-10-31 2016-07-27 Ampleon Netherlands B.V. Transistor arrangement
KR101566155B1 (ko) * 2013-12-17 2015-11-05 전자부품연구원 나노크기의 이산화티탄으로 표면이 코팅된 구형의 전이금속복합탄산물을 이용한 고전압용 비수계 리튬이차전지용 고용량 양극재료 및 그의 제조 방법
CN104485361B (zh) * 2014-12-25 2018-03-30 上海华虹宏力半导体制造有限公司 绝缘体上硅射频开关器件结构
US9712117B2 (en) 2014-12-30 2017-07-18 Skyworks Solutions, Inc. Cascode switch for power amplifier
JP6488720B2 (ja) * 2015-01-23 2019-03-27 三菱電機株式会社 半導体装置
EP3259781B1 (en) * 2015-02-20 2021-08-25 Vishay General Semiconductor LLC Gan-based schottky diode having large bond pads and reduced contact resistance
US10211861B2 (en) 2015-03-17 2019-02-19 Skyworks Solutions, Inc. Multi-mode integrated front end module
TWI584467B (zh) 2015-09-24 2017-05-21 台達電子工業股份有限公司 半導體裝置
KR20170056391A (ko) * 2015-11-13 2017-05-23 삼성전기주식회사 프론트 엔드 모듈
DE102015223599A1 (de) * 2015-11-27 2017-06-01 Robert Bosch Gmbh Leistungsmodul für einen Elektromotor
WO2017098578A1 (ja) * 2015-12-08 2017-06-15 三菱電機株式会社 電力増幅器
US10153306B2 (en) * 2016-02-29 2018-12-11 Skyworks Solutions, Inc. Transistor layout with low aspect ratio
US9947616B2 (en) 2016-03-17 2018-04-17 Cree, Inc. High power MMIC devices having bypassed gate transistors
US12464760B2 (en) 2016-03-17 2025-11-04 Macom Technology Solutions Holdings, Inc. Bypassed gate transistors having improved stability
US10128365B2 (en) 2016-03-17 2018-11-13 Cree, Inc. Bypassed gate transistors having improved stability
US9786660B1 (en) * 2016-03-17 2017-10-10 Cree, Inc. Transistor with bypassed gate structure field
US9960127B2 (en) 2016-05-18 2018-05-01 Macom Technology Solutions Holdings, Inc. High-power amplifier package
US10134658B2 (en) * 2016-08-10 2018-11-20 Macom Technology Solutions Holdings, Inc. High power transistors
CN106501340B (zh) * 2016-09-23 2019-07-09 上海小海龟科技有限公司 电极、离子敏感传感器、电容和离子活度的检测方法
US10692863B2 (en) * 2016-09-30 2020-06-23 Rohm Co., Ltd. Semiconductor device and semiconductor package
JP6812764B2 (ja) * 2016-11-29 2021-01-13 日亜化学工業株式会社 電界効果トランジスタ
CN110121768B (zh) * 2016-12-14 2023-10-31 株式会社村田制作所 前端模块以及通信装置
US10637411B2 (en) * 2017-10-06 2020-04-28 Qualcomm Incorporated Transistor layout for improved harmonic performance
US10763334B2 (en) 2018-07-11 2020-09-01 Cree, Inc. Drain and/or gate interconnect and finger structure
US10483352B1 (en) 2018-07-11 2019-11-19 Cree, Inc. High power transistor with interior-fed gate fingers
US10600746B2 (en) 2018-07-19 2020-03-24 Cree, Inc. Radio frequency transistor amplifiers and other multi-cell transistors having gaps and/or isolation structures between groups of unit cell transistors
CN109494204B (zh) * 2018-10-19 2020-11-27 隔空微电子(广州)有限公司 低噪声放大器芯片封装结构和卫星高频头电路
US10770415B2 (en) 2018-12-04 2020-09-08 Cree, Inc. Packaged transistor devices with input-output isolation and methods of forming packaged transistor devices with input-output isolation
US11417746B2 (en) 2019-04-24 2022-08-16 Wolfspeed, Inc. High power transistor with interior-fed fingers
CA3114695A1 (en) 2020-04-08 2021-10-08 National Research Council Of Canada Distributed inductance integrated field effect transistor structure
CN115362634B (zh) 2020-04-10 2023-12-22 株式会社村田制作所 高频电路、分集模块以及通信装置
US11502026B2 (en) * 2020-10-12 2022-11-15 Nxp Usa, Inc. Transistor with flip-chip topology and power amplifier containing same
WO2022079995A1 (ja) * 2020-10-16 2022-04-21 パナソニックIpマネジメント株式会社 窒化物半導体装置
CN112420841B (zh) * 2020-11-09 2023-12-01 深圳必特跨境科技有限公司 负微分电阻电路以及神经元晶体管结构
WO2022153523A1 (ja) * 2021-01-18 2022-07-21 ソニーグループ株式会社 通信装置、通信方法、及びプログラム
US11804527B2 (en) 2021-07-14 2023-10-31 Nxp Usa, Inc. Transistor with center fed gate

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5025296A (en) 1988-02-29 1991-06-18 Motorola, Inc. Center tapped FET
JPH02114561A (ja) 1988-10-24 1990-04-26 Mitsubishi Electric Corp 半導体装置
JP2878137B2 (ja) * 1994-06-29 1999-04-05 シャープ株式会社 増幅型光電変換素子、それを用いた増幅型固体撮像装置、及び増幅型光電変換素子の製造方法
US5689209A (en) * 1994-12-30 1997-11-18 Siliconix Incorporated Low-side bidirectional battery disconnect switch
JP2669392B2 (ja) 1995-03-10 1997-10-27 日本電気株式会社 半導体装置およびその実装構造
US5613861A (en) * 1995-06-07 1997-03-25 Xerox Corporation Photolithographically patterned spring contact
DE19914305B4 (de) * 1998-03-31 2004-11-25 Kanji Higashiyamato Otsuka Elektronische Vorrichtung
US6320548B1 (en) * 2000-01-26 2001-11-20 Integral Technologies, Inc. Dual disk active antenna
JP4536942B2 (ja) * 2001-02-09 2010-09-01 三菱電機株式会社 高周波用集積回路及びこれを用いた高周波回路装置
JP2003168736A (ja) * 2001-11-30 2003-06-13 Hitachi Ltd 半導体素子及び高周波電力増幅装置並びに無線通信機
US6774718B2 (en) * 2002-07-19 2004-08-10 Micro Mobio Inc. Power amplifier module for wireless communication devices

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