DE69625093D1 - Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE69625093D1
DE69625093D1 DE69625093T DE69625093T DE69625093D1 DE 69625093 D1 DE69625093 D1 DE 69625093D1 DE 69625093 T DE69625093 T DE 69625093T DE 69625093 T DE69625093 T DE 69625093T DE 69625093 D1 DE69625093 D1 DE 69625093D1
Authority
DE
Germany
Prior art keywords
exposure
manufacturing
exposure apparatus
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69625093T
Other languages
English (en)
Other versions
DE69625093T2 (de
Inventor
Kazuhiro Takahashi
Takahisa Shiozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP25283695A external-priority patent/JP3167101B2/ja
Priority claimed from JP26702895A external-priority patent/JP3245026B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69625093D1 publication Critical patent/DE69625093D1/de
Application granted granted Critical
Publication of DE69625093T2 publication Critical patent/DE69625093T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69625093T 1995-09-29 1996-09-27 Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung Expired - Fee Related DE69625093T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP25283695A JP3167101B2 (ja) 1995-09-29 1995-09-29 露光装置及びそれを用いたデバイスの製造方法
JP26702895A JP3245026B2 (ja) 1995-10-16 1995-10-16 露光方法及び露光装置及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE69625093D1 true DE69625093D1 (de) 2003-01-09
DE69625093T2 DE69625093T2 (de) 2003-07-31

Family

ID=26540905

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69621547T Expired - Lifetime DE69621547T2 (de) 1995-09-29 1996-09-27 Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
DE69625093T Expired - Fee Related DE69625093T2 (de) 1995-09-29 1996-09-27 Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69621547T Expired - Lifetime DE69621547T2 (de) 1995-09-29 1996-09-27 Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (4)

Country Link
US (1) US5892573A (de)
EP (2) EP0957401B1 (de)
KR (1) KR100210569B1 (de)
DE (2) DE69621547T2 (de)

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US7521623B2 (en) * 2004-11-24 2009-04-21 Apple Inc. Music synchronization arrangement
US7894177B2 (en) * 2005-12-29 2011-02-22 Apple Inc. Light activated hold switch
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JP2005109304A (ja) * 2003-10-01 2005-04-21 Canon Inc 照明光学系及び露光装置
JP4262566B2 (ja) * 2003-10-16 2009-05-13 株式会社日立製作所 車載用撮像装置及びカメラ
US7061586B2 (en) * 2004-03-02 2006-06-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
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JP2006303196A (ja) * 2005-04-20 2006-11-02 Canon Inc 測定装置及びそれを有する露光装置
DE102006060368B3 (de) * 2006-12-16 2008-07-31 Xtreme Technologies Gmbh Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle
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Also Published As

Publication number Publication date
US5892573A (en) 1999-04-06
DE69621547T2 (de) 2003-01-16
EP0766144A1 (de) 1997-04-02
EP0957401B1 (de) 2002-11-27
KR100210569B1 (ko) 1999-07-15
EP0766144B1 (de) 2002-06-05
KR970016828A (ko) 1997-04-28
DE69621547D1 (de) 2002-07-11
DE69625093T2 (de) 2003-07-31
EP0957401A1 (de) 1999-11-17

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