BR0112552B1 - processo para aplicar um revestimento a um substrato - Google Patents

processo para aplicar um revestimento a um substrato

Info

Publication number
BR0112552B1
BR0112552B1 BRPI0112552-4B1A BR0112552A BR0112552B1 BR 0112552 B1 BR0112552 B1 BR 0112552B1 BR 0112552 A BR0112552 A BR 0112552A BR 0112552 B1 BR0112552 B1 BR 0112552B1
Authority
BR
Brazil
Prior art keywords
coating
applying
substrate
metals
image
Prior art date
Application number
BRPI0112552-4B1A
Other languages
English (en)
Other versions
BR0112552A (pt
Inventor
Johannes Alphonsus Franciscus Maria Schade Westrum
Joannes Leonard Linden
Johannes Franciscus Maria Velthuis
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BR0112552A publication Critical patent/BR0112552A/pt
Publication of BR0112552B1 publication Critical patent/BR0112552B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Thermistors And Varistors (AREA)
  • Tone Control, Compression And Expansion, Limiting Amplitude (AREA)
  • Magnetic Heads (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
BRPI0112552-4B1A 2000-07-17 2001-07-17 processo para aplicar um revestimento a um substrato BR0112552B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00202559A EP1174526A1 (en) 2000-07-17 2000-07-17 Continuous vapour deposition
PCT/NL2001/000546 WO2002006558A1 (en) 2000-07-17 2001-07-17 Vapour deposition

Publications (2)

Publication Number Publication Date
BR0112552A BR0112552A (pt) 2003-06-24
BR0112552B1 true BR0112552B1 (pt) 2013-07-16

Family

ID=8171819

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0112552-4B1A BR0112552B1 (pt) 2000-07-17 2001-07-17 processo para aplicar um revestimento a um substrato

Country Status (13)

Country Link
US (1) US7220450B2 (pt)
EP (2) EP1174526A1 (pt)
JP (1) JP5049446B2 (pt)
KR (1) KR100819892B1 (pt)
CN (1) CN1213162C (pt)
AT (1) ATE450630T1 (pt)
AU (2) AU7583101A (pt)
BR (1) BR0112552B1 (pt)
CA (1) CA2416093C (pt)
DE (1) DE60140673D1 (pt)
ES (1) ES2337552T3 (pt)
MX (1) MXPA03000438A (pt)
WO (1) WO2002006558A1 (pt)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8435352B2 (en) * 2005-05-31 2013-05-07 Tata Steel Nederland Technology Bv Apparatus and method for coating a substrate
EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
EP2048261A1 (fr) * 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique
EP2199425A1 (fr) * 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
WO2011082179A1 (en) * 2009-12-28 2011-07-07 Global Solar Energy, Inc. Apparatus and methods of mixing and depositing thin film photovoltaic compositions
CN103249860B (zh) * 2010-12-13 2016-03-16 Posco公司 连续涂布设备
KR101439694B1 (ko) 2012-12-26 2014-09-12 주식회사 포스코 Zn-Mg 합금도금강판 및 그의 제조방법
UA116262C2 (uk) * 2013-08-01 2018-02-26 Арселорміттал Сталевий лист з цинковим покриттям
UA117592C2 (uk) 2013-08-01 2018-08-27 Арселорміттал Пофарбований оцинкований сталевий лист та спосіб його виготовлення
US10131983B2 (en) * 2013-11-05 2018-11-20 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
TWI523962B (zh) * 2014-10-03 2016-03-01 Nat Inst Chung Shan Science & Technology Method and apparatus for stabilizing vapor deposition uniformity film
TWI582251B (zh) * 2014-10-31 2017-05-11 財團法人工業技術研究院 蒸鍍系統以及蒸鍍方法
EP3117907B1 (de) * 2015-07-13 2017-10-25 HEC High End Coating GmbH Verfahren zur herstellung beschichteter substrate
EP3225717A1 (de) 2016-03-30 2017-10-04 HEC High End Coating GmbH Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung
KR102098455B1 (ko) 2017-12-26 2020-04-07 주식회사 포스코 연속 증착 장치 및 연속 증착 방법
WO2019239184A1 (en) * 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
JP2019060021A (ja) * 2018-11-09 2019-04-18 アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ 亜鉛コーティングを備えた塗装鋼板
JP2019060022A (ja) * 2018-11-09 2019-04-18 アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ 亜鉛コーティングを備えた鋼板
CN112553578B (zh) * 2019-09-26 2022-01-14 宝山钢铁股份有限公司 一种具有抑流式喷嘴的真空镀膜装置
CN113432775B (zh) * 2020-03-23 2023-04-18 核工业理化工程研究院 一种标定设备内部气体滞止压力与悬臂梁部件温度关系曲线的方法
WO2023062410A1 (en) * 2021-10-14 2023-04-20 Arcelormittal Vapour nozzle for pvd

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53110973A (en) * 1977-03-10 1978-09-28 Futaba Denshi Kogyo Kk Method and apparatus for manufacturing compounds
JPS59208006A (ja) * 1983-05-10 1984-11-26 Toyota Motor Corp 合金微粉末の製造方法
AU3994785A (en) * 1984-02-13 1985-08-27 Schmitt, J.J. 111 Method and apparatus for the gas jet deposition of conductingand dielectric thin solid films and products produced there by
CA1235808A (en) * 1984-03-22 1988-04-26 Tetsuo Oka Vertical magnetic recording medium and process for preparation thereof
JPS60251273A (ja) * 1984-05-28 1985-12-11 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPH02125866A (ja) * 1988-11-04 1990-05-14 Kobe Steel Ltd 合金蒸着めっき装置
US5104634A (en) * 1989-04-20 1992-04-14 Hercules Incorporated Process for forming diamond coating using a silent discharge plasma jet process
US5256205A (en) * 1990-05-09 1993-10-26 Jet Process Corporation Microwave plasma assisted supersonic gas jet deposition of thin film materials
US5919310A (en) * 1991-10-07 1999-07-06 Canon Kabushiki Kaisha Continuously film-forming apparatus provided with improved gas gate means
AU5598194A (en) * 1992-11-13 1994-06-08 Energy Conversion Devices Inc. Microwave apparatus for depositing thin films
JPH08269696A (ja) * 1995-03-28 1996-10-15 Nisshin Steel Co Ltd Ｍｇの蒸発方法
JPH0953173A (ja) * 1995-08-18 1997-02-25 Nisshin Steel Co Ltd 蒸発材料の安定供給方法
US5728224A (en) * 1995-09-13 1998-03-17 Tetra Laval Holdings & Finance S.A. Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate
JPH09143682A (ja) * 1995-11-22 1997-06-03 Nisshin Steel Co Ltd 多重ダクトを用いたＺｎ−Ｍｇ蒸着法及び蒸着めっき設備
BE1010351A6 (fr) * 1996-06-13 1998-06-02 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
US5874131A (en) * 1996-10-02 1999-02-23 Micron Technology, Inc. CVD method for forming metal-containing films
BE1010720A3 (fr) * 1996-10-30 1998-12-01 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'un alliage metallique en phase vapeur.
US6062256A (en) * 1997-02-11 2000-05-16 Engineering Measurements Company Micro mass flow control apparatus and method
US6165554A (en) * 1997-11-12 2000-12-26 Jet Process Corporation Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films
US6309508B1 (en) * 1998-01-15 2001-10-30 3M Innovative Properties Company Spinning disk evaporator
US6190732B1 (en) * 1998-09-03 2001-02-20 Cvc Products, Inc. Method and system for dispensing process gas for fabricating a device on a substrate
US6804285B2 (en) * 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
EP1014426A3 (en) * 1998-12-22 2004-02-04 Canon Kabushiki Kaisha Apparatus and method for processing a substrate
US6409837B1 (en) * 1999-01-13 2002-06-25 Tokyo Electron Limited Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor

Also Published As

Publication number Publication date
CN1213162C (zh) 2005-08-03
CN1458985A (zh) 2003-11-26
CA2416093A1 (en) 2002-01-24
JP2004504487A (ja) 2004-02-12
WO2002006558A1 (en) 2002-01-24
KR20030032999A (ko) 2003-04-26
KR100819892B1 (ko) 2008-04-07
ATE450630T1 (de) 2009-12-15
EP1301649A1 (en) 2003-04-16
AU2001275831B2 (en) 2006-09-07
CA2416093C (en) 2009-06-30
DE60140673D1 (de) 2010-01-14
EP1174526A1 (en) 2002-01-23
AU7583101A (en) 2002-01-30
US7220450B2 (en) 2007-05-22
BR0112552A (pt) 2003-06-24
JP5049446B2 (ja) 2012-10-17
MXPA03000438A (es) 2004-09-10
US20040022942A1 (en) 2004-02-05
EP1301649B1 (en) 2009-12-02
ES2337552T3 (es) 2010-04-27

Similar Documents

Publication Publication Date Title
BR0112552B1 (pt) processo para aplicar um revestimento a um substrato
BR0102061B1 (pt) processo para a produÇço de uma camada revestida por pulverizaÇço tÉrmica graduada sobre um substrato.
BR0103931B1 (pt) processo para formar um revestimento contendo alumÍnio.
EP1616975A3 (de) Beschichtetes Substrat
DE60225465D1 (de) Zusammensetzungen zur wässrigen aufbringung von fluorierten silanen
BR0200508B1 (pt) composição aquosa de revestimento, método para preparação de um substrato revestido, e, substrato revestido.
BRPI0516555A (pt) processo de revestimento
DE50014016D1 (de) Beschichtung, enthaltend kolloidal verteiltes metallisches bismut
DK1537097T3 (da) Fremgangsmåde til fremstilling af 3-Halo-4,5-dihydro-1H-pyrazoler
TW200705097A (en) Pattern coating material and pattern formation method
ATE395985T1 (de) Beschichtungsverfahren und beschichtungsmittel
DE602004005888D1 (de) Herstellung von selbstorganisierten monoschichten
BRPI0607111A2 (pt) componente com um revestimento para reduzir a capacidade de umedecimento da superfìcie e método de produção do mesmo
TW200801857A (en) Photoresist stripping liquid and method for processing substrate using the liquid
AR028571A1 (es) Proceso para preparar compuestos de acido iminodiacético a partir de sustratos de monoetanolamina
BR0208503A (pt) Produção de superfìcies abrasivas revestidas padronizadas
WO2002099153A3 (en) Inoculants for intermetallic layer
BR0203987B1 (pt) método para o revestimento de pelo menos um substrato com um fluido usando um aparelho.
PT1347984E (pt) Processo para a preparacao de derivados de taxano
BR0009453A (pt) Processo para a preparação de um composto
BR9907806A (pt) Processo para revestir pelo menos uma superfìcie de um substrato feito de vidro orgânico, e, solução de tratamento aquosa
BR0114102A (pt) Processo eficiente para a preparação de um inibidor do fator xa
PT1339703E (pt) Processo para a preparacao de paclitaxel
BR0008352A (pt) Composto quìmico, e, processo para produzir um composto
BR0307300A (pt) Integração de pelo menos dois processos para reutilizar ácido

Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 16/07/2013, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 19A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2594 DE 24-09-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.