DE69924680D1 - Scheibentransfervorrichtung - Google Patents

Scheibentransfervorrichtung

Info

Publication number
DE69924680D1
DE69924680D1 DE69924680T DE69924680T DE69924680D1 DE 69924680 D1 DE69924680 D1 DE 69924680D1 DE 69924680 T DE69924680 T DE 69924680T DE 69924680 T DE69924680 T DE 69924680T DE 69924680 D1 DE69924680 D1 DE 69924680D1
Authority
DE
Germany
Prior art keywords
transfer device
wafer transfer
wafer
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69924680T
Other languages
English (en)
Other versions
DE69924680T2 (de
DE69924680T8 (de
Inventor
Masaki Tsujimoto
Kenji Kobayashi
Hideo Numata
Keisuke Tokubuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintec Corp
Original Assignee
Toshiba Corp
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Lintec Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69924680D1 publication Critical patent/DE69924680D1/de
Publication of DE69924680T2 publication Critical patent/DE69924680T2/de
Publication of DE69924680T8 publication Critical patent/DE69924680T8/de
Active legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling
    • H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1702—For plural parts or plural areas of single part
    • Y10T156/1705—Lamina transferred to base from adhered flexible web or sheet type carrier
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1978—Delaminating bending means
    • Y10T156/1983—Poking delaminating means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Die Bonding (AREA)
DE69924680T 1998-08-18 1999-08-18 Scheibentransfervorrichtung Active DE69924680T8 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23160898A JP3560823B2 (ja) 1998-08-18 1998-08-18 ウェハ転写装置
JP23160898 1998-08-18

Publications (3)

Publication Number Publication Date
DE69924680D1 true DE69924680D1 (de) 2005-05-19
DE69924680T2 DE69924680T2 (de) 2006-03-02
DE69924680T8 DE69924680T8 (de) 2006-06-08

Family

ID=16926189

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69924680T Active DE69924680T8 (de) 1998-08-18 1999-08-18 Scheibentransfervorrichtung

Country Status (7)

Country Link
US (1) US6238515B1 (de)
EP (1) EP0982762B1 (de)
JP (1) JP3560823B2 (de)
KR (1) KR100568466B1 (de)
CN (1) CN1189916C (de)
DE (1) DE69924680T8 (de)
TW (1) TW418436B (de)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7295314B1 (en) * 1998-07-10 2007-11-13 Nanometrics Incorporated Metrology/inspection positioning system
US6320609B1 (en) * 1998-07-10 2001-11-20 Nanometrics Incorporated System using a polar coordinate stage and continuous image rotation to compensate for stage rotation
JP3348700B2 (ja) * 1999-08-19 2002-11-20 株式会社東京精密 エッチング装置
US6336787B1 (en) * 1999-10-07 2002-01-08 Mosel Vitelic, Inc. Method for transferring wafers in a semiconductor tape-peeling apparatus
JP2001135653A (ja) * 1999-11-02 2001-05-18 Mitsubishi Electric Corp ダイボンディング装置及び半導体装置
JP4166920B2 (ja) * 2000-02-24 2008-10-15 リンテック株式会社 シート剥離装置および方法
JP4502547B2 (ja) * 2000-08-07 2010-07-14 日東電工株式会社 半導体ウエハの保護テープ除去方法およびその装置
JP4546626B2 (ja) * 2000-08-29 2010-09-15 株式会社ディスコ 半導体素子のピックアップ方法
KR100441790B1 (ko) * 2001-03-22 2004-07-27 에이에스엠 어쌤블리 오토메이션 리미티드 픽업 및 재치 장치와 그 방법
JP2002367931A (ja) * 2001-06-07 2002-12-20 Lintec Corp ダイボンディングシート貼着装置およびダイボンディングシートの貼着方法
AT502233B1 (de) * 2001-06-07 2007-04-15 Thallner Erich Vorrichtung zum lösen eines trägers von einer halbleiterscheibe
DE10128923A1 (de) * 2001-06-15 2003-01-23 Philips Corp Intellectual Pty Verfahren zum Umsetzen eines im wesentlichen scheibenförmigen Werkstücks und Vorrichtung zur Durchführung dieses Verfahrens
JP4748901B2 (ja) * 2001-09-06 2011-08-17 日東電工株式会社 半導体ウエハのマウント方法およびこれに用いるカセット
JP3770820B2 (ja) * 2001-10-03 2006-04-26 日東電工株式会社 保護テープの貼付け方法
JP2003152058A (ja) * 2001-11-13 2003-05-23 Lintec Corp ウェハ転写装置
US6713366B2 (en) 2002-06-12 2004-03-30 Intel Corporation Method of thinning a wafer utilizing a laminated reinforcing layer over the device side
JP2004042163A (ja) * 2002-07-09 2004-02-12 Ebara Corp 研磨装置及びその消耗・交換部品の貼付け剥がし方法
KR100468748B1 (ko) * 2002-07-12 2005-01-29 삼성전자주식회사 프리컷 다이싱 테이프와 범용 다이싱 테이프를 웨이퍼에 마운팅할 수 있는 다이싱 테이프 부착 장비 및 이를포함하는 인라인 시스템
JP2004047823A (ja) * 2002-07-12 2004-02-12 Tokyo Seimitsu Co Ltd ダイシングテープ貼付装置およびバックグラインド・ダイシングテープ貼付システム
JP2004304066A (ja) * 2003-03-31 2004-10-28 Renesas Technology Corp 半導体装置の製造方法
JP4090416B2 (ja) * 2003-09-30 2008-05-28 日東電工株式会社 粘着テープ付ワークの離脱方法及び離脱装置
JP4444619B2 (ja) * 2003-10-10 2010-03-31 リンテック株式会社 マウント装置及びマウント方法
US7182117B2 (en) * 2003-10-31 2007-02-27 3M Innovative Properties Company Apparatus and method for applying an adhesive film to a surface of a structure
JP3949665B2 (ja) * 2004-02-24 2007-07-25 株式会社東芝 半導体装置の製造方法
KR20060135860A (ko) * 2004-04-19 2006-12-29 린텍 가부시키가이샤 시트 첩부장치 및 첩부방법
JP4528553B2 (ja) * 2004-04-19 2010-08-18 リンテック株式会社 シート剥離装置及び剥離方法
TW200539357A (en) * 2004-04-28 2005-12-01 Lintec Corp Adhering apparatus and adhering method
US7244663B2 (en) * 2004-08-31 2007-07-17 Micron Technology, Inc. Wafer reinforcement structure and methods of fabrication
US7680559B2 (en) * 2005-02-08 2010-03-16 Lam Research Corporation Wafer movement control macros
JP4326519B2 (ja) * 2005-03-31 2009-09-09 日東電工株式会社 保護テープ剥離方法およびこれを用いた装置
US7364983B2 (en) 2005-05-04 2008-04-29 Avery Dennison Corporation Method and apparatus for creating RFID devices
JP4533242B2 (ja) * 2005-05-25 2010-09-01 株式会社ディスコ ウェーハ搬送装置及びウェーハの研削−エッチングシステム
JP2007134510A (ja) * 2005-11-10 2007-05-31 Tokyo Seimitsu Co Ltd ウェーハマウンタ装置
JP4880293B2 (ja) * 2005-11-24 2012-02-22 リンテック株式会社 シート貼付装置及び貼付方法
US20120087774A1 (en) * 2006-01-27 2012-04-12 Camtek Ltd Diced Wafer Adaptor and a Method for Transferring a Diced Wafer
JP4841262B2 (ja) 2006-02-13 2011-12-21 株式会社東京精密 ウェーハ処理装置
JP4884075B2 (ja) * 2006-05-22 2012-02-22 株式会社東京精密 テープ貼付方法およびテープ貼付装置
JP4693696B2 (ja) 2006-06-05 2011-06-01 株式会社東京精密 ワーク処理装置
US7614848B2 (en) 2006-10-10 2009-11-10 United Technologies Corporation Fan exit guide vane repair method and apparatus
US7560303B2 (en) 2006-11-07 2009-07-14 Avery Dennison Corporation Method and apparatus for linear die transfer
JP4758376B2 (ja) * 2007-03-20 2011-08-24 株式会社岡本工作機械製作所 半導体基板の受け渡し方法
US9002514B2 (en) 2007-11-30 2015-04-07 Novellus Systems, Inc. Wafer position correction with a dual, side-by-side wafer transfer robot
JP4964107B2 (ja) * 2007-12-03 2012-06-27 東京応化工業株式会社 剥離装置
US8019046B1 (en) 2009-04-15 2011-09-13 Eran & Jan, Inc Apparatus for generating shortwave radiation
JP2011018873A (ja) * 2009-05-22 2011-01-27 Sony Ericsson Mobilecommunications Japan Inc 電磁シールド方法および電磁シールド用フィルム
JP5296604B2 (ja) * 2009-05-29 2013-09-25 リンテック株式会社 シート貼付装置及び貼付方法
SG179182A1 (en) * 2009-09-15 2012-04-27 Ers Electronic Gmbh Pinch roll, device, and method for removing a film from a disc-shaped workpiece
US8069893B2 (en) * 2010-02-03 2011-12-06 Lai Chin-Sen Cutting mechanism for dry film laminator
US20140154037A1 (en) * 2011-06-03 2014-06-05 Orion Systems Integration Pte Ltd Method and systems for semiconductor chip pick & transfer and bonding
US8546802B2 (en) * 2011-11-07 2013-10-01 Taiwan Semiconductor Manufacturing Company, Ltd. Pick-and-place tool for packaging process
US9105760B2 (en) 2011-11-07 2015-08-11 Taiwan Semiconductor Manufacturing Company, Ltd. Pick-and-place tool for packaging process
JP2014204089A (ja) * 2013-04-09 2014-10-27 株式会社ディスコ ウェーハ搬送機構及びウェーハの加工方法
US9679772B2 (en) 2015-10-15 2017-06-13 International Business Machines Corporation Method for handling thin brittle films
JP2018006395A (ja) * 2016-06-28 2018-01-11 株式会社ディスコ 搬送方法
JP6901322B2 (ja) * 2017-05-31 2021-07-14 株式会社ディスコ 保護テープの貼着装置
KR102649682B1 (ko) * 2017-08-28 2024-03-21 린텍 가부시키가이샤 기판 처리 시스템 및 기판 처리 방법
JP2019220513A (ja) * 2018-06-15 2019-12-26 リンテック株式会社 シート貼付装置および貼付方法
US10796940B2 (en) 2018-11-05 2020-10-06 Lam Research Corporation Enhanced automatic wafer centering system and techniques for same
US11889742B2 (en) * 2020-11-04 2024-01-30 Samsung Display Co., Ltd. Apparatus of manufacturing display device and method of manufacturing display device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6085536A (ja) * 1983-10-17 1985-05-15 Hitachi Ltd ウエハ位置決め装置
US5714029A (en) * 1984-03-12 1998-02-03 Nitto Electric Industrial Co., Ltd. Process for working a semiconductor wafer
GB2157193B (en) * 1984-04-10 1987-08-19 Nitto Electric Ind Co Process for peeling protective film off a thin article
JPS6443458A (en) * 1987-08-11 1989-02-15 Nitto Denko Corp Stick cutter for tacky tape with respect to thin board
JPH0691153B2 (ja) * 1987-11-28 1994-11-14 日東電工株式会社 保護フイルムの剥離方法
JP2598305B2 (ja) * 1988-06-06 1997-04-09 日東電工株式会社 半導体ウエハの処理システム
JPH0281456A (ja) * 1988-09-16 1990-03-22 Nitto Denko Corp 保護フィルムの剥離方法
JPH04336428A (ja) * 1991-05-13 1992-11-24 Nitto Denko Corp ウエハのテープ貼合わせ剥離装置
JPH05335411A (ja) 1992-06-02 1993-12-17 Toshiba Corp ペレットの製造方法
EP0848415A1 (de) * 1995-08-31 1998-06-17 Nitto Denko Corporation Verfahren und gerät zum abtrennen einer schutzklebefolie von einer halbleitenden scheibe
US6083811A (en) * 1996-02-07 2000-07-04 Northrop Grumman Corporation Method for producing thin dice from fragile materials
US6149758A (en) * 1997-06-20 2000-11-21 Lintec Corporation Sheet removing apparatus and method
JP4204658B2 (ja) * 1997-11-28 2009-01-07 リンテック株式会社 シート剥離装置および方法
JPH1140520A (ja) * 1997-07-23 1999-02-12 Toshiba Corp ウェーハの分割方法及び半導体装置の製造方法
JP3993918B2 (ja) * 1997-08-25 2007-10-17 富士通株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
DE69924680T2 (de) 2006-03-02
DE69924680T8 (de) 2006-06-08
KR20000017308A (ko) 2000-03-25
EP0982762A3 (de) 2001-08-16
JP3560823B2 (ja) 2004-09-02
US6238515B1 (en) 2001-05-29
JP2000068293A (ja) 2000-03-03
CN1189916C (zh) 2005-02-16
TW418436B (en) 2001-01-11
EP0982762B1 (de) 2005-04-13
EP0982762A2 (de) 2000-03-01
KR100568466B1 (ko) 2006-04-10
CN1246433A (zh) 2000-03-08

Similar Documents

Publication Publication Date Title
DE69924680T8 (de) Scheibentransfervorrichtung
DE69927166D1 (de) Pneumatische übergabevorrichtung
DE69806578D1 (de) Waferhaltevorrichtung
DE19823069B8 (de) Halbleiterbauelement
DE69935182D1 (de) Halbleiteranordnung
DE69922319D1 (de) Werkstückübergabevorrichtung
DE69637769D1 (de) Halbleitervorrichtung
DE69942813D1 (de) Halbleitervorrichtung
DE69727373D1 (de) Halbleitervorrichtung
DE69637698D1 (de) Halbleitervorrichtung
DE69912565D1 (de) Halbleiteranordnung
DE69937739D1 (de) Halbleitervorrichtung
NO20003761D0 (no) Varmeoverføringsanordning
DE69637809D1 (de) Halbleiteranordnung
DE69941201D1 (de) Hochfrequenz-Halbleiteranordnung
DE69737320D1 (de) Halbleitervorrichtung
DE60005959D1 (de) Halbleiteranordnung
DE69839597D1 (de) Hochfrequenzhalbleiteranordnung
DE69923374D1 (de) Halbleiteranordnung
DE69927476T2 (de) Halbleiteranordnung
DE69941921D1 (de) Halbleitervorrichtung
DE60019144D1 (de) Halbleitervorrichtung
DE60041030D1 (de) Halbleiterbauelement
DE69728850D1 (de) Halbleiteranordnung
NL1008236A1 (nl) Halfgeleiderinrichting.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: KUDLEK & GRUNERT PATENTANWAELTE PARTNERSCHAFT, 803

R082 Change of representative

Ref document number: 982762

Country of ref document: EP

Representative=s name: KUDLEK & GRUNERT PATENTANWAELTE PARTNERSCHAFT, DE

R081 Change of applicant/patentee

Ref document number: 982762

Country of ref document: EP

Owner name: LINTEC CORP., JP

Free format text: FORMER OWNER: LINTEC CORP., KABUSHIKI KAISHA TOSHIBA, , JP

Effective date: 20120829

R082 Change of representative

Ref document number: 982762

Country of ref document: EP

Representative=s name: KUDLEK & GRUNERT PATENTANWAELTE PARTNERSCHAFT, DE

Effective date: 20120829