EP2050841B1 - Alkalisches Galvanikbad mit einer Filtrationsmembran - Google Patents

Alkalisches Galvanikbad mit einer Filtrationsmembran Download PDF

Info

Publication number
EP2050841B1
EP2050841B1 EP09152660.8A EP09152660A EP2050841B1 EP 2050841 B1 EP2050841 B1 EP 2050841B1 EP 09152660 A EP09152660 A EP 09152660A EP 2050841 B1 EP2050841 B1 EP 2050841B1
Authority
EP
European Patent Office
Prior art keywords
bath
filtration membrane
electroplating bath
zinc
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
EP09152660.8A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2050841A1 (de
Inventor
Karlheinz Arzt
Jens-Eric Geissler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35530823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP2050841(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Priority to EP09152660.8A priority Critical patent/EP2050841B1/de
Priority to ES09152660.8T priority patent/ES2574158T3/es
Publication of EP2050841A1 publication Critical patent/EP2050841A1/de
Application granted granted Critical
Publication of EP2050841B1 publication Critical patent/EP2050841B1/de
Revoked legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange

Definitions

  • the invention relates to an alkaline electroplating bath for applying zinc alloys to substrates, in which the anode space and the cathode space are separated from one another by a filtration membrane.
  • zinc alloys can be deposited on substrates in a consistently high quality.
  • the electroplating bath is operated with zinc alloy baths containing organic additives such as brighteners and wetting agents and complexing agents in addition to soluble zinc salts and optionally other metal salts selected from iron, nickel, cobalt and tin salts as defined in claim 1.
  • Bath dilution reduces the concentration of impurities in proportion to the degree of dilution.
  • a dilution is easy to carry out, but has the disadvantage that the amount of electrolyte removed from the bath has to be supplied to cost-intensive disposal.
  • a complete new approach of the bath can be considered in this context as a special case of Badver Mednung.
  • Alkaline Zn baths contain a factor of 5 to 10 lower proportion of organic additives as acidic baths. Accordingly, contamination by decomposition products is generally less critical. In the case of alkaline alloy baths, however, the addition of significant amounts of organic complexing agents is required to complex the alloying additive (Fe, Co, Ni, Sn). These are oxidatively degraded at the anode and the accumulated decomposition products have a negative effect on the production process.
  • the EP 1 369 505 A2 discloses a method for purifying a zinc-nickel electrolyte in a galvanic process in which a portion of the process bath used in the process is evaporated until phase separation into a lower phase, at least one middle phase and an upper phase occurs, and the lower one and the upper phase are separated. This process requires several stages and is disadvantageous in terms of its energy requirements from a cost point of view.
  • the WO 00/06807 and WO 01/96631 describe electroplating baths for applying zinc-nickel coatings. To avoid the undesirable decomposition of additives at the anode, it is proposed to separate the anode from the alkaline electrolyte through an ion exchange membrane.
  • the baths known in the prior art have the disadvantage that in the anodic decomposition of the nitrogen-containing complexing agent cyanide is formed and accumulates in non-negligible concentration.
  • the WO 2005/073438 which belongs to the prior art according to Article 54 (3) EPC, describes an apparatus for the electrolytic deposition of zinc or alloys of zinc with at least one other metal selected from iron, cobalt, nickel and manganese on a workpiece comprising: (a) a basin divided by a separator into a cathode compartment and an anode compartment; (b) the workpiece immersed in an aqueous alkaline-pH cathode liquid contained in the cathode compartment and comprising zincate ions and optionally ions of the metal other than zinc; and (c) an alkaline pH aqueous anode liquid contained in the anode compartment and surrounding an anode of the anode liquid insoluble metal; wherein the separator is made of an open-cell material and satisfies the following three tests: (1) the pore diameters have a dimension between 10 nm and 50 ⁇ m; (2) In a basin containing an aqueous solution of 120 g / l NaOH,
  • the invention has for its object to provide an alkaline electroplating bath, which does not have the aforementioned disadvantages.
  • the life of the bath is to be increased, the anodic decomposition of organic constituents of the bath to be minimized and, when it is used, a layer thickness of consistently high quality to be obtained on the coated substrate.
  • the invention relates to an alkaline electroplating bath for applying zinc alloys on substrates having a cathode and an anode, comprising a zinc alloy bath, wherein the anode space and the cathode space are separated from each other by a filtration membrane, wherein the size of the pores of the filtration membrane in the range of 0.001 to 1 , 0 microns and wherein the zinc alloy bath comprises the following components: 80-250 g / l NaOH or KOH; 5-20 g / l zinc in the form of the soluble zinc salt; 0.02-10 g / l of the alloying metal Ni, Fe, Co, Sn in the form of the soluble metal salts; 2-200 g / l complexing agent selected from polyalkenylamines, alkanolamines, polyhydroxycarboxylates; 0.1-5 g / l aromatic or heteroaromatic brightener.
  • filtration membranes are used.
  • the size of the pores of this Filtration membranes is in a range of 0.001 to 1.0 microns, depending on the type of membrane (nano- or ultrafiltration membrane).
  • filtration membranes are used with a pore size in the range of 0.05 to 0.5 microns.
  • the pore size is in a range of 0.1 to 0, 3 microns.
  • the filtration membrane contained in the alkaline electroplating bath according to the invention may consist of various organic or inorganic, alkali-resistant materials. These materials are, for example, ceramics, polytetrafluoroethylene (PTFE), polysulfones and polypropylene.
  • PTFE polytetrafluoroethylene
  • polysulfones polysulfones
  • polypropylene polypropylene
  • filtration membranes made of polypropylene.
  • the filtration membrane in the alkaline electroplating bath according to the invention is designed as a flat membrane.
  • the alkaline electroplating bath according to the invention can also be realized with other membrane forms, examples being hoses, capillaries and hollow fibers.
  • Such baths are for example in US 5,417,840 .
  • US 4,421,611 US 4,877,496 or US 6,652,728 described.
  • the alkaline electroplating bath according to the invention has the advantage that in it also baths for the deposition of zinc alloys can be used, which are suitable for use in the from WO 00/06807 and WO 01/96631 known alkaline zinc-nickel bath with an ion exchange membrane are not suitable.
  • sold by the applicant bath "Protedur Ni-75" to call which is characterized by a particularly high efficiency.
  • the previously used anodes can be used further. These are mostly nickel anodes.
  • the use of these anodes is less expensive than that from the WO 00/06807 known electroplating bath, in which special platinum-plated titanium anodes must be used in addition.
  • the anode space is preferably made smaller than the cathode space, since the essential processes take place there.
  • Both baths were operated with and without filtration membrane in 5-liter tanks.
  • the filtration membrane used was the Abwa-Tec polymer membrane P150F, which has a pore size of 0.12 ⁇ m.
  • the membrane was placed in the anode to cathode bath with the anolyte and catholyte being identical, ie, no special anolyte was added.
  • iron sheets (7 ⁇ 10 cm), which are usually used for Hull cell tests, were used as workpieces to be coated and coated at a current density of 2 A / dm 2 .
  • the baths were operated in serial connection. The movement of the iron sheets was mechanical, at a speed of 1.4 m / min.
  • Table 2 shows the Hull cell layer thickness in a new approach and old approach depending on the throughput with and without filtration membrane. The layer thickness measurements were made after adjustment of the baths.
  • the dots are on the Hullzellenblechen 3 cm from the bottom edge and 2.5 cm from the left or right side edge. On the left side is the high current density (point A) and on the right the low current density (point B).
  • the average layer thickness is about 35% higher in a new batch in the high current density range and about 19% higher in the low current density range as if one had not used a filtration membrane. In the old batch, it is on average 17% and 12% higher than without filtration membrane.
  • a filtration membrane is produced after a throughput of> 1000 Ah / l introduced after a short time comparable to a new approach current efficiency.
  • composition of the aforementioned baths were analyzed according to the tests described above. Of particular interest was their cyanide content. This was much lower when using the baths according to the invention with a filtration membrane as baths without membrane. As shown in Table 4 below, a bath without the membrane had a cyanide content of 680 mg / L (new batch) and 790 mg / L (bath of> 1000 Ah / L), respectively, while the corresponding membrane baths contained a cyanide Content of 96 mg / L or 190 mg / L.
  • the cyanide content of an old batch ie a bath with> 1000 Ah / l can be reduced when it is provided with a filtration membrane and operated.
  • the cyanide content was reduced from 670 mg / l to 190 mg / l.
  • the color of the baths was also evaluated. It was found that the color of a freshly prepared bath without membrane changed from initially violet-orange to brown within 15 Ah / l, whereby it remained purple or violet-orange over the entire time when using a filtration membrane. The old batch remained brown without using a membrane and the color changed to orange-brown after 15 Ah / l using a filtration membrane. Violet is also the color of freshly applied baths, which then turn to orange (after a few Ah / l) and at high throughput in brown.
  • the voltage between anode and cathode was measured. It was about 3 V and was only about 50-100 mV higher in both approaches using a filtration membrane. Is used instead of the filtration membrane an ion exchange membrane, as in the WO 00/06807 described is, the voltage is higher by at least 500 mV. This again shows the advantage of using a filtration membrane instead of an ion exchange membrane.
  • the use of filtration membranes over the use of ion exchange membranes offers many advantages.
  • the coating process carried out therewith is more cost-effective, since no platinized anodes have to be used, catholyte and anolyte can have the same composition, and thus no circulation for the anolyte is required.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
EP09152660.8A 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran Revoked EP2050841B1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP09152660.8A EP2050841B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran
ES09152660.8T ES2574158T3 (es) 2005-04-26 2005-04-26 Baño galvánico alcalino con una membrana de filtración

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05009127A EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran
EP09152660.8A EP2050841B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
EP05009127A Division EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Publications (2)

Publication Number Publication Date
EP2050841A1 EP2050841A1 (de) 2009-04-22
EP2050841B1 true EP2050841B1 (de) 2016-05-11

Family

ID=35530823

Family Applications (2)

Application Number Title Priority Date Filing Date
EP05009127A Active EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran
EP09152660.8A Revoked EP2050841B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP05009127A Active EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Country Status (11)

Country Link
US (1) US8293092B2 (ja)
EP (2) EP1717353B1 (ja)
JP (1) JP4955657B2 (ja)
KR (1) KR101301275B1 (ja)
CN (3) CN104911676B (ja)
AT (1) ATE429528T1 (ja)
BR (1) BRPI0610765B1 (ja)
CA (1) CA2600273C (ja)
DE (1) DE502005007138D1 (ja)
ES (2) ES2324169T3 (ja)
WO (1) WO2006114305A1 (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090107545A1 (en) * 2006-10-09 2009-04-30 Soltaix, Inc. Template for pyramidal three-dimensional thin-film solar cell manufacturing and methods of use
ITTO20070704A1 (it) 2007-10-05 2009-04-06 Create New Technology S R L Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
US8177944B2 (en) 2007-12-04 2012-05-15 Ebara Corporation Plating apparatus and plating method
DE102008056776A1 (de) 2008-11-11 2010-05-12 Enthone Inc., West Haven Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
ES2404844T3 (es) 2010-05-07 2013-05-29 Dr.Ing. Max Schlötter Gmbh & Co. Kg Regeneración de electrolitos de cinc-níquel alcalinos mediante la eliminación de iones cianuro
IT1405319B1 (it) * 2010-12-27 2014-01-03 Fontana R D S R L Procedimento di rivestimento di pezzi metallici filettati
KR101420865B1 (ko) * 2012-10-12 2014-07-18 주식회사 익스톨 금속 도금장치
EP2784189A1 (en) 2013-03-28 2014-10-01 Coventya SAS Electroplating bath for zinc-iron alloys, method for depositing zinc-iron alloy on a device and such a device
JP6142408B2 (ja) 2015-03-13 2017-06-07 奥野製薬工業株式会社 治具用電解剥離剤
BR112015028629A2 (pt) * 2015-07-22 2017-07-25 Dipsol Chem método de eletrogalvanização de liga de zinco
EP3042985B1 (en) 2015-07-22 2019-04-10 Dipsol Chemicals Co., Ltd. Zinc alloy plating method
CA3024991A1 (en) * 2016-05-24 2017-11-30 Coventya, Inc. Ternary zinc-nickel-iron alloys and alkaline electrolytes for plating such alloys
CA3032224A1 (en) * 2016-07-29 2018-02-01 Simon Fraser University Methods of electrochemical deposition
EP3358045A1 (de) * 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
ES2969188T3 (es) 2017-06-14 2024-05-16 Dr Ing Max Schloetter Gmbh & Co Kg Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos
EP3461933B1 (en) 2017-09-28 2019-09-04 ATOTECH Deutschland GmbH Method for electrolytically depositing a zinc-nickel alloy layer on at least a substrate to be treated
US11165091B2 (en) 2018-01-23 2021-11-02 City University Of Hong Kong Battery system and a method of forming a battery
CA3127517A1 (en) * 2019-01-24 2020-07-30 Atotech Deutschland Gmbh Membrane anode system for electrolytic zinc-nickel alloy deposition
WO2020166062A1 (ja) 2019-02-15 2020-08-20 ディップソール株式会社 亜鉛又は亜鉛合金電気めっき方法及びシステム
RU2712582C1 (ru) * 2019-07-16 2020-01-29 Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" Электролит для электроосаждения цинк-железных покрытий
EP4273303A1 (en) * 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Method for depositing a zinc-nickel alloy on a substrate, an aqueous zinc-nickel deposition bath, a brightening agent and use thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3945900A (en) 1972-05-02 1976-03-23 Dorr-Oliver Incorporated Electro ultrafiltration process and apparatus
EP0649918A1 (en) 1993-10-21 1995-04-26 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
US5616246A (en) 1990-10-30 1997-04-01 Minnestoa Mining & Manufacturing Company Hydrophilic membranes for electrochemical devices and method for preparing same
US6383352B1 (en) 1998-11-13 2002-05-07 Mykrolis Corporation Spiral anode for metal plating baths
EP1553211A1 (en) 2002-07-25 2005-07-13 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB381931A (en) * 1931-07-11 1932-10-11 Mond Nickel Co Ltd Improvements relating to electro-plating and the electrodeposition of metals
IE39814B1 (en) * 1973-08-03 1979-01-03 Parel Sa Electrochemical process and apparatus
US4250002A (en) * 1979-09-19 1981-02-10 Hooker Chemicals & Plastics Corp. Polymeric microporous separators for use in electrolytic processes and devices
US4421611A (en) 1982-09-30 1983-12-20 Mcgean-Rohco, Inc. Acetylenic compositions and nickel plating baths containing same
JPS6353285A (ja) 1986-08-22 1988-03-07 Nippon Hyomen Kagaku Kk 亜鉛−ニツケル合金めつき液
JPH01116094A (ja) * 1987-10-28 1989-05-09 Eagle Ind Co Ltd 隔膜鍍金法
JPH02141596A (ja) * 1988-11-21 1990-05-30 Yuken Kogyo Kk ジンケート型亜鉛合金メッキ浴
JPH0444375A (ja) * 1990-06-12 1992-02-14 Zexel Corp レーザ共振器のアライメント装置
US5082538A (en) 1991-01-09 1992-01-21 Eltech Systems Corporation Process for replenishing metals in aqueous electrolyte solutions
CN2175238Y (zh) * 1993-09-29 1994-08-24 北京科技大学 锌-镍合金电镀用阳极
US5631102A (en) * 1996-02-12 1997-05-20 Wilson Greatbatch Ltd. Separator insert for electrochemical cells
JPH11200099A (ja) 1998-01-08 1999-07-27 Toyo Kohan Co Ltd 不溶性陽極を用いるめっき方法およびめっき装置
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE19840019C1 (de) 1998-09-02 2000-03-16 Atotech Deutschland Gmbh Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren
JP2000087299A (ja) * 1998-09-08 2000-03-28 Ebara Corp 基板メッキ装置
JP4060012B2 (ja) * 1999-07-19 2008-03-12 日本エレクトロプレイテイング・エンジニヤース株式会社 カップ式めっき装置
DE60023190T3 (de) 2000-06-15 2016-03-10 Coventya, Inc. Zink-nickel-elektroplattierung
FR2839729B1 (fr) * 2002-05-16 2005-02-11 Univ Toulouse Procede de protection d'un substrat en acier ou alliage d'aluminium contre la corrosion permettant de lui conferer des proprietes tribologiques, et substrat obtenu
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
EP1639155B1 (en) 2003-06-03 2016-11-02 Coventya, Inc. Zinc and zinc-alloy electroplating
JP4120497B2 (ja) * 2003-06-27 2008-07-16 Ｊｆｅスチール株式会社 電気亜鉛系めっき鋼板
FR2864553B1 (fr) 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3945900A (en) 1972-05-02 1976-03-23 Dorr-Oliver Incorporated Electro ultrafiltration process and apparatus
US5616246A (en) 1990-10-30 1997-04-01 Minnestoa Mining & Manufacturing Company Hydrophilic membranes for electrochemical devices and method for preparing same
EP0649918A1 (en) 1993-10-21 1995-04-26 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
US6383352B1 (en) 1998-11-13 2002-05-07 Mykrolis Corporation Spiral anode for metal plating baths
EP1553211A1 (en) 2002-07-25 2005-07-13 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film

Also Published As

Publication number Publication date
JP2008539329A (ja) 2008-11-13
DE502005007138D1 (de) 2009-06-04
US8293092B2 (en) 2012-10-23
BRPI0610765B1 (pt) 2017-04-04
JP4955657B2 (ja) 2012-06-20
ATE429528T1 (de) 2009-05-15
CN101146934A (zh) 2008-03-19
CN104911676B (zh) 2017-11-17
CN104911676A (zh) 2015-09-16
ES2324169T3 (es) 2009-07-31
EP1717353A1 (de) 2006-11-02
KR101301275B1 (ko) 2013-08-29
US20090107845A1 (en) 2009-04-30
CA2600273A1 (en) 2006-11-02
CA2600273C (en) 2014-08-12
EP2050841A1 (de) 2009-04-22
CN104911651A (zh) 2015-09-16
WO2006114305A1 (en) 2006-11-02
ES2574158T3 (es) 2016-06-15
BRPI0610765A2 (pt) 2010-07-20
KR20070122454A (ko) 2007-12-31
EP1717353B1 (de) 2009-04-22

Similar Documents

Publication Publication Date Title
EP2050841B1 (de) Alkalisches Galvanikbad mit einer Filtrationsmembran
EP0862665B1 (de) Verfahren zur elektrolytischen abscheidung von metallschichten
EP2116634B1 (de) Modifizierter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten
EP3666931A1 (de) Verfahren zur herstellung eines mit einer beschichtung aus chrom und chromoxid beschichteten metallbands auf basis einer elektrolytlösung mit einer dreiwertigen chromverbindung
EP3481976B1 (de) Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
DE4023444A1 (de) Cyanid-freies verfahren zur herstellung eines galvanischen kupferueberzuges
DE102010044551A1 (de) Anode sowie deren Verwendung in einem alkalischen Galvanikbad
EP3250733B1 (de) Herstellung von chromschichten auf tiefdruckzylindern
EP3067444B1 (de) Abscheidung von dekorativen palladium-eisen-legierungsbeschichtungen auf metallischen substanzen
EP2635724A1 (de) Verfahren zur abscheidung von hartchrom aus cr(vi)-freien elektrolyten
DE3029364A1 (de) Verfahren zur herstellung von kathoden mit niedriger wasserstoffueberspannung und ihre verwendung
EP1080252B1 (de) Verfahren zur galvanischen verkupferung von substraten
EP3415665B1 (de) Verfahren zur galvanischen abscheidung von zink-nickel-legierungsüberzügen aus einem alkalischen zink-nickel-legierungsbad mit reduziertem abbau von additiven
EP2384800B1 (de) Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen
DE102009023124A1 (de) Verfahren zur galvanischen Kupferbeschichtung und Vorrichtung zur Durchführung eines solchen Verfahrens
DE102019202899B3 (de) Wässrige Formulierung zum Herstellen einer Schicht aus Gold und Silber
DE2646697A1 (de) Verfahren zum behandeln von verzinktem metallband
DE2929305C2 (de) Verfahren und Vorrichtung zur kontinuierlichen galvanischen Abscheidung von Mangan auf Stahl
DE19610361A1 (de) Bad und Verfahren für die galvanische Abscheidung von Halbglanznickel
EP2878711A1 (de) Verfahren zur galvanischen Abscheidung von Nickel und entsprechender Elektrolyt
DE2063991A1 (de) Wässriges Chrombad und Verfahren zum Verchromen
AT222969B (de) Verfahren und Lösung zur elektrolytischen Abscheidung einer Legierung auf Metalloberflächen
WO2023041670A1 (de) Chrom-indium-, chrom-bismut- und chrom-antimon-beschichtung, verfahren zur herstellung und verwendung
DE102020131371A1 (de) Rutheniumlegierungsschicht und deren Schichtkombinationen
EP2431500A1 (de) Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen mit Hilfe von löslichen quartären Ammoniumverbindungen

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AC Divisional application: reference to earlier application

Ref document number: 1717353

Country of ref document: EP

Kind code of ref document: P

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

17P Request for examination filed

Effective date: 20090923

17Q First examination report despatched

Effective date: 20091022

AKX Designation fees paid

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: ATOTECH DEUTSCHLAND GMBH

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20151216

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AC Divisional application: reference to earlier application

Ref document number: 1717353

Country of ref document: EP

Kind code of ref document: P

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 798744

Country of ref document: AT

Kind code of ref document: T

Effective date: 20160515

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2574158

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20160615

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 502005015224

Country of ref document: DE

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20160511

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160912

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160812

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

REG Reference to a national code

Ref country code: DE

Ref legal event code: R026

Ref document number: 502005015224

Country of ref document: DE

PLBI Opposition filed

Free format text: ORIGINAL CODE: 0009260

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

26 Opposition filed

Opponent name: CONVENTYA HOLDING SAS

Effective date: 20170208

PLAX Notice of opposition and request to file observation + time limit sent

Free format text: ORIGINAL CODE: EPIDOSNOBS2

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 13

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

PLBB Reply of patent proprietor to notice(s) of opposition received

Free format text: ORIGINAL CODE: EPIDOSNOBS3

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20170426

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170430

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170426

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170430

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170426

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20170430

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 14

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170426

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170430

REG Reference to a national code

Ref country code: AT

Ref legal event code: MM01

Ref document number: 798744

Country of ref document: AT

Kind code of ref document: T

Effective date: 20170426

PLCK Communication despatched that opposition was rejected

Free format text: ORIGINAL CODE: EPIDOSNREJ1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170426

APAH Appeal reference modified

Free format text: ORIGINAL CODE: EPIDOSCREFNO

APBM Appeal reference recorded

Free format text: ORIGINAL CODE: EPIDOSNREFNO

APBP Date of receipt of notice of appeal recorded

Free format text: ORIGINAL CODE: EPIDOSNNOA2O

APBQ Date of receipt of statement of grounds of appeal recorded

Free format text: ORIGINAL CODE: EPIDOSNNOA3O

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20050426

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160511

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160511

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160911

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CZ

Payment date: 20210426

Year of fee payment: 17

Ref country code: DE

Payment date: 20210420

Year of fee payment: 17

Ref country code: IT

Payment date: 20210427

Year of fee payment: 17

Ref country code: FR

Payment date: 20210423

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 20210621

Year of fee payment: 17

APBU Appeal procedure closed

Free format text: ORIGINAL CODE: EPIDOSNNOA9O

REG Reference to a national code

Ref country code: DE

Ref legal event code: R103

Ref document number: 502005015224

Country of ref document: DE

Ref country code: DE

Ref legal event code: R064

Ref document number: 502005015224

Country of ref document: DE

RDAF Communication despatched that patent is revoked

Free format text: ORIGINAL CODE: EPIDOSNREV1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: PATENT REVOKED

RDAG Patent revoked

Free format text: ORIGINAL CODE: 0009271

REG Reference to a national code

Ref country code: FI

Ref legal event code: MGE

27W Patent revoked

Effective date: 20211029

REG Reference to a national code

Ref country code: AT

Ref legal event code: MA03

Ref document number: 798744

Country of ref document: AT

Kind code of ref document: T

Effective date: 20211029