DE60305246D1 - Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten - Google Patents

Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten

Info

Publication number
DE60305246D1
DE60305246D1 DE60305246T DE60305246T DE60305246D1 DE 60305246 D1 DE60305246 D1 DE 60305246D1 DE 60305246 T DE60305246 T DE 60305246T DE 60305246 T DE60305246 T DE 60305246T DE 60305246 D1 DE60305246 D1 DE 60305246D1
Authority
DE
Germany
Prior art keywords
organic electroluminescent
electroluminescent layers
substrate
deposition
coating source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60305246T
Other languages
English (en)
Other versions
DE60305246T2 (de
Inventor
Ki Beom Kim
Sang Dae Kim
Yoon Soo Han
Yoon Heung Tak
Seok Joo Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Display Co Ltd
Original Assignee
LG Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0042271A external-priority patent/KR100471358B1/ko
Priority claimed from KR10-2002-0058116A external-priority patent/KR100471361B1/ko
Priority claimed from KR1020020059786A external-priority patent/KR100669194B1/ko
Application filed by LG Electronics Inc filed Critical LG Electronics Inc
Publication of DE60305246D1 publication Critical patent/DE60305246D1/de
Application granted granted Critical
Publication of DE60305246T2 publication Critical patent/DE60305246T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
DE60305246T 2002-07-19 2003-07-18 Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten Expired - Lifetime DE60305246T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR2002042271 2002-07-19
KR10-2002-0042271A KR100471358B1 (ko) 2002-07-19 2002-07-19 유기 전자 발광층의 증착 장치
KR2002058116 2002-09-25
KR10-2002-0058116A KR100471361B1 (ko) 2002-09-25 2002-09-25 유기 전계 발광 소자 증착 장치
KR2002059786 2002-10-01
KR1020020059786A KR100669194B1 (ko) 2002-10-01 2002-10-01 유기 전계 발광 소자 증발원

Publications (2)

Publication Number Publication Date
DE60305246D1 true DE60305246D1 (de) 2006-06-22
DE60305246T2 DE60305246T2 (de) 2006-09-14

Family

ID=36571445

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60305246T Expired - Lifetime DE60305246T2 (de) 2002-07-19 2003-07-18 Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten

Country Status (6)

Country Link
US (3) US7025832B2 (de)
EP (3) EP1560467B1 (de)
JP (3) JP3924751B2 (de)
CN (1) CN1226448C (de)
AT (1) ATE326555T1 (de)
DE (1) DE60305246T2 (de)

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US20070178225A1 (en) * 2005-12-14 2007-08-02 Keiji Takanosu Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device
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KR101252756B1 (ko) * 2011-08-08 2013-04-09 공주대학교 산학협력단 복수의 증발특성을 갖는 점증발원의 노즐
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CN104099571A (zh) * 2013-04-01 2014-10-15 上海和辉光电有限公司 蒸发源组件和薄膜沉积装置和薄膜沉积方法
KR102098619B1 (ko) * 2013-05-31 2020-05-25 삼성디스플레이 주식회사 도가니 장치 및 이를 포함하는 증착 장치
CN105177510B (zh) * 2015-10-21 2018-04-03 京东方科技集团股份有限公司 蒸镀设备及蒸镀方法
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
CN106906445B (zh) * 2017-03-29 2019-02-12 武汉华星光电技术有限公司 一种蒸发源
CN107805782B (zh) * 2017-11-27 2019-09-20 深圳市华星光电半导体显示技术有限公司 一种蒸镀装置
JP7376278B2 (ja) 2018-08-16 2023-11-08 エーエスエム・アイピー・ホールディング・ベー・フェー 固体原料昇華器
DE102018131905B4 (de) * 2018-12-12 2024-04-25 VON ARDENNE Asset GmbH & Co. KG Verdampfungsanordnung und Verfahren
KR102221960B1 (ko) * 2019-03-25 2021-03-04 엘지전자 주식회사 증착 장치
JP7303031B2 (ja) * 2019-06-07 2023-07-04 株式会社アルバック 真空蒸着装置用の蒸着源
CN110344004A (zh) * 2019-08-29 2019-10-18 上海天马有机发光显示技术有限公司 一种蒸镀坩埚和蒸镀设备
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Also Published As

Publication number Publication date
JP2007128898A (ja) 2007-05-24
JP2007123285A (ja) 2007-05-17
US20060070576A1 (en) 2006-04-06
ATE326555T1 (de) 2006-06-15
US7025832B2 (en) 2006-04-11
JP2004095542A (ja) 2004-03-25
US7815737B2 (en) 2010-10-19
CN1226448C (zh) 2005-11-09
DE60305246T2 (de) 2006-09-14
EP1560467B1 (de) 2014-02-26
JP3924751B2 (ja) 2007-06-06
EP1560468A1 (de) 2005-08-03
CN1487116A (zh) 2004-04-07
EP1560467A1 (de) 2005-08-03
US20060054089A1 (en) 2006-03-16
EP1560468B1 (de) 2018-03-21
EP1382713A2 (de) 2004-01-21
US20040016400A1 (en) 2004-01-29
EP1382713B1 (de) 2006-05-17
EP1382713A3 (de) 2004-06-02
JP4429305B2 (ja) 2010-03-10

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