DE60305246D1 - Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten - Google Patents
Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente SchichtenInfo
- Publication number
- DE60305246D1 DE60305246D1 DE60305246T DE60305246T DE60305246D1 DE 60305246 D1 DE60305246 D1 DE 60305246D1 DE 60305246 T DE60305246 T DE 60305246T DE 60305246 T DE60305246 T DE 60305246T DE 60305246 D1 DE60305246 D1 DE 60305246D1
- Authority
- DE
- Germany
- Prior art keywords
- organic electroluminescent
- electroluminescent layers
- substrate
- deposition
- coating source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 230000008021 deposition Effects 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 2
- 238000007740 vapor deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0042271A KR100471358B1 (ko) | 2002-07-19 | 2002-07-19 | 유기 전자 발광층의 증착 장치 |
KR2002042271 | 2002-07-19 | ||
KR10-2002-0058116A KR100471361B1 (ko) | 2002-09-25 | 2002-09-25 | 유기 전계 발광 소자 증착 장치 |
KR2002058116 | 2002-09-25 | ||
KR1020020059786A KR100669194B1 (ko) | 2002-10-01 | 2002-10-01 | 유기 전계 발광 소자 증발원 |
KR2002059786 | 2002-10-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60305246D1 true DE60305246D1 (de) | 2006-06-22 |
DE60305246T2 DE60305246T2 (de) | 2006-09-14 |
Family
ID=36571445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60305246T Expired - Lifetime DE60305246T2 (de) | 2002-07-19 | 2003-07-18 | Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten |
Country Status (6)
Country | Link |
---|---|
US (3) | US7025832B2 (de) |
EP (3) | EP1560467B1 (de) |
JP (3) | JP3924751B2 (de) |
CN (1) | CN1226448C (de) |
AT (1) | ATE326555T1 (de) |
DE (1) | DE60305246T2 (de) |
Families Citing this family (44)
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---|---|---|---|---|
US20040144321A1 (en) * | 2003-01-28 | 2004-07-29 | Eastman Kodak Company | Method of designing a thermal physical vapor deposition system |
US7232588B2 (en) * | 2004-02-23 | 2007-06-19 | Eastman Kodak Company | Device and method for vaporizing temperature sensitive materials |
US6893939B1 (en) * | 2004-02-25 | 2005-05-17 | Eastman Kodak Company | Thermal physical vapor deposition source with minimized internal condensation effects |
US20060099344A1 (en) * | 2004-11-09 | 2006-05-11 | Eastman Kodak Company | Controlling the vaporization of organic material |
US7399422B2 (en) * | 2005-11-29 | 2008-07-15 | Asml Holding N.V. | System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby |
CA2605147C (en) * | 2005-05-31 | 2011-12-13 | Corus Technology Bv | Apparatus and method for coating a substrate |
JP4001296B2 (ja) | 2005-08-25 | 2007-10-31 | トッキ株式会社 | 有機材料の真空蒸着方法およびその装置 |
DE102005049906B4 (de) * | 2005-10-17 | 2009-12-03 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Verdampfung von Verdampfungsmaterial |
US20070178225A1 (en) * | 2005-12-14 | 2007-08-02 | Keiji Takanosu | Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device |
JP4847365B2 (ja) * | 2006-03-22 | 2011-12-28 | キヤノン株式会社 | 蒸着源および蒸着装置 |
JP2007291506A (ja) * | 2006-03-31 | 2007-11-08 | Canon Inc | 成膜方法 |
KR101106289B1 (ko) * | 2006-08-04 | 2012-01-18 | 순천향대학교 산학협력단 | 증착 공정을 위한 선형 증착 소스 |
CN101522943B (zh) * | 2006-10-10 | 2013-04-24 | Asm美国公司 | 前体输送系统 |
DE102008016619B3 (de) * | 2008-04-01 | 2009-11-05 | Kennametal Sintec Keramik Gmbh | Verdampferkörper |
KR101196564B1 (ko) * | 2008-04-11 | 2012-11-01 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 균열 장치 |
US20100189929A1 (en) * | 2009-01-28 | 2010-07-29 | Neal James W | Coating device and deposition apparatus |
US20120006809A1 (en) * | 2010-06-23 | 2012-01-12 | Colorado State University Research Foundation | Sublimation crucible with embedded heater element |
TW201200614A (en) * | 2010-06-29 | 2012-01-01 | Hon Hai Prec Ind Co Ltd | Coating device |
CN102312200B (zh) * | 2010-06-30 | 2014-04-23 | 鸿富锦精密工业(深圳)有限公司 | 蒸镀机 |
JP5557633B2 (ja) * | 2010-07-15 | 2014-07-23 | 日立造船株式会社 | 蒸着装置 |
JP5674431B2 (ja) * | 2010-11-17 | 2015-02-25 | 株式会社アルバック | 薄膜形成装置 |
CN102485952B (zh) * | 2010-12-06 | 2015-09-23 | 理想能源设备有限公司 | 汽化装置以及汽化方法 |
JP2012132049A (ja) * | 2010-12-20 | 2012-07-12 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置及び真空蒸着方法 |
DE102010055285A1 (de) * | 2010-12-21 | 2012-06-21 | Solarion Ag Photovoltaik | Verdampferquelle, Verdampferkammer und Beschichtungsverfahren |
KR101233629B1 (ko) * | 2011-04-13 | 2013-02-15 | 에스엔유 프리시젼 주식회사 | 대용량 박막형성용 증착장치 |
KR20120116720A (ko) * | 2011-04-13 | 2012-10-23 | 에스엔유 프리시젼 주식회사 | 원료물질 공급장치 |
KR101052435B1 (ko) * | 2011-04-13 | 2011-07-28 | 에스엔유 프리시젼 주식회사 | 박막형성용 증착장치 |
KR101252756B1 (ko) * | 2011-08-08 | 2013-04-09 | 공주대학교 산학협력단 | 복수의 증발특성을 갖는 점증발원의 노즐 |
US10266702B2 (en) * | 2012-06-08 | 2019-04-23 | University Of Houston System | Self-cleaning coatings and methods for making same |
FR2992976B1 (fr) * | 2012-07-04 | 2014-07-18 | Riber | Dispositif d'evaporation pour appareil de depot sous vide et appareil de depot sous vide comprenant un tel dispositif d'evaporation |
KR101433901B1 (ko) | 2012-10-25 | 2014-09-01 | 지제이엠 주식회사 | 유기물질의 증착장치 및 방법 |
CN104099571A (zh) * | 2013-04-01 | 2014-10-15 | 上海和辉光电有限公司 | 蒸发源组件和薄膜沉积装置和薄膜沉积方法 |
KR102098619B1 (ko) * | 2013-05-31 | 2020-05-25 | 삼성디스플레이 주식회사 | 도가니 장치 및 이를 포함하는 증착 장치 |
CN105177510B (zh) * | 2015-10-21 | 2018-04-03 | 京东方科技集团股份有限公司 | 蒸镀设备及蒸镀方法 |
US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
CN106906445B (zh) * | 2017-03-29 | 2019-02-12 | 武汉华星光电技术有限公司 | 一种蒸发源 |
CN107805782B (zh) * | 2017-11-27 | 2019-09-20 | 深圳市华星光电半导体显示技术有限公司 | 一种蒸镀装置 |
US11634812B2 (en) | 2018-08-16 | 2023-04-25 | Asm Ip Holding B.V. | Solid source sublimator |
DE102018131905B4 (de) * | 2018-12-12 | 2024-04-25 | VON ARDENNE Asset GmbH & Co. KG | Verdampfungsanordnung und Verfahren |
KR102221960B1 (ko) * | 2019-03-25 | 2021-03-04 | 엘지전자 주식회사 | 증착 장치 |
JP7303031B2 (ja) * | 2019-06-07 | 2023-07-04 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
CN110344004A (zh) * | 2019-08-29 | 2019-10-18 | 上海天马有机发光显示技术有限公司 | 一种蒸镀坩埚和蒸镀设备 |
US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
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-
2003
- 2003-07-18 AT AT03016305T patent/ATE326555T1/de not_active IP Right Cessation
- 2003-07-18 US US10/621,471 patent/US7025832B2/en not_active Expired - Lifetime
- 2003-07-18 DE DE60305246T patent/DE60305246T2/de not_active Expired - Lifetime
- 2003-07-18 EP EP05003605.2A patent/EP1560467B1/de not_active Expired - Lifetime
- 2003-07-18 EP EP03016305A patent/EP1382713B1/de not_active Expired - Lifetime
- 2003-07-18 EP EP05003606.0A patent/EP1560468B1/de not_active Expired - Lifetime
- 2003-07-18 CN CNB031787649A patent/CN1226448C/zh not_active Expired - Lifetime
- 2003-07-22 JP JP2003277602A patent/JP3924751B2/ja not_active Expired - Lifetime
-
2005
- 2005-11-04 US US11/266,366 patent/US20060070576A1/en not_active Abandoned
- 2005-11-04 US US11/266,365 patent/US7815737B2/en not_active Expired - Lifetime
-
2006
- 2006-12-20 JP JP2006343450A patent/JP4429305B2/ja not_active Expired - Lifetime
- 2006-12-20 JP JP2006343506A patent/JP2007123285A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1560468A1 (de) | 2005-08-03 |
EP1382713A2 (de) | 2004-01-21 |
JP3924751B2 (ja) | 2007-06-06 |
EP1382713A3 (de) | 2004-06-02 |
EP1560467B1 (de) | 2014-02-26 |
US7025832B2 (en) | 2006-04-11 |
CN1487116A (zh) | 2004-04-07 |
ATE326555T1 (de) | 2006-06-15 |
US20060054089A1 (en) | 2006-03-16 |
JP2007123285A (ja) | 2007-05-17 |
US7815737B2 (en) | 2010-10-19 |
US20060070576A1 (en) | 2006-04-06 |
EP1560468B1 (de) | 2018-03-21 |
JP2004095542A (ja) | 2004-03-25 |
CN1226448C (zh) | 2005-11-09 |
EP1560467A1 (de) | 2005-08-03 |
EP1382713B1 (de) | 2006-05-17 |
DE60305246T2 (de) | 2006-09-14 |
US20040016400A1 (en) | 2004-01-29 |
JP4429305B2 (ja) | 2010-03-10 |
JP2007128898A (ja) | 2007-05-24 |
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