DE69511920D1 - Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents
Belichtungsapparat und Verfahren zur Herstellung einer VorrichtungInfo
- Publication number
- DE69511920D1 DE69511920D1 DE69511920T DE69511920T DE69511920D1 DE 69511920 D1 DE69511920 D1 DE 69511920D1 DE 69511920 T DE69511920 T DE 69511920T DE 69511920 T DE69511920 T DE 69511920T DE 69511920 D1 DE69511920 D1 DE 69511920D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure apparatus
- device manufacturing
- manufacturing
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP00703694A JP3278277B2 (ja) | 1994-01-26 | 1994-01-26 | 投影露光装置及びこれを用いたデバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69511920D1 true DE69511920D1 (de) | 1999-10-14 |
DE69511920T2 DE69511920T2 (de) | 2000-03-30 |
Family
ID=11654821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69511920T Expired - Lifetime DE69511920T2 (de) | 1994-01-26 | 1995-01-25 | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5847746A (de) |
EP (1) | EP0668541B1 (de) |
JP (1) | JP3278277B2 (de) |
KR (1) | KR0164647B1 (de) |
DE (1) | DE69511920T2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5724122A (en) * | 1995-05-24 | 1998-03-03 | Svg Lithography Systems, Inc. | Illumination system having spatially separate vertical and horizontal image planes for use in photolithography |
EP0770925B1 (de) * | 1995-10-11 | 2002-01-02 | SANYO ELECTRIC Co., Ltd. | Verfahren und Vorrichtung zur optischen Behandlung |
US5844727A (en) * | 1997-09-02 | 1998-12-01 | Cymer, Inc. | Illumination design for scanning microlithography systems |
DE19855106A1 (de) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Beleuchtungssystem für die VUV-Mikrolithographie |
US6583937B1 (en) | 1998-11-30 | 2003-06-24 | Carl-Zeiss Stiftung | Illuminating system of a microlithographic projection exposure arrangement |
JP4521896B2 (ja) | 1999-06-08 | 2010-08-11 | キヤノン株式会社 | 照明装置、投影露光装置及びデバイス製造方法 |
DE19931848A1 (de) * | 1999-07-09 | 2001-01-11 | Zeiss Carl Fa | Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen |
JP4324957B2 (ja) * | 2002-05-27 | 2009-09-02 | 株式会社ニコン | 照明光学装置、露光装置および露光方法 |
JP4207478B2 (ja) * | 2002-07-12 | 2009-01-14 | 株式会社ニコン | オプティカルインテグレータ、照明光学装置、露光装置および露光方法 |
TWI248244B (en) * | 2003-02-19 | 2006-01-21 | J P Sercel Associates Inc | System and method for cutting using a variable astigmatic focal beam spot |
ATE511668T1 (de) * | 2004-02-17 | 2011-06-15 | Zeiss Carl Smt Gmbh | Beleuchtungssystem für eine mikrolithographische projektionsbelichtungsvorrichtung |
US7292393B2 (en) * | 2005-01-12 | 2007-11-06 | Kla-Tencor Technologies Corporation | Variable illuminator and speckle buster apparatus |
EP1986581B1 (de) | 2006-01-31 | 2012-10-03 | Regents of the University of Minnesota | Chirurgische stützstruktur |
JP5036732B2 (ja) * | 2006-02-17 | 2012-09-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の照明システム用の光結合器 |
TWI545352B (zh) | 2006-02-17 | 2016-08-11 | 卡爾蔡司Smt有限公司 | 用於微影投射曝光設備之照明系統 |
EP1927890A1 (de) | 2006-11-30 | 2008-06-04 | Carl Zeiss SMT AG | Verfahren zur Herstellung eines Projektionsobjektivs und mit diesem Verfahren hergestelltes Projektionsobjektiv |
JP2010283249A (ja) * | 2009-06-08 | 2010-12-16 | Nikon Corp | 照明光学系、露光装置、およびデバイス製造方法 |
US20130256286A1 (en) * | 2009-12-07 | 2013-10-03 | Ipg Microsystems Llc | Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths |
JP2011216863A (ja) * | 2010-03-17 | 2011-10-27 | Hitachi Via Mechanics Ltd | ビームサイズ可変照明光学装置及びビームサイズ変更方法 |
JP6135788B2 (ja) * | 2016-03-22 | 2017-05-31 | 富士通株式会社 | 圧縮プログラム、圧縮方法、圧縮装置、伸張プログラム、伸張方法、伸張装置およびデータ転送システム |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5998525A (ja) * | 1982-11-26 | 1984-06-06 | Canon Inc | 分割焼付け装置のアライメント方法 |
US5091744A (en) * | 1984-02-13 | 1992-02-25 | Canon Kabushiki Kaisha | Illumination optical system |
JPS60219744A (ja) * | 1984-04-17 | 1985-11-02 | Canon Inc | 投影露光装置 |
JPS60232552A (ja) * | 1984-05-02 | 1985-11-19 | Canon Inc | 照明光学系 |
US4851882A (en) * | 1985-12-06 | 1989-07-25 | Canon Kabushiki Kaisha | Illumination optical system |
EP0266203B1 (de) * | 1986-10-30 | 1994-07-06 | Canon Kabushiki Kaisha | Belichtungseinrichtung |
US4874954A (en) * | 1987-02-02 | 1989-10-17 | Canon Kabushiki Kaisha | Projection exposure apparatus |
US5121160A (en) * | 1989-03-09 | 1992-06-09 | Canon Kabushiki Kaisha | Exposure method and apparatus |
US5153773A (en) * | 1989-06-08 | 1992-10-06 | Canon Kabushiki Kaisha | Illumination device including amplitude-division and beam movements |
JP2657957B2 (ja) * | 1990-04-27 | 1997-09-30 | キヤノン株式会社 | 投影装置及び光照射方法 |
EP0967524A3 (de) * | 1990-11-15 | 2000-01-05 | Nikon Corporation | Verfahren und Vorrichtung zur Projektionsbelichtung |
US5097291A (en) * | 1991-04-22 | 1992-03-17 | Nikon Corporation | Energy amount control device |
-
1994
- 1994-01-26 JP JP00703694A patent/JP3278277B2/ja not_active Expired - Fee Related
-
1995
- 1995-01-24 US US08/377,791 patent/US5847746A/en not_active Expired - Lifetime
- 1995-01-25 DE DE69511920T patent/DE69511920T2/de not_active Expired - Lifetime
- 1995-01-25 EP EP95300447A patent/EP0668541B1/de not_active Expired - Lifetime
- 1995-01-25 KR KR1019950001248A patent/KR0164647B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0668541A1 (de) | 1995-08-23 |
DE69511920T2 (de) | 2000-03-30 |
US5847746A (en) | 1998-12-08 |
KR0164647B1 (ko) | 1999-01-15 |
JPH07211621A (ja) | 1995-08-11 |
EP0668541B1 (de) | 1999-09-08 |
JP3278277B2 (ja) | 2002-04-30 |
KR950024024A (ko) | 1995-08-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |