TW200508812A - Optical illumination device, exposure device and exposure method - Google Patents
Optical illumination device, exposure device and exposure methodInfo
- Publication number
- TW200508812A TW200508812A TW093116640A TW93116640A TW200508812A TW 200508812 A TW200508812 A TW 200508812A TW 093116640 A TW093116640 A TW 093116640A TW 93116640 A TW93116640 A TW 93116640A TW 200508812 A TW200508812 A TW 200508812A
- Authority
- TW
- Taiwan
- Prior art keywords
- aspect ratio
- exposure
- illumination device
- optical illumination
- variation means
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microscoopes, Condenser (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
An optical illumination device, an exposure device and an exposure method are provided. The optical illumination device is used to illuminate an illuminated surface M based on a light beam from a light source 1. The optical illumination device has an aspect ratio variation means (8, 9) for varying an aspect ratio of a light strength distribution formed on an illumination pupil that is substantially located at a position having a Fourier transformation relation with the illuminated surface. The aspect ratio variation means is substantially located at or in the vicinity of a position having a Fourier transformation relation with the illumination pupil, and comprises optical element groups (8a, 8b, 9a, 9b). The aspect ratio variation means is capable of changing a power ratio at two perpendicular directions. Therefore, the aspect ratio of a secondary light source formed at the illumination pupil can be adjusted at any time.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003170128 | 2003-06-16 | ||
JP2004150366 | 2004-05-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200508812A true TW200508812A (en) | 2005-03-01 |
Family
ID=33554420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093116640A TW200508812A (en) | 2003-06-16 | 2004-06-10 | Optical illumination device, exposure device and exposure method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2004112107A1 (en) |
TW (1) | TW200508812A (en) |
WO (1) | WO2004112107A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115453766A (en) * | 2022-11-11 | 2022-12-09 | 南京英田光学工程股份有限公司 | High-aspect-ratio beam expanding lens and laser communication terminal comprising same |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1036108A1 (en) | 2007-11-09 | 2009-05-12 | Asml Netherlands Bv | Device Manufacturing Method and Lithographic Device, and Computer Program Product. |
NL2017493B1 (en) * | 2016-09-19 | 2018-03-27 | Kulicke & Soffa Liteq B V | Optical beam homogenizer based on a lens array |
KR102541300B1 (en) * | 2020-08-25 | 2023-06-09 | 세메스 주식회사 | Apparatus for treating substrate |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3295956B2 (en) * | 1992-03-05 | 2002-06-24 | 株式会社ニコン | Exposure apparatus and method for manufacturing semiconductor element |
JPH11271619A (en) * | 1998-03-19 | 1999-10-08 | Nikon Corp | Illumination optical device and exposure device provided with illumination optical device |
JP2002231619A (en) * | 2000-11-29 | 2002-08-16 | Nikon Corp | Optical illumination equipment and aligner equipped with the same |
JP2003068604A (en) * | 2001-08-23 | 2003-03-07 | Nikon Corp | Illumination optical equipment and aligner using the illumination optical equipment |
JP2003142387A (en) * | 2001-11-07 | 2003-05-16 | Nikon Corp | Illumination optical apparatus, exposure apparatus, and exposure method |
-
2004
- 2004-06-10 TW TW093116640A patent/TW200508812A/en unknown
- 2004-06-10 JP JP2005506913A patent/JPWO2004112107A1/en not_active Withdrawn
- 2004-06-10 WO PCT/JP2004/008096 patent/WO2004112107A1/en active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115453766A (en) * | 2022-11-11 | 2022-12-09 | 南京英田光学工程股份有限公司 | High-aspect-ratio beam expanding lens and laser communication terminal comprising same |
Also Published As
Publication number | Publication date |
---|---|
JPWO2004112107A1 (en) | 2006-07-27 |
WO2004112107A1 (en) | 2004-12-23 |
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