DE69807949D1 - Verfahren und Vorrichtung zur Herstellung einer Dünnschicht - Google Patents

Verfahren und Vorrichtung zur Herstellung einer Dünnschicht

Info

Publication number
DE69807949D1
DE69807949D1 DE69807949T DE69807949T DE69807949D1 DE 69807949 D1 DE69807949 D1 DE 69807949D1 DE 69807949 T DE69807949 T DE 69807949T DE 69807949 T DE69807949 T DE 69807949T DE 69807949 D1 DE69807949 D1 DE 69807949D1
Authority
DE
Germany
Prior art keywords
producing
thin film
thin
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69807949T
Other languages
English (en)
Other versions
DE69807949T2 (de
Inventor
Takashi Hiraga
Tetsuo Moriya
Norio Tanaka
Hiromitsu Yanagimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainichiseika Color and Chemicals Mfg Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Dainichiseika Color and Chemicals Mfg Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainichiseika Color and Chemicals Mfg Co Ltd, National Institute of Advanced Industrial Science and Technology AIST filed Critical Dainichiseika Color and Chemicals Mfg Co Ltd
Application granted granted Critical
Publication of DE69807949D1 publication Critical patent/DE69807949D1/de
Publication of DE69807949T2 publication Critical patent/DE69807949T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C41/08—Coating a former, core or other substrate by spraying or fluidisation, e.g. spraying powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/34—Component parts, details or accessories; Auxiliary operations
    • B29C41/50—Shaping under special conditions, e.g. vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2791/00—Shaping characteristics in general
    • B29C2791/004—Shaping under special conditions
    • B29C2791/006—Using vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Spray Control Apparatus (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Nozzles (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroluminescent Light Sources (AREA)
DE69807949T 1997-01-20 1998-01-19 Verfahren und Vorrichtung zur Herstellung einer Dünnschicht Expired - Lifetime DE69807949T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00741997A JP3162313B2 (ja) 1997-01-20 1997-01-20 薄膜製造方法および薄膜製造装置

Publications (2)

Publication Number Publication Date
DE69807949D1 true DE69807949D1 (de) 2002-10-24
DE69807949T2 DE69807949T2 (de) 2003-05-22

Family

ID=11665361

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69807949T Expired - Lifetime DE69807949T2 (de) 1997-01-20 1998-01-19 Verfahren und Vorrichtung zur Herstellung einer Dünnschicht

Country Status (4)

Country Link
US (1) US6319321B1 (de)
EP (1) EP0854024B1 (de)
JP (1) JP3162313B2 (de)
DE (1) DE69807949T2 (de)

Families Citing this family (81)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10214682A (ja) * 1997-01-30 1998-08-11 Mitsubishi Chem Corp 有機電界発光素子の製造装置及び製造方法
JP3500050B2 (ja) * 1997-09-08 2004-02-23 東京エレクトロン株式会社 不純物除去装置、膜形成方法及び膜形成システム
JP3426494B2 (ja) * 1998-04-02 2003-07-14 沖電気工業株式会社 半導体装置の製造方法
ATE245055T1 (de) * 1999-04-15 2003-08-15 Fraunhofer Ges Forschung Release-schicht, verfahren zu ihrer herstellung sowie verwendung
DE19933230C2 (de) * 1999-04-15 2002-06-13 Fraunhofer Ges Forschung Release-Schicht, Verfahren zu ihrer Herstellung sowie Verwendung
JP4425438B2 (ja) * 1999-07-23 2010-03-03 株式会社半導体エネルギー研究所 Ｅｌ表示装置の作製方法
DE19935181C5 (de) * 1999-07-27 2004-05-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Schutz eines vakuumtechnisch bearbeiteten Substrates und Verwendung des Verfahrens
JP2001077011A (ja) * 1999-09-08 2001-03-23 Mitsubishi Electric Corp 半導体製造装置、その洗浄方法、および光源ユニット
JP4827294B2 (ja) * 1999-11-29 2011-11-30 株式会社半導体エネルギー研究所 成膜装置及び発光装置の作製方法
TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
NO312180B1 (no) * 2000-02-29 2002-04-08 Thin Film Electronics Asa Fremgangsmåte til behandling av ultratynne filmer av karbonholdige materialer
JP4618918B2 (ja) * 2000-03-27 2011-01-26 株式会社半導体エネルギー研究所 自発光装置の作製方法
JP2001281345A (ja) * 2000-03-31 2001-10-10 Fuji Photo Film Co Ltd エネルギー線検出装置およびその温度調整方法
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7517551B2 (en) * 2000-05-12 2009-04-14 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light-emitting device
JP3412616B2 (ja) * 2000-07-19 2003-06-03 住友電気工業株式会社 リチウム二次電池用負極の製造方法
US6525313B1 (en) * 2000-08-16 2003-02-25 Brucker Daltonics Inc. Method and apparatus for an electrospray needle for use in mass spectrometry
US20030196680A1 (en) * 2002-04-19 2003-10-23 Dielectric Systems, Inc Process modules for transport polymerization of low epsilon thin films
JP3969698B2 (ja) * 2001-05-21 2007-09-05 株式会社半導体エネルギー研究所 発光装置の作製方法
US20020197393A1 (en) * 2001-06-08 2002-12-26 Hideaki Kuwabara Process of manufacturing luminescent device
KR100685947B1 (ko) * 2001-09-08 2007-02-23 엘지.필립스 엘시디 주식회사 액정표시소자의 제조방법
US20030166311A1 (en) * 2001-09-12 2003-09-04 Seiko Epson Corporation Method for patterning, method for forming film, patterning apparatus, film formation apparatus, electro-optic apparatus and method for manufacturing the same, electronic equipment, and electronic apparatus and method for manufacturing the same
CN100395059C (zh) * 2001-12-18 2008-06-18 旭化成株式会社 金属氧化物分散体、由其得到的金属薄膜和生产该金属薄膜的方法
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
EP1369499A3 (de) 2002-04-15 2004-10-20 Semiconductor Energy Laboratory Co., Ltd. Verfahren und Vorrichtung zur Herstellung eines lichtemittierenden Bauteils
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
JP4597490B2 (ja) * 2002-06-19 2010-12-15 株式会社半導体エネルギー研究所 発光装置の作製方法
US6858464B2 (en) * 2002-06-19 2005-02-22 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
TWI276366B (en) 2002-07-09 2007-03-11 Semiconductor Energy Lab Production apparatus and method of producing a light-emitting device by using the same apparatus
US20040043138A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
US20040043140A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
US6677586B1 (en) * 2002-08-27 2004-01-13 Kla -Tencor Technologies Corporation Methods and apparatus for electron beam inspection of samples
AU2003263609A1 (en) 2002-09-20 2004-04-08 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
CN100544533C (zh) 2002-11-11 2009-09-23 株式会社半导体能源研究所 发光装置的制造方法
JP4712298B2 (ja) * 2002-12-13 2011-06-29 株式会社半導体エネルギー研究所 発光装置の作製方法
KR101032337B1 (ko) 2002-12-13 2011-05-09 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광장치 및 그의 제조방법
US6908045B2 (en) 2003-01-28 2005-06-21 Casio Computer Co., Ltd. Solution spray apparatus and solution spray method
KR20110038165A (ko) * 2003-02-05 2011-04-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 레지스트 패턴의 형성방법 및 반도체장치의 제조방법
JP4907088B2 (ja) * 2003-02-05 2012-03-28 株式会社半導体エネルギー研究所 表示装置の製造方法
JP2004281247A (ja) * 2003-03-17 2004-10-07 Pioneer Electronic Corp 有機エレクトロルミネッセンス表示パネル及びその製造方法
US7972616B2 (en) * 2003-04-17 2011-07-05 Nanosys, Inc. Medical device applications of nanostructured surfaces
US20050038498A1 (en) * 2003-04-17 2005-02-17 Nanosys, Inc. Medical device applications of nanostructured surfaces
US7803574B2 (en) * 2003-05-05 2010-09-28 Nanosys, Inc. Medical device applications of nanostructured surfaces
CN1303647C (zh) * 2003-09-30 2007-03-07 佳能株式会社 加热方法、加热装置、以及图像显示装置的制造方法
JP4580636B2 (ja) * 2003-12-11 2010-11-17 大日本印刷株式会社 成膜装置および成膜方法
US20050156353A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Method to improve the flow rate of imprinting material
US20050158419A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Thermal processing system for imprint lithography
JP2008226859A (ja) * 2004-10-22 2008-09-25 Seiko Epson Corp 有機エレクトロルミネッセンス装置の製造方法、及び有機エレクトロルミネッセンス装置
JP4329740B2 (ja) 2004-10-22 2009-09-09 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法、及び有機エレクトロルミネッセンス装置
JP4479571B2 (ja) * 2005-04-08 2010-06-09 富士電機デバイステクノロジー株式会社 磁気記録媒体の製造方法
KR100720529B1 (ko) * 2005-12-29 2007-05-22 동부일렉트로닉스 주식회사 반도체 소자의 금속배선 및 그의 형성방법
WO2007079366A2 (en) * 2005-12-30 2007-07-12 Dow Global Technologies, Inc. Method for improving glass bond adhesion
JP4513800B2 (ja) * 2006-12-08 2010-07-28 セイコーエプソン株式会社 有機ｅｌ素子の製造方法
JP2008233035A (ja) * 2007-03-23 2008-10-02 Toshiba Corp 基板検査方法
US8319002B2 (en) * 2007-12-06 2012-11-27 Nanosys, Inc. Nanostructure-enhanced platelet binding and hemostatic structures
CN101883545B (zh) 2007-12-06 2013-08-07 纳诺西斯有限公司 可再吸收的纳米增强型止血结构和绷带材料
JP2008311231A (ja) * 2008-06-26 2008-12-25 Seiko Epson Corp 膜形成装置、電子装置の製造方法及び電気光学装置の製造方法
JP4985602B2 (ja) * 2008-09-20 2012-07-25 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス素子
JP5423706B2 (ja) 2010-03-15 2014-02-19 三菱化学株式会社 有機電界発光素子の製造方法、有機電界発光素子、有機ｅｌ照明、及び有機ｅｌ表示装置
US8409407B2 (en) 2010-04-22 2013-04-02 Primestar Solar, Inc. Methods for high-rate sputtering of a compound semiconductor on large area substrates
JP5706243B2 (ja) * 2011-06-15 2015-04-22 株式会社キクテック 標識板剥離装置
KR101511283B1 (ko) * 2012-11-23 2015-04-13 주식회사 아모그린텍 스프레이 방식을 이용한 박막 형성장치 및 박막 형성방법
WO2014081216A1 (ko) 2012-11-23 2014-05-30 주식회사 아모그린텍 유기박막 형성장치 및 유기박막 형성방법과 이를 이용한 유기 박막소자의 제조방법
JP6054763B2 (ja) 2013-02-12 2016-12-27 株式会社ジャパンディスプレイ 有機ｅｌ表示装置
KR20230065385A (ko) * 2013-06-10 2023-05-11 카티바, 인크. 저-입자 가스 인클로저 시스템 및 방법
DE102013113019A1 (de) * 2013-11-25 2015-05-28 Heraeus Noblelight Gmbh Vakuum-Pumpeneinheit
WO2016003633A1 (en) * 2014-07-02 2016-01-07 Applied Materials, Inc Apparatus, systems, and methods for temperature control of substrates using embedded fiber optics and epoxy optical diffusers
CN107360715B (zh) * 2015-03-25 2020-07-31 琳得科株式会社 附有阻气层的板状体的制造装置
TWI549760B (zh) * 2015-04-09 2016-09-21 Pomiran Metalization Res Co Ltd Cleaning method and system of roll - to - roll polyimide film
JP6056899B2 (ja) * 2015-04-22 2017-01-11 セイコーエプソン株式会社 表面処理装置、プライマー処理装置および撥液膜形成装置
CN105243364B (zh) * 2015-09-24 2018-10-19 北京贯中精仪科技有限公司 光电吊舱搜索方法、装置以及系统
CN105137660A (zh) * 2015-09-25 2015-12-09 京东方科技集团股份有限公司 一种光配向膜杂质去除装置和方法
US10973088B2 (en) 2016-04-18 2021-04-06 Applied Materials, Inc. Optically heated substrate support assembly with removable optical fibers
US10928579B2 (en) 2016-06-27 2021-02-23 Viavi Solutions Inc. Optical devices
EP3269780A1 (de) 2016-06-27 2018-01-17 Viavi Solutions Inc. Flakes mit hoher farbsättigung
US10207479B2 (en) 2016-06-27 2019-02-19 Viavi Solutions Inc. Magnetic articles
US10907256B2 (en) 2016-12-22 2021-02-02 Raytheon Technologies Corporation Reinforcement of a deposited structure forming a metal matrix composite
US10648084B2 (en) * 2016-12-22 2020-05-12 United Technologies Corporation Material deposition to form a sheet structure
CN109207932A (zh) * 2017-06-30 2019-01-15 株式会社新柯隆 成膜装置
WO2019166103A1 (en) * 2018-03-02 2019-09-06 Applied Materials, Inc. Method for forming a coating on a substrate in a vacuum processing chamber, vacuum processing chamber and vacuum processing system
KR102649715B1 (ko) 2020-10-30 2024-03-21 세메스 주식회사 표면 처리 장치 및 표면 처리 방법

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH539130A (de) * 1970-02-27 1973-08-31 Egyesuelt Izzolampa Verfahren zur Aufdampfung von Schichten durch Vakuumaufdampfen
US4207356A (en) * 1976-12-09 1980-06-10 The D. L. Auld Company Method for coating glass containers
US4184188A (en) * 1978-01-16 1980-01-15 Veeco Instruments Inc. Substrate clamping technique in IC fabrication processes
GB2058096B (en) * 1979-03-29 1983-04-20 Showa Denko Kk Process for preparing gel-like composition of acetylene high polymer and process for fabrication thereof
US4300272A (en) * 1979-12-10 1981-11-17 The United States Of America As Represented By The Secretary Of The Army High vacuum continuous cycle fabrication facility
KR890002747B1 (ko) * 1983-11-07 1989-07-26 가부시기가이샤 히다찌세이사꾸쇼 이온 빔에 의한 성막방법 및 그 장치
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
FR2573325B1 (fr) * 1984-11-16 1993-08-20 Sony Corp Appareil et procede pour faire des depots de vapeur sur des plaquettes
JPS63186875A (ja) * 1987-01-29 1988-08-02 Tadahiro Omi 表面反応成膜装置
JPS63243298A (ja) 1987-03-31 1988-10-11 Idemitsu Kosan Co Ltd 有機薄膜の製造方法
JPH0620763B2 (ja) 1990-03-28 1994-03-23 工業技術院長 高分子薄膜形成方法
DE69233692T2 (de) * 1991-03-26 2007-12-06 Ngk Insulators, Ltd., Nagoya Verwendung eines korrosion beständigen Substratshalters
DE4228499C1 (de) * 1992-09-01 1993-10-07 Dresden Vakuumtech Gmbh Verfahren und Einrichtung zur plasmagestützten Beschichtung von Substraten
US5597661A (en) * 1992-10-23 1997-01-28 Showa Denko K.K. Solid polymer electrolyte, battery and solid-state electric double layer capacitor using the same as well as processes for the manufacture thereof
JP2965185B2 (ja) 1992-12-28 1999-10-18 工業技術院長 高パワー密度レーザー光に耐える有機系光材料の製造方法、使用方法および試験方法
JP3059972B2 (ja) 1993-03-12 2000-07-04 工業技術院長 有機系光学薄膜の製造法とその装置
JP3072299B2 (ja) 1993-03-12 2000-07-31 工業技術院長 有機系光学材料とその成形製造方法
JP2890087B2 (ja) * 1993-06-10 1999-05-10 東京エレクトロン株式会社 処理装置
JP3030309B2 (ja) * 1994-03-09 2000-04-10 工業技術院長 薄膜製造装置
JP2599569B2 (ja) 1994-03-09 1997-04-09 工業技術院長 複合型光学薄膜の製造方法とその製造装置
JPH0895101A (ja) 1994-09-22 1996-04-12 Fujitsu Ltd 非線形光学材料並びにそれを用いた非線形光学デバイス及び方向性結合型光スイッチ
JP2875768B2 (ja) * 1994-11-30 1999-03-31 新日本無線株式会社 半導体基板の熱処理方法
US5705044A (en) * 1995-08-07 1998-01-06 Akashic Memories Corporation Modular sputtering machine having batch processing and serial thin film sputtering

Also Published As

Publication number Publication date
EP0854024B1 (de) 2002-09-18
JPH10202153A (ja) 1998-08-04
JP3162313B2 (ja) 2001-04-25
EP0854024A2 (de) 1998-07-22
US6319321B1 (en) 2001-11-20
DE69807949T2 (de) 2003-05-22
EP0854024A3 (de) 1998-10-28

Similar Documents

Publication Publication Date Title
DE69807949D1 (de) Verfahren und Vorrichtung zur Herstellung einer Dünnschicht
DE59709248D1 (de) Verfahren und vorrichtung zur herstellung einer zahnbürste
DE69821429D1 (de) Vorrichtung und Verfahren zur Herstellung einer Dünnschicht einer Verbindung
DE69423371T2 (de) Verfahren und vorrichtung zur herstellung dünner schichten
ATE272135T1 (de) Verfahren und vorrichtung zur herstellung einer spinnvliesbahn
DE69842247D1 (de) Verfahren zur Herstellung einer dentalen Vorrichtung
DE69625093D1 (de) Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
DE69826478D1 (de) Verfahren und vorrichtung zur herstellung von dünnen funktionsfilmen
DE59503839D1 (de) Verfahren und Vorrichtung zur Herstellung einer Druckform
DE69731614D1 (de) Netzübergreifende einrichtung und verfahren zur herstellung einer solchen einrichtung
DE59506365D1 (de) Vorrichtung und verfahren zur herstellung einer bildsequenz
DE69918024D1 (de) Verfahren und Vorrichtung zur Herstellung einer Kunststoffplatte
DE69838154D1 (de) Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung
DE60007535D1 (de) Verfahren und vorrichtung zur herstellung einer polymerfolie
DE69811732D1 (de) Verfahren und vorrichtung zur herstellung einer schnecke
DE60010994D1 (de) Verfahren und Vorrichtung zur Herstellung einer Beschichtungsfolie
DE69837232D1 (de) Belichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung
DE69816145D1 (de) Verfahren und Vorrichtung zur Herstellung einer Zahnstange
DE60013509D1 (de) Verfahren und Vorrichtung zur Herstellung einer elastischen Verbundfolie
DE59702373D1 (de) Verfahren und Vorrichtung zur Herstellung eines Einkristalls
DE69424725T2 (de) Verfahren und Vorrichtung zur Herstellung einer Halbleiteranordnung
DE69603388T2 (de) Verfahren und Vorrichtung zur Herstellung einer Kunststofffolie
DE69918023D1 (de) Verfahren und Vorrichtung zur Herstellung einer Kunststofffolie
DE69737426D1 (de) Verfahren und Vorrichtung zur Herstellung von Fotorollfilm
DE69602820T2 (de) Verfahren und vorrichtung zur herstellung einer verbundfolie

Legal Events

Date Code Title Description
8364 No opposition during term of opposition