JP2002231619A5 - - Google Patents

Download PDF

Info

Publication number
JP2002231619A5
JP2002231619A5 JP2001074240A JP2001074240A JP2002231619A5 JP 2002231619 A5 JP2002231619 A5 JP 2002231619A5 JP 2001074240 A JP2001074240 A JP 2001074240A JP 2001074240 A JP2001074240 A JP 2001074240A JP 2002231619 A5 JP2002231619 A5 JP 2002231619A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001074240A
Other languages
Japanese (ja)
Other versions
JP2002231619A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001074240A priority Critical patent/JP2002231619A/ja
Priority claimed from JP2001074240A external-priority patent/JP2002231619A/ja
Priority to TW090120743A priority patent/TW516097B/zh
Priority to KR1020010074517A priority patent/KR20020042462A/ko
Priority to US09/994,861 priority patent/US20020085276A1/en
Priority to SG200107340A priority patent/SG114513A1/en
Priority to EP01128550A priority patent/EP1211561A3/en
Publication of JP2002231619A publication Critical patent/JP2002231619A/ja
Priority to US10/844,353 priority patent/US20040263817A1/en
Publication of JP2002231619A5 publication Critical patent/JP2002231619A5/ja
Pending legal-status Critical Current

Links

JP2001074240A 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置 Pending JP2002231619A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2001074240A JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置
TW090120743A TW516097B (en) 2000-11-29 2001-08-23 Illumination optical apparatus and exposure apparatus having the same
KR1020010074517A KR20020042462A (ko) 2000-11-29 2001-11-28 조명 광학 장치, 해당 조명 광학 장치를 구비한 노광장치, 마이크로디바이스의 제조 방법 및 노광 방법
US09/994,861 US20020085276A1 (en) 2000-11-29 2001-11-28 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
SG200107340A SG114513A1 (en) 2000-11-29 2001-11-28 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
EP01128550A EP1211561A3 (en) 2000-11-29 2001-11-29 Illumination apparatus
US10/844,353 US20040263817A1 (en) 2000-11-29 2004-05-13 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-363225 2000-11-29
JP2000363225 2000-11-29
JP2001074240A JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置

Publications (2)

Publication Number Publication Date
JP2002231619A JP2002231619A (ja) 2002-08-16
JP2002231619A5 true JP2002231619A5 (enExample) 2008-04-24

Family

ID=26604841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001074240A Pending JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置

Country Status (6)

Country Link
US (2) US20020085276A1 (enExample)
EP (1) EP1211561A3 (enExample)
JP (1) JP2002231619A (enExample)
KR (1) KR20020042462A (enExample)
SG (1) SG114513A1 (enExample)
TW (1) TW516097B (enExample)

Families Citing this family (84)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW554411B (en) * 2001-08-23 2003-09-21 Nikon Corp Exposure apparatus
DE10144243A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
US7079321B2 (en) * 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
US7006295B2 (en) * 2001-10-18 2006-02-28 Asml Holding N.V. Illumination system and method for efficiently illuminating a pattern generator
TW567406B (en) 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
JP4207478B2 (ja) 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
KR101547077B1 (ko) * 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
DE10322393A1 (de) * 2003-05-12 2004-12-02 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
TW200508812A (en) * 2003-06-16 2005-03-01 Nikon Corp Optical illumination device, exposure device and exposure method
JP2005032847A (ja) * 2003-07-09 2005-02-03 Advanced Lcd Technologies Development Center Co Ltd 結晶化装置、結晶化方法およびデバイス
JP4717813B2 (ja) * 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
TWI569308B (zh) * 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
JPWO2005062350A1 (ja) * 2003-12-19 2008-04-17 株式会社ニコン 光束変換素子、露光装置、照明光学系及び露光方法
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
CN101793993B (zh) 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 光学元件、光学布置及系统
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI395068B (zh) * 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
WO2005076083A1 (en) * 2004-02-07 2005-08-18 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP4497949B2 (ja) * 2004-02-12 2010-07-07 キヤノン株式会社 露光装置
US7276328B1 (en) * 2004-03-02 2007-10-02 Advanced Micro Devices, Inc. Lithography mask utilizing asymmetric light source
US20050225740A1 (en) * 2004-03-31 2005-10-13 Padlyar Sushil D Light source for photolithography
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US7400381B2 (en) * 2004-05-26 2008-07-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7116400B2 (en) * 2004-06-02 2006-10-03 Asml Netherlands B.V. Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method
JP4769448B2 (ja) * 2004-10-08 2011-09-07 キヤノン株式会社 干渉計を備えた露光装置及びデバイス製造方法
JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法
JP2006253487A (ja) * 2005-03-11 2006-09-21 Nikon Corp 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法
JP4591155B2 (ja) * 2005-03-30 2010-12-01 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
WO2007050743A2 (en) 2005-10-27 2007-05-03 Yale University An optical system for illumination of an evanescent field
JP4968589B2 (ja) 2005-11-16 2012-07-04 株式会社ニコン 基板処理方法、フォトマスクの製造方法及びフォトマスク、並びにデバイス製造方法
JP4697426B2 (ja) * 2005-11-18 2011-06-08 株式会社ニコン 光強度分布の評価方法、照明光学装置およびその調整方法、露光装置、および露光方法
JP5103901B2 (ja) * 2006-01-27 2012-12-19 富士通セミコンダクター株式会社 半導体装置の製造方法
TWI570520B (zh) * 2006-03-27 2017-02-11 尼康股份有限公司 照明光學裝置、曝光裝置以及元件製造方法
WO2007119514A1 (ja) 2006-04-17 2007-10-25 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
EP1857879A1 (en) * 2006-05-15 2007-11-21 Advanced Mask Technology Center GmbH & Co. KG An illumination system and a photolithography apparatus
JP5105316B2 (ja) * 2006-07-07 2012-12-26 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
WO2008007633A1 (en) 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
JP4883482B2 (ja) * 2006-08-18 2012-02-22 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JP2008071838A (ja) * 2006-09-12 2008-03-27 Nec Electronics Corp 半導体装置の製造方法
JP2008071791A (ja) 2006-09-12 2008-03-27 Canon Inc 照明光学系、露光装置およびデバイス製造方法
TWM324785U (en) * 2007-04-16 2008-01-01 Young Optics Inc Illumination system
US20080259304A1 (en) * 2007-04-20 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN105606344B (zh) 2008-05-28 2019-07-30 株式会社尼康 照明光学系统、照明方法、曝光装置以及曝光方法
EP2239084A1 (en) * 2009-04-07 2010-10-13 Excico France Method of and apparatus for irradiating a semiconductor material surface by laser energy
EP2253997A3 (en) * 2009-05-18 2010-12-08 Süss MicroTec Lithography GmbH Illumination system for a microlithographic contact and proximity exposure apparatus
US8079734B2 (en) * 2009-08-13 2011-12-20 Lite-On It Corporation Lighting device
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP4952801B2 (ja) * 2010-01-12 2012-06-13 株式会社ニコン 照明光学系、露光装置および露光方法
JP4952800B2 (ja) * 2010-01-12 2012-06-13 株式会社ニコン 照明光学系、露光装置および露光方法
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP2012018277A (ja) * 2010-07-07 2012-01-26 Olympus Imaging Corp 光路反射型のズームレンズを備えた撮像装置
WO2012031598A1 (en) * 2010-09-10 2012-03-15 Martin Professional A/S Illumination device with split beam effect
JP5338863B2 (ja) * 2011-07-04 2013-11-13 株式会社ニコン 照明光学系、露光装置、露光方法およびデバイス製造方法
JP2012156536A (ja) * 2012-03-28 2012-08-16 Nikon Corp 照明光学装置、露光装置および露光方法
JP5533917B2 (ja) * 2012-03-28 2014-06-25 株式会社ニコン 照明光学系、露光装置およびデバイス製造方法
US9500855B2 (en) * 2012-06-04 2016-11-22 The Boeing Company Modal corrector mirror with compliant actuation for optical aberrations
JP5644921B2 (ja) * 2013-09-09 2014-12-24 株式会社ニコン 照明光学装置
CN104698764B (zh) * 2013-12-10 2017-01-25 上海微电子装备有限公司 对准成像装置
JP5761329B2 (ja) * 2013-12-27 2015-08-12 株式会社ニコン 照明光学装置、露光装置および露光方法
JP5928632B2 (ja) * 2015-04-03 2016-06-01 株式会社ニコン 照明光学装置、露光装置および露光方法
US10133187B2 (en) * 2015-05-29 2018-11-20 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus
EP3112745B1 (en) * 2015-06-29 2018-08-01 Martin Professional ApS Prism effect system for light fixture with inverted multi-facet prisms
DE102015225262A1 (de) * 2015-12-15 2017-06-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
JP6330830B2 (ja) * 2016-02-15 2018-05-30 株式会社ニコン 照明光学装置、露光装置および露光方法
WO2017194393A1 (en) 2016-05-11 2017-11-16 Asml Netherlands B.V. Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method
JP6493445B2 (ja) * 2017-05-11 2019-04-03 株式会社ニコン 照明光学装置、露光装置および露光方法
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
JP7167844B2 (ja) * 2019-05-10 2022-11-09 株式会社リコー 光学系、および画像投射装置
US20240377753A1 (en) * 2023-05-08 2024-11-14 Kla Corporation Dynamic freeform optics for lithography illumination beam shaping
US20250004288A1 (en) * 2023-06-30 2025-01-02 Lumentum Operations Llc Beam control for optical beams
CN117872612B (zh) * 2023-12-21 2025-09-30 中国科学院长春光学精密机械与物理研究所 一种集成激光通信和激光对抗的滑环装置及方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748019A (en) * 1968-03-02 1973-07-24 Agfa Gevaert Ag Photographic recording and reproducing method and apparatus utilizing spatial carrier frequencies
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
EP0507487B1 (en) * 1991-04-05 1996-12-18 Nippon Telegraph And Telephone Corporation Optical projection exposure method and system using the same
US5264898A (en) * 1991-08-29 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
JP3209218B2 (ja) * 1991-12-27 2001-09-17 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
US5703675A (en) * 1992-01-17 1997-12-30 Nikon Corporation Projection-exposing apparatus with deflecting grating member
JP3295956B2 (ja) * 1992-03-05 2002-06-24 株式会社ニコン 露光装置及び半導体素子の製造方法
JP3362405B2 (ja) * 1992-05-21 2003-01-07 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
WO1994020883A1 (en) * 1993-03-01 1994-09-15 General Signal Corporation Variable annular illuminator for photolithographic projection imager
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
EP0658810B1 (de) * 1993-12-13 1998-11-25 Carl Zeiss Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
US5828455A (en) * 1997-03-07 1998-10-27 Litel Instruments Apparatus, method of measurement, and method of data analysis for correction of optical system
US5978085A (en) * 1997-03-07 1999-11-02 Litel Instruments Apparatus method of measurement and method of data analysis for correction of optical system
DE19809395A1 (de) * 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
JPH11271619A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JPH11274060A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
EP0949541B1 (en) * 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithography apparatus
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
JPH11317344A (ja) * 1998-04-30 1999-11-16 Nikon Corp 露光装置
EP1014196A3 (en) * 1998-12-17 2002-05-29 Nikon Corporation Method and system of illumination for a projection optical apparatus
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
JP2001174615A (ja) * 1999-04-15 2001-06-29 Nikon Corp 回折光学素子、該素子の製造方法、該素子を備える照明装置、投影露光装置、露光方法、及び光ホモジナイザー、該光ホモジナイザーの製造方法
US6671035B2 (en) * 1999-09-29 2003-12-30 Asml Netherlands B.V. Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
JP2002110502A (ja) * 2000-09-26 2002-04-12 Canon Inc 照明装置及び露光装置
JP3507459B2 (ja) * 2001-07-09 2004-03-15 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法

Similar Documents

Publication Publication Date Title
BE2022C531I2 (enExample)
BE2022C547I2 (enExample)
BE2017C059I2 (enExample)
BE2017C055I2 (enExample)
BE2017C051I2 (enExample)
BE2017C032I2 (enExample)
BE2016C051I2 (enExample)
BE2015C077I2 (enExample)
BE2014C052I2 (enExample)
BE2014C036I2 (enExample)
BE2014C026I2 (enExample)
BE2007C047I2 (enExample)
AU2002307149A8 (enExample)
BE2011C034I2 (enExample)
BE2014C006I2 (enExample)
BRPI0209186B1 (enExample)
BE2017C050I2 (enExample)
BRPI0204884B1 (enExample)
CH1379220H1 (enExample)
BE2014C008I2 (enExample)
BE2016C021I2 (enExample)
BRPI0101486B8 (enExample)
BE2012C051I2 (enExample)
BRPI0210463A2 (enExample)
AU2000280389A8 (enExample)