DE69511920D1 - Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE69511920D1
DE69511920D1 DE69511920T DE69511920T DE69511920D1 DE 69511920 D1 DE69511920 D1 DE 69511920D1 DE 69511920 T DE69511920 T DE 69511920T DE 69511920 T DE69511920 T DE 69511920T DE 69511920 D1 DE69511920 D1 DE 69511920D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
device manufacturing
manufacturing
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69511920T
Other languages
English (en)
Other versions
DE69511920T2 (de
Inventor
Kazuhiro Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69511920D1 publication Critical patent/DE69511920D1/de
Publication of DE69511920T2 publication Critical patent/DE69511920T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69511920T 1994-01-26 1995-01-25 Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung Expired - Lifetime DE69511920T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00703694A JP3278277B2 (ja) 1994-01-26 1994-01-26 投影露光装置及びこれを用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
DE69511920D1 true DE69511920D1 (de) 1999-10-14
DE69511920T2 DE69511920T2 (de) 2000-03-30

Family

ID=11654821

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69511920T Expired - Lifetime DE69511920T2 (de) 1994-01-26 1995-01-25 Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (5)

Country Link
US (1) US5847746A (de)
EP (1) EP0668541B1 (de)
JP (1) JP3278277B2 (de)
KR (1) KR0164647B1 (de)
DE (1) DE69511920T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
EP0770925B1 (de) * 1995-10-11 2002-01-02 SANYO ELECTRIC Co., Ltd. Verfahren und Vorrichtung zur optischen Behandlung
US5844727A (en) * 1997-09-02 1998-12-01 Cymer, Inc. Illumination design for scanning microlithography systems
DE19855106A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Beleuchtungssystem für die VUV-Mikrolithographie
US6583937B1 (en) 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
JP4521896B2 (ja) 1999-06-08 2010-08-11 キヤノン株式会社 照明装置、投影露光装置及びデバイス製造方法
DE19931848A1 (de) * 1999-07-09 2001-01-11 Zeiss Carl Fa Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen
JP4324957B2 (ja) * 2002-05-27 2009-09-02 株式会社ニコン 照明光学装置、露光装置および露光方法
JP4207478B2 (ja) * 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
TWI248244B (en) * 2003-02-19 2006-01-21 J P Sercel Associates Inc System and method for cutting using a variable astigmatic focal beam spot
ATE511668T1 (de) * 2004-02-17 2011-06-15 Zeiss Carl Smt Gmbh Beleuchtungssystem für eine mikrolithographische projektionsbelichtungsvorrichtung
US7292393B2 (en) * 2005-01-12 2007-11-06 Kla-Tencor Technologies Corporation Variable illuminator and speckle buster apparatus
EP1986581B1 (de) 2006-01-31 2012-10-03 Regents of the University of Minnesota Chirurgische stützstruktur
JP5036732B2 (ja) * 2006-02-17 2012-09-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明システム用の光結合器
TWI545352B (zh) 2006-02-17 2016-08-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
EP1927890A1 (de) 2006-11-30 2008-06-04 Carl Zeiss SMT AG Verfahren zur Herstellung eines Projektionsobjektivs und mit diesem Verfahren hergestelltes Projektionsobjektiv
JP2010283249A (ja) * 2009-06-08 2010-12-16 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
US20130256286A1 (en) * 2009-12-07 2013-10-03 Ipg Microsystems Llc Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
JP6135788B2 (ja) * 2016-03-22 2017-05-31 富士通株式会社 圧縮プログラム、圧縮方法、圧縮装置、伸張プログラム、伸張方法、伸張装置およびデータ転送システム

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5998525A (ja) * 1982-11-26 1984-06-06 Canon Inc 分割焼付け装置のアライメント方法
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
JPS60219744A (ja) * 1984-04-17 1985-11-02 Canon Inc 投影露光装置
JPS60232552A (ja) * 1984-05-02 1985-11-19 Canon Inc 照明光学系
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
EP0266203B1 (de) * 1986-10-30 1994-07-06 Canon Kabushiki Kaisha Belichtungseinrichtung
US4874954A (en) * 1987-02-02 1989-10-17 Canon Kabushiki Kaisha Projection exposure apparatus
US5121160A (en) * 1989-03-09 1992-06-09 Canon Kabushiki Kaisha Exposure method and apparatus
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JP2657957B2 (ja) * 1990-04-27 1997-09-30 キヤノン株式会社 投影装置及び光照射方法
EP0967524A3 (de) * 1990-11-15 2000-01-05 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
US5097291A (en) * 1991-04-22 1992-03-17 Nikon Corporation Energy amount control device

Also Published As

Publication number Publication date
EP0668541A1 (de) 1995-08-23
DE69511920T2 (de) 2000-03-30
US5847746A (en) 1998-12-08
KR0164647B1 (ko) 1999-01-15
JPH07211621A (ja) 1995-08-11
EP0668541B1 (de) 1999-09-08
JP3278277B2 (ja) 2002-04-30
KR950024024A (ko) 1995-08-21

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