DE69625093T2 - Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents
Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer VorrichtungInfo
- Publication number
- DE69625093T2 DE69625093T2 DE69625093T DE69625093T DE69625093T2 DE 69625093 T2 DE69625093 T2 DE 69625093T2 DE 69625093 T DE69625093 T DE 69625093T DE 69625093 T DE69625093 T DE 69625093T DE 69625093 T2 DE69625093 T2 DE 69625093T2
- Authority
- DE
- Germany
- Prior art keywords
- exposure
- manufacturing
- exposure apparatus
- exposure method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25283695A JP3167101B2 (ja) | 1995-09-29 | 1995-09-29 | 露光装置及びそれを用いたデバイスの製造方法 |
JP26702895A JP3245026B2 (ja) | 1995-10-16 | 1995-10-16 | 露光方法及び露光装置及びそれを用いたデバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69625093D1 DE69625093D1 (de) | 2003-01-09 |
DE69625093T2 true DE69625093T2 (de) | 2003-07-31 |
Family
ID=26540905
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69621547T Expired - Lifetime DE69621547T2 (de) | 1995-09-29 | 1996-09-27 | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
DE69625093T Expired - Fee Related DE69625093T2 (de) | 1995-09-29 | 1996-09-27 | Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69621547T Expired - Lifetime DE69621547T2 (de) | 1995-09-29 | 1996-09-27 | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5892573A (de) |
EP (2) | EP0957401B1 (de) |
KR (1) | KR100210569B1 (de) |
DE (2) | DE69621547T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10006807B2 (en) | 2013-09-20 | 2018-06-26 | Carl Zeiss Smt Gmbh | Apparatus for determining an optical property of an optical imaging system |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1092722A (ja) * | 1996-09-18 | 1998-04-10 | Nikon Corp | 露光装置 |
JPH10199800A (ja) * | 1997-01-09 | 1998-07-31 | Nikon Corp | オプティカルインテグレータを備える照明光学装置 |
EP1014429A4 (de) * | 1997-04-18 | 2000-07-19 | Nikon Corp | Verfahren und vorrichtung zur belichtungssteuerung, verfahren und vorrichtung zur belichtung, und verfahren zur herstellung dieser vorrichtung |
KR20010006467A (ko) * | 1997-04-18 | 2001-01-26 | 오노 시게오 | 노광 장치, 해당 장치를 이용한 노광 방법 및 회로 장치 제조 방법 |
EP0874283B1 (de) * | 1997-04-23 | 2003-09-03 | Nikon Corporation | Optischer Belichtungsapparat und optisches Reinigungsverfahren |
JP3177187B2 (ja) * | 1997-05-14 | 2001-06-18 | 株式会社東芝 | 補正装置と補正方法と画像読取装置と画像形成装置 |
DE19724903A1 (de) | 1997-06-12 | 1998-12-17 | Zeiss Carl Fa | Lichtintensitätsmeßanordnung |
JPH1116816A (ja) * | 1997-06-25 | 1999-01-22 | Nikon Corp | 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法 |
KR100564437B1 (ko) | 1997-07-25 | 2006-03-29 | 가부시키가이샤 니콘 | 투영 노광 장치, 투영 노광 방법, 광 세정 방법 및 반도체디바이스의 제조 방법 |
US6829041B2 (en) * | 1997-07-29 | 2004-12-07 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus having the same |
EP1010040B1 (de) * | 1997-08-08 | 2009-06-24 | Cymer, Inc. | Laserlichtbeleuchteter stepper oder scanner mit energiesensorrückopplung |
US6141081A (en) * | 1997-08-08 | 2000-10-31 | Cymer, Inc. | Stepper or scanner having two energy monitors for a laser |
US6563565B2 (en) | 1997-08-27 | 2003-05-13 | Nikon Corporation | Apparatus and method for projection exposure |
EP1043760A4 (de) * | 1997-11-28 | 2005-06-15 | Nikon Corp | Apparat und methode zur kontrolle der beleuchtung für eine gepulste lichtquelle, verwendet in einer ausrichtevorrichtung |
AU2962099A (en) | 1998-04-07 | 1999-10-25 | Nikon Corporation | Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same |
JP3658209B2 (ja) * | 1998-10-08 | 2005-06-08 | キヤノン株式会社 | 円弧照明光学系及びそれを用いた露光装置 |
JP4521896B2 (ja) | 1999-06-08 | 2010-08-11 | キヤノン株式会社 | 照明装置、投影露光装置及びデバイス製造方法 |
US6850313B2 (en) * | 1999-10-01 | 2005-02-01 | Nikon Corporation | Exposure method, exposure apparatus and its making method, device manufacturing method, and device |
JP2001110710A (ja) | 1999-10-08 | 2001-04-20 | Nikon Corp | 露光装置、露光方法、および半導体デバイスの製造方法 |
JP2001196293A (ja) * | 2000-01-14 | 2001-07-19 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
JP2001267239A (ja) * | 2000-01-14 | 2001-09-28 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP4289755B2 (ja) * | 2000-02-24 | 2009-07-01 | キヤノン株式会社 | 露光量制御方法、デバイス製造方法および露光装置 |
US20020041377A1 (en) * | 2000-04-25 | 2002-04-11 | Nikon Corporation | Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method |
JP2002134393A (ja) * | 2000-10-24 | 2002-05-10 | Mitsubishi Electric Corp | 露光装置、露光方法およびその露光方法を用いて製造した半導体装置 |
EP1209526B1 (de) * | 2000-11-23 | 2004-09-15 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer integrierten Schaltungsanordnung |
TW567400B (en) | 2000-11-23 | 2003-12-21 | Asml Netherlands Bv | Lithographic projection apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured by the manufacturing method |
WO2002063664A1 (fr) * | 2001-02-06 | 2002-08-15 | Nikon Corporation | Systeme et procede d'exposition et procede de production de dispositif |
EP1233304A1 (de) * | 2001-02-14 | 2002-08-21 | Asm Lithography B.V. | Lithographischer Apparat |
US7283208B2 (en) * | 2001-02-14 | 2007-10-16 | Asml Netherlands B.V. | Lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
US7236154B1 (en) | 2002-12-24 | 2007-06-26 | Apple Inc. | Computer light adjustment |
JP4652667B2 (ja) * | 2003-02-13 | 2011-03-16 | キヤノン株式会社 | 面位置計測方法及び走査型露光装置 |
EP1455337A1 (de) * | 2003-03-05 | 2004-09-08 | Matsushita Electric Industrial Co., Ltd. | Vorrichtung und Verfahren zur automatischen Helligkeitseinstellung von der Rückbeleuchtung einer Flüssigkristallanzeige |
US7521623B2 (en) * | 2004-11-24 | 2009-04-21 | Apple Inc. | Music synchronization arrangement |
US7894177B2 (en) * | 2005-12-29 | 2011-02-22 | Apple Inc. | Light activated hold switch |
US7616097B1 (en) | 2004-07-12 | 2009-11-10 | Apple Inc. | Handheld devices as visual indicators |
JP2005109304A (ja) * | 2003-10-01 | 2005-04-21 | Canon Inc | 照明光学系及び露光装置 |
JP4262566B2 (ja) * | 2003-10-16 | 2009-05-13 | 株式会社日立製作所 | 車載用撮像装置及びカメラ |
US7061586B2 (en) * | 2004-03-02 | 2006-06-13 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7443486B2 (en) | 2005-02-25 | 2008-10-28 | Asml Netherlands B.V. | Method for predicting a critical dimension of a feature imaged by a lithographic apparatus |
JP2006303196A (ja) * | 2005-04-20 | 2006-11-02 | Canon Inc | 測定装置及びそれを有する露光装置 |
DE102006060368B3 (de) * | 2006-12-16 | 2008-07-31 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle |
JP2008159695A (ja) | 2006-12-21 | 2008-07-10 | Canon Inc | 露光装置 |
JP2009164355A (ja) * | 2008-01-07 | 2009-07-23 | Canon Inc | 走査露光装置およびデバイス製造方法 |
JP2010129796A (ja) * | 2008-11-28 | 2010-06-10 | Canon Inc | 露光装置及びデバイス製造方法 |
US9904146B2 (en) * | 2015-10-29 | 2018-02-27 | GM Global Technology Operations LLC | Camera with positionable light shade |
US10036963B2 (en) * | 2016-09-12 | 2018-07-31 | Cymer, Llc | Estimating a gain relationship of an optical source |
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DE2210945C3 (de) * | 1972-03-07 | 1978-09-21 | Gerhard 8200 Rosenheim Krause | Belichtungsmefigerät |
JPS5998525A (ja) * | 1982-11-26 | 1984-06-06 | Canon Inc | 分割焼付け装置のアライメント方法 |
US4519692A (en) * | 1983-04-08 | 1985-05-28 | Warner-Lambert Technologies, Inc. | Exposure and camera control |
JPS6032050A (ja) * | 1983-08-02 | 1985-02-19 | Canon Inc | 露光装置 |
US4822975A (en) * | 1984-01-30 | 1989-04-18 | Canon Kabushiki Kaisha | Method and apparatus for scanning exposure |
US5171965A (en) * | 1984-02-01 | 1992-12-15 | Canon Kabushiki Kaisha | Exposure method and apparatus |
JPS6197830A (ja) * | 1984-10-18 | 1986-05-16 | Canon Inc | 露光装置 |
US5365342A (en) * | 1984-10-18 | 1994-11-15 | Canon Kabushiki Kaisha | Alignment and exposure apparatus and method for manufacture of integrated circuits |
JPH0614508B2 (ja) * | 1985-03-06 | 1994-02-23 | キヤノン株式会社 | ステップアンドリピート露光方法 |
DE3750174T2 (de) * | 1986-10-30 | 1994-11-17 | Canon Kk | Belichtungseinrichtung. |
US4874954A (en) * | 1987-02-02 | 1989-10-17 | Canon Kabushiki Kaisha | Projection exposure apparatus |
US4884101A (en) * | 1987-02-03 | 1989-11-28 | Nikon Corporation | Apparatus capable of adjusting the light amount |
JPS63193130A (ja) * | 1987-02-05 | 1988-08-10 | Canon Inc | 光量制御装置 |
US4825247A (en) * | 1987-02-16 | 1989-04-25 | Canon Kabushiki Kaisha | Projection exposure apparatus |
US4804978A (en) * | 1988-02-19 | 1989-02-14 | The Perkin-Elmer Corporation | Exposure control system for full field photolithography using pulsed sources |
JP2569711B2 (ja) * | 1988-04-07 | 1997-01-08 | 株式会社ニコン | 露光制御装置及び該装置による露光方法 |
US5191374A (en) * | 1988-11-17 | 1993-03-02 | Nikon Corporation | Exposure control apparatus |
JPH02177415A (ja) * | 1988-12-28 | 1990-07-10 | Canon Inc | 露光装置 |
JPH02177313A (ja) * | 1988-12-28 | 1990-07-10 | Canon Inc | 露光制御装置 |
US5475491A (en) * | 1989-02-10 | 1995-12-12 | Canon Kabushiki Kaisha | Exposure apparatus |
US5121160A (en) * | 1989-03-09 | 1992-06-09 | Canon Kabushiki Kaisha | Exposure method and apparatus |
JP2731953B2 (ja) * | 1989-08-07 | 1998-03-25 | キヤノン株式会社 | エネルギー量制御装置 |
JP2893778B2 (ja) * | 1990-01-17 | 1999-05-24 | キヤノン株式会社 | 露光装置 |
JP2849944B2 (ja) * | 1990-07-11 | 1999-01-27 | キヤノン株式会社 | 露光装置及びエネルギー制御装置並びに半導体素子の製造方法 |
JP2902172B2 (ja) * | 1991-09-04 | 1999-06-07 | キヤノン株式会社 | 露光装置 |
US5250797A (en) * | 1990-10-05 | 1993-10-05 | Canon Kabushiki Kaisha | Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters |
US5309198A (en) * | 1992-02-25 | 1994-05-03 | Nikon Corporation | Light exposure system |
JP3278896B2 (ja) * | 1992-03-31 | 2002-04-30 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
JP2946950B2 (ja) * | 1992-06-25 | 1999-09-13 | キヤノン株式会社 | 照明装置及びそれを用いた露光装置 |
JPH06119971A (ja) * | 1992-10-02 | 1994-04-28 | Seikosha Co Ltd | El素子の製造方法 |
US5581324A (en) * | 1993-06-10 | 1996-12-03 | Nikon Corporation | Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors |
JP2862477B2 (ja) * | 1993-06-29 | 1999-03-03 | キヤノン株式会社 | 露光装置及び該露光装置を用いてデバイスを製造する方法 |
JP3093528B2 (ja) * | 1993-07-15 | 2000-10-03 | キヤノン株式会社 | 走査型露光装置 |
JP3395280B2 (ja) * | 1993-09-21 | 2003-04-07 | 株式会社ニコン | 投影露光装置及び方法 |
-
1996
- 1996-09-25 KR KR1019960042416A patent/KR100210569B1/ko not_active IP Right Cessation
- 1996-09-27 EP EP99202282A patent/EP0957401B1/de not_active Expired - Lifetime
- 1996-09-27 EP EP96307098A patent/EP0766144B1/de not_active Expired - Lifetime
- 1996-09-27 DE DE69621547T patent/DE69621547T2/de not_active Expired - Lifetime
- 1996-09-27 DE DE69625093T patent/DE69625093T2/de not_active Expired - Fee Related
- 1996-09-30 US US08/724,527 patent/US5892573A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10006807B2 (en) | 2013-09-20 | 2018-06-26 | Carl Zeiss Smt Gmbh | Apparatus for determining an optical property of an optical imaging system |
Also Published As
Publication number | Publication date |
---|---|
US5892573A (en) | 1999-04-06 |
DE69621547T2 (de) | 2003-01-16 |
EP0766144A1 (de) | 1997-04-02 |
EP0957401B1 (de) | 2002-11-27 |
KR100210569B1 (ko) | 1999-07-15 |
DE69625093D1 (de) | 2003-01-09 |
EP0766144B1 (de) | 2002-06-05 |
KR970016828A (ko) | 1997-04-28 |
DE69621547D1 (de) | 2002-07-11 |
EP0957401A1 (de) | 1999-11-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |