BR0112552A - Processo para aplicar um revestimento a um substrato, e, uso de condições de estrangulamento em um processo de deposição de vapor contìnuo - Google Patents
Processo para aplicar um revestimento a um substrato, e, uso de condições de estrangulamento em um processo de deposição de vapor contìnuoInfo
- Publication number
- BR0112552A BR0112552A BR0112552-4A BR0112552A BR0112552A BR 0112552 A BR0112552 A BR 0112552A BR 0112552 A BR0112552 A BR 0112552A BR 0112552 A BR0112552 A BR 0112552A
- Authority
- BR
- Brazil
- Prior art keywords
- coating
- applying
- substrate
- vapor deposition
- continuous vapor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Thermistors And Varistors (AREA)
- Tone Control, Compression And Expansion, Limiting Amplitude (AREA)
- Magnetic Heads (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
"PROCESSO PARA APLICAR UM REVESTIMENTO A UM SUBSTRATO, E, USO DE CONDIçõES DE ESTRANGULAMENTO EM UM PROCESSO DE DEPOSIçãO DE VAPOR CONTìNUO". A invenção diz respeito a um processo para aplicar um revestimento a um substrato, em que o revestimento é formado de pelo menos dois componentes ou elementos. Numa modalidade preferida, o revestimento e formado de pelo menos dois metais. De acordo com a invenção, o revestimento é aplicado por deposição de vapor sob condições de estrangulamento.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00202559A EP1174526A1 (en) | 2000-07-17 | 2000-07-17 | Continuous vapour deposition |
PCT/NL2001/000546 WO2002006558A1 (en) | 2000-07-17 | 2001-07-17 | Vapour deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
BR0112552A true BR0112552A (pt) | 2003-06-24 |
BR0112552B1 BR0112552B1 (pt) | 2013-07-16 |
Family
ID=8171819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0112552-4B1A BR0112552B1 (pt) | 2000-07-17 | 2001-07-17 | processo para aplicar um revestimento a um substrato |
Country Status (13)
Country | Link |
---|---|
US (1) | US7220450B2 (pt) |
EP (2) | EP1174526A1 (pt) |
JP (1) | JP5049446B2 (pt) |
KR (1) | KR100819892B1 (pt) |
CN (1) | CN1213162C (pt) |
AT (1) | ATE450630T1 (pt) |
AU (2) | AU7583101A (pt) |
BR (1) | BR0112552B1 (pt) |
CA (1) | CA2416093C (pt) |
DE (1) | DE60140673D1 (pt) |
ES (1) | ES2337552T3 (pt) |
MX (1) | MXPA03000438A (pt) |
WO (1) | WO2002006558A1 (pt) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8435352B2 (en) * | 2005-05-31 | 2013-05-07 | Tata Steel Nederland Technology Bv | Apparatus and method for coating a substrate |
EP1972699A1 (fr) * | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP2048261A1 (fr) * | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
EP2199425A1 (fr) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
WO2011082179A1 (en) * | 2009-12-28 | 2011-07-07 | Global Solar Energy, Inc. | Apparatus and methods of mixing and depositing thin film photovoltaic compositions |
CN103249860B (zh) * | 2010-12-13 | 2016-03-16 | Posco公司 | 连续涂布设备 |
KR101439694B1 (ko) | 2012-12-26 | 2014-09-12 | 주식회사 포스코 | Zn-Mg 합금도금강판 및 그의 제조방법 |
UA116262C2 (uk) * | 2013-08-01 | 2018-02-26 | Арселорміттал | Сталевий лист з цинковим покриттям |
UA117592C2 (uk) | 2013-08-01 | 2018-08-27 | Арселорміттал | Пофарбований оцинкований сталевий лист та спосіб його виготовлення |
US10131983B2 (en) * | 2013-11-05 | 2018-11-20 | Tata Steel Nederland Technology B.V. | Method and apparatus for controlling the composition of liquid metal in an evaporator device |
TWI523962B (zh) * | 2014-10-03 | 2016-03-01 | Nat Inst Chung Shan Science & Technology | Method and apparatus for stabilizing vapor deposition uniformity film |
TWI582251B (zh) * | 2014-10-31 | 2017-05-11 | 財團法人工業技術研究院 | 蒸鍍系統以及蒸鍍方法 |
EP3117907B1 (de) * | 2015-07-13 | 2017-10-25 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate |
EP3225717A1 (de) | 2016-03-30 | 2017-10-04 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung |
KR102098455B1 (ko) | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
WO2019239184A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
JP2019060021A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた塗装鋼板 |
JP2019060022A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた鋼板 |
CN112553578B (zh) * | 2019-09-26 | 2022-01-14 | 宝山钢铁股份有限公司 | 一种具有抑流式喷嘴的真空镀膜装置 |
CN113432775B (zh) * | 2020-03-23 | 2023-04-18 | 核工业理化工程研究院 | 一种标定设备内部气体滞止压力与悬臂梁部件温度关系曲线的方法 |
WO2023062410A1 (en) * | 2021-10-14 | 2023-04-20 | Arcelormittal | Vapour nozzle for pvd |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53110973A (en) * | 1977-03-10 | 1978-09-28 | Futaba Denshi Kogyo Kk | Method and apparatus for manufacturing compounds |
JPS59208006A (ja) * | 1983-05-10 | 1984-11-26 | Toyota Motor Corp | 合金微粉末の製造方法 |
AU3994785A (en) * | 1984-02-13 | 1985-08-27 | Schmitt, J.J. 111 | Method and apparatus for the gas jet deposition of conductingand dielectric thin solid films and products produced there by |
CA1235808A (en) * | 1984-03-22 | 1988-04-26 | Tetsuo Oka | Vertical magnetic recording medium and process for preparation thereof |
JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
US5104634A (en) * | 1989-04-20 | 1992-04-14 | Hercules Incorporated | Process for forming diamond coating using a silent discharge plasma jet process |
US5256205A (en) * | 1990-05-09 | 1993-10-26 | Jet Process Corporation | Microwave plasma assisted supersonic gas jet deposition of thin film materials |
US5919310A (en) * | 1991-10-07 | 1999-07-06 | Canon Kabushiki Kaisha | Continuously film-forming apparatus provided with improved gas gate means |
AU5598194A (en) * | 1992-11-13 | 1994-06-08 | Energy Conversion Devices Inc. | Microwave apparatus for depositing thin films |
JPH08269696A (ja) * | 1995-03-28 | 1996-10-15 | Nisshin Steel Co Ltd | Mgの蒸発方法 |
JPH0953173A (ja) * | 1995-08-18 | 1997-02-25 | Nisshin Steel Co Ltd | 蒸発材料の安定供給方法 |
US5728224A (en) * | 1995-09-13 | 1998-03-17 | Tetra Laval Holdings & Finance S.A. | Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate |
JPH09143682A (ja) * | 1995-11-22 | 1997-06-03 | Nisshin Steel Co Ltd | 多重ダクトを用いたZn−Mg蒸着法及び蒸着めっき設備 |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US5874131A (en) * | 1996-10-02 | 1999-02-23 | Micron Technology, Inc. | CVD method for forming metal-containing films |
BE1010720A3 (fr) * | 1996-10-30 | 1998-12-01 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'un alliage metallique en phase vapeur. |
US6062256A (en) * | 1997-02-11 | 2000-05-16 | Engineering Measurements Company | Micro mass flow control apparatus and method |
US6165554A (en) * | 1997-11-12 | 2000-12-26 | Jet Process Corporation | Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films |
US6309508B1 (en) * | 1998-01-15 | 2001-10-30 | 3M Innovative Properties Company | Spinning disk evaporator |
US6190732B1 (en) * | 1998-09-03 | 2001-02-20 | Cvc Products, Inc. | Method and system for dispensing process gas for fabricating a device on a substrate |
US6804285B2 (en) * | 1998-10-29 | 2004-10-12 | Canon Kabushiki Kaisha | Gas supply path structure for a gas laser |
EP1014426A3 (en) * | 1998-12-22 | 2004-02-04 | Canon Kabushiki Kaisha | Apparatus and method for processing a substrate |
US6409837B1 (en) * | 1999-01-13 | 2002-06-25 | Tokyo Electron Limited | Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor |
-
2000
- 2000-07-17 EP EP00202559A patent/EP1174526A1/en not_active Withdrawn
-
2001
- 2001-07-17 CA CA002416093A patent/CA2416093C/en not_active Expired - Lifetime
- 2001-07-17 BR BRPI0112552-4B1A patent/BR0112552B1/pt not_active IP Right Cessation
- 2001-07-17 JP JP2002512445A patent/JP5049446B2/ja not_active Expired - Fee Related
- 2001-07-17 DE DE60140673T patent/DE60140673D1/de not_active Expired - Lifetime
- 2001-07-17 CN CNB018157629A patent/CN1213162C/zh not_active Expired - Fee Related
- 2001-07-17 EP EP01953374A patent/EP1301649B1/en not_active Expired - Lifetime
- 2001-07-17 AT AT01953374T patent/ATE450630T1/de active
- 2001-07-17 WO PCT/NL2001/000546 patent/WO2002006558A1/en active IP Right Grant
- 2001-07-17 AU AU7583101A patent/AU7583101A/xx active Pending
- 2001-07-17 AU AU2001275831A patent/AU2001275831B2/en not_active Ceased
- 2001-07-17 KR KR1020037000767A patent/KR100819892B1/ko active IP Right Grant
- 2001-07-17 ES ES01953374T patent/ES2337552T3/es not_active Expired - Lifetime
- 2001-07-17 US US10/333,039 patent/US7220450B2/en not_active Expired - Lifetime
- 2001-07-17 MX MXPA03000438A patent/MXPA03000438A/es active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN1213162C (zh) | 2005-08-03 |
CN1458985A (zh) | 2003-11-26 |
CA2416093A1 (en) | 2002-01-24 |
JP2004504487A (ja) | 2004-02-12 |
WO2002006558A1 (en) | 2002-01-24 |
KR20030032999A (ko) | 2003-04-26 |
KR100819892B1 (ko) | 2008-04-07 |
BR0112552B1 (pt) | 2013-07-16 |
ATE450630T1 (de) | 2009-12-15 |
EP1301649A1 (en) | 2003-04-16 |
AU2001275831B2 (en) | 2006-09-07 |
CA2416093C (en) | 2009-06-30 |
DE60140673D1 (de) | 2010-01-14 |
EP1174526A1 (en) | 2002-01-23 |
AU7583101A (en) | 2002-01-30 |
US7220450B2 (en) | 2007-05-22 |
JP5049446B2 (ja) | 2012-10-17 |
MXPA03000438A (es) | 2004-09-10 |
US20040022942A1 (en) | 2004-02-05 |
EP1301649B1 (en) | 2009-12-02 |
ES2337552T3 (es) | 2010-04-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 16/07/2013, OBSERVADAS AS CONDICOES LEGAIS. |
|
B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 19A ANUIDADE. |
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B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2594 DE 24-09-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |