DE69605337D1 - Positionierungssystem und Verfahren und Apparat zur Herstellung einer Vorrichtung - Google Patents
Positionierungssystem und Verfahren und Apparat zur Herstellung einer VorrichtungInfo
- Publication number
- DE69605337D1 DE69605337D1 DE69605337T DE69605337T DE69605337D1 DE 69605337 D1 DE69605337 D1 DE 69605337D1 DE 69605337 T DE69605337 T DE 69605337T DE 69605337 T DE69605337 T DE 69605337T DE 69605337 D1 DE69605337 D1 DE 69605337D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- positioning system
- positioning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C29/00—Bearings for parts moving only linearly
- F16C29/02—Sliding-contact bearings
- F16C29/025—Hydrostatic or aerostatic
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
- F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
- F16C32/0614—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
- F16C32/0618—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings via porous material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C2370/00—Apparatus relating to physics, e.g. instruments
- F16C2370/20—Optical, e.g. movable lenses or mirrors; Spectacles
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Machine Tool Units (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7036946A JPH08229759A (ja) | 1995-02-24 | 1995-02-24 | 位置決め装置並びにデバイス製造装置及び方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69605337D1 true DE69605337D1 (de) | 2000-01-05 |
DE69605337T2 DE69605337T2 (de) | 2000-05-11 |
Family
ID=12483927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69605337T Expired - Fee Related DE69605337T2 (de) | 1995-02-24 | 1996-02-21 | Positionierungssystem und Verfahren und Apparat zur Herstellung einer Vorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5858587A (de) |
EP (1) | EP0729073B1 (de) |
JP (1) | JPH08229759A (de) |
KR (1) | KR100223624B1 (de) |
DE (1) | DE69605337T2 (de) |
Families Citing this family (84)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3800616B2 (ja) * | 1994-06-27 | 2006-07-26 | 株式会社ニコン | 目標物移動装置、位置決め装置及び可動ステージ装置 |
US5699621A (en) * | 1996-02-21 | 1997-12-23 | Massachusetts Institute Of Technology | Positioner with long travel in two dimensions |
US6012697A (en) * | 1996-04-12 | 2000-01-11 | Nikon Corporation | Stage and supporting mechanism for supporting movable mirror on stage |
JPH10521A (ja) * | 1996-06-07 | 1998-01-06 | Nikon Corp | 支持装置 |
US6307616B1 (en) * | 1996-09-09 | 2001-10-23 | Canon Kabushiki Kaisha | Exposure apparatus and substrate handling system therefor |
JPH10103354A (ja) * | 1996-09-27 | 1998-04-21 | Nippon Steel Corp | 静圧気体軸受け |
US6151100A (en) * | 1996-12-12 | 2000-11-21 | Canon Kabushiki Kaisha | Positioning system |
US6128069A (en) * | 1997-03-13 | 2000-10-03 | Canon Kabushiki Kaisha | Stage mechanism for exposure apparatus |
US6296553B1 (en) | 1997-04-02 | 2001-10-02 | Nippei Toyama Corporation | Grinding method, surface grinder, workpiece support, mechanism and work rest |
JPH10293611A (ja) * | 1997-04-21 | 1998-11-04 | Canon Inc | 位置決め装置 |
DE69817750T2 (de) * | 1997-07-22 | 2004-07-01 | Asml Netherlands B.V. | Stützvorrichtung mit gaslager |
JP3358108B2 (ja) * | 1997-09-19 | 2002-12-16 | 株式会社ニコン | 露光装置、走査露光装置及び走査露光方法 |
US6408045B1 (en) | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
JP3483452B2 (ja) * | 1998-02-04 | 2004-01-06 | キヤノン株式会社 | ステージ装置および露光装置、ならびにデバイス製造方法 |
JP3387809B2 (ja) * | 1998-02-18 | 2003-03-17 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
JP3356683B2 (ja) * | 1998-04-04 | 2002-12-16 | 東京エレクトロン株式会社 | プローブ装置 |
JP3810039B2 (ja) | 1998-05-06 | 2006-08-16 | キヤノン株式会社 | ステージ装置 |
JP3413122B2 (ja) | 1998-05-21 | 2003-06-03 | キヤノン株式会社 | 位置決め装置及びこれを用いた露光装置並びにデバイス製造方法 |
JP4428741B2 (ja) * | 1998-09-04 | 2010-03-10 | キヤノン株式会社 | ガルバノミラーアクチュエータ |
US6130490A (en) * | 1999-04-06 | 2000-10-10 | Nikon Corporation | X-Y stage with movable magnet plate |
AU4167799A (en) * | 1999-06-18 | 2001-01-09 | Nikon Corporation | Stage device and exposure system |
JP2001242300A (ja) * | 2000-03-02 | 2001-09-07 | Sony Corp | 電子ビーム照射装置 |
AU2001244679A1 (en) | 2000-03-31 | 2001-10-08 | Toto Ltd. | Method for wet forming of powder, method for producing powder sintered compact, powdery sintered compact, and apparatus using powdery sintered compact |
TW509823B (en) | 2000-04-17 | 2002-11-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US6486941B1 (en) * | 2000-04-24 | 2002-11-26 | Nikon Corporation | Guideless stage |
JP4474020B2 (ja) * | 2000-06-23 | 2010-06-02 | キヤノン株式会社 | 移動装置及び露光装置 |
US6463664B1 (en) * | 2000-10-19 | 2002-10-15 | Sandia Corporation | Multi-axis planar slide system |
JP2002252166A (ja) * | 2001-02-27 | 2002-09-06 | Canon Inc | ステージ装置、露光装置およびデバイス製造方法ならびに移動案内方法 |
JP2002280283A (ja) * | 2001-03-16 | 2002-09-27 | Canon Inc | 基板処理装置 |
KR100787469B1 (ko) * | 2001-04-02 | 2007-12-26 | 삼성전자주식회사 | 액정표시장치 제조용 노광설비 및 이의 노광패턴얼라인먼트 방법 |
US20020178940A1 (en) * | 2001-04-20 | 2002-12-05 | Kitchin Jonathan P. | Ink jet transfer printing process |
JP4814438B2 (ja) * | 2001-05-02 | 2011-11-16 | 日本トムソン株式会社 | リニアモータを内蔵したステージ装置 |
US6781138B2 (en) * | 2001-05-30 | 2004-08-24 | Nikon Corp. | Positioning stage with stationary actuators |
JP2002359170A (ja) * | 2001-05-30 | 2002-12-13 | Nikon Corp | ステージ装置及び露光装置 |
US6882126B2 (en) * | 2001-11-29 | 2005-04-19 | Nikon Corporation | Holder mover for a stage assembly |
JP4136363B2 (ja) * | 2001-11-29 | 2008-08-20 | キヤノン株式会社 | 位置決め装置及びそれを用いた露光装置 |
JP4310065B2 (ja) * | 2002-01-22 | 2009-08-05 | 株式会社荏原製作所 | ステージ装置 |
US6791095B2 (en) * | 2002-03-21 | 2004-09-14 | Hermes-Microvision (Taiwan) Inc. | Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus |
JP4006253B2 (ja) * | 2002-03-28 | 2007-11-14 | 株式会社大井製作所 | 加工セル装置 |
US7393369B2 (en) * | 2002-06-11 | 2008-07-01 | Trulite, Inc. | Apparatus, system, and method for generating hydrogen |
JP2004055767A (ja) | 2002-07-18 | 2004-02-19 | Canon Inc | 電子ビーム露光装置及び半導体デバイスの製造方法 |
JP3862639B2 (ja) * | 2002-08-30 | 2006-12-27 | キヤノン株式会社 | 露光装置 |
JP2004228473A (ja) * | 2003-01-27 | 2004-08-12 | Canon Inc | 移動ステージ装置 |
JP4386241B2 (ja) | 2003-04-01 | 2009-12-16 | キヤノン株式会社 | 鉄心、鉄心の製造方法、位置決め装置および露光装置 |
JP2005005394A (ja) * | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
JP2005005393A (ja) * | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
US7556660B2 (en) | 2003-06-11 | 2009-07-07 | James Kevin Shurtleff | Apparatus and system for promoting a substantially complete reaction of an anhydrous hydride reactant |
US7438732B2 (en) * | 2003-06-11 | 2008-10-21 | Trulite, Inc | Hydrogen generator cartridge |
JP3968713B2 (ja) * | 2003-06-30 | 2007-08-29 | ソニー株式会社 | フラットディスプレイ装置及びフラットディスプレイ装置の試験方法 |
JP2005032818A (ja) * | 2003-07-08 | 2005-02-03 | Canon Inc | 静圧軸受、位置決め装置、並びに露光装置 |
JP2005155658A (ja) * | 2003-11-20 | 2005-06-16 | Canon Inc | 静圧気体軸受装置およびそれを用いたステージ装置 |
JP2005331048A (ja) * | 2004-05-20 | 2005-12-02 | Imv Corp | 防振x−yテーブル |
JP4493442B2 (ja) * | 2004-08-24 | 2010-06-30 | Okiセミコンダクタ株式会社 | 半導体装置の製造方法及び当該製造方法に使用される製造装置 |
JP4927338B2 (ja) * | 2005-02-21 | 2012-05-09 | 住友重機械工業株式会社 | ステージ装置及びガントリ型ステージ装置及びステージ装置の制御方法 |
GB0507681D0 (en) * | 2005-04-15 | 2005-05-25 | Westwind Air Bearings Ltd | Gas bearing spindles |
JP4535991B2 (ja) * | 2005-11-29 | 2010-09-01 | 京セラ株式会社 | 静圧スライダ |
US7648786B2 (en) * | 2006-07-27 | 2010-01-19 | Trulite, Inc | System for generating electricity from a chemical hydride |
US7651542B2 (en) * | 2006-07-27 | 2010-01-26 | Thulite, Inc | System for generating hydrogen from a chemical hydride |
US20100117279A1 (en) * | 2006-11-27 | 2010-05-13 | Camtek Ltd. | Supporting system and a method for supporting an object |
US8357214B2 (en) * | 2007-04-26 | 2013-01-22 | Trulite, Inc. | Apparatus, system, and method for generating a gas from solid reactant pouches |
CN100470379C (zh) | 2007-07-19 | 2009-03-18 | 清华大学 | 一种光刻机硅片台双台交换系统 |
US20090025293A1 (en) * | 2007-07-25 | 2009-01-29 | John Patton | Apparatus, system, and method for processing hydrogen gas |
AU2008279082A1 (en) | 2007-07-25 | 2009-01-29 | Trulite, Inc. | Apparatus, system, and method to manage the generation and use of hybrid electric power |
US20090057520A1 (en) * | 2007-09-05 | 2009-03-05 | Makoto Tada | Displacement Platform with a Precision Plane |
JP5200745B2 (ja) * | 2008-08-05 | 2013-06-05 | 日本精工株式会社 | 三次元位置決め装置及びそれを備えた原子間力顕微鏡 |
US8632064B2 (en) | 2009-07-15 | 2014-01-21 | The Board Of Trustees Of The Leland Stanford Junior University | Positioning apparatus with lockable joints and method of use |
KR100979539B1 (ko) * | 2010-01-29 | 2010-09-02 | 아주대학교산학협력단 | 평면 3자유도 스테이지 |
US20120043300A1 (en) * | 2010-08-22 | 2012-02-23 | Nauganeedles Llc | NanoNeedles Pulling System |
CN102455601B (zh) * | 2010-11-03 | 2013-12-18 | 上海微电子装备有限公司 | 四自由度精密定位装置 |
CN102537049A (zh) * | 2010-12-30 | 2012-07-04 | 上海微电子装备有限公司 | 径向气浮导向模块及应用其的光刻机运动平台 |
US9016675B2 (en) * | 2012-07-06 | 2015-04-28 | Asm Technology Singapore Pte Ltd | Apparatus and method for supporting a workpiece during processing |
JP6040613B2 (ja) * | 2012-07-25 | 2016-12-07 | 日本精工株式会社 | 位置決め装置、露光装置及び工作機械 |
CN103573815B (zh) * | 2012-07-31 | 2017-02-22 | 上海微电子装备有限公司 | 微动台及气浮轴承 |
CN104364893B (zh) * | 2013-01-30 | 2016-11-23 | 雅科贝思私人有限公司 | 一种平面定位系统与使用该平面定位系统的方法 |
JP5532175B1 (ja) * | 2013-07-02 | 2014-06-25 | 日本精工株式会社 | テーブル装置、及び搬送装置 |
CN104879622B (zh) * | 2015-05-28 | 2017-06-13 | 天津大学 | 一种基于正弦机构的二维线性微动转台 |
DE102016007114A1 (de) * | 2016-06-13 | 2017-12-14 | Rudolf Eitel | Vorrichtung zur variablen und geführten Positionierung eines zu messenden und/oder zu bearbeitenden Objektes oder eines Objektträgers |
NL2017773B1 (en) * | 2016-11-11 | 2018-05-24 | Suss Microtec Lithography Gmbh | Positioning device |
JP6878605B2 (ja) * | 2017-09-13 | 2021-05-26 | キヤノンセミコンダクターエクィップメント株式会社 | 加工装置 |
CN108296800A (zh) * | 2018-03-22 | 2018-07-20 | 广东工业大学 | 一种垂直解耦的xz高精运动平台 |
DE102018119641A1 (de) | 2018-08-13 | 2020-02-13 | Branson Ultraschall Niederlassung Der Emerson Technologies Gmbh & Co. Ohg | Schweißanlagen-Positionier-Anordnung |
CN109249305B (zh) * | 2018-09-30 | 2020-11-24 | 安徽安凯汽车股份有限公司 | 一种用于汽车零部件加工的辅助工装 |
CN112276384B (zh) * | 2020-12-24 | 2021-03-30 | 苏州德龙激光股份有限公司 | 半导体晶圆激光切割用气浮平台 |
CN112963450A (zh) * | 2021-03-23 | 2021-06-15 | 西安工业大学 | 新型三坐标t型气浮工作台 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8601095A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Positioneerinrichting. |
JP2665740B2 (ja) * | 1987-03-19 | 1997-10-22 | キヤノン株式会社 | 流体軸受装置 |
JP2649519B2 (ja) * | 1987-07-21 | 1997-09-03 | キヤノン株式会社 | 平板状物体移送位置決め装置 |
US5040431A (en) * | 1988-01-22 | 1991-08-20 | Canon Kabushiki Kaisha | Movement guiding mechanism |
JP2780302B2 (ja) * | 1989-02-07 | 1998-07-30 | キヤノン株式会社 | 露光装置 |
US5184055A (en) * | 1989-10-06 | 1993-02-02 | Canon Kabushiki Kaisha | Device for positioning control |
US5280677A (en) * | 1990-05-17 | 1994-01-25 | Canon Kabushiki Kaisha | Positioning mechanism |
JP2646412B2 (ja) * | 1992-02-18 | 1997-08-27 | キヤノン株式会社 | 露光装置 |
JP2881363B2 (ja) * | 1993-02-02 | 1999-04-12 | キヤノン株式会社 | 平行移動装置およびレンズ移動装置 |
JP3086764B2 (ja) * | 1993-02-22 | 2000-09-11 | キヤノン株式会社 | 静圧軸受装置 |
EP0869340A3 (de) * | 1994-03-07 | 1998-11-25 | Kabushiki Kaisha Toshiba | Vorrichtung zur Unterstützung und linearen Fortbewegung eines Stellgliedes |
-
1995
- 1995-02-24 JP JP7036946A patent/JPH08229759A/ja active Pending
-
1996
- 1996-02-16 US US08/602,460 patent/US5858587A/en not_active Expired - Lifetime
- 1996-02-21 EP EP96301168A patent/EP0729073B1/de not_active Expired - Lifetime
- 1996-02-21 DE DE69605337T patent/DE69605337T2/de not_active Expired - Fee Related
- 1996-02-24 KR KR1019960004509A patent/KR100223624B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0729073A1 (de) | 1996-08-28 |
EP0729073B1 (de) | 1999-12-01 |
KR960032102A (ko) | 1996-09-17 |
DE69605337T2 (de) | 2000-05-11 |
US5858587A (en) | 1999-01-12 |
KR100223624B1 (ko) | 1999-10-15 |
JPH08229759A (ja) | 1996-09-10 |
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