TW200508812A - Optical illumination device, exposure device and exposure method - Google Patents

Optical illumination device, exposure device and exposure method

Info

Publication number
TW200508812A
TW200508812A TW093116640A TW93116640A TW200508812A TW 200508812 A TW200508812 A TW 200508812A TW 093116640 A TW093116640 A TW 093116640A TW 93116640 A TW93116640 A TW 93116640A TW 200508812 A TW200508812 A TW 200508812A
Authority
TW
Taiwan
Prior art keywords
aspect ratio
exposure
illumination device
optical illumination
variation means
Prior art date
Application number
TW093116640A
Other languages
Chinese (zh)
Inventor
Hisashi Nishinaga
Yuji Kudo
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200508812A publication Critical patent/TW200508812A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An optical illumination device, an exposure device and an exposure method are provided. The optical illumination device is used to illuminate an illuminated surface M based on a light beam from a light source 1. The optical illumination device has an aspect ratio variation means (8, 9) for varying an aspect ratio of a light strength distribution formed on an illumination pupil that is substantially located at a position having a Fourier transformation relation with the illuminated surface. The aspect ratio variation means is substantially located at or in the vicinity of a position having a Fourier transformation relation with the illumination pupil, and comprises optical element groups (8a, 8b, 9a, 9b). The aspect ratio variation means is capable of changing a power ratio at two perpendicular directions. Therefore, the aspect ratio of a secondary light source formed at the illumination pupil can be adjusted at any time.
TW093116640A 2003-06-16 2004-06-10 Optical illumination device, exposure device and exposure method TW200508812A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003170128 2003-06-16
JP2004150366 2004-05-20

Publications (1)

Publication Number Publication Date
TW200508812A true TW200508812A (en) 2005-03-01

Family

ID=33554420

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116640A TW200508812A (en) 2003-06-16 2004-06-10 Optical illumination device, exposure device and exposure method

Country Status (3)

Country Link
JP (1) JPWO2004112107A1 (en)
TW (1) TW200508812A (en)
WO (1) WO2004112107A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115453766A (en) * 2022-11-11 2022-12-09 南京英田光学工程股份有限公司 High-aspect-ratio beam expanding lens and laser communication terminal comprising same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036108A1 (en) 2007-11-09 2009-05-12 Asml Netherlands Bv Device Manufacturing Method and Lithographic Device, and Computer Program Product.
NL2017493B1 (en) * 2016-09-19 2018-03-27 Kulicke & Soffa Liteq B V Optical beam homogenizer based on a lens array
KR102541300B1 (en) * 2020-08-25 2023-06-09 세메스 주식회사 Apparatus for treating substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3295956B2 (en) * 1992-03-05 2002-06-24 株式会社ニコン Exposure apparatus and method for manufacturing semiconductor element
JPH11271619A (en) * 1998-03-19 1999-10-08 Nikon Corp Illumination optical device and exposure device provided with illumination optical device
JP2002231619A (en) * 2000-11-29 2002-08-16 Nikon Corp Optical illumination equipment and aligner equipped with the same
JP2003068604A (en) * 2001-08-23 2003-03-07 Nikon Corp Illumination optical equipment and aligner using the illumination optical equipment
JP2003142387A (en) * 2001-11-07 2003-05-16 Nikon Corp Illumination optical apparatus, exposure apparatus, and exposure method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115453766A (en) * 2022-11-11 2022-12-09 南京英田光学工程股份有限公司 High-aspect-ratio beam expanding lens and laser communication terminal comprising same

Also Published As

Publication number Publication date
JPWO2004112107A1 (en) 2006-07-27
WO2004112107A1 (en) 2004-12-23

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