DE60140673D1 - Dampfphasenabscheidung - Google Patents
DampfphasenabscheidungInfo
- Publication number
- DE60140673D1 DE60140673D1 DE60140673T DE60140673T DE60140673D1 DE 60140673 D1 DE60140673 D1 DE 60140673D1 DE 60140673 T DE60140673 T DE 60140673T DE 60140673 T DE60140673 T DE 60140673T DE 60140673 D1 DE60140673 D1 DE 60140673D1
- Authority
- DE
- Germany
- Prior art keywords
- vapor deposition
- coating
- metals
- applying
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Thermistors And Varistors (AREA)
- Tone Control, Compression And Expansion, Limiting Amplitude (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00202559A EP1174526A1 (de) | 2000-07-17 | 2000-07-17 | Kontinuierliches Abscheiden aus der Gasphase |
PCT/NL2001/000546 WO2002006558A1 (en) | 2000-07-17 | 2001-07-17 | Vapour deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60140673D1 true DE60140673D1 (de) | 2010-01-14 |
Family
ID=8171819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60140673T Expired - Lifetime DE60140673D1 (de) | 2000-07-17 | 2001-07-17 | Dampfphasenabscheidung |
Country Status (13)
Country | Link |
---|---|
US (1) | US7220450B2 (de) |
EP (2) | EP1174526A1 (de) |
JP (1) | JP5049446B2 (de) |
KR (1) | KR100819892B1 (de) |
CN (1) | CN1213162C (de) |
AT (1) | ATE450630T1 (de) |
AU (2) | AU2001275831B2 (de) |
BR (1) | BR0112552B1 (de) |
CA (1) | CA2416093C (de) |
DE (1) | DE60140673D1 (de) |
ES (1) | ES2337552T3 (de) |
MX (1) | MXPA03000438A (de) |
WO (1) | WO2002006558A1 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1902152B1 (de) | 2005-05-31 | 2010-06-23 | Corus Technology BV | Vorrichtung und verfahren zum beschichten eines substrats |
EP1972699A1 (de) | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Verfahren zur Beschichtung eines Substrats unter Vakuum |
EP2048261A1 (de) * | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Industrieller Dampferzeuger zum Aufbringen einer Legierungsschicht auf einem Metallband |
EP2199425A1 (de) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Industrieller Dampferzeuger zum Aufbringen einer Legierungsschicht auf einem Metallband (II) |
WO2011082179A1 (en) * | 2009-12-28 | 2011-07-07 | Global Solar Energy, Inc. | Apparatus and methods of mixing and depositing thin film photovoltaic compositions |
US9267203B2 (en) * | 2010-12-13 | 2016-02-23 | Posco | Continuous coating apparatus |
KR101439694B1 (ko) | 2012-12-26 | 2014-09-12 | 주식회사 포스코 | Zn-Mg 합금도금강판 및 그의 제조방법 |
UA117592C2 (uk) * | 2013-08-01 | 2018-08-27 | Арселорміттал | Пофарбований оцинкований сталевий лист та спосіб його виготовлення |
UA116262C2 (uk) * | 2013-08-01 | 2018-02-26 | Арселорміттал | Сталевий лист з цинковим покриттям |
WO2015067662A1 (en) * | 2013-11-05 | 2015-05-14 | Tata Steel Nederland Technology B.V. | Method and apparatus for controlling the composition of liquid metal in an evaporator device |
TWI523962B (zh) * | 2014-10-03 | 2016-03-01 | Nat Inst Chung Shan Science & Technology | Method and apparatus for stabilizing vapor deposition uniformity film |
TWI582251B (zh) * | 2014-10-31 | 2017-05-11 | 財團法人工業技術研究院 | 蒸鍍系統以及蒸鍍方法 |
EP3120939B1 (de) * | 2015-07-13 | 2023-01-25 | HEC High End Coating GmbH | Beschichtete substrate und deren verwendung sowie anlagen zur herstellung der beschichteten substrate |
EP3225717A1 (de) | 2016-03-30 | 2017-10-04 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung |
KR102098455B1 (ko) * | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
WO2019239184A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
JP2019060022A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた鋼板 |
JP2019060021A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた塗装鋼板 |
CN112553578B (zh) * | 2019-09-26 | 2022-01-14 | 宝山钢铁股份有限公司 | 一种具有抑流式喷嘴的真空镀膜装置 |
CN113432775B (zh) * | 2020-03-23 | 2023-04-18 | 核工业理化工程研究院 | 一种标定设备内部气体滞止压力与悬臂梁部件温度关系曲线的方法 |
WO2023062410A1 (en) * | 2021-10-14 | 2023-04-20 | Arcelormittal | Vapour nozzle for pvd |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53110973A (en) * | 1977-03-10 | 1978-09-28 | Futaba Denshi Kogyo Kk | Method and apparatus for manufacturing compounds |
JPS59208006A (ja) * | 1983-05-10 | 1984-11-26 | Toyota Motor Corp | 合金微粉末の製造方法 |
WO1985003460A1 (en) * | 1984-02-13 | 1985-08-15 | Schmitt Jerome J Iii | Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby |
CA1235808A (en) * | 1984-03-22 | 1988-04-26 | Tetsuo Oka | Vertical magnetic recording medium and process for preparation thereof |
JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
US5104634A (en) * | 1989-04-20 | 1992-04-14 | Hercules Incorporated | Process for forming diamond coating using a silent discharge plasma jet process |
US5256205A (en) * | 1990-05-09 | 1993-10-26 | Jet Process Corporation | Microwave plasma assisted supersonic gas jet deposition of thin film materials |
US5919310A (en) * | 1991-10-07 | 1999-07-06 | Canon Kabushiki Kaisha | Continuously film-forming apparatus provided with improved gas gate means |
JP3471356B2 (ja) * | 1992-11-13 | 2003-12-02 | エナージー・コンバーション・デバイセス・インコーポレーテッド | 薄膜蒸着用マイクロ波装置 |
JPH08269696A (ja) * | 1995-03-28 | 1996-10-15 | Nisshin Steel Co Ltd | Mgの蒸発方法 |
JPH0953173A (ja) * | 1995-08-18 | 1997-02-25 | Nisshin Steel Co Ltd | 蒸発材料の安定供給方法 |
US5728224A (en) * | 1995-09-13 | 1998-03-17 | Tetra Laval Holdings & Finance S.A. | Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate |
JPH09143682A (ja) * | 1995-11-22 | 1997-06-03 | Nisshin Steel Co Ltd | 多重ダクトを用いたZn−Mg蒸着法及び蒸着めっき設備 |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US5874131A (en) * | 1996-10-02 | 1999-02-23 | Micron Technology, Inc. | CVD method for forming metal-containing films |
BE1010720A3 (fr) * | 1996-10-30 | 1998-12-01 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'un alliage metallique en phase vapeur. |
US6062256A (en) * | 1997-02-11 | 2000-05-16 | Engineering Measurements Company | Micro mass flow control apparatus and method |
US6165554A (en) * | 1997-11-12 | 2000-12-26 | Jet Process Corporation | Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films |
US6309508B1 (en) * | 1998-01-15 | 2001-10-30 | 3M Innovative Properties Company | Spinning disk evaporator |
US6190732B1 (en) * | 1998-09-03 | 2001-02-20 | Cvc Products, Inc. | Method and system for dispensing process gas for fabricating a device on a substrate |
US6804285B2 (en) * | 1998-10-29 | 2004-10-12 | Canon Kabushiki Kaisha | Gas supply path structure for a gas laser |
EP1014426A3 (de) * | 1998-12-22 | 2004-02-04 | Canon Kabushiki Kaisha | Vorrichtung und Verfahren zur Behandlung eines Substrates |
US6409837B1 (en) * | 1999-01-13 | 2002-06-25 | Tokyo Electron Limited | Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor |
-
2000
- 2000-07-17 EP EP00202559A patent/EP1174526A1/de not_active Withdrawn
-
2001
- 2001-07-17 KR KR1020037000767A patent/KR100819892B1/ko active IP Right Grant
- 2001-07-17 CN CNB018157629A patent/CN1213162C/zh not_active Expired - Fee Related
- 2001-07-17 JP JP2002512445A patent/JP5049446B2/ja not_active Expired - Fee Related
- 2001-07-17 ES ES01953374T patent/ES2337552T3/es not_active Expired - Lifetime
- 2001-07-17 AU AU2001275831A patent/AU2001275831B2/en not_active Ceased
- 2001-07-17 CA CA002416093A patent/CA2416093C/en not_active Expired - Lifetime
- 2001-07-17 BR BRPI0112552-4B1A patent/BR0112552B1/pt not_active IP Right Cessation
- 2001-07-17 DE DE60140673T patent/DE60140673D1/de not_active Expired - Lifetime
- 2001-07-17 MX MXPA03000438A patent/MXPA03000438A/es active IP Right Grant
- 2001-07-17 AT AT01953374T patent/ATE450630T1/de active
- 2001-07-17 AU AU7583101A patent/AU7583101A/xx active Pending
- 2001-07-17 EP EP01953374A patent/EP1301649B1/de not_active Expired - Lifetime
- 2001-07-17 US US10/333,039 patent/US7220450B2/en not_active Expired - Lifetime
- 2001-07-17 WO PCT/NL2001/000546 patent/WO2002006558A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
ATE450630T1 (de) | 2009-12-15 |
ES2337552T3 (es) | 2010-04-27 |
WO2002006558A1 (en) | 2002-01-24 |
MXPA03000438A (es) | 2004-09-10 |
JP2004504487A (ja) | 2004-02-12 |
AU2001275831B2 (en) | 2006-09-07 |
JP5049446B2 (ja) | 2012-10-17 |
EP1301649B1 (de) | 2009-12-02 |
BR0112552B1 (pt) | 2013-07-16 |
US20040022942A1 (en) | 2004-02-05 |
BR0112552A (pt) | 2003-06-24 |
CA2416093A1 (en) | 2002-01-24 |
CN1213162C (zh) | 2005-08-03 |
AU7583101A (en) | 2002-01-30 |
CA2416093C (en) | 2009-06-30 |
CN1458985A (zh) | 2003-11-26 |
US7220450B2 (en) | 2007-05-22 |
KR20030032999A (ko) | 2003-04-26 |
KR100819892B1 (ko) | 2008-04-07 |
EP1174526A1 (de) | 2002-01-23 |
EP1301649A1 (de) | 2003-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE60140673D1 (de) | Dampfphasenabscheidung | |
EP1616975A3 (de) | Beschichtetes Substrat | |
DK1537097T3 (da) | Fremgangsmåde til fremstilling af 3-Halo-4,5-dihydro-1H-pyrazoler | |
EP1416069A4 (de) | Organisches halbleiterelement | |
DE60234001D1 (de) | Verfahren zur Dampfabscheidung eines Kupferfilms. | |
ATE388187T1 (de) | Zusammensetzungen zur wässrigen aufbringung von fluorierten silanen | |
WO2003037996A1 (fr) | Matiere de revetement et procede pour former un film d'oxyde de titane et substrat metallique revetu d'un tel film | |
PT937013E (pt) | Substrato transparente revestido de pelo menos uma camada fina | |
ATE395985T1 (de) | Beschichtungsverfahren und beschichtungsmittel | |
DE50202449D1 (de) | Beschichtungsverfahren und beschichtung | |
TW200705097A (en) | Pattern coating material and pattern formation method | |
DE602004005888D1 (de) | Herstellung von selbstorganisierten monoschichten | |
FR2889087B1 (fr) | Support de cuisson pour ceramiques et procede d'obtention | |
NO20041965L (no) | Avleiringskontrollsammensetning for hoyavleiringsmiljo. | |
TW200801857A (en) | Photoresist stripping liquid and method for processing substrate using the liquid | |
AR028571A1 (es) | Proceso para preparar compuestos de acido iminodiacético a partir de sustratos de monoetanolamina | |
DE602004028223D1 (de) | Lötverfahren unter verwendung einer imidazolverbindung | |
DE60229380D1 (de) | N mit verwendung von inokulantien | |
DE60203382D1 (de) | Beschichtung eines glas-substrates mit einer siliziumhaltigen schicht | |
DE50205178D1 (de) | Verschleissfeste Schaltgabel | |
DK1347984T3 (da) | Fremgangsmåde til fremstilling af taxanderivater | |
BR0007960A (pt) | Tablete detergente revestido | |
FI20021923A0 (fi) | Päällystysasema | |
WO2004033190A3 (en) | Film having a patterned fibrillar surface, and method and apparatus for making the film | |
DK1409239T3 (da) | Fremgangsmåde til fremstilling af overfladeelement, og overfladeelement |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |