JP2002231619A - 照明光学装置および該照明光学装置を備えた露光装置 - Google Patents

照明光学装置および該照明光学装置を備えた露光装置

Info

Publication number
JP2002231619A
JP2002231619A JP2001074240A JP2001074240A JP2002231619A JP 2002231619 A JP2002231619 A JP 2002231619A JP 2001074240 A JP2001074240 A JP 2001074240A JP 2001074240 A JP2001074240 A JP 2001074240A JP 2002231619 A JP2002231619 A JP 2002231619A
Authority
JP
Japan
Prior art keywords
illumination
optical
optical system
light
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001074240A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002231619A5 (enExample
Inventor
Osamu Tanitsu
修 谷津
Masato Shibuya
眞人 渋谷
Mitsunori Toyoda
光紀 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001074240A priority Critical patent/JP2002231619A/ja
Priority to TW090120743A priority patent/TW516097B/zh
Priority to US09/994,861 priority patent/US20020085276A1/en
Priority to SG200107340A priority patent/SG114513A1/en
Priority to KR1020010074517A priority patent/KR20020042462A/ko
Priority to EP01128550A priority patent/EP1211561A3/en
Publication of JP2002231619A publication Critical patent/JP2002231619A/ja
Priority to US10/844,353 priority patent/US20040263817A1/en
Publication of JP2002231619A5 publication Critical patent/JP2002231619A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2001074240A 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置 Pending JP2002231619A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2001074240A JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置
TW090120743A TW516097B (en) 2000-11-29 2001-08-23 Illumination optical apparatus and exposure apparatus having the same
US09/994,861 US20020085276A1 (en) 2000-11-29 2001-11-28 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
SG200107340A SG114513A1 (en) 2000-11-29 2001-11-28 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
KR1020010074517A KR20020042462A (ko) 2000-11-29 2001-11-28 조명 광학 장치, 해당 조명 광학 장치를 구비한 노광장치, 마이크로디바이스의 제조 방법 및 노광 방법
EP01128550A EP1211561A3 (en) 2000-11-29 2001-11-29 Illumination apparatus
US10/844,353 US20040263817A1 (en) 2000-11-29 2004-05-13 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-363225 2000-11-29
JP2000363225 2000-11-29
JP2001074240A JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置

Publications (2)

Publication Number Publication Date
JP2002231619A true JP2002231619A (ja) 2002-08-16
JP2002231619A5 JP2002231619A5 (enExample) 2008-04-24

Family

ID=26604841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001074240A Pending JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置

Country Status (6)

Country Link
US (2) US20020085276A1 (enExample)
EP (1) EP1211561A3 (enExample)
JP (1) JP2002231619A (enExample)
KR (1) KR20020042462A (enExample)
SG (1) SG114513A1 (enExample)
TW (1) TW516097B (enExample)

Cited By (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004090952A1 (ja) * 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
WO2004112107A1 (ja) * 2003-06-16 2004-12-23 Nikon Corporation 照明光学装置、露光装置および露光方法
WO2005062350A1 (ja) * 2003-12-19 2005-07-07 Nikon Corporation 光束変換素子、露光装置、照明光学系及び露光方法
JP2005228846A (ja) * 2004-02-12 2005-08-25 Canon Inc 露光装置及び方法
JP2006108597A (ja) * 2004-10-08 2006-04-20 Canon Inc 干渉計を備えた露光装置及び方法、並びに、デバイス製造方法
JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法
US7095560B2 (en) 2001-12-12 2006-08-22 Nikon Corporation Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method
JP2006253487A (ja) * 2005-03-11 2006-09-21 Nikon Corp 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法
JP2006278979A (ja) * 2005-03-30 2006-10-12 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
WO2007058240A1 (ja) 2005-11-16 2007-05-24 Nikon Corporation 基板処理方法、フォトマスクの製造方法及びフォトマスク、並びにデバイス製造方法
JP2007142215A (ja) * 2005-11-18 2007-06-07 Nikon Corp 光強度分布の評価方法、照明光学装置およびその調整方法、露光装置、および露光方法
JPWO2005041277A1 (ja) * 2003-10-28 2007-08-23 株式会社ニコン 照明光学装置及び投影露光装置
JP2007227896A (ja) * 2006-01-27 2007-09-06 Fujitsu Ltd 半導体装置の製造方法
WO2007111146A1 (ja) 2006-03-27 2007-10-04 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
JP2007531327A (ja) * 2004-03-31 2007-11-01 インテル コーポレイション フォトリソグラフィ用光源
WO2008007633A1 (en) 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
WO2008007632A1 (en) 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
JP2008047744A (ja) * 2006-08-18 2008-02-28 Nikon Corp 照明光学装置、露光装置、およびデバイス製造方法
JP2010093291A (ja) * 2010-01-12 2010-04-22 Nikon Corp 照明光学装置、露光装置および露光方法
JP2010123983A (ja) * 2010-01-12 2010-06-03 Nikon Corp 照明光学装置、露光装置および露光方法
US7916391B2 (en) 2004-05-25 2011-03-29 Carl Zeiss Smt Gmbh Apparatus for providing a pattern of polarization
JP2011254086A (ja) * 2011-07-04 2011-12-15 Nikon Corp 照明光学装置、露光装置および露光方法
US8164738B2 (en) 2006-09-12 2012-04-24 Canon Kabushiki Kaisha Illumination optical system, exposure apparatus, and device manufacturing method
JP2012156536A (ja) * 2012-03-28 2012-08-16 Nikon Corp 照明光学装置、露光装置および露光方法
JP2012156537A (ja) * 2012-03-28 2012-08-16 Nikon Corp 照明光学装置、露光装置および露光方法
US8259393B2 (en) 2004-01-16 2012-09-04 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8279524B2 (en) 2004-01-16 2012-10-02 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8482717B2 (en) 2004-01-16 2013-07-09 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2014039044A (ja) * 2013-09-09 2014-02-27 Nikon Corp 照明光学装置
JP2014116612A (ja) * 2013-12-27 2014-06-26 Nikon Corp 照明光学装置、露光装置および露光方法
JP2015172749A (ja) * 2015-04-03 2015-10-01 株式会社ニコン 照明光学装置、露光装置および露光方法
US9195069B2 (en) 2006-04-17 2015-11-24 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2016139143A (ja) * 2016-02-15 2016-08-04 株式会社ニコン 照明光学装置、露光装置および露光方法
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2017173839A (ja) * 2017-05-11 2017-09-28 株式会社ニコン 照明光学装置、露光装置および露光方法
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW554411B (en) * 2001-08-23 2003-09-21 Nikon Corp Exposure apparatus
DE10144243A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
US7079321B2 (en) * 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
US7006295B2 (en) * 2001-10-18 2006-02-28 Asml Holding N.V. Illumination system and method for efficiently illuminating a pattern generator
JP4207478B2 (ja) * 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
DE10322393A1 (de) * 2003-05-12 2004-12-02 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
JP2005032847A (ja) * 2003-07-09 2005-02-03 Advanced Lcd Technologies Development Center Co Ltd 結晶化装置、結晶化方法およびデバイス
JP4717813B2 (ja) * 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
WO2005076083A1 (en) * 2004-02-07 2005-08-18 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
US7276328B1 (en) * 2004-03-02 2007-10-02 Advanced Micro Devices, Inc. Lithography mask utilizing asymmetric light source
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
US7400381B2 (en) * 2004-05-26 2008-07-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7116400B2 (en) * 2004-06-02 2006-10-03 Asml Netherlands B.V. Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method
US7835076B2 (en) 2005-10-27 2010-11-16 Yale University Optical system for illumination of an evanescent field
EP1857879A1 (en) * 2006-05-15 2007-11-21 Advanced Mask Technology Center GmbH & Co. KG An illumination system and a photolithography apparatus
JP5105316B2 (ja) * 2006-07-07 2012-12-26 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JP2008071838A (ja) * 2006-09-12 2008-03-27 Nec Electronics Corp 半導体装置の製造方法
TWM324785U (en) * 2007-04-16 2008-01-01 Young Optics Inc Illumination system
US20080259304A1 (en) * 2007-04-20 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179329A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
CN101910817B (zh) 2008-05-28 2016-03-09 株式会社尼康 照明光学系统、曝光装置以及器件制造方法
EP2239084A1 (en) * 2009-04-07 2010-10-13 Excico France Method of and apparatus for irradiating a semiconductor material surface by laser energy
EP2253997A3 (en) * 2009-05-18 2010-12-08 Süss MicroTec Lithography GmbH Illumination system for a microlithographic contact and proximity exposure apparatus
US8079734B2 (en) * 2009-08-13 2011-12-20 Lite-On It Corporation Lighting device
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP2012018277A (ja) * 2010-07-07 2012-01-26 Olympus Imaging Corp 光路反射型のズームレンズを備えた撮像装置
RU2517545C1 (ru) * 2010-09-10 2014-05-27 Мартин Профешнл А/С Осветительное устройство с эффектом расщепления пучка
US9500855B2 (en) * 2012-06-04 2016-11-22 The Boeing Company Modal corrector mirror with compliant actuation for optical aberrations
CN104698764B (zh) * 2013-12-10 2017-01-25 上海微电子装备有限公司 对准成像装置
US10133187B2 (en) * 2015-05-29 2018-11-20 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus
EP3112745B1 (en) * 2015-06-29 2018-08-01 Martin Professional ApS Prism effect system for light fixture with inverted multi-facet prisms
DE102015225262A1 (de) * 2015-12-15 2017-06-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2017194393A1 (en) 2016-05-11 2017-11-16 Asml Netherlands B.V. Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
JP7167844B2 (ja) * 2019-05-10 2022-11-09 株式会社リコー 光学系、および画像投射装置
US20240377753A1 (en) * 2023-05-08 2024-11-14 Kla Corporation Dynamic freeform optics for lithography illumination beam shaping
US20250004288A1 (en) * 2023-06-30 2025-01-02 Lumentum Operations Llc Beam control for optical beams
CN117872612B (zh) * 2023-12-21 2025-09-30 中国科学院长春光学精密机械与物理研究所 一种集成激光通信和激光对抗的滑环装置及方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05251308A (ja) * 1992-03-05 1993-09-28 Nikon Corp 照明光学装置
JPH05326366A (ja) * 1992-05-21 1993-12-10 Nikon Corp 投影露光装置
JP2000150374A (ja) * 1991-12-27 2000-05-30 Nikon Corp 投影露光装置及び方法、並びに素子製造方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748019A (en) * 1968-03-02 1973-07-24 Agfa Gevaert Ag Photographic recording and reproducing method and apparatus utilizing spatial carrier frequencies
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
EP0507487B1 (en) * 1991-04-05 1996-12-18 Nippon Telegraph And Telephone Corporation Optical projection exposure method and system using the same
US5264898A (en) * 1991-08-29 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
US6249335B1 (en) * 1992-01-17 2001-06-19 Nikon Corporation Photo-mask and method of exposing and projection-exposing apparatus
WO1994020883A1 (en) * 1993-03-01 1994-09-15 General Signal Corporation Variable annular illuminator for photolithographic projection imager
EP0658810B1 (de) * 1993-12-13 1998-11-25 Carl Zeiss Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
US5828455A (en) * 1997-03-07 1998-10-27 Litel Instruments Apparatus, method of measurement, and method of data analysis for correction of optical system
US5978085A (en) * 1997-03-07 1999-11-02 Litel Instruments Apparatus method of measurement and method of data analysis for correction of optical system
DE19809395A1 (de) * 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
JPH11271619A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JPH11274060A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
EP0949541B1 (en) * 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithography apparatus
JPH11317344A (ja) * 1998-04-30 1999-11-16 Nikon Corp 露光装置
KR20000048227A (ko) * 1998-12-17 2000-07-25 오노 시게오 이미지 투사 장치를 이용한 표면 조명 방법 및 조명 광학시스템
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
JP2001174615A (ja) * 1999-04-15 2001-06-29 Nikon Corp 回折光学素子、該素子の製造方法、該素子を備える照明装置、投影露光装置、露光方法、及び光ホモジナイザー、該光ホモジナイザーの製造方法
US6671035B2 (en) * 1999-09-29 2003-12-30 Asml Netherlands B.V. Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
JP2002110502A (ja) * 2000-09-26 2002-04-12 Canon Inc 照明装置及び露光装置
JP3507459B2 (ja) * 2001-07-09 2004-03-15 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000150374A (ja) * 1991-12-27 2000-05-30 Nikon Corp 投影露光装置及び方法、並びに素子製造方法
JPH05251308A (ja) * 1992-03-05 1993-09-28 Nikon Corp 照明光学装置
JPH05326366A (ja) * 1992-05-21 1993-12-10 Nikon Corp 投影露光装置

Cited By (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7095560B2 (en) 2001-12-12 2006-08-22 Nikon Corporation Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method
KR101187612B1 (ko) * 2003-04-09 2012-10-08 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP4735258B2 (ja) * 2003-04-09 2011-07-27 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP2012164993A (ja) * 2003-04-09 2012-08-30 Nikon Corp 露光方法及び装置、照明光学装置、並びにデバイス製造方法
JP2018106179A (ja) * 2003-04-09 2018-07-05 株式会社ニコン 露光方法及び装置、照明光学装置、並びにデバイス製造方法
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
JP2014116611A (ja) * 2003-04-09 2014-06-26 Nikon Corp 露光方法及び装置、照明光学装置、並びにデバイス製造方法
WO2004090952A1 (ja) * 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
JP2008072129A (ja) * 2003-04-09 2008-03-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2011097076A (ja) * 2003-04-09 2011-05-12 Nikon Corp 露光方法及び装置、照明光学装置、並びにデバイス製造方法
JP2017097372A (ja) * 2003-04-09 2017-06-01 株式会社ニコン 露光方法及び装置、照明光学装置、並びにデバイス製造方法
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US7446858B2 (en) 2003-04-09 2008-11-04 Nikon Corporation Exposure method and apparatus, and method for fabricating device
JP2016103025A (ja) * 2003-04-09 2016-06-02 株式会社ニコン 露光方法及び装置、照明光学装置、並びにデバイス製造方法
JP2009212540A (ja) * 2003-04-09 2009-09-17 Nikon Corp 露光方法及び装置、照明光学装置、並びにデバイス製造方法
JP2015092604A (ja) * 2003-04-09 2015-05-14 株式会社ニコン 露光方法及び装置、照明光学装置、並びにデバイス製造方法
KR101503992B1 (ko) 2003-04-09 2015-03-18 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2004112107A1 (ja) * 2003-06-16 2004-12-23 Nikon Corporation 照明光学装置、露光装置および露光方法
JP2016053718A (ja) * 2003-10-28 2016-04-14 株式会社ニコン 照明光学装置及び投影露光装置
JP2008182266A (ja) * 2003-10-28 2008-08-07 Nikon Corp 照明光学装置、投影露光装置、露光方法、及び電子デバイス製造方法
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
JPWO2005041277A1 (ja) * 2003-10-28 2007-08-23 株式会社ニコン 照明光学装置及び投影露光装置
JP2013211558A (ja) * 2003-10-28 2013-10-10 Nikon Corp 照明光学装置及び投影露光装置
JP2013191858A (ja) * 2003-10-28 2013-09-26 Nikon Corp 照明光学装置及び投影露光装置
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
JP2010192914A (ja) * 2003-10-28 2010-09-02 Nikon Corp 照明光学装置及び投影露光装置
JP4543331B2 (ja) * 2003-10-28 2010-09-15 株式会社ニコン 照明光学装置及び投影露光装置
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
WO2005062350A1 (ja) * 2003-12-19 2005-07-07 Nikon Corporation 光束変換素子、露光装置、照明光学系及び露光方法
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8289623B2 (en) 2004-01-16 2012-10-16 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8711479B2 (en) 2004-01-16 2014-04-29 Carl Zeiss Smt Gmbh Illumination apparatus for microlithography projection system including polarization-modulating optical element
US9316772B2 (en) 2004-01-16 2016-04-19 Carl Zeiss Smt Gmbh Producing polarization-modulating optical element for microlithography system
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8482717B2 (en) 2004-01-16 2013-07-09 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8259393B2 (en) 2004-01-16 2012-09-04 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8320043B2 (en) 2004-01-16 2012-11-27 Carl Zeiss Smt Gmbh Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
US8279524B2 (en) 2004-01-16 2012-10-02 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2005228846A (ja) * 2004-02-12 2005-08-25 Canon Inc 露光装置及び方法
JP2007531327A (ja) * 2004-03-31 2007-11-01 インテル コーポレイション フォトリソグラフィ用光源
US7916391B2 (en) 2004-05-25 2011-03-29 Carl Zeiss Smt Gmbh Apparatus for providing a pattern of polarization
JP2006108597A (ja) * 2004-10-08 2006-04-20 Canon Inc 干渉計を備えた露光装置及び方法、並びに、デバイス製造方法
JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法
JP2006253487A (ja) * 2005-03-11 2006-09-21 Nikon Corp 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法
JP2006278979A (ja) * 2005-03-30 2006-10-12 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2007058240A1 (ja) 2005-11-16 2007-05-24 Nikon Corporation 基板処理方法、フォトマスクの製造方法及びフォトマスク、並びにデバイス製造方法
JP2007142215A (ja) * 2005-11-18 2007-06-07 Nikon Corp 光強度分布の評価方法、照明光学装置およびその調整方法、露光装置、および露光方法
JP2007227896A (ja) * 2006-01-27 2007-09-06 Fujitsu Ltd 半導体装置の製造方法
WO2007111146A1 (ja) 2006-03-27 2007-10-04 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
US8493549B2 (en) 2006-03-27 2013-07-23 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9195069B2 (en) 2006-04-17 2015-11-24 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
JPWO2008007633A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
WO2008007633A1 (en) 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
US8325324B2 (en) 2006-07-12 2012-12-04 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
WO2008007632A1 (en) 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
JP2008047744A (ja) * 2006-08-18 2008-02-28 Nikon Corp 照明光学装置、露光装置、およびデバイス製造方法
US8164738B2 (en) 2006-09-12 2012-04-24 Canon Kabushiki Kaisha Illumination optical system, exposure apparatus, and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010123983A (ja) * 2010-01-12 2010-06-03 Nikon Corp 照明光学装置、露光装置および露光方法
JP2010093291A (ja) * 2010-01-12 2010-04-22 Nikon Corp 照明光学装置、露光装置および露光方法
JP2011254086A (ja) * 2011-07-04 2011-12-15 Nikon Corp 照明光学装置、露光装置および露光方法
JP2012156537A (ja) * 2012-03-28 2012-08-16 Nikon Corp 照明光学装置、露光装置および露光方法
JP2012156536A (ja) * 2012-03-28 2012-08-16 Nikon Corp 照明光学装置、露光装置および露光方法
JP2014039044A (ja) * 2013-09-09 2014-02-27 Nikon Corp 照明光学装置
JP2014116612A (ja) * 2013-12-27 2014-06-26 Nikon Corp 照明光学装置、露光装置および露光方法
JP2015172749A (ja) * 2015-04-03 2015-10-01 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2016139143A (ja) * 2016-02-15 2016-08-04 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2017173839A (ja) * 2017-05-11 2017-09-28 株式会社ニコン 照明光学装置、露光装置および露光方法

Also Published As

Publication number Publication date
TW516097B (en) 2003-01-01
US20020085276A1 (en) 2002-07-04
SG114513A1 (en) 2005-09-28
EP1211561A3 (en) 2005-01-26
EP1211561A2 (en) 2002-06-05
KR20020042462A (ko) 2002-06-05
US20040263817A1 (en) 2004-12-30

Similar Documents

Publication Publication Date Title
JP2002231619A (ja) 照明光学装置および該照明光学装置を備えた露光装置
US7095560B2 (en) Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method
JP5459571B2 (ja) オプティカルインテグレータ系、照明光学装置、露光装置、およびデバイス製造方法
US7471456B2 (en) Optical integrator, illumination optical device, exposure device, and exposure method
JP2003297727A (ja) 照明光学装置、露光装置および露光方法
KR20030017431A (ko) 조명 광학 장치, 노광 장치, 노광 방법 및 마이크로장치의 제조 방법
JP2001135560A (ja) 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法
JP4470095B2 (ja) 照明光学装置、露光装置および露光方法
HK1250792A1 (en) Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2002184676A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP2002075835A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP4051473B2 (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP5035747B2 (ja) オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法
JP2003068604A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP4106701B2 (ja) 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法
JP2003178952A (ja) 照明光学装置、露光装置および露光方法
JP5533917B2 (ja) 照明光学系、露光装置およびデバイス製造方法
JP6547887B2 (ja) 照明光学系、露光装置およびデバイス製造方法
US10281823B2 (en) Illumination system of a microlithographic projection exposure apparatus
JP2004311742A (ja) 光学系の調整方法、照明光学装置、露光装置、および露光方法
JPWO2004112107A1 (ja) 照明光学装置、露光装置および露光方法
JP4415223B2 (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP6330830B2 (ja) 照明光学装置、露光装置および露光方法
WO2003041134A1 (en) Illumination optical device, exposure device, and exposure method
JP2009071010A (ja) 照明光学系、露光装置、およびデバイス製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080229

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080311

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100712

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100715

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20101201