DE69813658D1 - Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE69813658D1
DE69813658D1 DE69813658T DE69813658T DE69813658D1 DE 69813658 D1 DE69813658 D1 DE 69813658D1 DE 69813658 T DE69813658 T DE 69813658T DE 69813658 T DE69813658 T DE 69813658T DE 69813658 D1 DE69813658 D1 DE 69813658D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
device manufacturing
projection exposure
projection
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69813658T
Other languages
English (en)
Other versions
DE69813658T2 (de
Inventor
Yoshiyuki Sekine
Ryusho Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69813658D1 publication Critical patent/DE69813658D1/de
Publication of DE69813658T2 publication Critical patent/DE69813658T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
    • G02B27/4277—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path being separated by an air space
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
DE69813658T 1997-02-28 1998-02-27 Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung Expired - Fee Related DE69813658T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6223997 1997-02-28
JP10044563A JP3065017B2 (ja) 1997-02-28 1998-02-10 投影露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE69813658D1 true DE69813658D1 (de) 2003-05-28
DE69813658T2 DE69813658T2 (de) 2003-12-18

Family

ID=26384510

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69813658T Expired - Fee Related DE69813658T2 (de) 1997-02-28 1998-02-27 Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung

Country Status (4)

Country Link
US (1) US6266192B1 (de)
EP (1) EP0863440B1 (de)
JP (1) JP3065017B2 (de)
DE (1) DE69813658T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
EP1075150A3 (de) * 1999-07-31 2005-04-27 Lg Electronics Inc. Projektionslinsensystem
EP1139138A4 (de) 1999-09-29 2006-03-08 Nikon Corp Projektionsbelichtungsverfahren, vorrichtung und optisches projektionssystem
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
JP2001264626A (ja) 2000-03-15 2001-09-26 Canon Inc 回折光学素子を有する光学系
JP2002156580A (ja) * 2000-09-05 2002-05-31 Canon Inc 結像素子及び画像読取装置
US6992824B1 (en) * 2003-12-27 2006-01-31 Motamedi Manouchehr E Efficient wave propagation for terahertz imaging and sensing
WO2005119369A1 (en) * 2004-06-04 2005-12-15 Carl Zeiss Smt Ag Projection system with compensation of intensity variatons and compensation element therefor
JP4646575B2 (ja) * 2004-08-31 2011-03-09 キヤノン株式会社 半導体装置の製造方法
DE102008054737A1 (de) 2008-01-10 2009-07-16 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie Objektiv hierfür
CN103399390B (zh) * 2013-05-10 2015-12-02 无锡国盛生物工程有限公司 生物芯片扫描仪荧光收集物镜
CN110568727B (zh) * 2018-06-05 2021-07-02 上海微电子装备（集团）股份有限公司 一种曝光系统、曝光方法和光刻机

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6093410A (ja) 1983-10-27 1985-05-25 Canon Inc 反射光学系
US4701035A (en) 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
JPS61156737A (ja) 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US5044706A (en) 1990-02-06 1991-09-03 Hughes Aircraft Company Optical element employing aspherical and binary grating optical surfaces
JP3353902B2 (ja) * 1990-12-12 2002-12-09 オリンパス光学工業株式会社 投影レンズ系
US5371570A (en) * 1993-01-04 1994-12-06 The University Of Rochester Refractive/diffractive optical system for broad-band through-the-lens imaging of alignment marks on substrates in stepper machines
JPH06324262A (ja) 1993-05-11 1994-11-25 Olympus Optical Co Ltd 撮像光学系
JPH06331941A (ja) * 1993-05-19 1994-12-02 Olympus Optical Co Ltd 投影レンズ系
JPH07128590A (ja) 1993-10-29 1995-05-19 Olympus Optical Co Ltd 縮小投影レンズ
US5754340A (en) * 1994-06-30 1998-05-19 Nikon Corporation Projection optical system and projection exposure apparatus using the same
JPH0817719A (ja) * 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
JPH0878319A (ja) * 1994-06-30 1996-03-22 Nikon Corp 投影露光装置
JPH08220482A (ja) * 1994-12-13 1996-08-30 Olympus Optical Co Ltd 回折光学素子を含む光学系
JPH08304741A (ja) * 1995-05-09 1996-11-22 Olympus Optical Co Ltd 回折光学素子を含む光学系
JPH08316124A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置

Also Published As

Publication number Publication date
EP0863440A3 (de) 1999-07-07
DE69813658T2 (de) 2003-12-18
EP0863440A2 (de) 1998-09-09
EP0863440B1 (de) 2003-04-23
JP3065017B2 (ja) 2000-07-12
US6266192B1 (en) 2001-07-24
JPH10303127A (ja) 1998-11-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee