DE69912565D1 - Halbleiteranordnung - Google Patents
HalbleiteranordnungInfo
- Publication number
- DE69912565D1 DE69912565D1 DE69912565T DE69912565T DE69912565D1 DE 69912565 D1 DE69912565 D1 DE 69912565D1 DE 69912565 T DE69912565 T DE 69912565T DE 69912565 T DE69912565 T DE 69912565T DE 69912565 D1 DE69912565 D1 DE 69912565D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
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- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
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- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33863998A JP3398609B2 (ja) | 1998-11-30 | 1998-11-30 | 半導体装置 |
JP33863998 | 1998-11-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69912565D1 true DE69912565D1 (de) | 2003-12-11 |
DE69912565T2 DE69912565T2 (de) | 2004-09-16 |
Family
ID=18320076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69912565T Expired - Lifetime DE69912565T2 (de) | 1998-11-30 | 1999-11-17 | Halbleiteranordnung |
Country Status (6)
Country | Link |
---|---|
US (1) | US20020056901A1 (de) |
EP (1) | EP1006576B1 (de) |
JP (1) | JP3398609B2 (de) |
KR (1) | KR100356770B1 (de) |
DE (1) | DE69912565T2 (de) |
TW (1) | TW440962B (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3405697B2 (ja) | 1999-09-20 | 2003-05-12 | ローム株式会社 | 半導体チップ |
KR100385165B1 (ko) * | 2000-09-25 | 2003-05-22 | 삼성테크윈 주식회사 | 반도체 패키지와 이의 제조방법 |
EP2273542A3 (de) | 2001-12-14 | 2011-10-26 | STMicroelectronics S.r.l. | Elektronische Halbleitervorrichtung und Verfahren zu deren Herstellung |
JP3727272B2 (ja) | 2002-01-15 | 2005-12-14 | 沖電気工業株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2003229517A (ja) * | 2002-01-31 | 2003-08-15 | Fujitsu Hitachi Plasma Display Ltd | 半導体チップ実装基板及びフラットディスプレイ |
KR20030094692A (ko) * | 2002-06-07 | 2003-12-18 | 삼성테크윈 주식회사 | 무전해 솔더범프 형성방법 |
JPWO2004059722A1 (ja) * | 2002-12-24 | 2006-05-11 | 株式会社デンソー | 半導体式センサおよび半導体装置のめっき方法 |
WO2004105133A1 (en) * | 2003-05-26 | 2004-12-02 | Axalto Sa | Wire bonding on in-line connection pads |
JP2005116632A (ja) * | 2003-10-03 | 2005-04-28 | Rohm Co Ltd | 半導体装置の製造方法および半導体装置 |
JP4661122B2 (ja) * | 2004-05-18 | 2011-03-30 | ソニー株式会社 | 部品実装配線基板および配線基板への部品の実装方法 |
JP4604641B2 (ja) * | 2004-10-18 | 2011-01-05 | 株式会社デンソー | 半導体装置 |
DE102005028951B4 (de) | 2005-06-22 | 2018-05-30 | Infineon Technologies Ag | Anordnung zur elektrischen Verbindung einer Halbleiter-Schaltungsanordnung mit einer äusseren Kontakteinrichtung |
DE102005033469B4 (de) * | 2005-07-18 | 2019-05-09 | Infineon Technologies Ag | Verfahren zum Herstellen eines Halbleitermoduls |
JP2008124437A (ja) | 2006-10-19 | 2008-05-29 | Matsushita Electric Ind Co Ltd | 半導体ウェハ、その製造方法、および半導体チップの製造方法 |
DE102006052202B3 (de) * | 2006-11-06 | 2008-02-21 | Infineon Technologies Ag | Halbleiterbauelement sowie Verfahren zur Herstellung eines Halbleiterbauelements |
KR20100033467A (ko) * | 2007-03-15 | 2010-03-30 | 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 평판 디스플레이 제조를 위한 구리 상호접속 |
US8293587B2 (en) | 2007-10-11 | 2012-10-23 | International Business Machines Corporation | Multilayer pillar for reduced stress interconnect and method of making same |
JP4806468B2 (ja) * | 2008-02-29 | 2011-11-02 | 三洋電機株式会社 | 半導体モジュール |
JP4588091B2 (ja) | 2008-02-29 | 2010-11-24 | 三洋電機株式会社 | 半導体モジュールの製造方法 |
JP2009246218A (ja) | 2008-03-31 | 2009-10-22 | Renesas Technology Corp | 半導体装置の製造方法および半導体装置 |
JP5331610B2 (ja) | 2008-12-03 | 2013-10-30 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置 |
JP2010141112A (ja) * | 2008-12-11 | 2010-06-24 | Sharp Corp | 半導体装置および半導体装置の製造方法 |
US20120261812A1 (en) * | 2011-04-14 | 2012-10-18 | Topacio Roden R | Semiconductor chip with patterned underbump metallization |
JP2012160739A (ja) * | 2012-03-14 | 2012-08-23 | Renesas Electronics Corp | 半導体装置 |
JP2013229491A (ja) * | 2012-04-26 | 2013-11-07 | Kyocera Corp | 電極構造、半導体素子、半導体装置、サーマルヘッドおよびサーマルプリンタ |
US9576923B2 (en) | 2014-04-01 | 2017-02-21 | Ati Technologies Ulc | Semiconductor chip with patterned underbump metallization and polymer film |
GB2557614A (en) | 2016-12-12 | 2018-06-27 | Infineon Technologies Austria Ag | Semiconductor device, electronic component and method |
JP2018186144A (ja) | 2017-04-25 | 2018-11-22 | 株式会社村田製作所 | 半導体装置及びパワーアンプモジュール |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS528785A (en) * | 1975-07-10 | 1977-01-22 | Citizen Watch Co Ltd | Semiconductor device electrode structure |
JPH0214527A (ja) * | 1988-11-11 | 1990-01-18 | Seiko Epson Corp | Mos型半導体装置 |
JPH02296336A (ja) * | 1989-05-10 | 1990-12-06 | Seiko Epson Corp | 半導体回路バンプの製造方法 |
DE69330603T2 (de) * | 1993-09-30 | 2002-07-04 | Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno, Catania | Verfahren zur Metallisierung und Verbindung bei der Herstellung von Leistungshalbleiterbauelementen |
-
1998
- 1998-11-30 JP JP33863998A patent/JP3398609B2/ja not_active Expired - Lifetime
-
1999
- 1999-11-17 DE DE69912565T patent/DE69912565T2/de not_active Expired - Lifetime
- 1999-11-17 TW TW088120029A patent/TW440962B/zh not_active IP Right Cessation
- 1999-11-17 EP EP99309158A patent/EP1006576B1/de not_active Expired - Lifetime
- 1999-11-26 KR KR1019990052984A patent/KR100356770B1/ko not_active IP Right Cessation
- 1999-11-29 US US09/449,864 patent/US20020056901A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1006576B1 (de) | 2003-11-05 |
JP3398609B2 (ja) | 2003-04-21 |
TW440962B (en) | 2001-06-16 |
EP1006576A1 (de) | 2000-06-07 |
US20020056901A1 (en) | 2002-05-16 |
KR100356770B1 (ko) | 2002-10-19 |
JP2000164623A (ja) | 2000-06-16 |
DE69912565T2 (de) | 2004-09-16 |
KR20000035730A (ko) | 2000-06-26 |
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