KR20020042462A - 조명 광학 장치, 해당 조명 광학 장치를 구비한 노광장치, 마이크로디바이스의 제조 방법 및 노광 방법 - Google Patents

조명 광학 장치, 해당 조명 광학 장치를 구비한 노광장치, 마이크로디바이스의 제조 방법 및 노광 방법 Download PDF

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Publication number
KR20020042462A
KR20020042462A KR1020010074517A KR20010074517A KR20020042462A KR 20020042462 A KR20020042462 A KR 20020042462A KR 1020010074517 A KR1020010074517 A KR 1020010074517A KR 20010074517 A KR20010074517 A KR 20010074517A KR 20020042462 A KR20020042462 A KR 20020042462A
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KR
South Korea
Prior art keywords
illumination
optical
optical system
mask
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020010074517A
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English (en)
Korean (ko)
Inventor
다니츠오사무
시부야마사토
도요다미츠노리
Original Assignee
시마무라 테루오
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 시마무라 테루오, 가부시키가이샤 니콘 filed Critical 시마무라 테루오
Publication of KR20020042462A publication Critical patent/KR20020042462A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020010074517A 2000-11-29 2001-11-28 조명 광학 장치, 해당 조명 광학 장치를 구비한 노광장치, 마이크로디바이스의 제조 방법 및 노광 방법 Withdrawn KR20020042462A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2000-00363225 2000-11-29
JP2000363225 2000-11-29
JPJP-P-2001-00074240 2001-03-15
JP2001074240A JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置

Publications (1)

Publication Number Publication Date
KR20020042462A true KR20020042462A (ko) 2002-06-05

Family

ID=26604841

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010074517A Withdrawn KR20020042462A (ko) 2000-11-29 2001-11-28 조명 광학 장치, 해당 조명 광학 장치를 구비한 노광장치, 마이크로디바이스의 제조 방법 및 노광 방법

Country Status (6)

Country Link
US (2) US20020085276A1 (enExample)
EP (1) EP1211561A3 (enExample)
JP (1) JP2002231619A (enExample)
KR (1) KR20020042462A (enExample)
SG (1) SG114513A1 (enExample)
TW (1) TW516097B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101020455B1 (ko) * 2003-10-28 2011-03-08 가부시키가이샤 니콘 조명 광학계, 투영 노광 장치, 노광 방법 및 디바이스 제조 방법
US8339578B2 (en) 2004-01-27 2012-12-25 Nikon Corporation Optical system, exposure system, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction

Families Citing this family (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW554411B (en) * 2001-08-23 2003-09-21 Nikon Corp Exposure apparatus
DE10144243A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
US7079321B2 (en) * 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
US7006295B2 (en) * 2001-10-18 2006-02-28 Asml Holding N.V. Illumination system and method for efficiently illuminating a pattern generator
TW567406B (en) 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
JP4207478B2 (ja) * 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
DE10322393A1 (de) * 2003-05-12 2004-12-02 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
JPWO2004112107A1 (ja) * 2003-06-16 2006-07-27 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2005032847A (ja) * 2003-07-09 2005-02-03 Advanced Lcd Technologies Development Center Co Ltd 結晶化装置、結晶化方法およびデバイス
JP4717813B2 (ja) * 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
JPWO2005062350A1 (ja) * 2003-12-19 2008-04-17 株式会社ニコン 光束変換素子、露光装置、照明光学系及び露光方法
EP1716457B9 (en) 2004-01-16 2012-04-04 Carl Zeiss SMT GmbH Projection system with a polarization-modulating element having a variable thickness profile
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
WO2005076083A1 (en) * 2004-02-07 2005-08-18 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP4497949B2 (ja) * 2004-02-12 2010-07-07 キヤノン株式会社 露光装置
US7276328B1 (en) * 2004-03-02 2007-10-02 Advanced Micro Devices, Inc. Lithography mask utilizing asymmetric light source
US20050225740A1 (en) * 2004-03-31 2005-10-13 Padlyar Sushil D Light source for photolithography
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US7400381B2 (en) * 2004-05-26 2008-07-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7116400B2 (en) * 2004-06-02 2006-10-03 Asml Netherlands B.V. Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method
JP4769448B2 (ja) * 2004-10-08 2011-09-07 キヤノン株式会社 干渉計を備えた露光装置及びデバイス製造方法
JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法
JP2006253487A (ja) * 2005-03-11 2006-09-21 Nikon Corp 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法
JP4591155B2 (ja) * 2005-03-30 2010-12-01 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7835076B2 (en) 2005-10-27 2010-11-16 Yale University Optical system for illumination of an evanescent field
EP1953806A1 (en) 2005-11-16 2008-08-06 Nikon Corporation Substrate processing method, photomask manufacturing method, photomask and device manufacturing method
JP4697426B2 (ja) * 2005-11-18 2011-06-08 株式会社ニコン 光強度分布の評価方法、照明光学装置およびその調整方法、露光装置、および露光方法
JP5103901B2 (ja) * 2006-01-27 2012-12-19 富士通セミコンダクター株式会社 半導体装置の製造方法
TWI570520B (zh) 2006-03-27 2017-02-11 尼康股份有限公司 照明光學裝置、曝光裝置以及元件製造方法
EP2009678A4 (en) 2006-04-17 2011-04-06 Nikon Corp OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
EP1857879A1 (en) * 2006-05-15 2007-11-21 Advanced Mask Technology Center GmbH & Co. KG An illumination system and a photolithography apparatus
JP5105316B2 (ja) * 2006-07-07 2012-12-26 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JPWO2008007633A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JP4883482B2 (ja) * 2006-08-18 2012-02-22 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JP2008071791A (ja) 2006-09-12 2008-03-27 Canon Inc 照明光学系、露光装置およびデバイス製造方法
JP2008071838A (ja) * 2006-09-12 2008-03-27 Nec Electronics Corp 半導体装置の製造方法
TWM324785U (en) * 2007-04-16 2008-01-01 Young Optics Inc Illumination system
US20080259304A1 (en) * 2007-04-20 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179329A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN101910817B (zh) 2008-05-28 2016-03-09 株式会社尼康 照明光学系统、曝光装置以及器件制造方法
EP2239084A1 (en) * 2009-04-07 2010-10-13 Excico France Method of and apparatus for irradiating a semiconductor material surface by laser energy
EP2253997A3 (en) * 2009-05-18 2010-12-08 Süss MicroTec Lithography GmbH Illumination system for a microlithographic contact and proximity exposure apparatus
US8079734B2 (en) * 2009-08-13 2011-12-20 Lite-On It Corporation Lighting device
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP4952800B2 (ja) * 2010-01-12 2012-06-13 株式会社ニコン 照明光学系、露光装置および露光方法
JP4952801B2 (ja) * 2010-01-12 2012-06-13 株式会社ニコン 照明光学系、露光装置および露光方法
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP2012018277A (ja) * 2010-07-07 2012-01-26 Olympus Imaging Corp 光路反射型のズームレンズを備えた撮像装置
RU2517545C1 (ru) * 2010-09-10 2014-05-27 Мартин Профешнл А/С Осветительное устройство с эффектом расщепления пучка
JP5338863B2 (ja) * 2011-07-04 2013-11-13 株式会社ニコン 照明光学系、露光装置、露光方法およびデバイス製造方法
JP2012156536A (ja) * 2012-03-28 2012-08-16 Nikon Corp 照明光学装置、露光装置および露光方法
JP5533917B2 (ja) * 2012-03-28 2014-06-25 株式会社ニコン 照明光学系、露光装置およびデバイス製造方法
US9500855B2 (en) * 2012-06-04 2016-11-22 The Boeing Company Modal corrector mirror with compliant actuation for optical aberrations
JP5644921B2 (ja) * 2013-09-09 2014-12-24 株式会社ニコン 照明光学装置
CN104698764B (zh) * 2013-12-10 2017-01-25 上海微电子装备有限公司 对准成像装置
JP5761329B2 (ja) * 2013-12-27 2015-08-12 株式会社ニコン 照明光学装置、露光装置および露光方法
JP5928632B2 (ja) * 2015-04-03 2016-06-01 株式会社ニコン 照明光学装置、露光装置および露光方法
US10133187B2 (en) * 2015-05-29 2018-11-20 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus
EP3112745B1 (en) * 2015-06-29 2018-08-01 Martin Professional ApS Prism effect system for light fixture with inverted multi-facet prisms
DE102015225262A1 (de) * 2015-12-15 2017-06-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
JP6330830B2 (ja) * 2016-02-15 2018-05-30 株式会社ニコン 照明光学装置、露光装置および露光方法
WO2017194393A1 (en) 2016-05-11 2017-11-16 Asml Netherlands B.V. Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method
JP6493445B2 (ja) * 2017-05-11 2019-04-03 株式会社ニコン 照明光学装置、露光装置および露光方法
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
JP7167844B2 (ja) * 2019-05-10 2022-11-09 株式会社リコー 光学系、および画像投射装置
US20240377753A1 (en) * 2023-05-08 2024-11-14 Kla Corporation Dynamic freeform optics for lithography illumination beam shaping
US20250004288A1 (en) * 2023-06-30 2025-01-02 Lumentum Operations Llc Beam control for optical beams
CN117872612B (zh) * 2023-12-21 2025-09-30 中国科学院长春光学精密机械与物理研究所 一种集成激光通信和激光对抗的滑环装置及方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748019A (en) * 1968-03-02 1973-07-24 Agfa Gevaert Ag Photographic recording and reproducing method and apparatus utilizing spatial carrier frequencies
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
EP0507487B1 (en) * 1991-04-05 1996-12-18 Nippon Telegraph And Telephone Corporation Optical projection exposure method and system using the same
US5264898A (en) * 1991-08-29 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
JP3209218B2 (ja) * 1991-12-27 2001-09-17 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
US6249335B1 (en) * 1992-01-17 2001-06-19 Nikon Corporation Photo-mask and method of exposing and projection-exposing apparatus
JP3295956B2 (ja) * 1992-03-05 2002-06-24 株式会社ニコン 露光装置及び半導体素子の製造方法
JP3362405B2 (ja) * 1992-05-21 2003-01-07 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
WO1994020883A1 (en) * 1993-03-01 1994-09-15 General Signal Corporation Variable annular illuminator for photolithographic projection imager
EP0658810B1 (de) * 1993-12-13 1998-11-25 Carl Zeiss Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
US5828455A (en) * 1997-03-07 1998-10-27 Litel Instruments Apparatus, method of measurement, and method of data analysis for correction of optical system
US5978085A (en) * 1997-03-07 1999-11-02 Litel Instruments Apparatus method of measurement and method of data analysis for correction of optical system
DE19809395A1 (de) * 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
JPH11271619A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JPH11274060A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
EP0949541B1 (en) * 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithography apparatus
JPH11317344A (ja) * 1998-04-30 1999-11-16 Nikon Corp 露光装置
KR20000048227A (ko) * 1998-12-17 2000-07-25 오노 시게오 이미지 투사 장치를 이용한 표면 조명 방법 및 조명 광학시스템
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
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US20020085276A1 (en) 2002-07-04
JP2002231619A (ja) 2002-08-16
SG114513A1 (en) 2005-09-28
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EP1211561A2 (en) 2002-06-05
US20040263817A1 (en) 2004-12-30

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