EP1114202A1 - Verfahren zur phosphatierung, nachspülung und kathodischer elektrotauchlackierung - Google Patents
Verfahren zur phosphatierung, nachspülung und kathodischer elektrotauchlackierungInfo
- Publication number
- EP1114202A1 EP1114202A1 EP99939400A EP99939400A EP1114202A1 EP 1114202 A1 EP1114202 A1 EP 1114202A1 EP 99939400 A EP99939400 A EP 99939400A EP 99939400 A EP99939400 A EP 99939400A EP 1114202 A1 EP1114202 A1 EP 1114202A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- ions
- phosphating
- rinsing
- process step
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 90
- 238000003618 dip coating Methods 0.000 title abstract 3
- 239000000243 solution Substances 0.000 claims abstract description 70
- 239000003973 paint Substances 0.000 claims abstract description 27
- 239000011701 zinc Substances 0.000 claims abstract description 27
- -1 silver ions Chemical class 0.000 claims abstract description 25
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 23
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 19
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910001431 copper ion Inorganic materials 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 11
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 9
- 239000007864 aqueous solution Substances 0.000 claims abstract description 9
- 229910052709 silver Inorganic materials 0.000 claims abstract description 9
- 239000004332 silver Substances 0.000 claims abstract description 9
- 239000010959 steel Substances 0.000 claims abstract description 9
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910001416 lithium ion Inorganic materials 0.000 claims abstract description 6
- 229910001335 Galvanized steel Inorganic materials 0.000 claims abstract description 5
- 239000008397 galvanized steel Substances 0.000 claims abstract description 5
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 3
- 239000000956 alloy Substances 0.000 claims abstract description 3
- 238000004070 electrodeposition Methods 0.000 claims description 29
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 24
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 19
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 13
- 150000001768 cations Chemical class 0.000 claims description 12
- 239000011572 manganese Substances 0.000 claims description 12
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 11
- 229910052742 iron Inorganic materials 0.000 claims description 11
- 229910052744 lithium Inorganic materials 0.000 claims description 11
- 229910001453 nickel ion Inorganic materials 0.000 claims description 11
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 10
- 229910052748 manganese Inorganic materials 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 239000012487 rinsing solution Substances 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 8
- 150000001204 N-oxides Chemical class 0.000 claims description 5
- IDCPFAYURAQKDZ-UHFFFAOYSA-N 1-nitroguanidine Chemical compound NC(=N)N[N+]([O-])=O IDCPFAYURAQKDZ-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 38
- 229910052759 nickel Inorganic materials 0.000 abstract description 21
- 239000004411 aluminium Substances 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 description 23
- 238000005260 corrosion Methods 0.000 description 23
- 229910019142 PO4 Inorganic materials 0.000 description 20
- 235000021317 phosphate Nutrition 0.000 description 20
- 239000010452 phosphate Substances 0.000 description 17
- 239000010949 copper Substances 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 229910021645 metal ion Inorganic materials 0.000 description 9
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 7
- 229910002651 NO3 Inorganic materials 0.000 description 7
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 230000007613 environmental effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 4
- 239000004922 lacquer Substances 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000002161 passivation Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- ONMOULMPIIOVTQ-UHFFFAOYSA-M 3-Nitrobenzene sulphonate Chemical compound [O-][N+](=O)C1=CC=CC(S([O-])(=O)=O)=C1 ONMOULMPIIOVTQ-UHFFFAOYSA-M 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 150000002611 lead compounds Chemical class 0.000 description 3
- 229910001437 manganese ion Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 3
- 238000005554 pickling Methods 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001844 chromium Chemical class 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 150000001845 chromium compounds Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 2
- 229910000399 iron(III) phosphate Inorganic materials 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 229910001463 metal phosphate Inorganic materials 0.000 description 2
- 150000002816 nickel compounds Chemical class 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 230000008092 positive effect Effects 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 150000003388 sodium compounds Chemical class 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- JUWGUJSXVOBPHP-UHFFFAOYSA-B titanium(4+);tetraphosphate Chemical compound [Ti+4].[Ti+4].[Ti+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O JUWGUJSXVOBPHP-UHFFFAOYSA-B 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- AFPHTEQTJZKQAQ-UHFFFAOYSA-N 3-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC([N+]([O-])=O)=C1 AFPHTEQTJZKQAQ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910000680 Aluminized steel Inorganic materials 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101100117236 Drosophila melanogaster speck gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- LFTLOKWAGJYHHR-UHFFFAOYSA-N N-methylmorpholine N-oxide Chemical compound CN1(=O)CCOCC1 LFTLOKWAGJYHHR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- RVGMCVRSUKTFHN-UHFFFAOYSA-G [F-].[Zr+4].[Al+3].[F-].[F-].[F-].[F-].[F-].[F-] Chemical class [F-].[Zr+4].[Al+3].[F-].[F-].[F-].[F-].[F-].[F-] RVGMCVRSUKTFHN-UHFFFAOYSA-G 0.000 description 1
- KLARSDUHONHPRF-UHFFFAOYSA-N [Li].[Mn] Chemical compound [Li].[Mn] KLARSDUHONHPRF-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000004973 alkali metal peroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- XQTIWNLDFPPCIU-UHFFFAOYSA-N cerium(3+) Chemical compound [Ce+3] XQTIWNLDFPPCIU-UHFFFAOYSA-N 0.000 description 1
- ITZXULOAYIAYNU-UHFFFAOYSA-N cerium(4+) Chemical compound [Ce+4] ITZXULOAYIAYNU-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- LVYZJEPLMYTTGH-UHFFFAOYSA-H dialuminum chloride pentahydroxide dihydrate Chemical compound [Cl-].[Al+3].[OH-].[OH-].[Al+3].[OH-].[OH-].[OH-].O.O LVYZJEPLMYTTGH-UHFFFAOYSA-H 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000009189 diving Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000009863 impact test Methods 0.000 description 1
- CDAISMWEOUEBRE-GPIVLXJGSA-N inositol Chemical compound O[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@H](O)[C@@H]1O CDAISMWEOUEBRE-GPIVLXJGSA-N 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- UJJUJHTVDYXQON-UHFFFAOYSA-N nitro benzenesulfonate Chemical compound [O-][N+](=O)OS(=O)(=O)C1=CC=CC=C1 UJJUJHTVDYXQON-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000005385 peroxodisulfate group Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- CDAISMWEOUEBRE-UHFFFAOYSA-N scyllo-inosotol Natural products OC1C(O)C(O)C(O)C(O)C1O CDAISMWEOUEBRE-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/20—Pretreatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/12—Orthophosphates containing zinc cations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/18—Orthophosphates containing manganese cations
- C23C22/182—Orthophosphates containing manganese cations containing also zinc cations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
- C23C22/36—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates
- C23C22/364—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates containing also manganese cations
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/82—After-treatment
- C23C22/83—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
Definitions
- the invention relates to a section of a sequence of processes as is customary for coating metal surfaces, in particular in vehicle construction: phosphating followed by rinsing and cathodic electrocoating. It solves the problem that low-lead or lead-free cathodically depositable electrodeposition paints on a phosphate layer, which was produced with a low-nickel phosphating solution, often have significantly poorer corrosion protection and paint adhesion properties than either lead-containing cathodically depositable electrodeposition paints or lead-free cathodically depositable electrodeposition paints with a phosphate layer a nickel-rich phosphating solution.
- the method can be used to treat surfaces made of steel, galvanized or alloy-galvanized steel, aluminum, aluminized or alloy-aluminized steel.
- the phosphating of metals pursues the goal of producing firmly adhered metal phosphate layers that already improve the corrosion resistance and in conjunction with paints and other organic coatings contribute to a significant increase in paint adhesion and resistance to infiltration when exposed to corrosion.
- Such phosphating processes have long been known.
- the low-zinc phosphating processes, in which the phosphating solutions are comparatively suitable, are particularly suitable for pretreatment before painting low levels of zinc ions of e.g. B. 0.3 to 3 g / 1 and in particular 0.5 to 2 g / 1.
- DE-A-39 20 296 describes a phosphating process which dispenses with nickel and uses magnesium ions in addition to zinc and manganese ions.
- the phosphating baths described here contain, in addition to 0.2 to 10 g / l nitrate ions, further oxidizing agents which act as accelerators, selected from nitrite, chlorate or an organic oxidizing agent.
- EP-A-60 716 discloses low-zinc phosphating baths which contain zinc and manganese as essential cations and which can contain nickel as an optional component.
- the necessary accelerators are preferably selected from nitrite, m-nitrobenzenesulfonate or hydrogen peroxide.
- EP-A-228 151 also describes phosphating baths which contain zinc and manganese as essential cations.
- the phosphating accelerator is selected from nitrite, nitrate, hydrogen peroxide, m-nitrobenzoate or p-nitrophenol.
- DE-A-43 41 041 describes a process for phosphating metal surfaces with aqueous, acidic phosphating solutions which contain zinc, manganese and phosphate ions and, as accelerators, m-nitrobenzosulfonic acid or its water-soluble salts, the metal surfaces being in contact with a phosphating solution brings, which is free of nickel, cobalt, copper, nitrite and oxo anions of halogens and the
- the phosphate layer on the metal surfaces is not completely closed. Rather, there remain more or less large "pores", the area of which in the The order of magnitude is 0.5 to 2% of the phosphated area and must be closed in the course of a so-called post-rinsing ("post-passivation”) in order not to leave a point of attack for corrosive influences on the metal surfaces. Post-passivation further improves the adhesion of a subsequently applied lacquer.
- a rinse solution which contains Al, Zr and fluoride ions, the solution being a mixture of complex fluorides or can also be regarded as a solution of aluminum hexafluorozirconate.
- the total amount of these 3 ions is in the range of 0.1 to 2.0 g / l.
- DE-A-21 00 497 relates to a process for the electrophoretic application of paints to iron-containing surfaces, the object being to apply white or other light colors to the iron-containing surfaces without discoloration.
- This object is achieved in that the surfaces, which may have been phosphated beforehand, are rinsed with copper-containing solutions. Copper concentrations between 0.1 and 10 g / l are proposed for this rinse solution.
- DE-A-34 00 339 also describes a copper-containing rinse solution for phosphated metal surfaces, with copper contents between 0.01 and 10 g / l being used.
- Nickel-free phosphating processes combined with a chrome-free rinse do not yet reliably meet the requirements for paint adhesion and corrosion protection on all body materials used in the automotive industry. This is especially true if you have a cathodically depositable after phosphating and rinsing Applies electrodeposition paint on the metal surface, which contains no lead-containing compounds for reasons of workplace hygiene and environmental protection.
- DE-A-195 11 573 describes a process for phosphating with a phosphating solution which is free from nitrite and nickel, and in which after the phosphating with an aqueous solution having a pH in the range from 3 to 7, which is rinsed 0.001 to 10 g / l of one or more of the following cations contains: lithium ions, copper ions and / or silver ions.
- the German patent application DE 197 05 701.2 extends this to low-nickel phosphating solutions.
- Alloys consisting of at least 50% by weight of iron, zinc or aluminum, comprising the process steps
- process step a) is phosphated with a zinc-containing acid phosphating solution which has a pH in the range from 2.5 to 3.6 and which
- aqueous solution with a pH in the range from 3 to 7, which contains 0.001 to 10 g / l of one or more of the following cations: lithium ions, copper ions and / or silver ions
- the lead content of the dip lacquer bath should not be above about 150 mg of lead per liter of bath liquid. In particular, the lead content should not be more than about 0.01% by weight, based on the dry substance of the electrocoat material.
- Electrodeposition lacquers which can be deposited cathodically and to which no lead compounds have been added are preferably used in the context of the present invention.
- layer-forming phosphating for process step a) is generally known in the technical field concerned. It means that a crystalline metal phosphate layer is deposited on the substrate, into which divalent metal ions from the phosphating solution are incorporated. In the layer-forming phosphating of iron or zinc-containing surfaces metal ions from the metal surface are also incorporated into the phosphate layer. A distinction is made between so-called “non-layer-forming phosphating”. Here, the metal surface is treated with a phosphating solution that does not contain any divalent metal ions that are built into the thin, generally non-crystalline, phosphate and oxide layer that forms.
- the phosphating solution used in process step a) preferably contains no copper ions. In practical operation, however, it cannot be ruled out that such ions may accidentally get into the phosphating bath. Preferably, however, no copper ions are intentionally added to the phosphating bath, so that the phosphating solution can be expected to contain no more than about 1 mg / l copper ions.
- a phosphating solution which does not contain more than 50 mg / l of nickel ions is used in process step a).
- nickel ions there is no need to add nickel ions to the phosphating solution. This is preferred for reasons of workplace hygiene and environmental protection.
- the containers for the phosphating solutions usually consist of nickel-containing stainless steel, it cannot be ruled out that nickel ions can get into the phosphating bath from the surface of the container.
- the resulting nickel content of the phosphating solution is usually less than 10 mg / l. Accordingly, it is preferred in the sequence of processes according to the invention to work with a low-nickel, preferably nickel-free phosphating solution which, however, should at least not contain more than about 10 mg / l of nickel ions.
- the nickel concentration is preferably below 1 mg / l.
- the phosphating solution used in process step a) of the process sequence according to the invention preferably contains one or more further metal ions whose positive effect on the corrosion protection of zinc phosphate layers is known in the prior art.
- the phosphating solution can contain one or more of the following cations:
- the presence of manganese and / or lithium is particularly preferred.
- the possibility of the presence of divalent iron depends on the accelerator system described below.
- the presence of iron (II) in the concentration range mentioned requires an accelerator which has no oxidizing effect on these ions. Hydroxylamine is an example of this.
- the presence of soluble compounds of hexavalent tungsten in the phosphating bath also has advantages in terms of corrosion resistance and paint adhesion in the process sequence according to the invention.
- Phosphating solutions which contain 20 to 800 mg / l, preferably 50 to 600 mg / l, of tungsten in the form of water-soluble tungstates, silicotungstates and / or borotungstates can be used in the phosphating processes according to the invention.
- the anions mentioned can be used in the form of their acids and / or their water-soluble salts, preferably ammonium salts.
- phosphating baths which are said to be suitable for different substrates, it has become customary to add free and / or complex-bound fluoride in amounts of up to 2.5 g / l of total fluoride, of which up to 800 mg / l of free fluoride.
- the presence of such amounts of fluoride is also advantageous for the phosphating baths in the context of the invention.
- the aluminum content of the bath should not exceed 3 mg / l.
- higher Al contents are tolerated due to the complex formation, provided that the concentration of the non-complexed Al does not exceed 3 mg / l.
- fluoride-containing baths are therefore advantageous if the surfaces to be phosphated are at least partially made of aluminum or contain aluminum. In these cases, it is favorable not to use fluoride bound to the complex, but only free fluoride, preferably in concentrations in the range from 0.5 to 1.0 g / l.
- the phosphating baths For the phosphating of zinc surfaces, it is not absolutely necessary that the phosphating baths contain so-called accelerators.
- accelerators are known in the prior art as components of zinc phosphating baths. These are understood to mean substances which chemically bind the hydrogen generated by the acid pickling on the metal surface by reducing them themselves. Oxidizing accelerators also have the effect of oxidizing released iron (II) ions to the trivalent stage by pickling on steel surfaces, so that they can precipitate out as iron (III) phosphate.
- the accelerators which can be used in the phosphating bath of the sequence of processes according to the invention were listed above.
- nitrate ions in amounts of up to 10 g / l can be present as co-accelerators, which can have a particularly favorable effect on the phosphating of steel surfaces.
- the phosphating solution contain as little nitrate as possible.
- Nitrate concentrations of 0.5 g / l should preferably not be exceeded, since at higher nitrate concentrations there is a risk of so-called "speck formation". This means white, crater-like defects in the phosphate layer.
- Hydrogen peroxide is preferred for reasons of environmental friendliness, and hydroxylamine is particularly preferred as an accelerator for technical reasons because of the simplified formulation options for redosing solutions. However, using these two accelerators together is not advisable since hydroxylamine is decomposed by hydrogen peroxide. If hydrogen peroxide is used in free or bound form as an accelerator, concentrations of 0.005 to 0.02 g / l hydrogen peroxide are particularly preferred. The hydrogen peroxide can be added as such to the phosphating solution. However, it is also possible to use hydrogen peroxide in bound form in the form of compounds which give hydrogen peroxide in the phosphating bath by hydrolysis reactions.
- Examples of such compounds are persalts, such as perborates, percarbonates, peroxosulfates or peroxodisulfates.
- Ionic peroxides such as, for example, alkali metal peroxides can be considered as further sources of hydrogen peroxide.
- Hydroxylamine can be used as a free base, as a hydroxylamine complex or in the form of hydroxylammonium salts. If free hydroxylamine is added to the phosphating bath or a phosphating bath concentrate, it will largely exist as a hydroxylammonium cation due to the acidic nature of these solutions.
- Hydroxylammonium salt the sulfates and the phosphates are particularly suitable. In the case of the phosphates, the acid salts are preferred due to the better solubility.
- Hydroxylamine or its compounds are added to the phosphating bath in amounts such that the calculated concentration of the free hydroxylamine is between 0.1 and 10 g / l, preferably between 0.2 and 6 g / l and in particular between 0.3 and 2 g / l lies.
- the use of hydroxylamine as an accelerator on iron surfaces leads to particularly favorable spherical and / or columnar phosphate crystals.
- the post-rinsing to be carried out in process step b) is particularly suitable as post-passivation of such phosphate layers.
- N-oxides as described in more detail in German patent application DE-A-197 33 978.6, are also suitable as accelerators.
- N-methylmorpholine-N-oxide is particularly preferred as the organic N-oxide.
- the N-oxides are preferably used in combination with co-accelerators such as chlorate, hydrogen peroxide, m-nitrobenzenesulfonate or nitroguanidine.
- Nitroguanidine can also be used as the sole accelerator, as described, for example, in DE-A-196 34 685.
- lithium-containing phosphating baths the preferred concentrations of lithium ions are in the range from 0.4 to 1 g / l.
- Phosphating baths particularly preferred, which contain lithium as the only monovalent cation.
- ammonia is preferably used, so that the lithium-containing phosphating baths can additionally contain ammonium ions in the range from about 0.5 to about 2 g / l.
- the use of basic sodium compounds such as sodium hydroxide solution is less preferred in this case, since the presence of sodium ions in the lithium-containing phosphating baths worsens the corrosion protection properties of the layers obtained.
- the free acid is preferably adjusted by adding basic sodium compounds such as sodium carbonate or sodium hydroxide.
- the manganese content of the phosphating bath should be between 0.2 and 4 g / l, since with lower manganese contents the positive influence on the corrosion behavior of the phosphate layers is no longer given and with higher manganese contents there is no further positive effect. Contents between 0.3 and 2 g / l and in particular between 0.5 and 1.5 g / l are preferred.
- the zinc content of the phosphating bath is preferably set to values between 0.45 and 2 g / l. As a result of the pickling removal during the phosphating of zinc-containing surfaces, it is possible that the current zinc content of the working bath increases to up to 3 g / l.
- the form in which the zinc and manganese ions are introduced into the phosphating baths is in principle irrelevant. It is particularly advisable to use the oxides and / or the carbonates as the zinc and / or manganese source.
- iron dissolves in the form of iron (II) ions. If the phosphating baths do not contain any substances which have a strong oxidizing effect on iron (II), the divalent iron changes to the trivalent state primarily as a result of air oxidation, so that it can precipitate out as iron (III) phosphate. Therefore, iron (II) contents can build up in the phosphating baths, which are significantly higher than the contents containing baths containing oxidizing agents.
- iron (II) concentrations of up to 50 ppm are normal, although values of up to 500 ppm can also appear briefly in the production process. Such iron (II) concentrations are not detrimental to the phosphating process according to the invention.
- the weight ratio of phosphate ions to zinc ions in the phosphating baths can vary within a wide range, provided it is in the range between 3.7 and 30. A weight ratio between 7 and 25 is particularly preferred. For this calculation, the total phosphorus content of the phosphating bath is considered to be present in the form of phosphate ions PO ⁇ "
- Phosphating can be carried out by spraying, immersing or spray-immersing.
- the exposure times are in the usual range between about 1 and about 4 minutes.
- the temperature of the phosphating solution is in the range between about 40 and about 60 ° C.
- An intermediate rinsing with water can take place between the phosphating according to process step a) and the final rinsing according to process step b). However, this is not necessary and it can even be advantageous to dispense with this intermediate rinsing, since a reaction of the rinsing solution with the phosphating solution still adhering to the phosphated surface can then take place, which has a favorable effect on the corrosion protection.
- the rinse solution used in process step b) preferably has a pH in the range from 3.4 to 6 and a temperature in the range from 20 to 50 ° C.
- the concentrations of the cations in the aqueous solution used in process step b) are preferably in the following ranges: lithium (l) 0.02 to 2, in particular 0.2 to 1.5 g / l, copper (II) 0.002 to 1 g / l, in particular 0.01 to 0.1 g / l and silver (l) 0.002 to 1 g / l, in particular 0.01 to 0.1 g / l.
- the metal ions mentioned can be used individually or in a mixture exist together. Rinsing solutions which contain copper (II) are particularly preferred.
- metal ions mentioned are introduced into the rinse solution is in principle irrelevant as long as it is ensured that the metal compounds are soluble in the concentration ranges of the metal ions mentioned.
- metal compounds with anions that are known to promote corrosion, such as chloride should be avoided. It is particularly preferred to use the metal ions as nitrates or as carboxylates, in particular as acetates. Phosphates are also suitable as long as they are soluble under the chosen concentration and pH conditions. The same applies to sulfates.
- the metal ions of lithium, copper and / or silver are used in the rinsing solutions together with 0.1 to 1 g / l of hexafluorotitanate and / or, particularly preferably, hexafluorozirconate ions. It is preferred that the concentrations of the anions mentioned are in the range from 100 to 500 ppm. Suitable sources of the hexafluoro anions mentioned are their acids or their salts which are water-soluble under the concentration and pH conditions mentioned, in particular their alkali metal and / or ammonium salts.
- the hexafluoro anions at least partially in the form of their acids and to dissolve basic compounds of lithium, copper and / or silver in the acidic solutions.
- the hydroxides, oxides or carbonates of the metals mentioned come into consideration. This procedure avoids using the metals together with any interfering anions.
- the pH can be adjusted with ammonia or sodium carbonate.
- the rinsing solutions can contain the ions of lithium, copper and / or silver together with ions of cerium (III) and / or cerium (IV), the total concentration of the cerium ions being in the range from 0.01 to 1 g / l.
- the rinse solution can also contain aluminum (III) compounds, the concentration of aluminum being in the range from 0.01 to 1 g / l.
- the aluminum compounds include, in particular, polyaluminium compounds such as polymer
- Aluminum hydroxychloride or polymeric aluminum hydroxysulfate into consideration (WO 92/15724), or else complex aluminum-zirconium fluorides, as are known for example from EP-B-410497.
- the metal surfaces phosphated in process step a) can be brought into contact with the rinse solution by spraying, dipping or splash-dipping in process step b), the exposure time being in the range from 0.5 to 10 minutes and preferably being about 40 to about 120 seconds. Because of the simpler plant technology, it is preferable to spray the rinse solution in process step b) onto the metal surface phosphated in process step a).
- the pretreated according to the invention can Metal surfaces can be dried. In the interest of a faster production cycle, however, such drying is preferably avoided.
- the cathodic electrodeposition is now carried out using a cathodically depositable electrodeposition lacquer which is at least low in lead, but preferably lead-free.
- “Low-lead” is understood here to mean that the electrodeposition paint which can be deposited cathodically contains no more than 0.05% by weight of lead, based on the dry substance of the electrodeposition paint. It preferably contains less than 0.01% by weight, based on dry substance, and preferably no intentionally added lead compounds
- electrocoat materials are commercially available, examples include: Cathoguard R 310 and Cathoguard R 400 from BASF, Aqua EC 3000 from Herberts and Enviroprime R from PPG.
- the phosphating bath optionally contained sodium or ammonium ions to adjust the free acid. Temperature: 50 ° C, time: 4 minutes.
- the free acid score is understood to mean the consumption in ml of 0.1 normal sodium hydroxide solution in order to titrate 10 ml of bath solution up to a pH of 3.6. Similarly, the total acid score indicates consumption in ml up to a pH of 8.2.
- the corrosion protection test was carried out according to the VDA alternating climate test 621-415. As a result, the paint infiltration at the scratch (U / 2: half scratch width, in mm) is entered in Table 2. In addition, a paint adhesion test was carried out according to the VW stone impact test, which was assessed according to the K value. Higher K values mean poorer, lower K values better paint adhesion. The results are also shown in Table 2.
- Comparison 1 and comparison 2 show that the sequence of processes: phosphating with a nickel-free phosphating solution, rinsing with a copper-free rinsing solution used in practice and subsequent cathodic electrodeposition with a lead-free cathodically depositable electrodeposition varnish (Comparison 2) gives significantly worse corrosion protection results than in cathodic electrocoating with a lead-containing cathodic electrodeposition paint (comparison 1).
- Example 1 shows that when the lead-free cathodic electrocoat material is used, after rinsing with a copper-containing rinsing solution (solution 1), significantly better corrosion protection values are obtained.
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- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Chemical Treatment Of Metals (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19834796 | 1998-08-01 | ||
| DE19834796A DE19834796A1 (de) | 1998-08-01 | 1998-08-01 | Verfahren zur Phosphatierung, Nachspülung und kathodischer Elektrotauchlackierung |
| PCT/EP1999/005273 WO2000008231A1 (de) | 1998-08-01 | 1999-07-23 | Verfahren zur phosphatierung, nachspülung und kathodischer elektrotauchlackierung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1114202A1 true EP1114202A1 (de) | 2001-07-11 |
Family
ID=7876147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99939400A Withdrawn EP1114202A1 (de) | 1998-08-01 | 1999-07-23 | Verfahren zur phosphatierung, nachspülung und kathodischer elektrotauchlackierung |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US6447662B1 (cs) |
| EP (1) | EP1114202A1 (cs) |
| JP (1) | JP2004500479A (cs) |
| KR (1) | KR20010072179A (cs) |
| CN (1) | CN1311827A (cs) |
| AU (1) | AU5371499A (cs) |
| BR (1) | BR9912841A (cs) |
| CA (1) | CA2339234A1 (cs) |
| CZ (1) | CZ2001409A3 (cs) |
| DE (1) | DE19834796A1 (cs) |
| PL (1) | PL345590A1 (cs) |
| SK (1) | SK1552001A3 (cs) |
| TR (1) | TR200100243T2 (cs) |
| WO (1) | WO2000008231A1 (cs) |
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| DE19958192A1 (de) * | 1999-12-02 | 2001-06-07 | Henkel Kgaa | Verfahren zur Phosphatierung, Nachspülung und kathodischer Elektrotauchlackierung |
| DE10056628B4 (de) * | 2000-11-15 | 2004-07-22 | Henkel Kgaa | Fraktionierte Regenerierung eines mit Nickelionen beladenen schwach sauren Ionenaustauschers |
| CN100374620C (zh) * | 2002-07-10 | 2008-03-12 | 坎梅陶尔股份有限公司 | 金属表面的涂层方法 |
| DE102004007361B4 (de) * | 2003-02-24 | 2005-10-06 | Innovent E.V. | Verfahren zur Modifizierung von verzinkten Stahloberflächen und Schwarzstahloberflächen |
| DE10323305B4 (de) * | 2003-05-23 | 2006-03-30 | Chemetall Gmbh | Verfahren zur Beschichtung von metallischen Oberflächen mit einer Wasserstoffperoxid enthaltenden Phosphatierungslösung, Phosphatierlösung und Verwendung der behandelten Gegenstände |
| KR101043076B1 (ko) * | 2003-11-24 | 2011-06-21 | 주식회사 포스코 | 아연계 전기도금강판의 인산염 피막 형성용 조성물 및이를 이용한 인산염 처리방법 |
| US8030246B2 (en) | 2006-07-21 | 2011-10-04 | American Superconductor Corporation | Low resistance splice for high temperature superconductor wires |
| US20080314479A1 (en) * | 2007-06-07 | 2008-12-25 | Henkel Ag & Co. Kgaa | High manganese cobalt-modified zinc phosphate conversion coating |
| US8282801B2 (en) * | 2008-12-18 | 2012-10-09 | Ppg Industries Ohio, Inc. | Methods for passivating a metal substrate and related coated metal substrates |
| DE102010001686A1 (de) | 2010-02-09 | 2011-08-11 | Henkel AG & Co. KGaA, 40589 | Zusammensetzung für die alkalische Passivierung von Zinkoberflächen |
| JP5861249B2 (ja) * | 2010-09-15 | 2016-02-16 | Jfeスチール株式会社 | 容器用鋼板の製造方法 |
| CN102114463B (zh) * | 2011-03-02 | 2013-08-07 | 康海燕 | 一种减少氧化物涂层氚滞留的方法 |
| EP2503025B1 (de) * | 2011-03-22 | 2013-07-03 | Henkel AG & Co. KGaA | Mehrstufige korrosionsschützende Behandlung metallischer Bauteile, die zumindest teilweise Oberflächen von Zink oder Zinklegierungen aufweisen |
| JP6129180B2 (ja) * | 2012-08-08 | 2017-05-17 | 日本パーカライジング株式会社 | 金属表面処理液、金属基材の表面処理方法及びそれにより得られた金属基材 |
| CN104685099A (zh) | 2012-08-29 | 2015-06-03 | Ppg工业俄亥俄公司 | 含锂的锆预处理组合物,处理金属基材的相关方法,和相关的经涂覆的金属基材 |
| SG11201501408RA (en) | 2012-08-29 | 2015-03-30 | Ppg Ind Ohio Inc | Zirconium pretreatment compositions containing molybdenum, associated methods for treating metal substrates, and related coated metal substrates |
| WO2016162423A1 (de) | 2015-04-07 | 2016-10-13 | Chemetall Gmbh | Verfahren zur nickelfreien phosphatierung von metallischen oberflächen |
| DE102016206417A1 (de) | 2016-04-15 | 2017-10-19 | Henkel Ag & Co. Kgaa | Fördergestellbehandlung zur unterdrückung anlagenbedingter phosphatüberschleppung in einer prozessfolge zur tauchlackierung |
| DE102016206418A1 (de) * | 2016-04-15 | 2017-10-19 | Henkel Ag & Co. Kgaa | Unterdrückung anlagenbedingter phosphatüberschleppung in einer prozessfolge zur tauchlackierung |
| RU2729485C1 (ru) | 2016-08-24 | 2020-08-07 | Ппг Индастриз Огайо, Инк. | Железосодержащая композиция очистителя |
| CN106424673B (zh) * | 2016-10-19 | 2018-10-26 | 云南驰宏资源综合利用有限公司 | 一种减缓铅锭表面氧化腐蚀的方法 |
| CN108342723B (zh) * | 2018-03-19 | 2020-02-07 | 常州市春雷浩宇环保科技有限公司 | 一种适用于锌系磷化液的无渣促进剂 |
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| DE19705701A1 (de) | 1997-02-14 | 1998-08-20 | Henkel Kgaa | Verfahren zur Niedrig-Nickel-Phosphatierung mit metallhaltiger Nachspülung |
| DE19733978A1 (de) | 1997-08-06 | 1999-02-11 | Henkel Kgaa | Mit N-Oxiden beschleunigtes Phosphatierverfahren |
-
1998
- 1998-08-01 DE DE19834796A patent/DE19834796A1/de not_active Ceased
-
1999
- 1999-07-23 WO PCT/EP1999/005273 patent/WO2000008231A1/de not_active Ceased
- 1999-07-23 TR TR2001/00243T patent/TR200100243T2/xx unknown
- 1999-07-23 CA CA002339234A patent/CA2339234A1/en not_active Abandoned
- 1999-07-23 CN CN99809241A patent/CN1311827A/zh active Pending
- 1999-07-23 EP EP99939400A patent/EP1114202A1/de not_active Withdrawn
- 1999-07-23 US US09/744,759 patent/US6447662B1/en not_active Expired - Fee Related
- 1999-07-23 JP JP2000563851A patent/JP2004500479A/ja active Pending
- 1999-07-23 CZ CZ2001409A patent/CZ2001409A3/cs unknown
- 1999-07-23 BR BR9912841-1A patent/BR9912841A/pt not_active IP Right Cessation
- 1999-07-23 SK SK155-2001A patent/SK1552001A3/sk unknown
- 1999-07-23 KR KR1020017001396A patent/KR20010072179A/ko not_active Withdrawn
- 1999-07-23 AU AU53714/99A patent/AU5371499A/en not_active Abandoned
- 1999-07-23 PL PL99345590A patent/PL345590A1/xx unknown
Non-Patent Citations (1)
| Title |
|---|
| See references of WO0008231A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20010072179A (ko) | 2001-07-31 |
| CA2339234A1 (en) | 2000-02-17 |
| DE19834796A1 (de) | 2000-02-03 |
| CN1311827A (zh) | 2001-09-05 |
| AU5371499A (en) | 2000-02-28 |
| JP2004500479A (ja) | 2004-01-08 |
| TR200100243T2 (tr) | 2001-05-21 |
| US6447662B1 (en) | 2002-09-10 |
| BR9912841A (pt) | 2001-05-02 |
| CZ2001409A3 (cs) | 2001-08-15 |
| WO2000008231A1 (de) | 2000-02-17 |
| PL345590A1 (en) | 2001-12-17 |
| SK1552001A3 (en) | 2001-10-08 |
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